This document discusses the fabrication of different types of diodes and integrated circuits. It describes the fabrication process of Schottky barrier diodes using metal-semiconductor contacts and their low storage time characteristics. It also summarizes the fabrication of different types of integrated resistors like diffused, epitaxial, pinched, and thin film resistors. Additionally, it covers the construction of integrated junction and MOS capacitors. Finally, it outlines the fabrication process for JFET, MOSFET and CMOS devices.