This document discusses various nanolithography techniques for fabricating nano-scale structures. It introduces nanolithography and defines its terms. It then outlines and describes several key nanolithography methods including photolithography, electron beam lithography, x-ray lithography, nanoimprint lithography, and dip pen nanolithography. Diagrams and figures are included to illustrate the various processes. References are provided at the end.

1. NANOLITHOGRAPHY
TECHNIQUES
FOR NANO SCALE
FABRICATION
DONE BY:
GIRISH RAGHUNATHAN
1RV18MMD07 1

2. OUTLINE
• Introduction
• Photolithography
• Electron Beam Lithography
• X Ray Lithography
• Nano imprint Lithography
• Dip pen lithography
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3. INTRODUCTION
• Nanolithography is the branch of nanotechnology concerned
with the study and application of fabricating nanometer-scale
structures.
• Nanos –dwarf
• Lithos- stone
• Graphein- to write
• Roughly nanolithography translates into ‘tiny writing on stone’
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4. PHOTOLITHOGRAPHY
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STEPS IN PHOTOLITHOGRAPHY :
1) WATER CLEANING
2) BARRIER LAYER FORMATION
3) PHOTORESIST APPLICATION
4) PRE BAKING
5) MASK ALIGNMENT AND EXPOSURE
6) DEVELOPMENT
7) HARD BAKING
8) ETCHING
9) STRIPPING Fig 1: Photolithography Process

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Fig 2: Spin coating of resist

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Fig 3: Photolithography Process

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Fig 4: Photolithography Process

8. ELECTRON BEAM NANOLITHOGRAPHY
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Fig 5:Electron Beam Nanolithography

9. X- RAY NANOLITHOGRAPHY
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Fig 6: X RAY nanolithography
Fig 7: Sample
fabricated by
X ray
nanolithography

10. NANO IMPRINT LITHOGRAPHY
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Fig 8: Nano Imprint Lithography

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Fig 9,10: Nano imprint lithography

12. DIP PEN NANOLITHOGRAPHY
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Fig 11: Dip pen nanolithography
Process
Fig 12: Sample fabricated by dip pen
nano
lithography Process

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Fig 13: Photolithography Process

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Fig 14: Atomic Force microscopy

15. REFERENCES
• M. Feldman, 2013, “Nanolithography, The Art of Fabricating
Nanoelectronic and Nanophotonic Devices and Systems”,1st
edition.
• Dhara Parikh, Barry Craver, Hatem N. Nounu, Fu-On Fong, and
John C. Wolfe, "Nanoscale Pattern Definition on Nonplanar
Surfaces Using Ion Beam Proximity Lithography and Conformal
Plasma-Deposited Resist", Journal of Microelectromechanical
Systems, VOL. 17, NO. 3, JUNE 2008
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