photolithography: why patterning is required, material required for etching, pattern of FTO, procedure and experimental data.

1. PATTERNING OF FTO
FOR USING AS ANODE IN PSSC
BY
Preeti choudhary
M.Sc. APPLIED PHYSICS
2017/MAP/016
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2. Why patterning is required?
Etching of FTO from the edges of
glass is required to prevent short
circuiting between top and
bottom contacts in device during
testing.
Since test leads press down at
the edges of solar cell.
Etching of FTO layer at
this edge
cathode
anode
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3. Material required for Etching.
1. Polyamide tape (used as mask)
or
Any sticker which don’t react with acids.
2. Zinc powder.
3. HCl (2M)
4. Dropper
5. DI water (for washing)
6. Ethanol (for washing)
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4. Pattern of FTO
Exposed Area
Tapped Area
Exposed Area
FTO GLASS
Etched Area
(non-conducting)
Etched Area
(non-conducting)
FTO coated Area
(conducting)
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5. Procedure:
Masking
Pour zinc powder
Drop HCl
Clean glass 5

6. THANK YOU
FOR YOUR ATTENTION
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