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Introduction 
 Vapor Phase Deposition (VPD) technique is a 
method of preparing the extremely pure optical 
glasses. 
 Vapor Phase methods are the ones that are now used 
to produce silica-based fibers with very low 
attenuation, highest transparency with the optimal 
optical properties. 
2
Ingredients 
Starting Materials Dopants 
Starting materials are volatile 
organic compounds such as: 
o SiCl4 
o GeCl4 
o SiF4 
o BCL3 
o O2 
o BBr3 
o POCl3 
Refractive index modification is 
achieved through the formation 
of dopants from the non-silica 
starting materials: 
o TiO2 
o GeO2 
o P2O5 
o Al2O3 
o B2O3 
o F 
3
Classification 
4 
Vapor Phase 
Deposition 
Flame Hydrolysis 
Vapor Axial 
Deposition (VAD) 
Outside Vapor 
Phase Oxidation 
Process (OVPO) 
Chemical Vapor 
Deposition 
Modified Chemical 
Vapor Deposition 
(MCVD) 
Plasma-activated 
Chemical Vapor 
Deposition (PCVD)
Schematic Illustration 
5
Outside Vapor Phase Oxidation (OVPO) 
o Uses flame hydrolysis stems from work on soot processes which were 
used to produce the first fiber with losses of less than 20 dBKm-1. 
o Oxygen is passed through the silicon compound which is vaporized 
removing impurities. 
o Dopants are added and gave following reactions: 
6
Outside Vapor Phase Oxidation (OVPO) (cont.) 
o The silica is regenerated as a fine soot which is deposited on a cool 
rotating mandrel. The flame is reversed back and forth over the length 
of the mandrel for getting sufficient numbers of silica layers. 
o After the process ends, the mandrel is removed and the porous mass 
of silica soot is sintered. 
7
Vapor Axial Depositions (VAD) 
o Continuous technique for 
producing low loss optical 
fibers. 
o Vaporized constituents are 
injected from burners and react 
to form silica soot by flame 
hydrolysis and makes a solid 
porous glass preform. 
o The preform is pulled upwards. 
o Dehydrated by heating with 
SOCl2 using the reaction: 
Fig: The VAD Process 8
Modified Chemical Vapor Deposition (MCVD) 
o Vapor-phase reactants (halide and 
oxygen) pass through a hot zone. 
o Glass particles formed during this 
reaction travel with the gas flow and 
are deposited on the walls of the silica 
tube. 
o The hot zone is moved back and forth 
along the tube allowing the particles 
to be deposited on a layer-by-layer 
basis giving a sintered transparent 
silica film on the walls of the tube. 
o Vaporized GeCl4 and POCl3 are 
added to the gas flow. 
o The core glass is then formed by the 
deposition of successive layers of 
germane-silicate or phosphor-silicate 
glass. 
o After the deposition is completed the 
temperature is increased to between 
1700 and 1900 °C. The tube is then 
collapsed to give a solid preform 
which may then be drawn into fiber. 
9 
Fig: a) Deposition; b) Collapse to 
produce a preform; c) Fiber drawing
The MCVD Process 
10
Plasma-activated Chemical Vapor Deposition (PCVD) 
o PCVD is the stimulation 
of oxide formation by 
means of a non-isothermal 
plasma maintained at low 
pressure in a microwave 
cavity (2.45 GHz) which 
surrounds the tube. 
o Volatile reactants are 
introduced into the tube 
where they react 
heterogeneously. 
o The reaction zone is 
moved backwards and 
forwards along the tube 
by control of the 
microwave cavity and a 
circularly symmetric layer 
growth is formed. 
11 
Fig: The PCVD Process
General Optical Fiber Making Process 
Fig: Double Circle Method Fig: Rod-in-tube Method 12
General Optical Fiber Making Process 
13
Summery 
o Both step index and graded index fibers are made with 
these processes. 
o Gives relatively similar performance for the fabrication of 
both multi-mode and single-mode fibers. 
o MCVD and VAD technique employed together as MCVD-VAD 
hybrid technique for producing polarization 
maintaining fiber. 
14

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Vapor Phase Deposition Techniques

  • 1.
  • 2. Introduction  Vapor Phase Deposition (VPD) technique is a method of preparing the extremely pure optical glasses.  Vapor Phase methods are the ones that are now used to produce silica-based fibers with very low attenuation, highest transparency with the optimal optical properties. 2
  • 3. Ingredients Starting Materials Dopants Starting materials are volatile organic compounds such as: o SiCl4 o GeCl4 o SiF4 o BCL3 o O2 o BBr3 o POCl3 Refractive index modification is achieved through the formation of dopants from the non-silica starting materials: o TiO2 o GeO2 o P2O5 o Al2O3 o B2O3 o F 3
  • 4. Classification 4 Vapor Phase Deposition Flame Hydrolysis Vapor Axial Deposition (VAD) Outside Vapor Phase Oxidation Process (OVPO) Chemical Vapor Deposition Modified Chemical Vapor Deposition (MCVD) Plasma-activated Chemical Vapor Deposition (PCVD)
  • 6. Outside Vapor Phase Oxidation (OVPO) o Uses flame hydrolysis stems from work on soot processes which were used to produce the first fiber with losses of less than 20 dBKm-1. o Oxygen is passed through the silicon compound which is vaporized removing impurities. o Dopants are added and gave following reactions: 6
  • 7. Outside Vapor Phase Oxidation (OVPO) (cont.) o The silica is regenerated as a fine soot which is deposited on a cool rotating mandrel. The flame is reversed back and forth over the length of the mandrel for getting sufficient numbers of silica layers. o After the process ends, the mandrel is removed and the porous mass of silica soot is sintered. 7
  • 8. Vapor Axial Depositions (VAD) o Continuous technique for producing low loss optical fibers. o Vaporized constituents are injected from burners and react to form silica soot by flame hydrolysis and makes a solid porous glass preform. o The preform is pulled upwards. o Dehydrated by heating with SOCl2 using the reaction: Fig: The VAD Process 8
  • 9. Modified Chemical Vapor Deposition (MCVD) o Vapor-phase reactants (halide and oxygen) pass through a hot zone. o Glass particles formed during this reaction travel with the gas flow and are deposited on the walls of the silica tube. o The hot zone is moved back and forth along the tube allowing the particles to be deposited on a layer-by-layer basis giving a sintered transparent silica film on the walls of the tube. o Vaporized GeCl4 and POCl3 are added to the gas flow. o The core glass is then formed by the deposition of successive layers of germane-silicate or phosphor-silicate glass. o After the deposition is completed the temperature is increased to between 1700 and 1900 °C. The tube is then collapsed to give a solid preform which may then be drawn into fiber. 9 Fig: a) Deposition; b) Collapse to produce a preform; c) Fiber drawing
  • 11. Plasma-activated Chemical Vapor Deposition (PCVD) o PCVD is the stimulation of oxide formation by means of a non-isothermal plasma maintained at low pressure in a microwave cavity (2.45 GHz) which surrounds the tube. o Volatile reactants are introduced into the tube where they react heterogeneously. o The reaction zone is moved backwards and forwards along the tube by control of the microwave cavity and a circularly symmetric layer growth is formed. 11 Fig: The PCVD Process
  • 12. General Optical Fiber Making Process Fig: Double Circle Method Fig: Rod-in-tube Method 12
  • 13. General Optical Fiber Making Process 13
  • 14. Summery o Both step index and graded index fibers are made with these processes. o Gives relatively similar performance for the fabrication of both multi-mode and single-mode fibers. o MCVD and VAD technique employed together as MCVD-VAD hybrid technique for producing polarization maintaining fiber. 14