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Plasma Etching

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Minh Anh Nguyen

Plasma etching is a key process in microelectronic device manufacturing that uses reactive gases and radio frequency power to chemically etch materials in an anisotropic manner. It offers advantages over wet etching such as better control, reproducibility, selectivity, and ability to produce vertical sidewalls. While more expensive than wet etching, plasma etching became widely adopted in the 1970s and enabled the manufacturing of smaller features needed for advancing microelectronics technology.

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Plasma Etching By Student : EE576 (VLSI Processing) Minh Anh Thi Nguyen 11/8/01
Outline ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
When Plasma Etching applies in Microelectronic ,[object Object],[object Object]
What is Plasma Etching ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Types of plasma etching system ,[object Object],[object Object],[object Object],[object Object]
None plasma based ,[object Object],[object Object],[object Object],[object Object]
Plasma based ,[object Object],[object Object]
Isotropic etching ,[object Object],[object Object],[object Object],[object Object],[object Object]
Anisotropic etching ,[object Object],[object Object]
Isotropic Vs. Anisotropic ,[object Object],[object Object],[object Object]
Isotropic vs. Anisotropic ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Plasma etching ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Sputter etching ,[object Object],[object Object],[object Object]
Chemical etching ,[object Object],[object Object],[object Object]
Accelerated ion –assisted etching ,[object Object]
Sidewall-protected ion-assisted etching ,[object Object],[object Object]
Reactive ion etching ,[object Object],[object Object],[object Object]
Parameters in plasma ,[object Object],[object Object],[object Object],[object Object],[object Object]
Plasma etch process temperature control ,[object Object],[object Object],[object Object]
Plasma temperature control (cont.) ,[object Object],[object Object],[object Object]
Low pressure ,[object Object],[object Object]
How Plasma etching works ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
How Plasma etching works ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Reactive plasma etching and equipment ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Barrel Reactor ,[object Object]
RIE system ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
MRIE system ,[object Object],[object Object],[object Object],[object Object],[object Object]
ERC system ,[object Object],[object Object],[object Object],[object Object]
ICP system ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Clustered plasma system ,[object Object],[object Object],[object Object]
Processes of plasma etching
Advantages of Plasma etching ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Disadvantages of plasma etching ,[object Object],[object Object],[object Object],[object Object],[object Object]
When do we want to use plasma etching ,[object Object],[object Object],[object Object]
Why use plasma etching? ,[object Object],[object Object],[object Object],[object Object]
References ,[object Object],[object Object],[object Object],[object Object]
[object Object]

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Plasma Etching

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