PRESENTED BY:- 
SHASHI KUMAR SHAW 
2K13E25 
UNIVERSITY OF PUNE
 Introduction 
 Types of crystal growth 
 Bridgeman technique 
 CZ technique 
 Conclusion
 Silicon is a most abundant material is nature 
 It contents many impurities 
 Defects in crystal 
 Single crystal is the requirement
1. Bridgman technique 
2. Czochralski technique 
But CZ is most preferable technique for the 
growth of single crystal silicon over Bridgman.
 It is a very simple process 
System for Bridgeman :- 
1. Quartz ampoule 
2. Quartz boat 
3. Seed crystal 
4. Charges 
5. Heater 
6. Temperature profile
Si melt 
Si
 Bridgman growth single crystal have a lot of 
dislocation
 CZ is also known as “liquid solid 
monocomponent growth system” 
 CZ is more complex than Bridgman 
Requirement for CZ:- 
1. Furnace 
2. Crystal pulling rate 
3. Ambient control 
4. Control system
L 
dm 
dt 
 kL 
dT 
dx 1 
A1  kS 
dT 
dx 2 
A2 
L latent heat of fusion 
dm 
dt 
 amount of freezing per unit time 
kL  thermal conductivity of liquid 
dT 
dx 1 
 thermal gradient at isotherm x1 
k thermal conductivity of solid 
S dT 
 thermal gradient at x 2 
dx 2
 Reaction of O2 with single crystal silicon during 
growth it alters the properties of grown silicon. 
 95% O2 will be in interstitial sites in the crystal 
 5% can form a complex impurity like SiO4 
(donor) 
 If the O2 concentration > 6.4*10^17/cm3 
dislocation will form in the crystal.
 Bridgman crystal growth technique is simple 
but with serious limitation. 
 CZ is complex process but it give good quality 
of single crystal than Bridgman.
THANK YOU

Crystal growth techniques

  • 1.
    PRESENTED BY:- SHASHIKUMAR SHAW 2K13E25 UNIVERSITY OF PUNE
  • 2.
     Introduction Types of crystal growth  Bridgeman technique  CZ technique  Conclusion
  • 3.
     Silicon isa most abundant material is nature  It contents many impurities  Defects in crystal  Single crystal is the requirement
  • 4.
    1. Bridgman technique 2. Czochralski technique But CZ is most preferable technique for the growth of single crystal silicon over Bridgman.
  • 5.
     It isa very simple process System for Bridgeman :- 1. Quartz ampoule 2. Quartz boat 3. Seed crystal 4. Charges 5. Heater 6. Temperature profile
  • 6.
  • 7.
     Bridgman growthsingle crystal have a lot of dislocation
  • 8.
     CZ isalso known as “liquid solid monocomponent growth system”  CZ is more complex than Bridgman Requirement for CZ:- 1. Furnace 2. Crystal pulling rate 3. Ambient control 4. Control system
  • 10.
    L dm dt  kL dT dx 1 A1  kS dT dx 2 A2 L latent heat of fusion dm dt  amount of freezing per unit time kL  thermal conductivity of liquid dT dx 1  thermal gradient at isotherm x1 k thermal conductivity of solid S dT  thermal gradient at x 2 dx 2
  • 11.
     Reaction ofO2 with single crystal silicon during growth it alters the properties of grown silicon.  95% O2 will be in interstitial sites in the crystal  5% can form a complex impurity like SiO4 (donor)  If the O2 concentration > 6.4*10^17/cm3 dislocation will form in the crystal.
  • 12.
     Bridgman crystalgrowth technique is simple but with serious limitation.  CZ is complex process but it give good quality of single crystal than Bridgman.
  • 14.