This document discusses the synthesis of nano materials using sputtering. It begins by introducing nano materials and describing electron beam lithography and sputtering processes. The document then details the experimental procedure used, which involves using EBL to pattern PMMA resist on a silicon nitride wafer with a desired pattern. Sputtering is then used to co-deposit alumina and silica onto the patterned wafer. Scanning electron microscopy and atomic force microscopy are used to characterize the synthesized nano materials and confirm the presence of uniformly distributed 50nm cubes. Analysis of SEM and AFM images shows the nano materials have a flat surface, good adhesiveness, and low surface roughness.