Integrated Circuit (IC) Manufacture
- Slicing the Silicon ingot
- Fabrication of IC’s (Lithography, Sputtering, diffused junction, …)
- Testing each IC on the slice
- Dicing (cutting each chip out with a diamond saw)
- Packaging
CrO2 – low temperature thin film growth, structural and physical propertiespmfds
The document summarizes research on growing chromium dioxide (CrO2) thin films at low temperatures using chemical vapor deposition. Key findings include:
1) High quality CrO2 thin films with the desired structural and magnetic properties could be grown at as low as 330°C, significantly lower than previous methods allowed.
2) Films grown at lower temperatures had thinner intermediate chromium oxide layers and higher spin polarization near 100%, desirable for spintronic devices.
3) Growth temperature, oxygen flow rate, and film thickness were found to influence the structural, magnetic, and electrical properties of the resulting CrO2 thin films.
Introduction to thin film growth and molecular beam epitaxyOleg Maksimov
This document provides an introduction to thin film growth techniques focusing on molecular beam epitaxy (MBE). It describes various physical vapor deposition and chemical vapor deposition methods. MBE is explained in detail, including the advantages of growth in an ultra-high vacuum environment with independent material sources and in-situ monitoring via RHEED. Different growth modes such as Frank-van der Merwe, Volmer-Weber, and Stranski-Krastanov are also summarized.
A presentation on Molecular Beam Epitaxy made by Deepak Rajput. It was presented as a course requirement at the University of Tennessee Space Institute in Fall 2008.
Molecular beam epitaxy (MBE) is a method for growing thin films one layer at a time under ultra-high vacuum conditions. It involves heating solid sources of material in effusion cells to create molecular beams that are deposited on a heated substrate. The absence of carrier gases and ultra-high vacuum environment result in films of the highest purity. MBE is widely used to manufacture semiconductor devices and is considered a fundamental tool for nanotechnology development due to its precise control over layer thickness down to a single atomic layer.
Epitaxial deposition is a method for growing high quality crystalline films on crystalline substrates. There are two main types: homoepitaxy, where the film and substrate are the same material, and heteroepitaxy, where they differ. Key parameters that affect the epitaxial growth process include temperature, pressure, and reactant flow. Common techniques include vapor phase epitaxy, liquid phase epitaxy, and molecular beam epitaxy, each with their own advantages and disadvantages for producing films for semiconductor and optoelectronic devices.
This document discusses molecular beam epitaxy (MBE), a process for depositing thin crystalline films. MBE involves heating pure elements in separate cells under high vacuum and allowing them to condense as a film on a substrate. It allows precise control over film thickness and composition to grow structures like semiconductor lasers. In-situ diagnostics like reflection high-energy electron diffraction (RHEED) are used to monitor growth. Challenges include the Ataro-Tiller-Grinfeld instability that can cause cracking in the film above a critical thickness if the substrate and film have a lattice mismatch.
This document provides information about molecular beam epitaxy (MBE) for thin film growth. MBE uses beams of molecules in an ultra-high vacuum to deposit thin crystalline films one layer at a time onto a substrate. Key aspects of MBE include its very low deposition rate, the use of shutters to control layer thickness at an atomic level, and in-situ monitoring using reflection high-energy electron diffraction. Challenges include the Ataro-Tiller-Grinfeld instability that can cause films to crack due to lattice mismatch with the substrate.
CrO2 – low temperature thin film growth, structural and physical propertiespmfds
The document summarizes research on growing chromium dioxide (CrO2) thin films at low temperatures using chemical vapor deposition. Key findings include:
1) High quality CrO2 thin films with the desired structural and magnetic properties could be grown at as low as 330°C, significantly lower than previous methods allowed.
2) Films grown at lower temperatures had thinner intermediate chromium oxide layers and higher spin polarization near 100%, desirable for spintronic devices.
3) Growth temperature, oxygen flow rate, and film thickness were found to influence the structural, magnetic, and electrical properties of the resulting CrO2 thin films.
Introduction to thin film growth and molecular beam epitaxyOleg Maksimov
This document provides an introduction to thin film growth techniques focusing on molecular beam epitaxy (MBE). It describes various physical vapor deposition and chemical vapor deposition methods. MBE is explained in detail, including the advantages of growth in an ultra-high vacuum environment with independent material sources and in-situ monitoring via RHEED. Different growth modes such as Frank-van der Merwe, Volmer-Weber, and Stranski-Krastanov are also summarized.
A presentation on Molecular Beam Epitaxy made by Deepak Rajput. It was presented as a course requirement at the University of Tennessee Space Institute in Fall 2008.
Molecular beam epitaxy (MBE) is a method for growing thin films one layer at a time under ultra-high vacuum conditions. It involves heating solid sources of material in effusion cells to create molecular beams that are deposited on a heated substrate. The absence of carrier gases and ultra-high vacuum environment result in films of the highest purity. MBE is widely used to manufacture semiconductor devices and is considered a fundamental tool for nanotechnology development due to its precise control over layer thickness down to a single atomic layer.
Epitaxial deposition is a method for growing high quality crystalline films on crystalline substrates. There are two main types: homoepitaxy, where the film and substrate are the same material, and heteroepitaxy, where they differ. Key parameters that affect the epitaxial growth process include temperature, pressure, and reactant flow. Common techniques include vapor phase epitaxy, liquid phase epitaxy, and molecular beam epitaxy, each with their own advantages and disadvantages for producing films for semiconductor and optoelectronic devices.
This document discusses molecular beam epitaxy (MBE), a process for depositing thin crystalline films. MBE involves heating pure elements in separate cells under high vacuum and allowing them to condense as a film on a substrate. It allows precise control over film thickness and composition to grow structures like semiconductor lasers. In-situ diagnostics like reflection high-energy electron diffraction (RHEED) are used to monitor growth. Challenges include the Ataro-Tiller-Grinfeld instability that can cause cracking in the film above a critical thickness if the substrate and film have a lattice mismatch.
This document provides information about molecular beam epitaxy (MBE) for thin film growth. MBE uses beams of molecules in an ultra-high vacuum to deposit thin crystalline films one layer at a time onto a substrate. Key aspects of MBE include its very low deposition rate, the use of shutters to control layer thickness at an atomic level, and in-situ monitoring using reflection high-energy electron diffraction. Challenges include the Ataro-Tiller-Grinfeld instability that can cause films to crack due to lattice mismatch with the substrate.
Molecular beam epitaxy (MBE) is a technique for growing crystalline thin films one atomic layer at a time by heating a substrate and directing beams of molecules or atoms onto the substrate from various solid sources placed in evaporation cells. The technique allows for precise and pure layering of compound semiconductor materials less than 0.01 nanometers thick. MBE is used to produce complex semiconductor structures that can then be processed into electronic and optoelectronic devices like transistors, light-emitting diodes, solar cells, and lasers used in applications such as fiber optics, phones, satellites, and displays.
Pulsed laser deposition is a thin film growth technique where a high-power pulsed laser is focused on a target in a vacuum chamber, vaporizing the target material which then condenses on a substrate. It allows for the growth of a wide variety of oxide, nitride, metal and other films. The composition of the deposited film mimics that of the target. PLD systems are relatively inexpensive and easy to use, leading to its popularity in academic research. Key advantages include nearly stoichiometric transfer, flexibility in depositing different materials, and real-time thickness control. The laser-target interaction process involves rapid heating, vaporization and formation of an energetic plume that interacts strongly with the substrate during deposition.
Rosa alejandra lukaszew a review of the thin film techniques potentially ap...thinfilmsworkshop
This document discusses thin film techniques that could be applicable for superconducting radio frequency (SRF) cavities. It reviews various thin film deposition methods like sputtering, evaporation, and ion beam assisted deposition. Challenges in achieving high quality niobium films for SRF cavities are discussed, including issues like adhesion, purity, defects, grain size, stress. The document provides background on thin film nucleation and growth processes. It also summarizes some previous work done on niobium thin films at the College of William and Mary using DC magnetron sputtering and reactive sputtering.
The document discusses the process for manufacturing optical fibers. It describes purifying silica, depositing silica onto a silica tube via chemical vapor deposition to form the core, sintering and annealing the tube to create a solid rod, drawing the rod out to form thin fibers, and applying polymer coatings for protection. It also mentions upcoming tests and review materials for class.
The document discusses cadmium telluride thin film solar cells. It describes how CdTe solar cells work and the fabrication process using spray pyrolysis to deposit CdS thin films and pulsed plasma deposition to deposit CdTe layers at low temperature. Characterization of the films using XRD showed the CdS films were polycrystalline hexagonal structures and the CdTe films had an optical bandgap of 1.50eV, matching the expected value.
This document provides an overview of metallization for integrated circuits. It discusses the requirements and purposes of metallization, including interconnecting thousands of devices on chips. Two common metallization methods described are vacuum evaporation and sputter deposition. Vacuum evaporation locally heats a material source to vaporize and deposit the metal film, while sputter deposition uses ion momentum from a plasma to eject atoms from a target onto the substrate. The document outlines the apparatus and processes for each technique.
This document discusses top-down and bottom-up approaches for designing and preparing nanoparticles. The top-down approach involves breaking down bulk materials into nano-sized particles using methods like ball milling. The bottom-up approach involves building nanoparticles from individual atoms or molecules using nucleation and growth methods. Both approaches have advantages like control over particle size but also disadvantages such as potential contamination from milling or difficulty producing at large scale.
This document provides an overview of thin film deposition methods and thin film characterization techniques. It discusses the objectives of the course, which are to provide an understanding of thin film deposition methods, their capabilities and limitations. Hands-on demonstrations and experiments will help participants understand each deposition method and stimulate discussion. The document then summarizes various thin film deposition techniques like evaporation, sputtering, chemical vapor deposition, their principles and examples of applications. It also summarizes various characterization techniques used to analyze thin films and determine properties like composition, structure, thickness and defects.
This document discusses pulsed laser deposition (PLD), a physical vapor deposition technique used to deposit thin films. In PLD, a high-power pulsed laser beam is focused onto a target material, vaporizing it and creating a plasma plume that expands toward a substrate where the ablated material is deposited as a thin film. Factors like laser parameters, substrate temperature, background pressure influence the nucleation and growth of the deposited film. PLD offers benefits like exact transfer of complex materials and variable growth rates compared to other thin film deposition methods.
Thin films are layers of material ranging from 10-500 nanometers thick. Thin film technology is used in many applications like microelectronics, optics, and magnetic coatings. There are various deposition techniques used to fabricate thin films, including physical vapor deposition methods like sputtering and evaporation, and chemical vapor deposition methods like plasma-enhanced CVD and low-pressure CVD. Each deposition technique has advantages and disadvantages depending on the substrate and material properties. Thin films are used to produce microelectronics, sensors, tailored materials, optical coatings, and corrosion/wear resistant coatings.
Bottom up approaches for nanoparticle synthesiskusumDabodiya
The document discusses bottom-up approaches for synthesizing nanomaterials. Bottom-up approaches involve building nanostructures from individual atoms and molecules, as opposed to top-down approaches which break down bulk materials. Some key bottom-up techniques described are physical vapor deposition methods like inert gas condensation, thermal evaporation, sputtering, and laser ablation which use gas precursors. Liquid phase bottom-up methods including wet chemical synthesis and microemulsion techniques are also covered. The document provides details on the mechanisms and advantages of various bottom-up synthesis methods.
This document summarizes the key steps in integrated circuit fabrication: 1) wafer preparation through crystal growth, 2) oxidation, 3) photolithography, 4) diffusion, 5) ion implantation, 6) metallization, 7) testing, 8) passivation, and 9) packaging. It describes processes like Czochralski growth, oxidation, photolithography, diffusion, ion implantation, and metallization. It also discusses semiconductor types, apparatus used, and differences between diffusion, ion implantation, and doping. The document provides an overview of IC fabrication methods and processes.
This document discusses silicon nanocrystals. It defines a nanocrystal as a crystalline nanoparticle with at least one dimension less than or equal to 100 nm. It explains that silicon nanocrystals can emit light even though bulk silicon cannot. The document discusses two methods for preparing silicon nanocrystals: electrochemical etching of silicon wafers and pulverization. Electrochemical etching uses hydrofluoric acid to dissolve silicon and form a porous structure containing silicon nanocrystals. Pulverization produces silicon nanocrystal agglomerates in powder form.
Metallic Thin Film Deposition for Sensing ApplicationsMinh Tran
This poster presented the deposition of metallic thin film by the wet-chemistry methods, i.e. the galvanic displacement and the electrodeposition. The methods offered not only the simplicity and low-cost of the experimental setup, but also certain levels of control over the morphology, density, and size of the deposited metallic nanostructures. Several characterization methods were applied to examine the thin films, including the SEM, AFM, XRD, and XPS. Furthermore, thin film deposition by physical and chemical vapor deposition will be outlined for future work. Finally, the samples were tested for their applicability for Surface Enhanced Raman Spectroscopy (SERS) in which low concentrations of Rhodamine 6G (R6G) dye and paraoxon, a highly toxic organophosphate pesticide, were detected. They showed promising results.
This document discusses nanomaterials and nanotechnology. It defines nanomaterials as materials with structured components less than 100nm in at least one dimension. It describes four main types of nanomaterials: carbon-based, metal-based, dendrimers, and composites. The properties of nanoparticles differ from bulk materials due to their high surface area to volume ratio and quantum confinement effects. Nanoparticles are synthesized using top-down or bottom-up approaches such as sol-gel methods, chemical vapor deposition, and pulsed laser deposition. Nanotechnology has applications in areas like energy, electronics, medicine, and consumer goods.
This document provides an overview of nanomaterials and carbon nanotubes. It discusses how nanomaterials are materials with sizes between 1 to 100 nm that exhibit unique properties. Carbon nanotubes are nanomaterials made of rolled graphene sheets that have excellent mechanical and electrical properties. The document outlines several methods for synthesizing carbon nanotubes including high pressure carbon monoxide deposition and chemical vapor deposition. It then discusses important properties and applications of carbon nanotubes such as their strength, conductivity, and use as reinforcements in composites.
Band gap engineering of hybrid perovskites for solar cellsKiriPo
This document discusses band gap engineering of hybrid organic-inorganic lead halide perovskites. It describes how the band gap of methylammonium lead iodide bromide perovskites can be tuned between 1.55-2.29 eV by varying the halide composition in the solution during a two-step deposition process. Using a mesoporous scaffold improves the mechanical stability of the perovskite films. Annealing after deposition prevents instant degradation but affects uniform film formation. The goal is to optimize the fabrication process and characterize the resulting perovskite films.
Shulze - Surface and Thin Film Characterization of Superconducting Multilayer...thinfilmsworkshop
http://www.surfacetreatments.it/thinfilms
Surface and Thin Film Characterization of Superconducting Multilayer films for application in RF (Roland Schulze - 30')
Speaker: Roland Schulze - Los Alamos National Laboratory | Duration: 30 min.
Abstract
The use of multilayer ultra-thin films on the interior surfaces of Nb superconducting RF cavities shows great promise in substantially improving the performance characteristics of superconducting RF cavities into the 100 MV/m range by increasing the RF critical magnetic field, HRF, through careful choice of new materials and thin film structures. However, there are substantial materials science challenges associated with producing such complex film structures, particularly for conformal application of uniform thin films on the interior surfaces of RF cavities. Here we present surface and thin film analysis of ultra-thin films of two candidate materials, MgB2 and NbN superconductors, deposited through several different methods, along with multilayers produced with alternating superconductor and dielectric films. We report on the analysis methods and techniques, using primarily x-ray photoelectron spectroscopy and Auger spectroscopy with ion sputter depth profiling, and describe results from variety of thin film samples. The materials stability, microstructure, chemistry, and thin film morphology are highly dependent on methods and parameters used in the thin film deposition. From our analysis, important factors for producing quality superconducting and dielectric films include chemical stoichiometry, impurity content, deposition temperature, substrate choice and conditioning, choice of dielectric material, and the nature of the thin film interfaces. These factors will be discussed in the context of the production methods used for these ultra-thin superconducting films.
Molecular beam epitaxy (MBE) is a technique for growing crystalline thin films one atomic layer at a time by heating a substrate and directing beams of molecules or atoms onto the substrate from various solid sources placed in evaporation cells. The technique allows for precise and pure layering of compound semiconductor materials less than 0.01 nanometers thick. MBE is used to produce complex semiconductor structures that can then be processed into electronic and optoelectronic devices like transistors, light-emitting diodes, solar cells, and lasers used in applications such as fiber optics, phones, satellites, and displays.
Pulsed laser deposition is a thin film growth technique where a high-power pulsed laser is focused on a target in a vacuum chamber, vaporizing the target material which then condenses on a substrate. It allows for the growth of a wide variety of oxide, nitride, metal and other films. The composition of the deposited film mimics that of the target. PLD systems are relatively inexpensive and easy to use, leading to its popularity in academic research. Key advantages include nearly stoichiometric transfer, flexibility in depositing different materials, and real-time thickness control. The laser-target interaction process involves rapid heating, vaporization and formation of an energetic plume that interacts strongly with the substrate during deposition.
Rosa alejandra lukaszew a review of the thin film techniques potentially ap...thinfilmsworkshop
This document discusses thin film techniques that could be applicable for superconducting radio frequency (SRF) cavities. It reviews various thin film deposition methods like sputtering, evaporation, and ion beam assisted deposition. Challenges in achieving high quality niobium films for SRF cavities are discussed, including issues like adhesion, purity, defects, grain size, stress. The document provides background on thin film nucleation and growth processes. It also summarizes some previous work done on niobium thin films at the College of William and Mary using DC magnetron sputtering and reactive sputtering.
The document discusses the process for manufacturing optical fibers. It describes purifying silica, depositing silica onto a silica tube via chemical vapor deposition to form the core, sintering and annealing the tube to create a solid rod, drawing the rod out to form thin fibers, and applying polymer coatings for protection. It also mentions upcoming tests and review materials for class.
The document discusses cadmium telluride thin film solar cells. It describes how CdTe solar cells work and the fabrication process using spray pyrolysis to deposit CdS thin films and pulsed plasma deposition to deposit CdTe layers at low temperature. Characterization of the films using XRD showed the CdS films were polycrystalline hexagonal structures and the CdTe films had an optical bandgap of 1.50eV, matching the expected value.
This document provides an overview of metallization for integrated circuits. It discusses the requirements and purposes of metallization, including interconnecting thousands of devices on chips. Two common metallization methods described are vacuum evaporation and sputter deposition. Vacuum evaporation locally heats a material source to vaporize and deposit the metal film, while sputter deposition uses ion momentum from a plasma to eject atoms from a target onto the substrate. The document outlines the apparatus and processes for each technique.
This document discusses top-down and bottom-up approaches for designing and preparing nanoparticles. The top-down approach involves breaking down bulk materials into nano-sized particles using methods like ball milling. The bottom-up approach involves building nanoparticles from individual atoms or molecules using nucleation and growth methods. Both approaches have advantages like control over particle size but also disadvantages such as potential contamination from milling or difficulty producing at large scale.
This document provides an overview of thin film deposition methods and thin film characterization techniques. It discusses the objectives of the course, which are to provide an understanding of thin film deposition methods, their capabilities and limitations. Hands-on demonstrations and experiments will help participants understand each deposition method and stimulate discussion. The document then summarizes various thin film deposition techniques like evaporation, sputtering, chemical vapor deposition, their principles and examples of applications. It also summarizes various characterization techniques used to analyze thin films and determine properties like composition, structure, thickness and defects.
This document discusses pulsed laser deposition (PLD), a physical vapor deposition technique used to deposit thin films. In PLD, a high-power pulsed laser beam is focused onto a target material, vaporizing it and creating a plasma plume that expands toward a substrate where the ablated material is deposited as a thin film. Factors like laser parameters, substrate temperature, background pressure influence the nucleation and growth of the deposited film. PLD offers benefits like exact transfer of complex materials and variable growth rates compared to other thin film deposition methods.
Thin films are layers of material ranging from 10-500 nanometers thick. Thin film technology is used in many applications like microelectronics, optics, and magnetic coatings. There are various deposition techniques used to fabricate thin films, including physical vapor deposition methods like sputtering and evaporation, and chemical vapor deposition methods like plasma-enhanced CVD and low-pressure CVD. Each deposition technique has advantages and disadvantages depending on the substrate and material properties. Thin films are used to produce microelectronics, sensors, tailored materials, optical coatings, and corrosion/wear resistant coatings.
Bottom up approaches for nanoparticle synthesiskusumDabodiya
The document discusses bottom-up approaches for synthesizing nanomaterials. Bottom-up approaches involve building nanostructures from individual atoms and molecules, as opposed to top-down approaches which break down bulk materials. Some key bottom-up techniques described are physical vapor deposition methods like inert gas condensation, thermal evaporation, sputtering, and laser ablation which use gas precursors. Liquid phase bottom-up methods including wet chemical synthesis and microemulsion techniques are also covered. The document provides details on the mechanisms and advantages of various bottom-up synthesis methods.
This document summarizes the key steps in integrated circuit fabrication: 1) wafer preparation through crystal growth, 2) oxidation, 3) photolithography, 4) diffusion, 5) ion implantation, 6) metallization, 7) testing, 8) passivation, and 9) packaging. It describes processes like Czochralski growth, oxidation, photolithography, diffusion, ion implantation, and metallization. It also discusses semiconductor types, apparatus used, and differences between diffusion, ion implantation, and doping. The document provides an overview of IC fabrication methods and processes.
This document discusses silicon nanocrystals. It defines a nanocrystal as a crystalline nanoparticle with at least one dimension less than or equal to 100 nm. It explains that silicon nanocrystals can emit light even though bulk silicon cannot. The document discusses two methods for preparing silicon nanocrystals: electrochemical etching of silicon wafers and pulverization. Electrochemical etching uses hydrofluoric acid to dissolve silicon and form a porous structure containing silicon nanocrystals. Pulverization produces silicon nanocrystal agglomerates in powder form.
Metallic Thin Film Deposition for Sensing ApplicationsMinh Tran
This poster presented the deposition of metallic thin film by the wet-chemistry methods, i.e. the galvanic displacement and the electrodeposition. The methods offered not only the simplicity and low-cost of the experimental setup, but also certain levels of control over the morphology, density, and size of the deposited metallic nanostructures. Several characterization methods were applied to examine the thin films, including the SEM, AFM, XRD, and XPS. Furthermore, thin film deposition by physical and chemical vapor deposition will be outlined for future work. Finally, the samples were tested for their applicability for Surface Enhanced Raman Spectroscopy (SERS) in which low concentrations of Rhodamine 6G (R6G) dye and paraoxon, a highly toxic organophosphate pesticide, were detected. They showed promising results.
This document discusses nanomaterials and nanotechnology. It defines nanomaterials as materials with structured components less than 100nm in at least one dimension. It describes four main types of nanomaterials: carbon-based, metal-based, dendrimers, and composites. The properties of nanoparticles differ from bulk materials due to their high surface area to volume ratio and quantum confinement effects. Nanoparticles are synthesized using top-down or bottom-up approaches such as sol-gel methods, chemical vapor deposition, and pulsed laser deposition. Nanotechnology has applications in areas like energy, electronics, medicine, and consumer goods.
This document provides an overview of nanomaterials and carbon nanotubes. It discusses how nanomaterials are materials with sizes between 1 to 100 nm that exhibit unique properties. Carbon nanotubes are nanomaterials made of rolled graphene sheets that have excellent mechanical and electrical properties. The document outlines several methods for synthesizing carbon nanotubes including high pressure carbon monoxide deposition and chemical vapor deposition. It then discusses important properties and applications of carbon nanotubes such as their strength, conductivity, and use as reinforcements in composites.
Band gap engineering of hybrid perovskites for solar cellsKiriPo
This document discusses band gap engineering of hybrid organic-inorganic lead halide perovskites. It describes how the band gap of methylammonium lead iodide bromide perovskites can be tuned between 1.55-2.29 eV by varying the halide composition in the solution during a two-step deposition process. Using a mesoporous scaffold improves the mechanical stability of the perovskite films. Annealing after deposition prevents instant degradation but affects uniform film formation. The goal is to optimize the fabrication process and characterize the resulting perovskite films.
Shulze - Surface and Thin Film Characterization of Superconducting Multilayer...thinfilmsworkshop
http://www.surfacetreatments.it/thinfilms
Surface and Thin Film Characterization of Superconducting Multilayer films for application in RF (Roland Schulze - 30')
Speaker: Roland Schulze - Los Alamos National Laboratory | Duration: 30 min.
Abstract
The use of multilayer ultra-thin films on the interior surfaces of Nb superconducting RF cavities shows great promise in substantially improving the performance characteristics of superconducting RF cavities into the 100 MV/m range by increasing the RF critical magnetic field, HRF, through careful choice of new materials and thin film structures. However, there are substantial materials science challenges associated with producing such complex film structures, particularly for conformal application of uniform thin films on the interior surfaces of RF cavities. Here we present surface and thin film analysis of ultra-thin films of two candidate materials, MgB2 and NbN superconductors, deposited through several different methods, along with multilayers produced with alternating superconductor and dielectric films. We report on the analysis methods and techniques, using primarily x-ray photoelectron spectroscopy and Auger spectroscopy with ion sputter depth profiling, and describe results from variety of thin film samples. The materials stability, microstructure, chemistry, and thin film morphology are highly dependent on methods and parameters used in the thin film deposition. From our analysis, important factors for producing quality superconducting and dielectric films include chemical stoichiometry, impurity content, deposition temperature, substrate choice and conditioning, choice of dielectric material, and the nature of the thin film interfaces. These factors will be discussed in the context of the production methods used for these ultra-thin superconducting films.
Integrated circuits are microscopic arrays of electronic components fabricated onto a single silicon chip. Some key points:
- The first integrated circuit was proposed in 1952 and demonstrated in 1959 by Jack Kilby and Robert Noyce, consisting of just a few transistors.
- Modern integrated circuits can contain billions of components and are fabricated using photolithography to etch circuits onto silicon wafers through a series of deposition, doping, and etching steps.
- Advantages of integrated circuits include low cost, high reliability, low power use, high speeds, and small size. Disadvantages are that they cannot be modified or repaired once produced.
The document describes LPKF's laser direct structuring system for 3D electronics fabrication. Key steps include: 3D part and conductor design, part coating with epoxy, laser etching of conductive traces, copper plating of traces, and post-processing like soldering or wire bonding. The system allows electrical functionalization of 3D structures for applications like antennas on housings or chemical sensors with flip-chip die on plastic substrates.
This document presents a novel TSV fabrication technique using magnetic assembly of nickel wires. It describes the design and construction of an automated assembly tool to insert nickel wires into via holes in silicon wafers. The document also details efforts to improve the RF performance of the TSVs by depositing a thin gold layer on the nickel wires to take advantage of the skin effect. Test structures containing different TSV configurations were fabricated to evaluate the RF capabilities of the new TSV technology.
A printed circuit board (PCB) is a non-conductive laminated substrate that mechanically supports and electrically connects electronic components using copper tracks, pads and other features etched onto copper sheets. PCBs have evolved from early point-to-point wiring to modern surface mount and multilayer board designs. Key aspects of PCBs include the substrate material (often FR-4 fiberglass), copper patterning process (subtractive or additive), drilling of holes, plating, solder mask and the assembly of electronic components. Modern PCB design utilizes computer-aided manufacturing systems to efficiently layout, simulate and produce circuit boards.
This document discusses integrated circuits (ICs). It provides a brief history starting from the 1940s and covers the scale of integration from small to ultra-large scale. The key types of ICs and wafer fabrication process involving shaping, etching, cleaning and film deposition are summarized. The advantages of ICs include their small size, low weight and high speed. Applications include automobiles, appliances and computers.
This document provides an introduction and background on Complementary Metal Oxide Semiconductor (CMOS) technology. It discusses key components of a CMOS circuit including NMOS, PMOS, photolithography, etching, chemical mechanical planarization, shallow trench isolation, contacts, vias, and interlayer dielectrics. The objectives of the project are to identify defects in a defective CMOS sample using electrical testing, scanning laser optical microscopy, passive voltage contrast under SEM, and focused ion beam with EDX to determine the root cause of the defect.
High Capacity Planar Supercapacitors and Lithium-Ion Batteries byModular Man...Bing Hsieh
High Capacity Planar Supercapacitors and Lithium Ion Batteries by Modular Manufacturing
Novel planar supercapacitors (SC) and lithium ion batteries (LIB) having interdigitated electrodes for large format applications will be presented. We will discuss the design principles of the new planar structures, their potential to give > 5X improvement in capacity over current supercapacitors, their pack designs, as well as low cost fabrication by modular manufacturing. The drawings given in the following link depict the plan view (top) and the cross-sectional view (bottom) of a planar LIB, wherein the dotted and the hatched areas are the positive and the negative electrodes respectively; the gray areas are the current collectors and the gray lines are the grid lines. Unlike the known interdigitated thin film microsupercapacitor design where the current collectors are situated on the top or bottom surfaces of the electrodes and paralleled to the plane of the substrate and can only exert limited weak fringe fields, the current collectors in our new design are running along the sidewalls of the electrodes and are perpendicular to the substrate and can thus provide strong direct fields, as indicated by the purple arrow, to promote facile ion movement across the entire thickness of the electrodes (20-100 µm). In addition, the relatively narrow inter-spaces between two opposite electrodes (20-100 µm) may allow much higher power densities than ever. Due to their scalability and low cost modular manufacturing processes by printing, the new planar SC/LIB may be designed for a wide range of applications such as mobile devices, transportation, and grid and distributed energy storage.
https://drive.google.com/file/d/0B7fDeNQTYRc9VDdOTTVYRmh2QWc/view?usp=sharing
1) The document describes research into fabricating 3D self-rolled thin-film structures for use in high density energy storage devices like lithium-ion batteries.
2) Using techniques like angled e-beam deposition and selective etching, the researchers were able to form rolled-up nanotube structures with diameters controlled down to the micrometer scale from thin films of materials like silicon, gold, and titanium.
3) Preliminary results show the 3D nanotube architecture allows for a small volume footprint with a large surface area, which could provide advantages for lithium-ion batteries by accommodating high volume expansion during charging and discharging over many cycles.
Semiconductor devices and presentation.pptmohasanali
This document provides an overview of semiconductor device fabrication. It discusses the basic process which involves taking raw polysilicon material and purifying it into silicon wafers. The wafers then undergo a repeated process of oxidation, photolithography, etching, and other steps to build the integrated circuits. Key aspects like dimensions, historical perspectives, and Moore's Law regarding decreasing size over time are covered. The document also outlines typical device structures, packaging challenges, and opportunities for electrical engineering graduates in the semiconductor industry.
Edo ppp-coe-cor-int-xxx-014-208-236-rev-a-tml lisco cathodic protection systemErol DAG
This document provides details on the cathodic protection system being designed and installed for the steel piles at the Libyan Iron and Steel Company's Bulk Berth No. 2 and Loading Berth development project. The system will use impressed current cathodic protection delivered via 22 transformer/rectifier units to protect the piles across 11 modules. Key aspects of the design include electrical isolation of modules, redundancy provisions, and connection of the steel piles to ensure uniform protection.
This document provides an overview of integrated circuits (ICs), including a brief history from their invention in 1958, the scale of integration from small to ultra-large scale, the wafer fabrication process involving shaping, etching, cleaning and film deposition, the advantages of ICs being small, light and fast, and their applications in computers, automobiles and more.
VLSI stands for Very Large Scale Integration and refers to integrated circuits with over 100,000 transistors. The document discusses the history and progression of integration levels from SSI to VLSI to ULSI. It also describes the photolithography process used to etch circuit designs onto silicon wafers at the microscopic level needed for modern integrated circuits.
The document provides information on VLSI technology course syllabus covering topics such as cleanroom technology, epitaxy, oxidation, diffusion, lithography, etching, and metallization. It discusses the creation of electronic grade silicon from sand through processes like reduction, purification, crystal growth via Czochralski method, wafer shaping through sawing and polishing to produce uniform thickness wafers ready for fabrication.
Integrated circuits have increased dramatically in complexity over time due to advances in fabrication technology allowing for higher densities of components on silicon chips. The fabrication process involves growing high purity silicon crystals, depositing layers, doping for conductivity, patterning circuits using photolithography, and packaging individual dies. Advances like shrinking transistor sizes and cleaner room environments have allowed integration to scale while maintaining reliability.
This document provides an overview of printed circuit board (PCB) design and describes the steps involved in creating a PCB using EAGLE tutorial software. It discusses what a PCB is, how PCBs work through drilling, patterning, lamination and coating processes. It outlines reasons for learning PCB design like creating robust embedded devices. The document then details developing the functional design by identifying components, designing the schematic, and laying out the PCB design and routing. It provides guidance on component selection including through-hole, surface mount packages, and decoupling capacitors.
Sorry to say but the college spelling is wrong actually "technology" word is missing. Its by mistake.
A presentation on printed circuit board designing. A brief discussion on pcb fabrication. Basic steps involved in it.
Kerala Engineering Architecture Medical is an entrance examination series for admissions to various professional degree courses in the state of Kerala, India. It is conducted by the Office of the Commissioner of Entrance Exams run by the Government of Kerala
Paleontology is the study of the history of life on Earth as based on fossils. Fossils are the remains of plants, animals, fungi, bacteria, and single-celled living things that have been replaced by rock material or impressions of organisms preserved in roc
This document provides an overview of basic chemistry concepts. It defines chemistry as the study of matter and its properties. The main branches of chemistry are described as organic, inorganic, physical, industrial, analytical, biochemistry, and nuclear chemistry. Matter is classified as pure substances or mixtures based on its composition. Elements are the basic units that make up all matter and can exist as atoms or molecules. Chemical properties and reactions are governed by laws such as the law of conservation of mass. The mole concept is introduced as a unit used to quantify the amount of substance.
1. The document provides an overview of key concepts in ecology including definitions of ecology, environment, biotic and abiotic factors, levels of biological organization, niche, adaptation, species, populations, communities, ecosystems, producers, consumers, trophic levels, food chains, food webs, ecological pyramids, biotic interactions, symbiosis, biomes, and ecological succession.
2. Key terms are defined such as ecology, environment, producers, consumers, trophic levels, competition, predation, symbiosis, mutualism, commensalism, parasitism, biome, primary succession and secondary succession.
3. Examples are provided to illustrate various ecological concepts and interactions between organisms.
The ways in which an element—or compound such as water—moves between its various living and nonliving forms and locations in the biosphere is called a biogeochemical cycle. Biogeochemical cycles important to living organisms include the water, carbon, nitrogen, phosphorus, and sulfur cycles.
The AC and DC bridge both are used for measuring the unknown parameter of the circuit. The AC bridge measures the unknown impedance of the circuit. The DC bridge measures the unknown resistance of the circuit.
This document discusses three types of electronic bridges: Hays Bridge, Scherings Bridge, and Wien Bridge. It presents topics on each bridge but does not provide any details about their applications or functions. The document lists the three bridge types but lacks descriptions and explanations.
For most of us, our name existed even before we did.
In anticipation of our arrival, our parents went through an ultra stressful process of narrowing down dozens of potential names until they chose the perfect one.
Luckily they did, because whatever your name is, it has followed you throughout your entire life; and in some cases, people may have heard of your name before they’ve ever met you.
When it comes to how to name an app, it’s of similar importance as naming a child. The name of your app will follow your brand forever, and in many cases, potential users will hear the name before they ever actually use your app.
flora and fauna of himachal pradesh and keralaAJAL A J
flora and fauna of himachal pradesh and kerala
A green pearl in the Himalayan crown, Himachal Pradesh is blessed with a rich flora and fauna that graces the land with grandeur and majesty. Other animals that can be sighted in the wild include the ibex, wild yak, ghoral deer, musk deer, Himalayan black bear, brown bear, leopards and the Himalayan Thar. Also kerala is gods on country
Bachelor of Science in Cardio-vascular technology is an undergraduate course in cardiology. These technologists assist the physicians in the diagnosis and the treatment of cardiac (heart) and peripheral vascular conditions (blood vessels). The cardiovascular technologists are also responsible for preparing the patients for open-heart surgeries and pacemaker implantation surgeries. The technologists also monitor the patient’s cardiac parameters while they undergo the surgery. B. Sc. in Cardiovascular technology is a three years’ full-time undergraduate course and is an interesting and important course in medicine.
`Remove Unprofitable Products and Services. The products or services with the highest gross profit margin are the most important to your business. ...
Find New Customers. New customers can help grow your business. ...
Increase your Conversion Rate. ...
Review Current Pricing Structure. ...
Reduce your inventory. ...
Reduce your overheads.
PCOS is a condition characterized by the formation of cysts in the ovaries caused by increased levels of male hormones preventing ovulation. It can be diagnosed through hormonal testing, ultrasound detection of cysts, and can be caused by genetic or metabolic factors like obesity. Women with PCOS have a higher risk of health issues like infertility, gestational diabetes, and miscarriage during pregnancy and require careful monitoring. Homeopathic, Ayurvedic, and Siddha medicines may help treat PCOS through regulating hormones and the menstrual cycle.
Courses and Career Options after Class 12 in HumanitiesAJAL A J
This document provides information on career and course options after completing class 12 in humanities. It discusses options in several fields such as geography, anthropology, economics, psychology, social work, foreign languages, history, and sports/physical education. For each field, it provides a brief introduction, lists relevant courses and areas of work, and describes some example courses and institutes. The document aims to help students choose the right career path after 12th humanities. It ends by asking if the reader is ready to take their career to the next level.
The document provides guidance on preparing for the NEET exam over different time periods. It outlines important topics in physics, botany, and zoology for NEET. A 180-day and 60-day preparation strategy are presented. General tips are provided, such as understanding the exam pattern, clearly knowing the syllabus, prioritizing subjects, taking scheduled breaks, and regularly evaluating preparation through practice tests.
This document provides information about career counseling services offered by Ajal A J, including a message about his objectives and previous experience in career counseling. It also contains a presentation about revolutions in agriculture and making farms more profitable through out-of-box thinking. Contact information is provided to get in touch with Ajal A J for career counseling or agricultural consulting services.
Are you an NRI and aiming to come back to India to pursue graduation from the top-tier colleges of India?
Then, you’re halfway there. Being an NRI, your top preference would be IITs and NITs of India. If that's the case, you must know the fee structure of both the IITs, NITs (under DASA scheme), Centrally Funded Institutions and State-Level Govt. Engineering Colleges.
Note: According to the latest update from DASA, from session 2021-22 onwards, JEE Rank is made mandatory for NRI/PIO/OCI Students to be eligible for DASA & CIWG Schemes. Hence, 2020-21 will be the last year when SAT 2 scores will be considered for DASA/CIWG Scheme.
Subjects to study if you want to work for a charityAJAL A J
The charity sector can be competitive and experience, volunteer or otherwise, can count for a lot. But there are ways to make that third sector CV stand out from the competition. Why not take some courses? A course can be a great way to make your application shine and an opportunity to learn new skills and ideas.
Joint Entrance Examination - Main or commonly known as JEE Main is a national level entrance exam conducted by the NTA to offer admission to BE/BTech, BPlan and BArch courses at the IIITs (Indian Institute of Information Technology), NITs (National Institute of Technology) and other Centrally Funded Technical Institutions (CFTIs) across the country.
The CLAT 2020 exam will now be held on August 22nd in a computer-based online format. The application deadline has been extended to July 10th. The exam will contain 150 multiple choice questions testing English, current affairs, legal reasoning, and quantitative skills. It provides admission to 22 national law universities in India.
Tools & Techniques for Commissioning and Maintaining PV Systems W-Animations ...Transcat
Join us for this solutions-based webinar on the tools and techniques for commissioning and maintaining PV Systems. In this session, we'll review the process of building and maintaining a solar array, starting with installation and commissioning, then reviewing operations and maintenance of the system. This course will review insulation resistance testing, I-V curve testing, earth-bond continuity, ground resistance testing, performance tests, visual inspections, ground and arc fault testing procedures, and power quality analysis.
Fluke Solar Application Specialist Will White is presenting on this engaging topic:
Will has worked in the renewable energy industry since 2005, first as an installer for a small east coast solar integrator before adding sales, design, and project management to his skillset. In 2022, Will joined Fluke as a solar application specialist, where he supports their renewable energy testing equipment like IV-curve tracers, electrical meters, and thermal imaging cameras. Experienced in wind power, solar thermal, energy storage, and all scales of PV, Will has primarily focused on residential and small commercial systems. He is passionate about implementing high-quality, code-compliant installation techniques.
Null Bangalore | Pentesters Approach to AWS IAMDivyanshu
#Abstract:
- Learn more about the real-world methods for auditing AWS IAM (Identity and Access Management) as a pentester. So let us proceed with a brief discussion of IAM as well as some typical misconfigurations and their potential exploits in order to reinforce the understanding of IAM security best practices.
- Gain actionable insights into AWS IAM policies and roles, using hands on approach.
#Prerequisites:
- Basic understanding of AWS services and architecture
- Familiarity with cloud security concepts
- Experience using the AWS Management Console or AWS CLI.
- For hands on lab create account on [killercoda.com](https://killercoda.com/cloudsecurity-scenario/)
# Scenario Covered:
- Basics of IAM in AWS
- Implementing IAM Policies with Least Privilege to Manage S3 Bucket
- Objective: Create an S3 bucket with least privilege IAM policy and validate access.
- Steps:
- Create S3 bucket.
- Attach least privilege policy to IAM user.
- Validate access.
- Exploiting IAM PassRole Misconfiguration
-Allows a user to pass a specific IAM role to an AWS service (ec2), typically used for service access delegation. Then exploit PassRole Misconfiguration granting unauthorized access to sensitive resources.
- Objective: Demonstrate how a PassRole misconfiguration can grant unauthorized access.
- Steps:
- Allow user to pass IAM role to EC2.
- Exploit misconfiguration for unauthorized access.
- Access sensitive resources.
- Exploiting IAM AssumeRole Misconfiguration with Overly Permissive Role
- An overly permissive IAM role configuration can lead to privilege escalation by creating a role with administrative privileges and allow a user to assume this role.
- Objective: Show how overly permissive IAM roles can lead to privilege escalation.
- Steps:
- Create role with administrative privileges.
- Allow user to assume the role.
- Perform administrative actions.
- Differentiation between PassRole vs AssumeRole
Try at [killercoda.com](https://killercoda.com/cloudsecurity-scenario/)
Applications of artificial Intelligence in Mechanical Engineering.pdfAtif Razi
Historically, mechanical engineering has relied heavily on human expertise and empirical methods to solve complex problems. With the introduction of computer-aided design (CAD) and finite element analysis (FEA), the field took its first steps towards digitization. These tools allowed engineers to simulate and analyze mechanical systems with greater accuracy and efficiency. However, the sheer volume of data generated by modern engineering systems and the increasing complexity of these systems have necessitated more advanced analytical tools, paving the way for AI.
AI offers the capability to process vast amounts of data, identify patterns, and make predictions with a level of speed and accuracy unattainable by traditional methods. This has profound implications for mechanical engineering, enabling more efficient design processes, predictive maintenance strategies, and optimized manufacturing operations. AI-driven tools can learn from historical data, adapt to new information, and continuously improve their performance, making them invaluable in tackling the multifaceted challenges of modern mechanical engineering.
Supermarket Management System Project Report.pdfKamal Acharya
Supermarket management is a stand-alone J2EE using Eclipse Juno program.
This project contains all the necessary required information about maintaining
the supermarket billing system.
The core idea of this project to minimize the paper work and centralize the
data. Here all the communication is taken in secure manner. That is, in this
application the information will be stored in client itself. For further security the
data base is stored in the back-end oracle and so no intruders can access it.
Prediction of Electrical Energy Efficiency Using Information on Consumer's Ac...PriyankaKilaniya
Energy efficiency has been important since the latter part of the last century. The main object of this survey is to determine the energy efficiency knowledge among consumers. Two separate districts in Bangladesh are selected to conduct the survey on households and showrooms about the energy and seller also. The survey uses the data to find some regression equations from which it is easy to predict energy efficiency knowledge. The data is analyzed and calculated based on five important criteria. The initial target was to find some factors that help predict a person's energy efficiency knowledge. From the survey, it is found that the energy efficiency awareness among the people of our country is very low. Relationships between household energy use behaviors are estimated using a unique dataset of about 40 households and 20 showrooms in Bangladesh's Chapainawabganj and Bagerhat districts. Knowledge of energy consumption and energy efficiency technology options is found to be associated with household use of energy conservation practices. Household characteristics also influence household energy use behavior. Younger household cohorts are more likely to adopt energy-efficient technologies and energy conservation practices and place primary importance on energy saving for environmental reasons. Education also influences attitudes toward energy conservation in Bangladesh. Low-education households indicate they primarily save electricity for the environment while high-education households indicate they are motivated by environmental concerns.
Build the Next Generation of Apps with the Einstein 1 Platform.
Rejoignez Philippe Ozil pour une session de workshops qui vous guidera à travers les détails de la plateforme Einstein 1, l'importance des données pour la création d'applications d'intelligence artificielle et les différents outils et technologies que Salesforce propose pour vous apporter tous les bénéfices de l'IA.
Impartiality as per ISO /IEC 17025:2017 StandardMuhammadJazib15
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Generative AI Use cases applications solutions and implementation.pdfmahaffeycheryld
Generative AI solutions encompass a range of capabilities from content creation to complex problem-solving across industries. Implementing generative AI involves identifying specific business needs, developing tailored AI models using techniques like GANs and VAEs, and integrating these models into existing workflows. Data quality and continuous model refinement are crucial for effective implementation. Businesses must also consider ethical implications and ensure transparency in AI decision-making. Generative AI's implementation aims to enhance efficiency, creativity, and innovation by leveraging autonomous generation and sophisticated learning algorithms to meet diverse business challenges.
https://www.leewayhertz.com/generative-ai-use-cases-and-applications/
13. PCB Manufacture
Types of PCB's
single-side, double-side and multi-layer
Which type to use ?
(a) Circuit complexity
(b) Available space
(c) Cost
Typical PCB
insulated substrate
copper connections
protective covering
14. Packaging
Dual Inline Package and its lead-frame
Steps in Lead Frame Manufacture:
(1) Cut copper strips
(2) Clean in a chemical bath
(3) laminate a layer of photoresist
(4) Expose photoresist through mask
(5) Develop and etch
(6) Remove lamination
(7) Plate internal regions with gold/silver
Dual Inline Package and its lead-frame
Steps in Lead Frame Manufacture:
(1) Cut copper strips
(2) Clean in a chemical bath
(3) laminate a layer of photoresist
(4) Expose photoresist through mask
(5) Develop and etch
(6) Remove lamination
(7) Plate internal regions with gold/silver
- Make leadframe
- Die attachment (chip bonded to leadframe using epoxy)
- Wire bonding (ultrasonic welding)
- Encapsulation (moisture resistant coating)
- Molding (plastic package)
- Marking (chip number, co. name, marked on package [laser, silkscreen])
- DTFS: deflash, trim the leadframe, form the leads, singulate (cut dambars)
- Leadfinishing: electroplating the leads
15.
16. Integrated Circuit (IC) Manufacture
- Slicing the Silicon ingot
- Fabrication of IC’s (Lithography, Sputtering, diffused junction, …)
- Testing each IC on the slice
[source: www.towajapan.co.jp]
- Dicing (cutting each chip out with a diamond saw)
- Packaging
24. References
• Carter, Ronald. “Lecture 9 – EE 5342” UTA
• Cheung, Nathan “ Lecture 17 – EE 143” UC Berkeley
• http: //et.nmso.edu/ETCLASSES/vlsi/files/CRYSTAL.HTM
• Hastings, Alan “The Art of Analog Layout”, Prentice Hall, New
Jersey, 2001
• Campbell, Stephen A. , “The Science and Engineering of
Microelectronic Fabrication”, Oxford University Press, New York,
2001
• Alvarez, Antonio, “BiCMOS Technology and Applications”, Prentice
Hall, New Jersey, 2001