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M-Solv: Innolae, Cambridge 2/2/16
2
Adam Brunton
M-Solv: Innolae, Cambridge 2/2/16
Laser and inkjet tools for large area electronics
manufacturing
CLICK TO EDIT MASTER TITLE STYLE
3
M-Solv: Innolae, Cambridge 2/2/16
M-SOLV: WHO WE ARE
• Design, build and sell manufacturing equipment for
R&D and high volume production.
• Combining high performance motion control
platforms with innovative process technologies:
- Laser patterning/micromachining, ink jet of functional
materials, and spray deposition of solution based
materials.
• Developing low energy, low cost of ownership and
environmentally friendly manufacturing processes
using the latest cutting edge technologies.
• Manufacture robust capacitive touch sensors for
industrial applications with Touchnetix
CLICK TO EDIT MASTER TITLE STYLE
4
M-Solv: Innolae, Cambridge 2/2/16
WHO WE ARE : Locations
CN Innovations
Parent Company
Hong Kong
Anderson Group
Manufacturing Partner
Taiwan
M-Solv HK
Hong Kong
M-Solv Limited
United Kingdom
5
M-Solv: Innolae, Cambridge 2/2/16
Introduction
• Large area electronic devices we can make
with inkjet and laser:
• Touch sensor
• Thin-film PV interconnect
• What else?
6
M-Solv: Innolae, Cambridge 2/2/16
Touch
7
M-Solv: Innolae, Cambridge 2/2/16
Touch
8
M-Solv: Innolae, Cambridge 2/2/16
Touch
9
M-Solv: Innolae, Cambridge 2/2/16
Process speed: how does a laser keep up with an inkjet?
10
M-Solv: Innolae, Cambridge 2/2/16
Touch
PAGE:
Ag ink jet
printing
Laser patterning
11
M-Solv: Innolae, Cambridge 2/2/16
Digital manufacture
• Minimise materials waste
• Optimise throughput
• This is a strong driver for the digital
process
• 1-11 are different sensors
represented by multi-layer CAD
files, layers for:
• Metal print
• Metal laser
• ITO laser
• Overcoat print
12
M-Solv: Innolae, Cambridge 2/2/16
Laser sintering of nanoparticle inks
200 µm
13
M-Solv: Innolae, Cambridge 2/2/16
Copper vs silver
• Copper is lower cost than silver
• Electromigration is a big problem
with silver (for M-Solv anyway)
• Our offering is ultra-robust
sensors
• Copper is much less prone to EM
• Copper is much more difficult to
sinter
• Can’t use oven – oxidation
• Laser works very well
CLICK TO EDIT MASTER TITLE STYLE
14
M-Solv: Innolae, Cambridge 2/2/16
Conclusions on capacitive touch
• Inkjet + laser is an ideal way of depositing metallisation
• Fast and efficient
• Print resolution not really OK
- Laser defines high resolution tracks down to 25mm/25mm track/gap
- Need a laser anyway to pattern the ITO electrodes
• Copper is resistant to electromigration
• Fully digital
- Inkjet and laser run direct from CAD
- Ideal for niche products with limited production runs
- Digitally-generated mixed product substrates minimise wastage and are key to good
margins!
CLICK TO EDIT MASTER TITLE STYLE
15
M-Solv: Innolae, Cambridge 2/2/16
Conventional thin-film Interconnect
• Thin Film PV is made by mainly vacuum deposition of a
TCO/semiconductor/metal stack, a few mm thick on, usually, a glass
substrate. The ~ 1m2 panels are divided into series interconnected cells
by laser scribing across the panel after each layer is deposited.
Three main inorganic TF PV materials:
• Thin-film silicon (TF-Si)
• Cadmium telluride (CdTe)
• CIGS/CIS
CLICK TO EDIT MASTER TITLE STYLE
16
M-Solv: Innolae, Cambridge 2/2/16
Conventional process
• Disadvantage:
- The laser processes, P1, P2, P3, happen at room temperature in air,
the deposition processes happen at high temperature in vacuum –
air/vacuum/air transitions can only occur at room temperature
P1
P2
P3
TCO
CdTe
metal
P1, P2 and P3 are laser processes
that happen after the TCO, CdTe
and metal deposition steps,
respectively
CLICK TO EDIT MASTER TITLE STYLE
17
M-Solv: Innolae, Cambridge 2/2/16
Conventional process
• As the TCO-coated glass panel goes along the automated production line
it goes repeatedly from air to vacuum and gets heated and cooled for the
various processes until it finally emerges as a complete module ready for
lamination
0
100
200
300
400
500
Temperature(°C)
Panel Transit time
Laser P1 CdS CdTe Activation Laser P2
Back
contact
Laser P3
TCO
Glass
δt = 1500°c
Ambient Vacuum
CLICK TO EDIT MASTER TITLE STYLE
18
M-Solv: Innolae, Cambridge 2/2/16
One Step Interconnect (OSI) process
• After full stack deposition, depth-controlled laser scribes are made A, B,
P3. A is filled with UV-cured insulating inkjet material, B is filled by inkjet
with metal which bridges A making the interconnect. This all happens in a
single pass of the process heads! Fast & self aligning.
TCO
CdTe
Metal
A B P3
CLICK TO EDIT MASTER TITLE STYLE
19
M-Solv: Innolae, Cambridge 2/2/16
One Step Interconnect (OSI) process
• Using OSI there is only one ambient-vacuum and one vacuum-ambient
transition. The process is shorter in time and length of the production line.
The temperature profile is flatter – total DT reduced by 400⁰C. This should
facilitate better process control
0
100
200
300
400
500
Temperature(°C)
Panel Transit time
CdS CdTe Activation
Back
contact
OSI
TCO
glass
ΔT = 1100°C
ambient vacuum
CLICK TO EDIT MASTER TITLE STYLE
20
M-Solv: Innolae, Cambridge 2/2/16
Example CdTe minimodule: Laser
CLICK TO EDIT MASTER TITLE STYLE
21
M-Solv: Innolae, Cambridge 2/2/16
Insulator
CLICK TO EDIT MASTER TITLE STYLE
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M-Solv: Innolae, Cambridge 2/2/16
Conductor
CLICK TO EDIT MASTER TITLE STYLE
23
M-Solv: Innolae, Cambridge 2/2/16
Cell measurement
• Measure the J/V curve of a cell under AM1.5 illumination, using the OSI interconnect to
access the front electrode. In the equivalent circuit – the interconnect does not add
significant series resistance Riser or add a low Rish . This is shown by the good fill factors in
the J/V curves on the following slides.
Incident Light
CLICK TO EDIT MASTER TITLE STYLE
24
M-Solv: Innolae, Cambridge 2/2/16
J/V: cell strings
• Interconnect performance is good, a string of 5 cells was probed as 1,2,…,5 cell substrings
and the J/V curves are plotted below, with fill-factors indicated. Efficiency of the mini-
module was ~11% as expected from reference cell measurements.
25
M-Solv: Innolae, Cambridge 2/2/16
Laser sintering on sensitive PV material (CIGS)
All copper grid
All copper
mini-module
This is tricky because direct exposure to the laser beam destroys the
CIGS and the copper is printed on 3 substrates, metal, polymer
dielectrtric and TCO – all need a different cure dose.
IV curve: just as good as Ag + oven
CLICK TO EDIT MASTER TITLE STYLE
26
M-Solv: Innolae, Cambridge 2/2/16
OSI: One Step Interconnect
• Separate thin film deposition from interconnect
• Suitable for all thin film PV technologies CIGS, CdTe, TF-Si, etc
• Suitable for roll-to-roll processing
• Deposit all layers in thin film PV stack – no need to break vacuum
• OSI divides and interconnects in a single process:
- Depth controlled laser scribes
- Inkjet insulator and metal
• Interconnects are good
• Process is fast and cost effective
• Opens up many new possibilities in thin film PV manufacturing
• Efficiency up  Cost down!
CLICK TO EDIT MASTER TITLE STYLE
27
M-Solv: Innolae, Cambridge 2/2/16
SMI: Scanned mask imaging
• Process able to match performance of
excimer laser systems with a solid state
laser
- <5 µm resolution, high throughput
 Multi Mode Solid State Laser
 Low Average Power <100W
 Low Pulse Energy to few mJ
 Repetition rate approximately 10 kHz
 Top Hat Profile
 Low Running Costs
• Applications:
- Semiconductor packaging
- Micro-machining
- ITO Patterning
CLICK TO EDIT MASTER TITLE STYLE
28
M-Solv: Innolae, Cambridge 2/2/16
SMI: scanned mask imaging
29
M-Solv: Innolae, Cambridge 2/2/16
M-Solv roll-to-roll tool for this kind of processing
CLICK TO EDIT MASTER TITLE STYLE
30
M-Solv: Innolae, Cambridge 2/2/16
Summary and acknowledgements
• Presented inkjet printing for two large-area electronics applications
- Digital capacitive touch sensor manufacturing
- One step thin-film PV interconnection
• Indicated how laser processing complements inkjet deposition
• Funding by Innovate UK and the EU H2020 programme is gratefully acknowledged
adam.brunton@m-solv.com

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brunton_et_al_innolae_2016_1_for_linkedin

  • 2. 2 Adam Brunton M-Solv: Innolae, Cambridge 2/2/16 Laser and inkjet tools for large area electronics manufacturing
  • 3. CLICK TO EDIT MASTER TITLE STYLE 3 M-Solv: Innolae, Cambridge 2/2/16 M-SOLV: WHO WE ARE • Design, build and sell manufacturing equipment for R&D and high volume production. • Combining high performance motion control platforms with innovative process technologies: - Laser patterning/micromachining, ink jet of functional materials, and spray deposition of solution based materials. • Developing low energy, low cost of ownership and environmentally friendly manufacturing processes using the latest cutting edge technologies. • Manufacture robust capacitive touch sensors for industrial applications with Touchnetix
  • 4. CLICK TO EDIT MASTER TITLE STYLE 4 M-Solv: Innolae, Cambridge 2/2/16 WHO WE ARE : Locations CN Innovations Parent Company Hong Kong Anderson Group Manufacturing Partner Taiwan M-Solv HK Hong Kong M-Solv Limited United Kingdom
  • 5. 5 M-Solv: Innolae, Cambridge 2/2/16 Introduction • Large area electronic devices we can make with inkjet and laser: • Touch sensor • Thin-film PV interconnect • What else?
  • 9. 9 M-Solv: Innolae, Cambridge 2/2/16 Process speed: how does a laser keep up with an inkjet?
  • 10. 10 M-Solv: Innolae, Cambridge 2/2/16 Touch PAGE: Ag ink jet printing Laser patterning
  • 11. 11 M-Solv: Innolae, Cambridge 2/2/16 Digital manufacture • Minimise materials waste • Optimise throughput • This is a strong driver for the digital process • 1-11 are different sensors represented by multi-layer CAD files, layers for: • Metal print • Metal laser • ITO laser • Overcoat print
  • 12. 12 M-Solv: Innolae, Cambridge 2/2/16 Laser sintering of nanoparticle inks 200 µm
  • 13. 13 M-Solv: Innolae, Cambridge 2/2/16 Copper vs silver • Copper is lower cost than silver • Electromigration is a big problem with silver (for M-Solv anyway) • Our offering is ultra-robust sensors • Copper is much less prone to EM • Copper is much more difficult to sinter • Can’t use oven – oxidation • Laser works very well
  • 14. CLICK TO EDIT MASTER TITLE STYLE 14 M-Solv: Innolae, Cambridge 2/2/16 Conclusions on capacitive touch • Inkjet + laser is an ideal way of depositing metallisation • Fast and efficient • Print resolution not really OK - Laser defines high resolution tracks down to 25mm/25mm track/gap - Need a laser anyway to pattern the ITO electrodes • Copper is resistant to electromigration • Fully digital - Inkjet and laser run direct from CAD - Ideal for niche products with limited production runs - Digitally-generated mixed product substrates minimise wastage and are key to good margins!
  • 15. CLICK TO EDIT MASTER TITLE STYLE 15 M-Solv: Innolae, Cambridge 2/2/16 Conventional thin-film Interconnect • Thin Film PV is made by mainly vacuum deposition of a TCO/semiconductor/metal stack, a few mm thick on, usually, a glass substrate. The ~ 1m2 panels are divided into series interconnected cells by laser scribing across the panel after each layer is deposited. Three main inorganic TF PV materials: • Thin-film silicon (TF-Si) • Cadmium telluride (CdTe) • CIGS/CIS
  • 16. CLICK TO EDIT MASTER TITLE STYLE 16 M-Solv: Innolae, Cambridge 2/2/16 Conventional process • Disadvantage: - The laser processes, P1, P2, P3, happen at room temperature in air, the deposition processes happen at high temperature in vacuum – air/vacuum/air transitions can only occur at room temperature P1 P2 P3 TCO CdTe metal P1, P2 and P3 are laser processes that happen after the TCO, CdTe and metal deposition steps, respectively
  • 17. CLICK TO EDIT MASTER TITLE STYLE 17 M-Solv: Innolae, Cambridge 2/2/16 Conventional process • As the TCO-coated glass panel goes along the automated production line it goes repeatedly from air to vacuum and gets heated and cooled for the various processes until it finally emerges as a complete module ready for lamination 0 100 200 300 400 500 Temperature(°C) Panel Transit time Laser P1 CdS CdTe Activation Laser P2 Back contact Laser P3 TCO Glass δt = 1500°c Ambient Vacuum
  • 18. CLICK TO EDIT MASTER TITLE STYLE 18 M-Solv: Innolae, Cambridge 2/2/16 One Step Interconnect (OSI) process • After full stack deposition, depth-controlled laser scribes are made A, B, P3. A is filled with UV-cured insulating inkjet material, B is filled by inkjet with metal which bridges A making the interconnect. This all happens in a single pass of the process heads! Fast & self aligning. TCO CdTe Metal A B P3
  • 19. CLICK TO EDIT MASTER TITLE STYLE 19 M-Solv: Innolae, Cambridge 2/2/16 One Step Interconnect (OSI) process • Using OSI there is only one ambient-vacuum and one vacuum-ambient transition. The process is shorter in time and length of the production line. The temperature profile is flatter – total DT reduced by 400⁰C. This should facilitate better process control 0 100 200 300 400 500 Temperature(°C) Panel Transit time CdS CdTe Activation Back contact OSI TCO glass ΔT = 1100°C ambient vacuum
  • 20. CLICK TO EDIT MASTER TITLE STYLE 20 M-Solv: Innolae, Cambridge 2/2/16 Example CdTe minimodule: Laser
  • 21. CLICK TO EDIT MASTER TITLE STYLE 21 M-Solv: Innolae, Cambridge 2/2/16 Insulator
  • 22. CLICK TO EDIT MASTER TITLE STYLE 22 M-Solv: Innolae, Cambridge 2/2/16 Conductor
  • 23. CLICK TO EDIT MASTER TITLE STYLE 23 M-Solv: Innolae, Cambridge 2/2/16 Cell measurement • Measure the J/V curve of a cell under AM1.5 illumination, using the OSI interconnect to access the front electrode. In the equivalent circuit – the interconnect does not add significant series resistance Riser or add a low Rish . This is shown by the good fill factors in the J/V curves on the following slides. Incident Light
  • 24. CLICK TO EDIT MASTER TITLE STYLE 24 M-Solv: Innolae, Cambridge 2/2/16 J/V: cell strings • Interconnect performance is good, a string of 5 cells was probed as 1,2,…,5 cell substrings and the J/V curves are plotted below, with fill-factors indicated. Efficiency of the mini- module was ~11% as expected from reference cell measurements.
  • 25. 25 M-Solv: Innolae, Cambridge 2/2/16 Laser sintering on sensitive PV material (CIGS) All copper grid All copper mini-module This is tricky because direct exposure to the laser beam destroys the CIGS and the copper is printed on 3 substrates, metal, polymer dielectrtric and TCO – all need a different cure dose. IV curve: just as good as Ag + oven
  • 26. CLICK TO EDIT MASTER TITLE STYLE 26 M-Solv: Innolae, Cambridge 2/2/16 OSI: One Step Interconnect • Separate thin film deposition from interconnect • Suitable for all thin film PV technologies CIGS, CdTe, TF-Si, etc • Suitable for roll-to-roll processing • Deposit all layers in thin film PV stack – no need to break vacuum • OSI divides and interconnects in a single process: - Depth controlled laser scribes - Inkjet insulator and metal • Interconnects are good • Process is fast and cost effective • Opens up many new possibilities in thin film PV manufacturing • Efficiency up  Cost down!
  • 27. CLICK TO EDIT MASTER TITLE STYLE 27 M-Solv: Innolae, Cambridge 2/2/16 SMI: Scanned mask imaging • Process able to match performance of excimer laser systems with a solid state laser - <5 µm resolution, high throughput  Multi Mode Solid State Laser  Low Average Power <100W  Low Pulse Energy to few mJ  Repetition rate approximately 10 kHz  Top Hat Profile  Low Running Costs • Applications: - Semiconductor packaging - Micro-machining - ITO Patterning
  • 28. CLICK TO EDIT MASTER TITLE STYLE 28 M-Solv: Innolae, Cambridge 2/2/16 SMI: scanned mask imaging
  • 29. 29 M-Solv: Innolae, Cambridge 2/2/16 M-Solv roll-to-roll tool for this kind of processing
  • 30. CLICK TO EDIT MASTER TITLE STYLE 30 M-Solv: Innolae, Cambridge 2/2/16 Summary and acknowledgements • Presented inkjet printing for two large-area electronics applications - Digital capacitive touch sensor manufacturing - One step thin-film PV interconnection • Indicated how laser processing complements inkjet deposition • Funding by Innovate UK and the EU H2020 programme is gratefully acknowledged adam.brunton@m-solv.com