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BREAKDOWN VOLTAGE OF SILICON DIOXIDE
(Microelectronics Technology)
Advisor: Prof. Nguyen Đuc Chien
Students: Nguyen Minh - 20132586
Nguyen Van Long -
20132393
Hoang Tuan Linh -
20132263
Hanoi, Oct 21st 2016
CONTENTS
1.Thermal SiO2 Properties
2.Review of breakdown of silicon dioxide layer
3.Dielectric strength measurement
4.Time-dependent breakdown voltage
5.Application of Breakdown Voltage
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 2
1. THERMAL SiO2 PROPERTIES
 (1) Excellent Electrical Insulator
 (2) High breakdown Electric Field (>10MV/cm)
 (3) Stable and Reproducible Si/SiO2 Interface
 (4) Conformal oxide growth on exposed Si surface
 (5) Good dissusion mask for common dopants
 (6) Very good etching selectivity between Si and SiO2
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 3
II. REVIEW OF BREAKDOWN OF SILICON DIOXIDE LAYER
 Breakdown Voltage
 Breakdown Voltage is defined experimentaily as the
exceeding of a preset current
 2 breakdown measures:
- Fast voltage ramp (dielectric strength)
- Constant voltage wearout
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 4
III. DIELECTRIC STRENGTH MEASUREMENT
Dielectric strength = the field at which it
would break down
Itr = the current chosen to define
breakdown
IBD = the current at breakdown
Rsi = resistance in the measurement circuit
tbd = time-to-breakdown
Extrapolation of a plot of tbd versus I to zero
time gave IBD. VBD could be caculated from
this technique via the equation for Fowler-
Nordheim tunneling (log(J/E^2) ~ 1/E):
Microelectronics Technology - Breakdown Voltage of Silicon Oxide 5
IV. TIME-DEPENDENT BREAKDOWN VOLTAGE
- Consists of the application of a constant
voltage and measuring the time to
breakdown
- TDDB (Time-Dependent Dielectric
Breakdown)
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 6
IV. TIME-DEPENDENT BREAKDOWN VOLTAGE
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 7
V. APPLICATION OF BREAKDOWN VOLTAGE
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 9
Variation in EBD with oxide thickness
Breakdown voltage =>
thickness of the SiO2
layer
E = V/d
THANKS FOR YOUR LISTENING!
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 10
Q&A
11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 11
III. DIELECTRIC STRENGTH MEASUREMENT
Microelectronics Technology - Breakdown Voltage of Silicon Oxide 12

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Breakdown Voltage of Silicon Dioxide

  • 1. BREAKDOWN VOLTAGE OF SILICON DIOXIDE (Microelectronics Technology) Advisor: Prof. Nguyen Đuc Chien Students: Nguyen Minh - 20132586 Nguyen Van Long - 20132393 Hoang Tuan Linh - 20132263 Hanoi, Oct 21st 2016
  • 2. CONTENTS 1.Thermal SiO2 Properties 2.Review of breakdown of silicon dioxide layer 3.Dielectric strength measurement 4.Time-dependent breakdown voltage 5.Application of Breakdown Voltage 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 2
  • 3. 1. THERMAL SiO2 PROPERTIES  (1) Excellent Electrical Insulator  (2) High breakdown Electric Field (>10MV/cm)  (3) Stable and Reproducible Si/SiO2 Interface  (4) Conformal oxide growth on exposed Si surface  (5) Good dissusion mask for common dopants  (6) Very good etching selectivity between Si and SiO2 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 3
  • 4. II. REVIEW OF BREAKDOWN OF SILICON DIOXIDE LAYER  Breakdown Voltage  Breakdown Voltage is defined experimentaily as the exceeding of a preset current  2 breakdown measures: - Fast voltage ramp (dielectric strength) - Constant voltage wearout 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 4
  • 5. III. DIELECTRIC STRENGTH MEASUREMENT Dielectric strength = the field at which it would break down Itr = the current chosen to define breakdown IBD = the current at breakdown Rsi = resistance in the measurement circuit tbd = time-to-breakdown Extrapolation of a plot of tbd versus I to zero time gave IBD. VBD could be caculated from this technique via the equation for Fowler- Nordheim tunneling (log(J/E^2) ~ 1/E): Microelectronics Technology - Breakdown Voltage of Silicon Oxide 5
  • 6. IV. TIME-DEPENDENT BREAKDOWN VOLTAGE - Consists of the application of a constant voltage and measuring the time to breakdown - TDDB (Time-Dependent Dielectric Breakdown) 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 6
  • 7. IV. TIME-DEPENDENT BREAKDOWN VOLTAGE 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 7
  • 8. V. APPLICATION OF BREAKDOWN VOLTAGE 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 9 Variation in EBD with oxide thickness Breakdown voltage => thickness of the SiO2 layer E = V/d
  • 9. THANKS FOR YOUR LISTENING! 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 10
  • 10. Q&A 11/10/2016Microelectronics Technology - Breakdown Voltage of Silicon Oxide 11
  • 11. III. DIELECTRIC STRENGTH MEASUREMENT Microelectronics Technology - Breakdown Voltage of Silicon Oxide 12

Editor's Notes

  1. phi = the barrier height m*: khối lượng hiệu dụng của electron (=O.5m-e) h = hằng số plang
  2. phi = the barrier height m*: khối lượng hiệu dụng của electron (=O.5m-e) h = hằng số plang