Nanomanufacturing involves producing materials and parts on the nanoscale using either top-down or bottom-up approaches. The top-down approach starts with large pieces of material and makes them smaller through techniques like lithography, while the bottom-up approach builds up structures atom by atom through self-assembly and deposition. Nanomanufacturing allows precise control at the atomic scale, which gives materials unique properties. Current applications include electronics, sensors, and information storage, while potential future applications could expand to fields like aviation, nanobots, and pharmaceuticals.

1. BY
AKSHAY S. MARATHE
CAD-CAM

2.  The term was first proposed by K. Eric Drexler in the 1970's.
 A nanometer is one billionth of a meter.
 It is the manipulation of matter on an atomic and molecular
scale.
 It is currently undergoing extensive development

3. Definition:
Nanomanufacturing is both the production of nanoscaled
materials, which can be powders or fluids, and the
manufacturing of parts "bottom up" from nanoscaled
materials or "top down" in smallest steps for high precision

4.  Materials exhibit unique properties at these scales
 Increase in toughness
 High hardness
 Low thermal co-efficient of expansion

5.  Top-down approach: (1) Scanning probe lithography
(2) Focused beam lithography
(3) Nanoimprint lithography
 Bottom-up approach: (1) Chemical vapor deposition
(2) Physical vapor deposition
(3) Dip-pen nanolithography
(4) Self assembly

6.  Starts from large piece of material and gradually reducing it
to a nanostructure
 Used by the semi-conductor industry
 This approach offers reliability and device complexity
 However it uses energy in large amount and produces more
waste

7.  It is a mechanical approach to realize patterning
 Different configurations are available such as Scanning
tunneling microscope and Atomic force microscope
Mechanical patterning

8. Scanning tunneling microscope

9. Block diagram of Atomic force microscope

10.  It is a high resolution patterning method where electron or
ion beam is used
 Uses modern electron microscope
 High-energy ions tend to damage the sample surface

11.  It is a method of fabricating nanometer scale patterns
 It creates patterns by mechanical deformation of imprint resist and
subsequent processes
 It is able to replicate sub-10 nm patterns with high throughput

12. Nano-imprint lithography

13.  It involves building up of structures, atom by atom or
molecule by molecule
 More economical as there is very less wastage of material
 Formation of films and structures is much easier

14.  It is a relatively matured coating process
 It is widely used in ceramic and semiconductor industry

15.  It is a surface coating methods in which materials are
evaporated by electron beam, ion beam, plasma
 There are no chemical reactions involved in this method
 This process usually requires a high vacuum environment to
allow the vapor to reach the substrate and to reduce the
impurity of deposited films

17.  It enables direct deposition of nanoscale materials onto a
substrate in a flexible manner
 This technique allows surface patterning on scales of under
100 nanometers
 It uses an Atomic force microscope tip to deposit organic
molecules

18. Molecular ink diffusing from a nanoscale
tip to a surface through a water meniscus

19.  It is the autonomous organization of components into patterns or
structures without human intervention
 Many biological systems use self-assembly to assemble various
molecules and structures
 Manufacturing will benefit from applications of self-
assembly

21. CURRENT APPLICATIONS:
 Electronics industry:
Use of nanoscale features to improve
processing speed, memory capacity,
reliability etc
 Sensing units:
Use of nanosensors for medicinal purpose and for
making nanoscale computer chips
 Materials and chemical industry
 Information storage devices

22. Nanosensor

23. POTENTIAL APPLICATIONS:
 Aviation industry
 Nano bots
 Pharmaceuticals and Bio- technology

24. THANK YOU