The document discusses thin film deposition techniques for industrial applications. It describes electron beam evaporation and magnetron sputtering methods. Examples are given of thin film applications in architectural glass coatings, photovoltaics, and web coating systems. Rotatable and planar sputtering targets are compared, showing higher deposition rates and uniformity are achieved with rotatable targets. Reactive sputtering is detailed for depositing oxides and nitrides. The document emphasizes von Ardenne's equipment for high-rate production coating of large glass or flexible polymer substrates.
Rajeev R. Pillai fabricated lithographically patterned cobalt microstructures and characterized their properties. He used DC magnetron sputtering to deposit a thin film of cobalt on a silicon substrate, then direct laser beam writing and ion beam etching to pattern the cobalt film. Atomic force microscopy and magnetic resistance measurements were used to characterize the structural and magnetic properties of the cobalt microstructures. The resistance was found to vary with the angle between the magnetic field and current, showing the anisotropic magnetoresistance effect.
The document describes a project to develop a fabrication process for tungsten silicon nitride (WSiN) thin film resistors with very high sheet resistance (TFRVHs) for use in monolithic microwave integrated circuits. The design approach involves using reactive sputtering deposition with a WSi3 target and introducing nitrogen gas to increase the sheet resistance of deposited WSiN films. Various characterization tools are identified to evaluate the sheet resistance, thickness, stress, morphology, and composition of deposited films to determine if the design requirements are met. The goals are to produce TFRVHs with 2000 ohm/square sheet resistance, 750-1500 angstrom thickness, and within 10% standard deviation, uniformity and margin of error.
Functional Coatings on Steel in the Built Environment -Current and Future Tec...Sanjay Ghosh
Functional coatings can provide many benefits when applied to steel structures including energy efficiency, healthcare and safety functions. Intumescent coatings provide fire protection and anti-microbial coatings improve health. Solar cells and heaters can be fabricated on low-cost rough steel surfaces using insulating coatings like SU8 and SiOx to provide functions like electricity generation and solar heating. Characterization of steel coated with insulating layers shows improved properties for solar applications like reduced roughness and electrical insulation. Future trends in functional coatings include more sustainable and environmentally friendly water-based technologies, as well as coatings with self-healing and sensing abilities.
This document summarizes research on self-organized porous alumina templates and their applications in nanofabrication. It describes the experimental techniques for synthesizing porous alumina templates through anodization of aluminum foils. Factors that influence the pore size and spacing are discussed, such as applied voltage, aluminum purity, and etching time. Various deposition methods are also summarized, such as electrodeposition of nickel and sputtering of cobalt through the templates. Finally, potential applications of these templates in areas such as carbon nanotube growth and their optical properties are mentioned.
TCOs (transparent conducting oxides) are used in a variety of applications and are deposited on large areas through various techniques. They are used in windows to improve thermal efficiency (U value) and in thin-film solar panels as front contacts. TCO characteristics like transmission, resistance, and morphology are important for different applications. Industrial TCO production involves either inline CVD coating of tin oxide during the float glass process or offline coating methods like magnetron sputtering at a later stage. Maintaining optimal optical and electrical properties while enabling large-scale manufacturing is key.
This document summarizes a lecture on thin film deposition techniques given by Dr. Toru Hara. It begins with definitions of thin films and their applications in electronic devices, optical coatings, optoelectronic devices, and quantum devices. It then provides brief introductions to specific applications like transistors, oxygen sensors, and LEDs. The main deposition techniques are also summarized, including chemical methods like plating, CSD, CVD, and ALD, as well as physical methods like thermal evaporation, sputtering, PLD, and MBE. Examples of equipment schematics are provided for many of the techniques.
Shulze - Surface and Thin Film Characterization of Superconducting Multilayer...thinfilmsworkshop
http://www.surfacetreatments.it/thinfilms
Surface and Thin Film Characterization of Superconducting Multilayer films for application in RF (Roland Schulze - 30')
Speaker: Roland Schulze - Los Alamos National Laboratory | Duration: 30 min.
Abstract
The use of multilayer ultra-thin films on the interior surfaces of Nb superconducting RF cavities shows great promise in substantially improving the performance characteristics of superconducting RF cavities into the 100 MV/m range by increasing the RF critical magnetic field, HRF, through careful choice of new materials and thin film structures. However, there are substantial materials science challenges associated with producing such complex film structures, particularly for conformal application of uniform thin films on the interior surfaces of RF cavities. Here we present surface and thin film analysis of ultra-thin films of two candidate materials, MgB2 and NbN superconductors, deposited through several different methods, along with multilayers produced with alternating superconductor and dielectric films. We report on the analysis methods and techniques, using primarily x-ray photoelectron spectroscopy and Auger spectroscopy with ion sputter depth profiling, and describe results from variety of thin film samples. The materials stability, microstructure, chemistry, and thin film morphology are highly dependent on methods and parameters used in the thin film deposition. From our analysis, important factors for producing quality superconducting and dielectric films include chemical stoichiometry, impurity content, deposition temperature, substrate choice and conditioning, choice of dielectric material, and the nature of the thin film interfaces. These factors will be discussed in the context of the production methods used for these ultra-thin superconducting films.
The document describes experiments to create a tapered porous structure in anodic aluminum oxide (AAO) tubular membranes for use in hemodialysis. It outlines procedures for a two-step anodization process using different electrolyte solutions and voltage parameters at each step. Analysis of results from initial experiments showed that membrane thickness increased with voltage and time during second anodization. Future work proposed repeating experiments while systematically varying time parameters to optimize pore size around 20nm and thickness near 60μm.
Rajeev R. Pillai fabricated lithographically patterned cobalt microstructures and characterized their properties. He used DC magnetron sputtering to deposit a thin film of cobalt on a silicon substrate, then direct laser beam writing and ion beam etching to pattern the cobalt film. Atomic force microscopy and magnetic resistance measurements were used to characterize the structural and magnetic properties of the cobalt microstructures. The resistance was found to vary with the angle between the magnetic field and current, showing the anisotropic magnetoresistance effect.
The document describes a project to develop a fabrication process for tungsten silicon nitride (WSiN) thin film resistors with very high sheet resistance (TFRVHs) for use in monolithic microwave integrated circuits. The design approach involves using reactive sputtering deposition with a WSi3 target and introducing nitrogen gas to increase the sheet resistance of deposited WSiN films. Various characterization tools are identified to evaluate the sheet resistance, thickness, stress, morphology, and composition of deposited films to determine if the design requirements are met. The goals are to produce TFRVHs with 2000 ohm/square sheet resistance, 750-1500 angstrom thickness, and within 10% standard deviation, uniformity and margin of error.
Functional Coatings on Steel in the Built Environment -Current and Future Tec...Sanjay Ghosh
Functional coatings can provide many benefits when applied to steel structures including energy efficiency, healthcare and safety functions. Intumescent coatings provide fire protection and anti-microbial coatings improve health. Solar cells and heaters can be fabricated on low-cost rough steel surfaces using insulating coatings like SU8 and SiOx to provide functions like electricity generation and solar heating. Characterization of steel coated with insulating layers shows improved properties for solar applications like reduced roughness and electrical insulation. Future trends in functional coatings include more sustainable and environmentally friendly water-based technologies, as well as coatings with self-healing and sensing abilities.
This document summarizes research on self-organized porous alumina templates and their applications in nanofabrication. It describes the experimental techniques for synthesizing porous alumina templates through anodization of aluminum foils. Factors that influence the pore size and spacing are discussed, such as applied voltage, aluminum purity, and etching time. Various deposition methods are also summarized, such as electrodeposition of nickel and sputtering of cobalt through the templates. Finally, potential applications of these templates in areas such as carbon nanotube growth and their optical properties are mentioned.
TCOs (transparent conducting oxides) are used in a variety of applications and are deposited on large areas through various techniques. They are used in windows to improve thermal efficiency (U value) and in thin-film solar panels as front contacts. TCO characteristics like transmission, resistance, and morphology are important for different applications. Industrial TCO production involves either inline CVD coating of tin oxide during the float glass process or offline coating methods like magnetron sputtering at a later stage. Maintaining optimal optical and electrical properties while enabling large-scale manufacturing is key.
This document summarizes a lecture on thin film deposition techniques given by Dr. Toru Hara. It begins with definitions of thin films and their applications in electronic devices, optical coatings, optoelectronic devices, and quantum devices. It then provides brief introductions to specific applications like transistors, oxygen sensors, and LEDs. The main deposition techniques are also summarized, including chemical methods like plating, CSD, CVD, and ALD, as well as physical methods like thermal evaporation, sputtering, PLD, and MBE. Examples of equipment schematics are provided for many of the techniques.
Shulze - Surface and Thin Film Characterization of Superconducting Multilayer...thinfilmsworkshop
http://www.surfacetreatments.it/thinfilms
Surface and Thin Film Characterization of Superconducting Multilayer films for application in RF (Roland Schulze - 30')
Speaker: Roland Schulze - Los Alamos National Laboratory | Duration: 30 min.
Abstract
The use of multilayer ultra-thin films on the interior surfaces of Nb superconducting RF cavities shows great promise in substantially improving the performance characteristics of superconducting RF cavities into the 100 MV/m range by increasing the RF critical magnetic field, HRF, through careful choice of new materials and thin film structures. However, there are substantial materials science challenges associated with producing such complex film structures, particularly for conformal application of uniform thin films on the interior surfaces of RF cavities. Here we present surface and thin film analysis of ultra-thin films of two candidate materials, MgB2 and NbN superconductors, deposited through several different methods, along with multilayers produced with alternating superconductor and dielectric films. We report on the analysis methods and techniques, using primarily x-ray photoelectron spectroscopy and Auger spectroscopy with ion sputter depth profiling, and describe results from variety of thin film samples. The materials stability, microstructure, chemistry, and thin film morphology are highly dependent on methods and parameters used in the thin film deposition. From our analysis, important factors for producing quality superconducting and dielectric films include chemical stoichiometry, impurity content, deposition temperature, substrate choice and conditioning, choice of dielectric material, and the nature of the thin film interfaces. These factors will be discussed in the context of the production methods used for these ultra-thin superconducting films.
The document describes experiments to create a tapered porous structure in anodic aluminum oxide (AAO) tubular membranes for use in hemodialysis. It outlines procedures for a two-step anodization process using different electrolyte solutions and voltage parameters at each step. Analysis of results from initial experiments showed that membrane thickness increased with voltage and time during second anodization. Future work proposed repeating experiments while systematically varying time parameters to optimize pore size around 20nm and thickness near 60μm.
Sebastiani - Nano-mechanical and microstructural characterization of MS-PVD N...thinfilmsworkshop
This document summarizes a presentation on nano-mechanical and microstructural characterization of niobium thin films deposited by magnetron sputtering. Key points discussed include:
- Four niobium coatings were produced by varying the applied bias voltage and substrate material.
- Nanoindentation testing revealed the coatings' hardness is not affected by the substrate at depths less than one tenth the coating thickness.
- Analysis of deformation mechanisms using FIB sectioning showed columnar grain sliding and recrystallization during plastic deformation.
- A thin surface oxide layer of around 10nm was found, which could impact the coatings' superconducting performance.
A few Curious Aspects of ZnO Nanostructures - Prof.Joy MitraSTS FORUM 2016
This document summarizes research on designing defects in ZnO nanostructures. It discusses how ZnO naturally forms with n-type doping due to oxygen vacancies and zinc interstitials. The researcher investigates controlling the ratio of zinc interstitials to oxygen vacancies to tune the material's optical and electrical properties. Photoluminescence and conductive atomic force microscopy experiments on ZnO nanorods with varying defect concentrations show changes in emission spectra and localized photoresponse correlated with grain structure. The findings provide insight into defect engineering of ZnO for optoelectronic applications.
Thin films are layers of material ranging from 10-500 nanometers thick. Thin film technology is used in many applications like microelectronics, optics, and magnetic coatings. There are various deposition techniques used to fabricate thin films, including physical vapor deposition methods like sputtering and evaporation, and chemical vapor deposition methods like plasma-enhanced CVD and low-pressure CVD. Each deposition technique has advantages and disadvantages depending on the substrate and material properties. Thin films are used to produce microelectronics, sensors, tailored materials, optical coatings, and corrosion/wear resistant coatings.
The document summarizes principles of vacuum arc deposition (VAD), a PVD process where a plasma produced from a high current discharge in vacuum is used to deposit coatings. Key aspects discussed include cathode spots that erode cathode material to produce a highly ionized metal plasma jet, and the characteristics of vacuum arc plasma such as high ionization, energy and density compared to sputtering plasmas. Vacuum arc deposition has been widely used since the 1970s to produce hard coatings.
This doctoral dissertation examines the use of reduced graphene oxide and its composites for various energy applications. The document outlines the synthesis of reduced graphene oxide through chemical reduction of graphene oxide. Characterization shows the reduced graphene oxide has a layered morphology. The dissertation discusses using reduced graphene oxide composites with materials like ZnO, Ag, and Ag2O as electron transport layers to improve dye-sensitized solar cell performance. Reduced graphene oxide is also investigated as a counter electrode material for dye-sensitized solar cells. Additionally, the potential of reduced graphene oxide composites with polymers and metal oxides for supercapacitors, lithium-ion batteries, and electromagnetic interference shielding is reviewed. Specific applications demonstrated include a reduced graphene oxide
Transparent Conducting Oxides - from and industrial perspectivecdtpv
This document summarizes a presentation given at the University of Liverpool on transparent conducting oxides (TCOs) from an industrial perspective. It discusses how TCOs like fluorine-doped tin oxide are made at an industrial scale using chemical vapor deposition processes and how they are used in applications like energy-efficient windows and solar panels. It also provides an overview of NSG Group, a major glass manufacturer, their TCO products, and their TCO coating processes.
Vacuum Arc Deposition in interior cavities (Yan Valsky), Lecture Prof. R..LBo...Yan Valsky, MSc, MBA
This document discusses vacuum arc deposition (VAD), a physical vapor deposition technique used to apply hard coatings. It reviews the physics behind VAD, including cathode spot formation and plasma jet characteristics. Engineering considerations for VAD like arc ignition, heat removal and macroparticle control are also covered. Finally, it suggests approaches for using VAD to coat interior cavities, such as using the cavity as a vacuum chamber or miniature filtration systems, but notes the technical challenges involved.
Seminário apresentado pelo doutor Santiago Corujeira Gallo, na UCS (Caxias do Sul, RS) em
28 de setembro de 2009. Público: estudantes, professores e pesquisadores da Pós-Graduação em Materiais (PGMat -UCS)
M.Sc. Chemical Engineering Thesis Defense (Omer Farooqi)Omer Farooqi
This is the presentation for my M.Sc. research thesis. I worked on a novel electrode preparation method to carry out voltammetry in order to detect heavy metals in water.
Simulation Studies of ZnO Nanowire Field-Effect Transistornoelds
This document summarizes simulations of zinc oxide nanowire field-effect transistors (ZnO NWFETs) to assess their performance. The simulations used a 3D simulator to model the quantum confinement and ballistic transport effects in NWFETs. The simulations showed that quad-gate ZnO NWFETs with a gate length of 15 nm, gate underlap of 5 nm, and aspect ratio of 2 exhibited near ideal subthreshold characteristics. However, on-state currents could be improved by fabricating parallel nanowire arrays. Future work should include carrier scattering effects and contact resistance for a more realistic model, and allow simulation of larger NWFETs with multiple integrated nanowires.
In-situ TEM studies of tribo-induced bonding modification in near-frictionles...Deepak Rajput
A presentation on "In-situ TEM studies of tribo-induced bonding modification in near-frictionless carbon films" made by Deepak Rajput. This presentation was based on "critical review of a paper," in All Things Carbon course offered at the University of Tennessee Space Insitute at Tullahoma in Fall 2009.
The document summarizes the synthesis of tungsten disulfide (WS2) nanosheets using chemical vapor deposition (CVD) with a gas-phase sulfur reactant. It is observed that the WS2 grows laterally and that domains coalesce over time. The number of layers can be controlled by adjusting the reaction time. Additionally, a graphene/WS2 heterostructure is shown to have properties suitable for photo detection.
The document discusses research into printed carbon nanotube (CNT) vacuum electronics. It aims to demonstrate the feasibility of printed CNT devices and integrating a vacuum diode into printed electronics. Progress includes growing high quality CNTs at low temperatures compatible with substrates, demonstrating vacuum diodes with thresholds of 15V, and developing the process flow and mask design for a nanoscale printed diode.
Anne marie valente feliciano - nucleation of nb films on cu substratesthinfilmsworkshop
In the pursuit of niobium (Nb) films with similar performance with the commonly used bulk Nb surfaces for Superconducting RF (SRF) applications, significant progress has been made with the development of energetic condensation deposition techniques. The controlled incoming ion energy enables a number of processes such as desorption of adsorbed species, enhanced mobility of surface atoms and sub-implantation of impinging ions, thus producing improved film structures at lower process temperatures. All these along with the quality of the Cu substrate have an important influence on the nucleation and subsequent growth of the Nb film, creating a favorable template for growing the final surface exposed to SRF fields. This contribution shows how the structure and defect density thus electron mean free path (represented by residual resistance ratio values) of Nb films can be tailored on Cu substrates, by varying the ion energy and thermal energy provided to the substrate, favoring the hetero-epitaxial or the fiber growth mode.
The Characterization of Graphene Paper for Flexible Electronics ApplicationKamyar Karimi
This document discusses the characterization of graphene paper for flexible electronics applications. It begins with an introduction that defines graphene and its properties, and motivates the need for scalable graphene production methods. It then describes the methodology used, which includes developing a graphene-ethyl cellulose ink and fabricating graphene paper samples. Results showed the paper has a thickness of 200 nm at 3 mg/ml ink concentration. Sheet resistance was modeled and found to be as low as 4.2x10-7 ohm-m. Mechanical tests showed increased annealing time weakens the structure. The paper did not exhibit good supercapacitance due to ethyl cellulose decomposition and low surface area. Recommendations include automated coating for scale up and methods
Carbon nanotubes and their economic feasibilityJeffrey Funk
These slides use concepts from my (Jeff Funk) course entitled analyzing hi-tech opportunities to analyze how the economic feasibility of carbon nanotubes is becoming better through the emergence of new forms of carbon nanotubes, new methods of synthesis, and the increased scale of production equipment. New forms of carbon nanotubes continue to be developed; new ones include carbon nanobuds, doped carbon nanotubes, and graphenated carbon nanotubes, each of which includes many variations. The large number of variations suggests that carbon nanotubes will likely experience improvements in performance and the number of applications will continue to grow.
Nanostructured carbon coating for multipactor effect preventing on metal surf...Aleksei Lavrin
Technology of creation of nanostructured carbon coating on metal parts of transceiver tract of UHF communications equipment of the spacecraft, suppressing the emergence of effect of secondary emission discharge in vacuum conditions.
Plazma-Sk Ltd. Nanosized carbon coating to supress the multipactor effectIgor_Kossyi
Technology of creation nanostructured carbon coating on metal parts of transceiver tract of UHF communications equipment of the spacecraft, suppressing the emergence of effect of secondary emission discharge in vacuum conditions, which is, in the opinion of the community of scientists and engineers, the main cause of the destruction of on-board equipment of communications satellites.
Sebastiani - Nano-mechanical and microstructural characterization of MS-PVD N...thinfilmsworkshop
This document summarizes a presentation on nano-mechanical and microstructural characterization of niobium thin films deposited by magnetron sputtering. Key points discussed include:
- Four niobium coatings were produced by varying the applied bias voltage and substrate material.
- Nanoindentation testing revealed the coatings' hardness is not affected by the substrate at depths less than one tenth the coating thickness.
- Analysis of deformation mechanisms using FIB sectioning showed columnar grain sliding and recrystallization during plastic deformation.
- A thin surface oxide layer of around 10nm was found, which could impact the coatings' superconducting performance.
A few Curious Aspects of ZnO Nanostructures - Prof.Joy MitraSTS FORUM 2016
This document summarizes research on designing defects in ZnO nanostructures. It discusses how ZnO naturally forms with n-type doping due to oxygen vacancies and zinc interstitials. The researcher investigates controlling the ratio of zinc interstitials to oxygen vacancies to tune the material's optical and electrical properties. Photoluminescence and conductive atomic force microscopy experiments on ZnO nanorods with varying defect concentrations show changes in emission spectra and localized photoresponse correlated with grain structure. The findings provide insight into defect engineering of ZnO for optoelectronic applications.
Thin films are layers of material ranging from 10-500 nanometers thick. Thin film technology is used in many applications like microelectronics, optics, and magnetic coatings. There are various deposition techniques used to fabricate thin films, including physical vapor deposition methods like sputtering and evaporation, and chemical vapor deposition methods like plasma-enhanced CVD and low-pressure CVD. Each deposition technique has advantages and disadvantages depending on the substrate and material properties. Thin films are used to produce microelectronics, sensors, tailored materials, optical coatings, and corrosion/wear resistant coatings.
The document summarizes principles of vacuum arc deposition (VAD), a PVD process where a plasma produced from a high current discharge in vacuum is used to deposit coatings. Key aspects discussed include cathode spots that erode cathode material to produce a highly ionized metal plasma jet, and the characteristics of vacuum arc plasma such as high ionization, energy and density compared to sputtering plasmas. Vacuum arc deposition has been widely used since the 1970s to produce hard coatings.
This doctoral dissertation examines the use of reduced graphene oxide and its composites for various energy applications. The document outlines the synthesis of reduced graphene oxide through chemical reduction of graphene oxide. Characterization shows the reduced graphene oxide has a layered morphology. The dissertation discusses using reduced graphene oxide composites with materials like ZnO, Ag, and Ag2O as electron transport layers to improve dye-sensitized solar cell performance. Reduced graphene oxide is also investigated as a counter electrode material for dye-sensitized solar cells. Additionally, the potential of reduced graphene oxide composites with polymers and metal oxides for supercapacitors, lithium-ion batteries, and electromagnetic interference shielding is reviewed. Specific applications demonstrated include a reduced graphene oxide
Transparent Conducting Oxides - from and industrial perspectivecdtpv
This document summarizes a presentation given at the University of Liverpool on transparent conducting oxides (TCOs) from an industrial perspective. It discusses how TCOs like fluorine-doped tin oxide are made at an industrial scale using chemical vapor deposition processes and how they are used in applications like energy-efficient windows and solar panels. It also provides an overview of NSG Group, a major glass manufacturer, their TCO products, and their TCO coating processes.
Vacuum Arc Deposition in interior cavities (Yan Valsky), Lecture Prof. R..LBo...Yan Valsky, MSc, MBA
This document discusses vacuum arc deposition (VAD), a physical vapor deposition technique used to apply hard coatings. It reviews the physics behind VAD, including cathode spot formation and plasma jet characteristics. Engineering considerations for VAD like arc ignition, heat removal and macroparticle control are also covered. Finally, it suggests approaches for using VAD to coat interior cavities, such as using the cavity as a vacuum chamber or miniature filtration systems, but notes the technical challenges involved.
Seminário apresentado pelo doutor Santiago Corujeira Gallo, na UCS (Caxias do Sul, RS) em
28 de setembro de 2009. Público: estudantes, professores e pesquisadores da Pós-Graduação em Materiais (PGMat -UCS)
M.Sc. Chemical Engineering Thesis Defense (Omer Farooqi)Omer Farooqi
This is the presentation for my M.Sc. research thesis. I worked on a novel electrode preparation method to carry out voltammetry in order to detect heavy metals in water.
Simulation Studies of ZnO Nanowire Field-Effect Transistornoelds
This document summarizes simulations of zinc oxide nanowire field-effect transistors (ZnO NWFETs) to assess their performance. The simulations used a 3D simulator to model the quantum confinement and ballistic transport effects in NWFETs. The simulations showed that quad-gate ZnO NWFETs with a gate length of 15 nm, gate underlap of 5 nm, and aspect ratio of 2 exhibited near ideal subthreshold characteristics. However, on-state currents could be improved by fabricating parallel nanowire arrays. Future work should include carrier scattering effects and contact resistance for a more realistic model, and allow simulation of larger NWFETs with multiple integrated nanowires.
In-situ TEM studies of tribo-induced bonding modification in near-frictionles...Deepak Rajput
A presentation on "In-situ TEM studies of tribo-induced bonding modification in near-frictionless carbon films" made by Deepak Rajput. This presentation was based on "critical review of a paper," in All Things Carbon course offered at the University of Tennessee Space Insitute at Tullahoma in Fall 2009.
The document summarizes the synthesis of tungsten disulfide (WS2) nanosheets using chemical vapor deposition (CVD) with a gas-phase sulfur reactant. It is observed that the WS2 grows laterally and that domains coalesce over time. The number of layers can be controlled by adjusting the reaction time. Additionally, a graphene/WS2 heterostructure is shown to have properties suitable for photo detection.
The document discusses research into printed carbon nanotube (CNT) vacuum electronics. It aims to demonstrate the feasibility of printed CNT devices and integrating a vacuum diode into printed electronics. Progress includes growing high quality CNTs at low temperatures compatible with substrates, demonstrating vacuum diodes with thresholds of 15V, and developing the process flow and mask design for a nanoscale printed diode.
Anne marie valente feliciano - nucleation of nb films on cu substratesthinfilmsworkshop
In the pursuit of niobium (Nb) films with similar performance with the commonly used bulk Nb surfaces for Superconducting RF (SRF) applications, significant progress has been made with the development of energetic condensation deposition techniques. The controlled incoming ion energy enables a number of processes such as desorption of adsorbed species, enhanced mobility of surface atoms and sub-implantation of impinging ions, thus producing improved film structures at lower process temperatures. All these along with the quality of the Cu substrate have an important influence on the nucleation and subsequent growth of the Nb film, creating a favorable template for growing the final surface exposed to SRF fields. This contribution shows how the structure and defect density thus electron mean free path (represented by residual resistance ratio values) of Nb films can be tailored on Cu substrates, by varying the ion energy and thermal energy provided to the substrate, favoring the hetero-epitaxial or the fiber growth mode.
The Characterization of Graphene Paper for Flexible Electronics ApplicationKamyar Karimi
This document discusses the characterization of graphene paper for flexible electronics applications. It begins with an introduction that defines graphene and its properties, and motivates the need for scalable graphene production methods. It then describes the methodology used, which includes developing a graphene-ethyl cellulose ink and fabricating graphene paper samples. Results showed the paper has a thickness of 200 nm at 3 mg/ml ink concentration. Sheet resistance was modeled and found to be as low as 4.2x10-7 ohm-m. Mechanical tests showed increased annealing time weakens the structure. The paper did not exhibit good supercapacitance due to ethyl cellulose decomposition and low surface area. Recommendations include automated coating for scale up and methods
Carbon nanotubes and their economic feasibilityJeffrey Funk
These slides use concepts from my (Jeff Funk) course entitled analyzing hi-tech opportunities to analyze how the economic feasibility of carbon nanotubes is becoming better through the emergence of new forms of carbon nanotubes, new methods of synthesis, and the increased scale of production equipment. New forms of carbon nanotubes continue to be developed; new ones include carbon nanobuds, doped carbon nanotubes, and graphenated carbon nanotubes, each of which includes many variations. The large number of variations suggests that carbon nanotubes will likely experience improvements in performance and the number of applications will continue to grow.
Nanostructured carbon coating for multipactor effect preventing on metal surf...Aleksei Lavrin
Technology of creation of nanostructured carbon coating on metal parts of transceiver tract of UHF communications equipment of the spacecraft, suppressing the emergence of effect of secondary emission discharge in vacuum conditions.
Plazma-Sk Ltd. Nanosized carbon coating to supress the multipactor effectIgor_Kossyi
Technology of creation nanostructured carbon coating on metal parts of transceiver tract of UHF communications equipment of the spacecraft, suppressing the emergence of effect of secondary emission discharge in vacuum conditions, which is, in the opinion of the community of scientists and engineers, the main cause of the destruction of on-board equipment of communications satellites.
Plazma-Sk Ltd. has developed a nanostructured coating technology to suppress secondary electron emission on metal surfaces in communication satellites. The technology involves coating metal surfaces with a thin film of nanostructured carbon particles to prevent multipactor discharge. This allows for increased power transmission and reduced satellite failure rates. The coating can be applied at low cost in open air and does not require expensive equipment. Testing has confirmed the coating reduces secondary electron emission and increases the multipactor threshold. The technology provides a low-cost solution and competitive advantages over alternatives. Plazma-Sk seeks funding to further develop and commercialize the technology.
The minimum pressure for viscous flow in a 1 inch diameter pipe is approximately 5 Torr.
At 5 Torr, the mean free path is 0.2 cm.
The Knudsen number is then:
Kn = MFP/d
= 0.2 cm / 2.54 cm
= 0.078
Since Kn < 0.01, the flow will be viscous at or below 5 Torr pressure.
Influence of Thickness on Electrical and Structural Properties of Zinc Oxide ...paperpublications3
Abstract: Zinc Oxide (ZnO) thin films were prepared on corning (7059) glass substrates at a thickness of 75.5 and 130.5nm by RF sputtering technique. The deposition was carried out at room temperature after which the samples were annealed in open air at 1500C. The electrical and structural properties of these films were studied. The electrical properties of the films were monitored by four-point probe method while the structural properties were studied by X-ray diffraction (XRD). It was found that the electrical resistance of the films decreases with increase in the thickness of the films. The XRD analysis of the films showed that the films have a peak located at 〖34.31^0-34.35〗^0with hkl (002). Other parameters calculated include the stress ( ) and the grain size (D).
This document discusses considerations for organic photovoltaic (OPV) thin-film processing and spin coating. It addresses general OPV requirements, practical fabrication issues like cleaning and solvent compatibility, and spin coating parameters that influence film thickness and morphology such as solution concentration, spin speed, and solvent selection. The ideal is to use solvent blends that allow for good surface wetting and rapid drying while also permitting molecular self-organization in the film. Processing conditions like atmosphere, temperature, and substrate treatment are also crucial factors for technologies like perovskite solar cells.
Atomization of reduced graphene oxide ultra thin film for transparent electro...Conference Papers
This document summarizes research on using an atomization process to deposit reduced graphene oxide (rGO) thin films for use as transparent conductive electrodes. Key points:
- Graphene oxide was spray coated onto silicon wafers and glass slides using an ultrasonic atomizer. Thermal reduction processes were then used to make the films electrically conductive while maintaining optical transparency.
- Thinner films with 1-2 spray coats had higher transparency (>90%) but higher resistivity, while thicker 3-4 coat films had lower transparency (77.1%) but lower resistivity (5.3 kΩ/sq).
- Rapid thermal processing was more effective than plasma processing at reducing resistivity. Sheet resistance decreased
Atomization of reduced graphene oxide ultra thin film for transparent electro...Conference Papers
This document summarizes research on using an atomization process to deposit reduced graphene oxide (rGO) thin films for use as transparent conductive electrodes. Key points:
- Graphene oxide was spray coated onto silicon wafers and glass slides using an ultrasonic atomizer. Thermal reduction processes were then used to make the films electrically conductive while maintaining optical transparency.
- Thinner films with 1-2 spray coats had higher transparency (>90%) but higher resistivity, while thicker 3-4 coat films had lower transparency (77.1%) but lower resistivity (5.3 kΩ/sq).
- Rapid thermal processing was more effective than plasma processing at reducing resistivity. Sheet resistance decreased
Slides of invited talk on ALD for MEMS at the AVS-ALD conference ALD 2009 Monterey, California, USA
---
Full reference:
R. L. Puurunen, M. Blomberg, H. Kattelus, ALD layer in MEMS fabrication, 9th International Conference on Atomic Layer Deposition “ALD 2009”, Monterey, California, July 19-22, 2009. Invited talk.
This document discusses thin-film photovoltaics research and opportunities. It covers several topics:
- Thin-film solar cell technologies like CIGS, CdTe, and emerging materials like CZTS have higher efficiencies than earlier generations and lower production costs. Research aims to further improve efficiency and reduce costs.
- The Helmholtz-Zentrum in Berlin conducts R&D on thin-film photovoltaics including advanced materials, device concepts, and characterization techniques to develop more efficient and cost-effective solar cells.
- Issues like material scarcity for some thin-film technologies are being addressed through research into alternative materials and processes to produce solar cells on flexible substrates using less raw
There has been an explosion in new coating technologies for electronics over the past 24 months.
•Key Drivers
–Moisture proofing
–Oxygen barrier (hermeticity)
–Tin whiskers
This document discusses the technical challenges involved in developing an extreme ultraviolet (EUV) light source for semiconductor lithography. Key challenges include developing high-reflectance optics and masks that can withstand EUV light without absorbing too much heat. Producing an efficient EUV plasma from tin droplets using a dual-pulse laser system provides the best method so far but still results in tin debris contamination. Additional challenges include the massive power requirements to generate enough photons and developing photoresists that can resolve features with the lower photon flux of current EUV sources compared to existing 193nm light sources. Overcoming these challenges is critical to continuing the miniaturization of semiconductors as dictated by Moore's Law.
anti reflective coatings on the solar photo voltaic panel'sRajneesh Gautam
Rajneesh Kumar Gautam presented on antireflective coatings. Antireflective coatings help reduce the reflection of light off of surfaces, improving efficiency. Typically 4% of incoming light is reflected off photovoltaic modules without coatings. Coatings work through destructive interference between incident light rays using thin film layers with thicknesses of around one quarter the wavelength of light. Common coating application areas include solar panels, optical windows, and displays where reducing surface reflections increases performance. Coatings are applied using methods like chemical vapor deposition, physical vapor deposition, and spraying.
The document discusses several advanced materials processing techniques including powder processing, sol-gel processing, thermal oxidation, sputtering, pulsed laser deposition, and chemical vapor deposition. It also discusses applications of these techniques such as coating ceramic outer air seals on gas turbine blades and depositing optical fibers. MEMS applications are explored including uses in biotechnology, chemical detection, adaptive optics, and miniature sensors and actuators.
The document provides an overview of material and chemical research activities at ITRI Jassy in Taiwan. It describes the various divisions and their research focuses, including materials for displays, energy storage, electronics, chemicals and fibers. It also summarizes key projects on hybrid materials, coatings, fibers and international collaborations.
Nanotechnology harnesses unusual behaviors of materials at the nanoscale (1-100 nanometers) to achieve scientific and practical results. Materials behave differently at the nanoscale, enabling applications in many fields. Nanotechnology is used in electronics, sunscreens, and other products, and is predicted to significantly grow the number of related jobs. Nanostructures are classified by their dimensions, with zero-dimensional structures having all dimensions in the nanoscale and higher dimensions having some dimensions outside this range. Properties like surface area to volume ratio and quantum confinement explain how size at the nanoscale impacts behavior.
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Attraverso attività formative basate sulla domanda, per cui giovani imprenditori pugliesi tra i 18 e i 35 anni sono stati chiamati a scegliere temi, sedi, metodi didattici e docenti, ARTI ha realizzato percorsi formativi pubblici e aperti a tutti , con lezioni trasmesse anche in streaming e disponibili in remoto su una piattaforma dedicata, www.laboratoridalbasso.it
4. 15.10.2013 Seminar University of Salento4
Application of Thin Films in Contemporary Industry
Outline
• Introduction
• Methods of Deposition
• EB-evaporation
• Sputtering
• Applications & Equipment for Production
• Architectural Glass Coating
• (Thin Film) Photovoltaic
• Sputter Roll Coater for Polymer Films
• Metal Strip Coater
• Developments for OELD Applications
• Summary
5. Introduction
Examples of Thin Film Application
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Solar Park near Leipzig
40 MWp CdTe Solar Farm
(former Russian Military Airport)World Jewellery Center Milano
www.juwi.de
5
7. Introduction
What means “THIN”
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• 0.01 .. 10 nm semiconductor, barrier,
passivation, EUV-optics
• 20 nm transparent metallic layers
• 10 .. > 100 nm optical (refractive) layers
e.g. thickness for interference with λ/4 in SiO2:
550 nm /4 /1,5 = 91,6 nm
• 200 µm thermal barrier
coatings (TBC) YSZ
8. Methods of Deposition
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Plating
Spin Coating
Pyrolytic Coating
and many others …
Chemical Vapor Deposition (CVD)
Atomic Layer Deposition (ALD)
Physical Vapor Deposition (PVD)
• Evaporation (e.g. by electron beam)
• Sputtering
• Molecular Beam Epitaxy (MBE)
• Cathodic Arc Deposition
9. Methods of Deposition
PVD-Process Conditions: Vacuum
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• Mean free path of particles
l ∼ 1/p
air, room temperature, p = 10-2 mbar l = 10 mm
p = 10-3 mbar l = 100 mm
• Scattered particles due to collisions
• Processes with inherent ion-bombardment, e.g. Ar+
• Parasitic incorporation vs. reactive processes
• Common pressure for evaporation < 1*10-4 mbar
• Common pressure for sputtering 5*10-3 mbar
10. Methods of Deposition: Electron Beam Technology
EB-Gun
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EB Generation and EB Guidance
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11. Methods of Deposition: EB-Technology
EB-Gun
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EH150V EH300V EH800V
- Max. Process Chamber Pressure 5 Pa
- Beam Power 30 ... 800 kW
- Acceleration Voltage 30 ... 60 kV
- Cathode System Quick and Easy Exchange
- Space Charge Limited Mode
Option: Temperature Limited Mode
- Power control
patented
Variocathode
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12. Methods of Deposition: Sputtering
Basic Mechanisms of a DC Plasma Discharg
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13. Methods of Deposition: Sputtering
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Vacuum + Argon inlet + electrical
discharge generate the plasma,
i. e. negative electrons and
Argon ions.
High-energetic Argon ions hit the
target surface provoking
energy cascades.
A layer is built up on the substrate
by sputtering the target material.
Substrate
Target
hv
e-
14. Methods of Deposition: Sputtering
Basic Principles of Magnetron Sputtering
• Magnetron-Principle:
Closed magnetic tunnel in front of the sputter target (cathode)
-500 V
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Methods of Deposition: Sputtering
Planar Magnetron Technology
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Plasma Target
Utilization max 45%
16. Re-deposition zones
and oxide deposition:
clamping ledges
powder formation
flaking
film quality disturbed
Reactive Sputtering of
SiO2
Methods of Deposition: Sputtering
Planar Target with Re-Depositions
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17. Methods of Deposition: Sputtering
Dual Rotatable Magnetron RDM 3800
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Target Utilization 85%
ZnO-Al Ceramic Target
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18. Methods of Deposition: Sputtering
Why rotatable targets?
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• Much higher target utilization (factor 2)
• No re-deposition zones at the target surface
• 1.5 to 2 times higher dynamic deposition rates
• Better uniformity < ± 1.5%
• Less arcing, less flaking
• Enhanced magnetic field strength, tunable magnetbars
• Total: lower cost of ownership, CoO
19. Methods of Deposition: Sputtering
Coating Technology- RDM Process in DC Mode
DC, DC-DC or DC-Pulse
conductive Targets (ρ ≤ 1 Ωcm),
long-term stable TCO processes (e.g. ITO or ZnO:Al2O3)
Anode AnodeDC DC
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20. Methods of Deposition: Sputtering
Coating Technology – RDM Process in AC Mode
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AC/MF
+ +- -
AC/MF
++ --
Electron drift
Film condensation with densification by ion impact
Moving substrate
21. Methods of Deposition: Sputtering
Working Ranges for High Rate Reactive Sputtering
21
P = constant!
metallic mode
reactive mode
transition mode
stabilization
by fast control of
reactive gas flow,
only
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22. Film
Material
Target
Material
Type of sputter
process
Max. Dyn. Dep. Rate [nm*m/min]
Rotatable Planar
SiOx Si/Si:Al AC reactive 120 (RDM) 73 (SDM)
Nb2O5 NbxO AC ceramic 80 (RDM) 39 (SDM)
SiO2 Si/Si:Al AC reactive 80 (RDM) 39 (SDM)
ITO ITO DC/DC ceramic 180 (RSM/RSM) 67 (SSM/SSM)
Mo Mo DC/DC metallic 200 (RSM/RSM) 130 (WSM)
ZnO:Al
Zn:Al/
AZO
DC reactive 120 (RSM) N/A
Methods of Deposition: Sputtering
Typical Maximal Dynamic Deposition Rates
Rotatable
RDM – Rotatable Dual Magnetron
RSM – Rotatable Single Magnetron
Planar
SDM – Standard Dual Magnetron
SSM – Standard Single Magnetron
WSM – Wide Single Magnetron
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24. Application: Architectural Glas Coating
GC330H
LowE- und Solar Control-Coatings
Substrate sizes up 3.3 x 6.0 m²
Cycle time 40 sec
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26. Application: Architectural Glas Coating
Benefits of Architectural Low-E Glass Coating
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65 % Transmittance
Outdoors Indoors
Reflectance 23 %
Absorption 12 %
U= 1.2 W/m2K
15 liter fuel oil
per m2 and year
U= 5.8 W/m2K
68 liter fuel oil
per m2 and year
Reflectance 8 %
Absorption 4 %
Energy
savings
heating and cooling costs saving
environmental protection
Fuel
consumption 100% 21%
88 % Transmittance
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Improved Silver Layer: Lower Resistance =
Higher NIR Reflectance
Bottom Layer: TiO2
Increased transmittance and neutral color
Split Top Layer: SnO2/Si3N4
Improved mechanical and chemical robustness of
layer stack
Si3N4
SnO2
NiCrOx
Ag
ZnO
TiO2(TxO)
Glass
Application: Architectural Glass Coating
Heat protection coating with U = 1.1 W/m2K (Single Low-E)
28. Application: Thin Film PV
Solar Cell Structures
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Cd Te > 3 µm
ITO or SnO2:F
CdS0.3 µm
Glass pane 4 mm
CIGS > 2 µm
Cu In (Ga) Se, S
Mo 0.5 µm
i-ZnO and ZnO:Al 1µm
Glass pane 4 mm
Thin Film
a-Si:H CdTe CIGS
Metal 0.5 µm
η = 7% η = 10% η = 13%
ZnO:Al or SnO2:F
Metal Reflector 0.3 µm
ZnO:Al
p a-Si : H
i a-Si : H
n a-Si : H
CdS 50 nm
Glass pane 4 mm
29. Applications for Web Coating
• Invisible ITO-films for touch panels or EMI shielding
• Window films i.e. Low-E, electrochromic, IR blocker
• Antireflection, dry AR coatings
• Flexible PV, contact and absorber layers
• Enhanced mirrors, optical filters
• Barrier and adhesion layers
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30. FOSA1600 Web Coating System
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• Modular design of multi-chamber platform for R2R vacuum coatings
• Deposition of high-quality layers using advanced sputtering technology
• Flexible substrates, polymer films with multiple coil handling
• Industrial mass production
32. Modularity of
Multi-Chamber System
System
• 1x unwinding, 1x rewinding, 1 to 3x process chambers
• 1 drum per process chamber
• Concept allows up to 24 magnetrons
FOSA1600S4FOSA1600D8FOSA1600T12
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33. Pre-Treatment Setup Compartment Mode Type
Plasma Treatment for
all Substrates
DC
LION
Plasma and
Ion Impact
AC Glow Discharge AC
Electron
Impact
Free Span Heaters
Heat and
Desorption
Infra Red
IR
Cryo – Traps
Effective H2O
Pumping within the
Sputter Compartment
Trapping
@ T < -125°C
Pumping
of Water
Vapor
Techniques for Applied Web Coatings
Processes for Pre-treatment of Polymer Films
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Substrate
≈AC
Substrat
Drum @ 80°C
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34. Film Materials Setup Compartment Mode Type
Ag, Al, Cu, Ti, Metals
NiV, NiCr, Alloys
ITO, NbOx, Ceramics
DC
(pulsed)
WSM
planar
Ag, Al, Cu, Ti, Metals
NiV, NiCr, Alloys
ITO, NbOx, Ceramics
DC
(pulsed)
RSM
rotatable
Ag, Al, Cu, Ti, Metals
NiV, NiCr, Alloys
ITO, AZO, Ceramics
DC/DC
separated
(pulsed)
RSM/RSM
rotatable
Ag, Al, Cu, Ti, Metals
ITO, AZO, TCO’s
TiOx, NbOx, Ceramics
DC/DC
DAS (pulsed)
RSM/RSM
rotatable
Techniques for Applied Web Coatings
DC Magnetron Sputtering
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Substrat
Substrat
Substrat
Substrat
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35. Film Materials Setup Compartment Mode Type
Al-reactive Oxides
Si-reactive Oxides
TiO2, Nb2O5, Oxides
AC-MF
dense
Plasma
SDM
planar
Al-reactive Oxides
Si-reactive Oxides
TiO2, Nb2O5, Oxides
AC-MF
dense
Plasma
RDM
rotatable
Al-reactive Nitrides
Si-reactive Nitrides
mixed Oxide-Nitrides
AC-MF
dense
Plasma
RDM
rotatable
Techniques for Applied Web Coatings
AC-MF Magnetron Sputtering
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Substrat
Substrat
Substrat
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36. Metrology
In-Situ
Measurement
• Multi-track optical measurement (Transmit., Reflectance)
• Non contact sheet resistance measurement
• Other parameters on request
• Marker cathode
Process
Control
• Impedance control for SiOxNY deposition
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38. Applications & Equipment for Production
Air-to-Air Metal Strip Coater MCS1250
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• Substrate 1.25 m (W)
• R2R for Metal Strip Coating 24h/5d onto Al, Cu, Steel
• EB-PVD and Rotatable Magnetron Sputtering
• Film materials: Al, CrN, SiO2, TiO2,
39. Metallbandbeschichter MSC 1200
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Applications & Equipment for Production
Air-to-Air Metal Strip Coater
Coatings and Applications
onto Al, Cu and SST metal strip:
Reflectors
Absorbers
Technologies:
• Glow Discharge
• Sputter Etching
• Metallic and Reactive Sputtering
• Electron Beam Evaporation
Length 106 m, Strip width 1,2 m
41. Applications & Equipment for Production
Reflectors with Metal Strips
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Light Reflectors made from Aluminium
Reflectatance:
Electro plated < 85%
Vacuum coating > 96%
20% less energy consumption
with constant illumination strength
42. Applications & Equipment for Production
Enhanced Reflectance vs. Mirror Material
• Enhanced Al Mirror • Enhanced Ag Mirror
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43. Seminar University of Salento43
Applications & Equipment for Production
EB-PVD: Layer Properties
Parameter SiO2 TiO2
Index of refraction n = 1.44 n = 2.2...2.3
(λ = 670 nm)
λ/(4n)-thickness 85 nm 45 nm
O2 partial pressure 1 x 10-4 mbar 1 x 10-4 mbar
density 0.8 ... 0.9 ρbulk 0.8 .... 0.9 ρbulk
Maximum dynamic rate
(absorption free) 30 nm/s 5...6 nm/s
Evaporated material
per cycle (120 h) 80 kg 75 kg
Techn. Challenges Sublimation residual absorption
(re-oxidation of
suboxides)
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44. Solar Absorber with Metal Strip
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Solar Absorber – Top Roof Modul Copper Metal Strip – PVD coated
45. Solar water heating
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• Goals
Best usage of solar energy High solar absorbance Ae
Reduced losses low Emissivity ε
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46. Process Monitoring Using Ellipsometry
In-Situ / Ex-Situ
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• in situ: Ellipsometry, XRF
• ex situ: Reflectometry
• reverse thickness
calculation
• position matching
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