NANOFABRICATION
TECHNIQUES
PRESENTED BY
MOHSINA AFROOZ
NT/M.TECH/2017-07
OUTLINES
• What is Nanofabrication ?
• Nanofabrication process
• Application
• Conclusion
• References
WHAT IS NANOFABRICATION?
• Nanofabrication refers to the design process of
nanomaterial and devices that are measured in
nanometers(0.1-100nm).
TECHNIQUES OF
NANOFABRICATION
1. Thin Film Deposition
 Physical vapor deposition
 Chemical vapor deposition
2. Patterning i.e. Lithography
 Optical Lithography
 E-beam Lithography
3. Film modification i.e. Etching
 Wet Etching
 Dry Etching
Typical nanofabrication
Process
THIN FILM DEPOSITION
• A thin film is a layer
of materials ranging
from monolayer to
several micrometer
thickness
• It involves deposition
of individual
molecules or atoms
LITHOGRAPHY PROCEDURE
• Lithography consist of patterning substrate by
employing the interaction of beams of photons
or particles with materials
PHOTOLITHOGRAPHY
• PHOTO meaning light
• LITHO meaning stone
• GRAPHY meaning write
That is ‘’PRINTING WITH LIGHT’’
Alphonse Poitevin invented this technique in 1855
ETCHING
• Process that removes material from surface after
lithography is done
• Etching removes those part of substrate which
was not masked
• It also removes the part of resist which was
exposed to light to give fine patterns.
ETCHING
Application of nanofabrication
“Size matters”
Use in manufacturing of PCB, Microcontrollers, MOSFET,
MEMS which are used in large scale in smartphones,
computers and other electronic devices
References
1. Introduction to Nanofabrication by ErliChen,Center for
Imaging and Mesoscale Structure Harvard University
2. Nano-fabrication,Richard Langford richard.langford@tcd.ie
Ex 2006
3. M.D. Austin H. Ge W. Wu M. Li Z. Yu D. Wasserman S.A.
Lyon S‥Y Chou "Fabrication of 5nm linewidth and 14nm
pitch features by nanoimprint lithography" <em>Appl. Phys.
Lett.</em> vol. 84 no. 26 pp. 5299 2004.
Nanofabrication techniques

Nanofabrication techniques

  • 1.
  • 2.
    OUTLINES • What isNanofabrication ? • Nanofabrication process • Application • Conclusion • References
  • 3.
    WHAT IS NANOFABRICATION? •Nanofabrication refers to the design process of nanomaterial and devices that are measured in nanometers(0.1-100nm).
  • 5.
    TECHNIQUES OF NANOFABRICATION 1. ThinFilm Deposition  Physical vapor deposition  Chemical vapor deposition 2. Patterning i.e. Lithography  Optical Lithography  E-beam Lithography 3. Film modification i.e. Etching  Wet Etching  Dry Etching
  • 6.
  • 7.
    THIN FILM DEPOSITION •A thin film is a layer of materials ranging from monolayer to several micrometer thickness • It involves deposition of individual molecules or atoms
  • 8.
    LITHOGRAPHY PROCEDURE • Lithographyconsist of patterning substrate by employing the interaction of beams of photons or particles with materials
  • 9.
    PHOTOLITHOGRAPHY • PHOTO meaninglight • LITHO meaning stone • GRAPHY meaning write That is ‘’PRINTING WITH LIGHT’’ Alphonse Poitevin invented this technique in 1855
  • 11.
    ETCHING • Process thatremoves material from surface after lithography is done • Etching removes those part of substrate which was not masked • It also removes the part of resist which was exposed to light to give fine patterns.
  • 12.
  • 13.
    Application of nanofabrication “Sizematters” Use in manufacturing of PCB, Microcontrollers, MOSFET, MEMS which are used in large scale in smartphones, computers and other electronic devices
  • 14.
    References 1. Introduction toNanofabrication by ErliChen,Center for Imaging and Mesoscale Structure Harvard University 2. Nano-fabrication,Richard Langford richard.langford@tcd.ie Ex 2006 3. M.D. Austin H. Ge W. Wu M. Li Z. Yu D. Wasserman S.A. Lyon S‥Y Chou "Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography" <em>Appl. Phys. Lett.</em> vol. 84 no. 26 pp. 5299 2004.