This document discusses pulsed laser deposition (PLD), a physical vapor deposition technique used to deposit thin films. In PLD, a high-power pulsed laser beam is focused onto a target material, vaporizing it and creating a plasma plume that expands toward a substrate where the ablated material is deposited as a thin film. Factors like laser parameters, substrate temperature, background pressure influence the nucleation and growth of the deposited film. PLD offers benefits like exact transfer of complex materials and variable growth rates compared to other thin film deposition methods.