Sputtering/reactive_sputtering/magnetron_sputtering/ion_sputtering/substrate_thinfilmdeposition_physical vapor deposition

1. Muhammad Jawad Nasir
SP22-RPH-003
Presentation Topic
“The detailed description of sputtering”
Presented to
D r. Kashif Tufail Chaudhry And My Class
Associate Professor Batch MS/Spring 2022
Department Of Physics Date: 12-Dec-2022
COMSATS University Islamabad , Lahore Campus

2. Basic Terminologies
what are thin films ?
Thin film is the layer of material ranging from fraction of nanometer(monolayer)
to several micrometer in thickness.
Muhammad Jawad Nasir

3. What is the Substrate ?
It is a solid substance or medium to which another substance is applied
and to which that second substance adhere.
Semiconductor
Nobel Metals
Ceramics
Muhammad Jawad Nasir

4. Muhammad Jawad Nasir
Thin Film Deposition
Physical
Deposition
Chemical
Deposition
Evaporation Sputtering CVD ALD

5. What Is Sputtering
sputtering, is a physical process in which atoms in a solid state (target) are released and
passed into the gas phase by bombardment with energetic ion.
Metallic Films : Al-Alloy, Ti, Tantalum,
Nickle, Cobalt, Gold etc.
Muhammad Jawad Nasir

6. General Mechanism
Evaporation
Transport and
Deposition
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Gas Phase
Solid Phase
(Changes In Physical Morphology)

7. Requirements For Sputtering
Vacuum
Inert Gas
Power Supply
Substrate of your
choice
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8. Sputtering Steps
◊ Ions are generated and directed at a targeted
◊ The ions sputter target atom
◊ The ejected atoms are transported to the substrate
◊ Atoms condense and form a thin film
Muhammad Jawad Nasir

9. Sputtering Yield
Defined as the number of atoms ejected per incident ion.
Determine the deposition rate
Depends Upon :
• Mass of bombarding ion.
• Energy of the bombarding ion.
• Direction of incidence of ions (angle).
• Pressure.
Muhammad Jawad Nasir

10. Energy Of The Bombarding Ions
Ion energy vs. Sputter Yield
Source: Introduction to micro
electronics fabrication.
Richard C. Jaeger P.132 Chap 6
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11. Types Of Sputtering Deposition
1 - Magnetron Sputtering
2- Ion-Beam Sputtering
3-Reactive Sputtering
4- Ion-assisted deposition
5- High Target Utilization Sputtering (Hi TUS)
6-High Power Impulse Magnetron Sputtering (Hi PIMS)
7- Gas Flow Sputtering
Muhammad Jawad Nasir

12. Magnetron Sputtering
•Magnetron Sputtering is the most commonly used method for sputter
deposition.
•It usually utilize a strong electric and magnetic fields to trap electrons close
to the surface of the magnetron, which is the ‘Target’.
•The electrons follow helical paths around the magnetic fields line undergoing
more ionizing collisions with gaseous neutrals near the target surface.
•The extra Argon ions created as a result of these collisions leads to a higher
deposition rate . It also mean the plasma can be sustained at lower pressure.
Muhammad Jawad Nasir

13. Muhammad Jawad Nasir

14. Illustration Of Magnetron Sputtering
M + e- M+• + 2e-
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15. Why Magnetron Sputtering ?
1-Super Hard Coating:
TiN, TiC , and other super hard coatings, coating the surface of tools to enhance
performance and prolonged service life.
2-Solid Lubricating Film:
Commonly used are soft metals (Ag, Au, Pb, Sn etc.) layered substances (MoS2,
WS2, Graphite, etc.) polymer material (nylon, polytetrachloroethylene, etc.)
3-Transparent Conductive Film:
Its thickness is thin, its transparency is close to that of glass, and its conductivity is close to
that of metal ,such as Indium Tin Oxide(ITO), Aluminum-Doped Zinc oxide (ZAO),etc. These
films used in LCD , Touch Screen, and Thin Film Solar Cell.
Muhammad Jawad Nasir

16. 1- Nearly All Type Of Materials Can 1-Plasma Instability
be deposited regardless of their melting
temperature 2-Non uniformly removal of particles
from the target results the non-
2-Source can be placed scaled and uniform films on the substrate.
positioned anywhere in the chamber.
3-An erosion track in the target, leads
3-Films of compounds and alloys can to poor efficiency of sputtering yield
be deposited vs target volume.
Muhammad Jawad Nasir

17. Ion-Beam Sputtering
Ion beam sputtering utilize ion source to generate a focused ion beam directed at
target to be sputtered.
The ion source consists of a cathode and anode
with a common central axis.
Applying a high voltage (2-10kv) to anode creates
an electrostatic field inside ion source.
When Argon gas is injected into the ion source the
high E-field ionize it creating plasma,
The ions accelerated from anode to exit aperture creating a collimated ion beam which
hits the target and via momentum transfer b/w ion and target sputter the material on the
substrate.
Muhammad Jawad Nasir

18. Uses Of Ion-Beam Sputtering
Vanadium oxide microbolometer
Precision Optics (Lasers, IR detectors)
VCSEL anti reflective coatings
High efficiency solar cells
Thermal imaging
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19. Reactive Sputtering
In reactive sputtering, the sputtered
particle from a target material undergo a
chemical reaction aiming to deposit a film
with different composition on substrate.
The chemical reaction that the particles
undergo is with a reactive gas introduced
into the sputtering chamber such as oxygen
and nitrogen , enabling the production
of oxide and nitride respectively.
Muhammad Jawad Nasir

20. Types Of Reactive Gases and Their Uses
1-oxygen:
Is used for deposition of oxide films e.g., Al2O3, SiO2 , TiO2 etc.
2-Nitrogen:
This aids the deposition of nitride films e.g., TiN, ZrN, CrN, etc,
3-Acetylene C2H2
One od the gases that can aid the deposition of metal-DLC,
hydrogenated carbide, carbo-nitride films.
Muhammad Jawad Nasir

21. Uses Of Reactive Sputtering
It has become a valuable commercial process for depositing
Dielectrics
Resistors
Semiconductors
For Example:
The reactive sputtering of tantalum nitride is one of
the most widely used processes for depositing resistors.
Muhammad Jawad Nasir

22. Summary
what is sputtering ?
Magnetron sputtering
Ion beam sputtering
Reactive Sputtering
Their Applications and uses.
Monday 11-Dec-2022 A.D

23. References (URL's)
1- en.wikipedia.org/wiki/thin_film
2- www.techtarget.com/whatis/definition/substrate%3famp=1
3- https://nanografi.com/blog/sputtering-process-types-and-
uses/#:~:text=Sputtering%20is%20a%20physical%20process,(mainly%20no
ble%20gas%20ions).
4- Introduction to microfabrication electronics 2nd edition by Richard C. Jaeger
5-https://www.sputtertargets.net/blog/an-overview-of-magnetron-
sputtering.html
6-https://www.dentonvacuum.com/what-is-ion-beam-deposition
7-https://www.lesker.com/newweb/ped/applications/reactive-sputtering-
research.cfm
Animations
The animated videos are taken from YouTube

24. THANK YOU