Lab 1: To generate layout for CMOS Inverter circuit and simulate it for verification.
VLSI Lab VLSI  LABORATORY FRONT END  DESIGN (CAD) BACK END  DESIGN (CAD) TECHNOLOGY (TCAD)
Proper hardware Proper software Foundry or link up with some fab lab Test facility Purpose
DESIGN STEPS SCHEMATIC LAYOUT DESIGN DRC LAYOUT Vs SCHEMATIC PARASITIC EXTRACTION POST LAYOUT SIMULTION
List of Experiments To generate layout for CMOS Inverter circuit and simulate it for verification. To prepare layout for given logic function and verify it with simulations. Introduction to programmable devices (FPGA, CPLD), Hardware  Description Language (VHDL), and the use programming tool. Implementation of basic logic gates and its testing. Implementation of adder circuits and its testing. Implementation of J-K and D Flip Flops and its testing. Implementation 4 to 1 multiplexer and its testing. Implementation of 3 to 8 decoder and its testing. Implementation of sequential adder and its testing. Implementation of BCD counter and its testing. Simulation of CMOS Inverter using SPICE for transfer characteristic. Simulation and verification of two input CMOS NOR gate using SPICE. Introduction to Block Diagram Mathod Design of digital Logic using block diagram.
Project Mini Project:  VHDL/Verilog based mini project with emphasis on design and implementation into the group of maximum 3 students.
Design Abstraction Levels n+ n+ S G D + DEVICE CIRCUIT GATE MODULE SYSTEM
Microwind Microwind is a tool for designing and simulating circuits  at layout level. The tool features full editing facilities (copy, cut, past, duplicate, move), various views (MOS characteristics, 2D cross section, 3D process viewer), and an analog simulator
Tools from Microwind Microwind DSCH Microwind3 Editor Microwind 2D viewer Microwind 3D viewer Microwind analog simulator Microwind tutorial on MOS devices View of Silicon Atoms
Getting Microwind Go to the website http://www.microwind.net/document Download the freeware version of the microwind Unzip the files in a Folder
Microwind Downloads
INTRODUCTION THE TOOL User-friendly and intuitive design tool for educational use.  The student draws the masks of the circuit layout and performs analog simulation The tool displays the layout in 2D, static 3D and animated 3D
Our Approach MOS DEVICE Traditional teaching : in-depth explanation of the potentials, fields, threshold voltage, and eventually the expression of the current  Ids   Our approach : step-by-step illustration of the most important relationships between layout and performance.   Design of the MOS I/V Simulation 2D view Time domain analysis 1. 2. 3. 4.
Feature Size Chips are specified with set of masks Minimum dimensions of masks determine transistor size (and hence speed, cost, and power) Feature size  f = distance between source and drain Set by minimum width of polysilicon Feature size improves 30% every 3 years or so Normalize for feature size when describing design Rules E.g.  λ =  0 . 090  μ m in 0.180  μ m process
Layout design rules: For complex processes, it becomes difficult to understand the intricacies of the fabrication process and interpret different photo masks. They act as interface between the circuit designer and the process engineer.
Editing Icons Access to Simulation 2D 3D Views Layout Library Simulation Properties Palette of Layers Active Layers Current Technology Work Area One dot on the grid is 5 lambda or 0.30 µm Menu Command Microwind Environment
Design Rules N- Well r101 Minimum width 12 λ r102 Between wells 12  λ r110 Minimum well Area 144  λ 2 r 102 r 101 N - Well
r201 Minimum N+ and P+ diffusion width 4 λ r 201 r 201 N - Well P+ Diff N+ Diff
r202 Between two P+ and N+ diffusions 4 λ N - Well P+ Diff N+ Diff r 202 r 202
r203 Extra N-well after P+ diffusion   6 λ N - Well P+ Diff N+ Diff r 203 r 203
r204  Between N+ diffusion and n-well 6  λ r 204 N - Well P+ Diff N+ Diff
r210 Minimum diffusion area 16 λ 2 r 210 r 210 N - Well P+ Diff N+ Diff
r301 Polysilicon Width 2 λ N - Well P+ Diff N+ Diff Polysilicon r 301 r 301 Polysilicon
r302 Polysilicon gate on Diffusion 2 λ N - Well P+ Diff N+ Diff Polysilicon r 302 r 302 Polysilicon
r307 Extra Polysilicon surrounding Diffusion 3 λ N - Well P+ Diff N+ Diff Polysilicon r 307 r 307 r 307 r 307 Polysilicon
r304 Between two Polysilicon boxes  3 λ N - Well P+ Diff N+ Diff Polysilicon Polysilicon r 304 r 304
r307 Diffusion after Polysilicon  4 λ N - Well P+ Diff N+ Diff Polysilicon Polysilicon r 307 r 307 r 307 r 307
r401 Contact width 2 λ Contact Polysilicon Contact Metal/Polysilicon Contact r 401
r404 Extra Poly surrounding contact 1 λ Contact Polysilicon Contact Metal/Polysilicon Contact r 404 r 404
r405 Extra metal surrounding contact 1 λ Contact Polysilicon Contact Metal/Polysilicon Contact r 405 r 405
r403 Extra diffusion surrounding contact 1 λ N - Well P+ Diff N+ Diff Polysilicon Polysilicon r 403 r 403
r501 Between two Metals 4 λ Metal 1  Metal 2 Metal 3  Metal 4  Metal 5  Metal 6  r 501 r 501
r510 Minimum Metal area 16 λ 2 r 510 r 510 r 510 r 510 r 510 r 510 Metal 1  Metal 2 Metal 3  Metal 4  Metal 5  Metal 6
Step 1: Select Foundary
Step 2: Select Foundary
Step 3: n+ Diffussion
Step 4: Polysilicon
Step 5: n+diff and Metal Contact
This Completes nMOS design Now go for pMOS Design, and the first need is to construct N Well
Step 6: Create N Well
Step 6: p+ Diffusion
Step 7: Polysilicon
Step 8: Contacts
Final Connections pMOS Completed Now Interconnection of pMOS and nMOS to complete inverter Connect Source of pMOS to VDD and Source of nMOS to VSS. Short the Drain of both pMOS and nMOS.
INVERTER: Complete Design
Check DRC
Assign Source Assign Signal (Clock) to Gate Terminal Add Visible node at Output
Inverter with Source
Run Simulation
VTC Characteristics
Thanks Give Your Feedbacks at: www.amitdegada.weebly.com/blog.html
 
 

Lab inv l

  • 1.
    Lab 1: Togenerate layout for CMOS Inverter circuit and simulate it for verification.
  • 2.
    VLSI Lab VLSI LABORATORY FRONT END DESIGN (CAD) BACK END DESIGN (CAD) TECHNOLOGY (TCAD)
  • 3.
    Proper hardware Propersoftware Foundry or link up with some fab lab Test facility Purpose
  • 4.
    DESIGN STEPS SCHEMATICLAYOUT DESIGN DRC LAYOUT Vs SCHEMATIC PARASITIC EXTRACTION POST LAYOUT SIMULTION
  • 5.
    List of ExperimentsTo generate layout for CMOS Inverter circuit and simulate it for verification. To prepare layout for given logic function and verify it with simulations. Introduction to programmable devices (FPGA, CPLD), Hardware Description Language (VHDL), and the use programming tool. Implementation of basic logic gates and its testing. Implementation of adder circuits and its testing. Implementation of J-K and D Flip Flops and its testing. Implementation 4 to 1 multiplexer and its testing. Implementation of 3 to 8 decoder and its testing. Implementation of sequential adder and its testing. Implementation of BCD counter and its testing. Simulation of CMOS Inverter using SPICE for transfer characteristic. Simulation and verification of two input CMOS NOR gate using SPICE. Introduction to Block Diagram Mathod Design of digital Logic using block diagram.
  • 6.
    Project Mini Project: VHDL/Verilog based mini project with emphasis on design and implementation into the group of maximum 3 students.
  • 7.
    Design Abstraction Levelsn+ n+ S G D + DEVICE CIRCUIT GATE MODULE SYSTEM
  • 8.
    Microwind Microwind isa tool for designing and simulating circuits at layout level. The tool features full editing facilities (copy, cut, past, duplicate, move), various views (MOS characteristics, 2D cross section, 3D process viewer), and an analog simulator
  • 9.
    Tools from MicrowindMicrowind DSCH Microwind3 Editor Microwind 2D viewer Microwind 3D viewer Microwind analog simulator Microwind tutorial on MOS devices View of Silicon Atoms
  • 10.
    Getting Microwind Goto the website http://www.microwind.net/document Download the freeware version of the microwind Unzip the files in a Folder
  • 11.
  • 12.
    INTRODUCTION THE TOOLUser-friendly and intuitive design tool for educational use. The student draws the masks of the circuit layout and performs analog simulation The tool displays the layout in 2D, static 3D and animated 3D
  • 13.
    Our Approach MOSDEVICE Traditional teaching : in-depth explanation of the potentials, fields, threshold voltage, and eventually the expression of the current Ids Our approach : step-by-step illustration of the most important relationships between layout and performance. Design of the MOS I/V Simulation 2D view Time domain analysis 1. 2. 3. 4.
  • 14.
    Feature Size Chipsare specified with set of masks Minimum dimensions of masks determine transistor size (and hence speed, cost, and power) Feature size f = distance between source and drain Set by minimum width of polysilicon Feature size improves 30% every 3 years or so Normalize for feature size when describing design Rules E.g. λ = 0 . 090 μ m in 0.180 μ m process
  • 15.
    Layout design rules:For complex processes, it becomes difficult to understand the intricacies of the fabrication process and interpret different photo masks. They act as interface between the circuit designer and the process engineer.
  • 16.
    Editing Icons Accessto Simulation 2D 3D Views Layout Library Simulation Properties Palette of Layers Active Layers Current Technology Work Area One dot on the grid is 5 lambda or 0.30 µm Menu Command Microwind Environment
  • 17.
    Design Rules N-Well r101 Minimum width 12 λ r102 Between wells 12 λ r110 Minimum well Area 144 λ 2 r 102 r 101 N - Well
  • 18.
    r201 Minimum N+and P+ diffusion width 4 λ r 201 r 201 N - Well P+ Diff N+ Diff
  • 19.
    r202 Between twoP+ and N+ diffusions 4 λ N - Well P+ Diff N+ Diff r 202 r 202
  • 20.
    r203 Extra N-wellafter P+ diffusion 6 λ N - Well P+ Diff N+ Diff r 203 r 203
  • 21.
    r204 BetweenN+ diffusion and n-well 6 λ r 204 N - Well P+ Diff N+ Diff
  • 22.
    r210 Minimum diffusionarea 16 λ 2 r 210 r 210 N - Well P+ Diff N+ Diff
  • 23.
    r301 Polysilicon Width2 λ N - Well P+ Diff N+ Diff Polysilicon r 301 r 301 Polysilicon
  • 24.
    r302 Polysilicon gateon Diffusion 2 λ N - Well P+ Diff N+ Diff Polysilicon r 302 r 302 Polysilicon
  • 25.
    r307 Extra Polysiliconsurrounding Diffusion 3 λ N - Well P+ Diff N+ Diff Polysilicon r 307 r 307 r 307 r 307 Polysilicon
  • 26.
    r304 Between twoPolysilicon boxes 3 λ N - Well P+ Diff N+ Diff Polysilicon Polysilicon r 304 r 304
  • 27.
    r307 Diffusion afterPolysilicon 4 λ N - Well P+ Diff N+ Diff Polysilicon Polysilicon r 307 r 307 r 307 r 307
  • 28.
    r401 Contact width2 λ Contact Polysilicon Contact Metal/Polysilicon Contact r 401
  • 29.
    r404 Extra Polysurrounding contact 1 λ Contact Polysilicon Contact Metal/Polysilicon Contact r 404 r 404
  • 30.
    r405 Extra metalsurrounding contact 1 λ Contact Polysilicon Contact Metal/Polysilicon Contact r 405 r 405
  • 31.
    r403 Extra diffusionsurrounding contact 1 λ N - Well P+ Diff N+ Diff Polysilicon Polysilicon r 403 r 403
  • 32.
    r501 Between twoMetals 4 λ Metal 1 Metal 2 Metal 3 Metal 4 Metal 5 Metal 6 r 501 r 501
  • 33.
    r510 Minimum Metalarea 16 λ 2 r 510 r 510 r 510 r 510 r 510 r 510 Metal 1 Metal 2 Metal 3 Metal 4 Metal 5 Metal 6
  • 34.
  • 35.
  • 36.
    Step 3: n+Diffussion
  • 37.
  • 38.
    Step 5: n+diffand Metal Contact
  • 39.
    This Completes nMOSdesign Now go for pMOS Design, and the first need is to construct N Well
  • 40.
  • 41.
    Step 6: p+Diffusion
  • 42.
  • 43.
  • 44.
    Final Connections pMOSCompleted Now Interconnection of pMOS and nMOS to complete inverter Connect Source of pMOS to VDD and Source of nMOS to VSS. Short the Drain of both pMOS and nMOS.
  • 45.
  • 46.
  • 47.
    Assign Source AssignSignal (Clock) to Gate Terminal Add Visible node at Output
  • 48.
  • 49.
  • 50.
  • 51.
    Thanks Give YourFeedbacks at: www.amitdegada.weebly.com/blog.html
  • 52.
  • 53.

Editor's Notes

  • #3 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #4 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #5 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #6 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #7 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #8 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #9 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #10 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #11 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #12 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #13 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #14 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #37 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #38 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #39 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #40 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #41 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #42 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #43 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #44 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #45 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #46 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #47 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #48 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #49 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #50 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #51 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #52 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #53 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.
  • #54 34 Praxair Semiconductor Manufacturing Technology, Module 3: Semiconductor Manufacturing Processes References I am grateful for the contributions from SEMATECH, the Austin Community College, and MKS Instruments. For further reading, I especially recommend the reference from Scientific American.