This document discusses and compares two techniques for growing single crystal silicon: the Bridgman technique and the Czochralski (CZ) technique. It states that while the Bridgman technique is simpler, involving a quartz ampoule, boat, heater and temperature profile, crystals grown with this method contain many dislocations. The CZ technique is more complex but can produce higher quality crystals. It involves controlling a furnace, crystal pulling rate, ambient conditions and system. The document concludes that the CZ technique is preferable for growing single crystal silicon due to producing crystals with fewer defects.