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2D/3D AOI在Packaging Substrate
的運用及演變與對設備商之建議
Reporter : 陳永財(Morse Chen)
SBU/Div. : Unimicron Carrier SBU/S1 Plant RD
Date : 2014/10/15
Contents
1
1. Unimicrom公司簡介
2. 2D&3D AOI Metrology應用
3. 2D AOI 演變與挑戰
4. 3D AOI 演變與挑戰
5. 給設備商之建議
1. Unimicrom公司簡介
2
Unimicron Introduction
3
Unmicron Customer Base
Established
CEO
President of Carrier SBU
President of PCB SBU
Total Employees
Registered Capital
Filed Patents
1990
T.J. Tseng
ChiaPin Lee
Maurice Lee
10,150 (Taiwan) / 11,298 (China)
US$ 523.3M (NT$ 15.39Bn)
2,349 (Since 1998)
 Notebook
 PC & Peripheral
 Communication
 Consumer
 Packaging
 Others
Unimicron CSP Product Roadmap
4
2003 2005 2008 2010 2011 2012 2013 2014 2015 2016
FC PoP
I/O
FCCSP
Hybrid CSP
WB PoP
EPS FC PoP
Ultra Thin CSP
TCA
Coreless
BOL
UTS – EP
Unimicron FCBGA Product Roadmap
5
I/O
Coreless FCBGA
FCBGA (BT)
FCBGA (ABF)
EPS FCBGA
TCA
LBS / HLC by low loss ABF
BOL
2003 2005 2008 2010 2011 2012 2013 2014 2015 2016
6
2. 2D&3D AOI Metrology應用
2D/3D Metrology Application in packaging substrate
2D Application
Trace defect --- open/short/nick/…
Via defect ---missing plating/recess/…
7
2D/3D Metrology Application in packaging substrate
3D Application
Bump Height/Dimension
Warpage
SR surface
Bump height
Convex (cry)
++
-
Concave (smile)
-
8
9
3. 2D AOI 演變與挑戰
10
Fine line design for Resolution trend(R&D)
Challenge --- mouse bite defects
Defect size /
type
Detection
by AOI
Detection
by 4W OST
Risk if escapes to Customer
Very small nick
(L,W :<3~4um)
Not always NO Potential reliability risk defect
Medium nick
(W : 4um~L :~10um)
YES NO Trace crack open at stressful location.
Potentially escape to customer.
Big nick
W : almost full width
L : 10~ 30um level
YES Questionable
Missing Plated Cu
(L : 30um~ level)
YES YES Trace crack open in various locations
L
W
L
W
L
L
W
AOI machines are used on fine line design layers to detect “mouse-
bite” type defects not caught by E-test.
– these are potential product reliability risk defects.
11
 Case Study
 Copper or Dust ?
Challenge --- real defect & false alarm cause
12
 Case Study
 Nick or Oxidation ?
Challenge --- real defect & false alarm cause
Microscope image Red light imageBlue light image
13
 Case Study
 VRS times coverage vs image quality
Challenge --- real defect & false alarm cause
14
15
4. 3D AOI 演變與挑戰
Reduced Bump Pitch requires better inspection metrology resolution.
Challenge --- Fine Bump pitch
16
o Large variations of bump flattened areas from center to corners
o CAW(C4 area warpage) impact to assembly integration yield cause open issue
Corner bumps
are flattened
Center bumps are
not flattened
Flatten Bump Metrology challenges
17
Tighter Pitches with smaller present metrology challenge
Need to assess
--Higher resolution/speed or smart sensor/camera technology
--Higher proformance logic to reduce false alarm
Bump AOI
10 um pixel
70 um SRO
50 um SRO 40 um SRO
Need higher
resolution
18
Bump Metrology challenges
19
5. 給設備商之建議
Expectation on Metrology Tool
 Technical (Quality)
 Higher Resolution for fine line design product
 Direct SCRAP proposal (Skip VRS)
 Defect mapping system for strip type product
 Automation operation (ex:Loader & Un-Loader)
 Throughput (Cost)
 Faster / Lower false alarm
 Improvement (YIP)
 Datamation capability for
in-line Analysis/Process feedback
20
21
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2D3D AOI在packaging substrate的運用及演變與對設備商之建議

  • 1. 2D/3D AOI在Packaging Substrate 的運用及演變與對設備商之建議 Reporter : 陳永財(Morse Chen) SBU/Div. : Unimicron Carrier SBU/S1 Plant RD Date : 2014/10/15
  • 2. Contents 1 1. Unimicrom公司簡介 2. 2D&3D AOI Metrology應用 3. 2D AOI 演變與挑戰 4. 3D AOI 演變與挑戰 5. 給設備商之建議
  • 4. Unimicron Introduction 3 Unmicron Customer Base Established CEO President of Carrier SBU President of PCB SBU Total Employees Registered Capital Filed Patents 1990 T.J. Tseng ChiaPin Lee Maurice Lee 10,150 (Taiwan) / 11,298 (China) US$ 523.3M (NT$ 15.39Bn) 2,349 (Since 1998)  Notebook  PC & Peripheral  Communication  Consumer  Packaging  Others
  • 5. Unimicron CSP Product Roadmap 4 2003 2005 2008 2010 2011 2012 2013 2014 2015 2016 FC PoP I/O FCCSP Hybrid CSP WB PoP EPS FC PoP Ultra Thin CSP TCA Coreless BOL UTS – EP
  • 6. Unimicron FCBGA Product Roadmap 5 I/O Coreless FCBGA FCBGA (BT) FCBGA (ABF) EPS FCBGA TCA LBS / HLC by low loss ABF BOL 2003 2005 2008 2010 2011 2012 2013 2014 2015 2016
  • 7. 6 2. 2D&3D AOI Metrology應用
  • 8. 2D/3D Metrology Application in packaging substrate 2D Application Trace defect --- open/short/nick/… Via defect ---missing plating/recess/… 7
  • 9. 2D/3D Metrology Application in packaging substrate 3D Application Bump Height/Dimension Warpage SR surface Bump height Convex (cry) ++ - Concave (smile) - 8
  • 10. 9 3. 2D AOI 演變與挑戰
  • 11. 10 Fine line design for Resolution trend(R&D)
  • 12. Challenge --- mouse bite defects Defect size / type Detection by AOI Detection by 4W OST Risk if escapes to Customer Very small nick (L,W :<3~4um) Not always NO Potential reliability risk defect Medium nick (W : 4um~L :~10um) YES NO Trace crack open at stressful location. Potentially escape to customer. Big nick W : almost full width L : 10~ 30um level YES Questionable Missing Plated Cu (L : 30um~ level) YES YES Trace crack open in various locations L W L W L L W AOI machines are used on fine line design layers to detect “mouse- bite” type defects not caught by E-test. – these are potential product reliability risk defects. 11
  • 13.  Case Study  Copper or Dust ? Challenge --- real defect & false alarm cause 12
  • 14.  Case Study  Nick or Oxidation ? Challenge --- real defect & false alarm cause Microscope image Red light imageBlue light image 13
  • 15.  Case Study  VRS times coverage vs image quality Challenge --- real defect & false alarm cause 14
  • 16. 15 4. 3D AOI 演變與挑戰
  • 17. Reduced Bump Pitch requires better inspection metrology resolution. Challenge --- Fine Bump pitch 16
  • 18. o Large variations of bump flattened areas from center to corners o CAW(C4 area warpage) impact to assembly integration yield cause open issue Corner bumps are flattened Center bumps are not flattened Flatten Bump Metrology challenges 17
  • 19. Tighter Pitches with smaller present metrology challenge Need to assess --Higher resolution/speed or smart sensor/camera technology --Higher proformance logic to reduce false alarm Bump AOI 10 um pixel 70 um SRO 50 um SRO 40 um SRO Need higher resolution 18 Bump Metrology challenges
  • 21. Expectation on Metrology Tool  Technical (Quality)  Higher Resolution for fine line design product  Direct SCRAP proposal (Skip VRS)  Defect mapping system for strip type product  Automation operation (ex:Loader & Un-Loader)  Throughput (Cost)  Faster / Lower false alarm  Improvement (YIP)  Datamation capability for in-line Analysis/Process feedback 20