Semiconductor Diode
T.Ramprakash
AP/ECE
Ramco Institute of Technology
1
Semiconductor Diode
• PN junction diode
• Current equations
• Diffusion and Drift Current Densities
• Energy Band diagram
• Forward and Reverse bias characteristics
• Transition and Diffusion Capacitances
• Switching Characteristics
• Breakdown in PN Junction Diodes
2
Semiconductor Diode
• Introduction to Semiconductors
• PN junction diode Constructions
• Zero Bias - Built in Voltage Calculation and Depletion Width calculation
• Forward Bias Characteristics
• Reverse Bias Characteristics
• Current equations
• Diffusion and Drift Current Densities
• Energy Band diagram
• Transition and Diffusion Capacitances
• Switching Characteristics
• Breakdown in PN Junction Diodes 3
Semiconductor
4
Semiconductor
• A semiconductor is a material which has electrical
conductivity to a degree between that of a metal and
that of an insulator.
• Conductivity of
– Silicon  50 X 103 Ω–cm
– germanium  50 Ω-cm
• Semiconductors are the foundation of modern
electronics including
– transistors,
– solar cells,
– light -emitting diodes (LEDs),
– quantum dots,
– digital and analog integrated circuits
5
Silicon Vs Germanium
Silicon (14) Germanium (32)
6
Classification of Semiconductor
• Intrinsic Semiconductor
• Extrinsic Semiconductor
7
Intrinsic Semiconductor
• A pure form of Semiconductor
• The concentration of electrons (ni) in the conduction band =
concentration of holes (pi) in the valance band. (ni = pi)
• Conductivity is poor
• Eg. Pure Silicon, Pure Germanium (Tetravalent)
8
Extrinsic Semiconductor
• A Impure form of Semiconductor
• To increase the conductivity of intrinsic semiconductor, a small
amount of impurity (Pentavalent or Trivalent) is added.
• This process of adding impurity is known as Doping.
• 1 or 2 atoms of impurity for 106 intrinsic atoms.
• Electron concentration ≠ Hole concentration
• One type of carrier will predominate in an extrinsic semiconductor
9
Classification of Extrinsic Semiconductor
• N Type Semiconductor
• P Type Semiconductor
10
N Type Semiconductor
• A small amount of pentavalent impurities is added
• It is denoting one extra electron for conduction, so it is called
donor impurity (Donors)
• +ve charged Ions
• Electron concentration > Hole Concentration
• Most commonly used dopants are
– Arsenic,
– Antimony and
– Phosphorus
11
P Type Semiconductor
• A small amount of trivalent impurities is added
• It accepts free electrons in the place of hole, so it is called
Acceptor impurity (Acceptors)
• - ve charged Ions
• Hole concentration > Electron Concentration
• Most commonly used dopants are
– Aluminum,
– Boron, and
– Gallium
12
Mass Action Law
• Under thermal equilibrium the product of the free electron
concentration and the free hole concentration is equal to a
constant equal to the square of intrinsic carrier
concentration.
np = ni
2
13
Electrical Neutrality in Semiconductor
Positive Charge Density
p  Hole Concentration
N
D
 Concentration of donor ions
Negative Charge Density
n  Electron Concentration
N
A
 Concentration of Acceptor ions
Total + ve charged density = Total – ve charged density
p + ND = n + NA 14
Charge Density in a Semiconductor
P Type Material
NA > ND {ND ≈ 0}
pp + ND = np + NA
NA = pp – np { pp >> np}
NA = pp
Mass action Law: np pp = ni
2
N Type Material
ND > NA {NA ≈ 0}
pn + ND = nn + NA
ND = nn – pn { nn >> pn}
ND = nn
Mass action Law: nn pn = ni
2
D
i
N
n
pn
2

A
i
p
N
n
n
2

15
Conductivity of Semiconductor
EJ
EnpqJ
EqnEqpJ
EqnJ
EqpJ
JJJ
np
np
nn
pp
np
.
)(
)(













1
The resistivity of a semiconductor is
np qnqp  The conductivity of a semiconductor is
16
Conductivity of Semiconductor


1
The Resistivity of a semiconductor is
np qnqp  The Conductivity of a semiconductor is
q = 1.6*10-19 coulomb
17
Problems
Consider an Intrinsic Silicon bar of cross section 5 cm2 and length
0.5 cm at room temperature 300o K. An average field of 20 V/cm
is applied across the ends of the silicon bar.
Assume, Electron mobility = 1400 cm2/v-s
Hole mobility = 450 cm2/v-s
Intrinsic carrier concentration = 1.5*1010 cm3
Calculate,
I. Electron hole component of current density
II. Total current in the bar
III. Resistivity of the Bar
18
PN Junction Diode
anode cathode
19
Dopant distribution in PN Junction Diode
20
Dopant distribution in PN Junction Diode
E
n~0, and donor ions
are exposed
p~0, and acceptor
ions are exposed
Space Charge Region
21
22
Calculation of Depletion Width
23
Calculation of Depletion Width
24
Calculation of Depletion Width
Similarly, In N side region,
Therefore, the total built in potential Vbi
W.K.T, Thermal Equilibrium,
Substituting in the above equation,
25
Calculation of Depletion Width
26
PN Junction Forward bias
27
Forward bias Characteristics
- VF( )
28
PN Junction Reverse bias
29
Reverse bias Characteristics
+ VR( )
Reverse Saturation Current
30
Characteristics of PN Junction
31
Diode Current Equation
The Diode equation relating the voltage V and current I is given
by,
32
Diode Current Equation
At x= 0
At Thermal Equilibrium At Forward Bias
33
Diode Current Equation
34
Diode Current Equation
Considering Carrier generation and recombination,
35
Diode Current Equation
At room temperature, VT = 25.8 mv
Therefore, I = Io [e(40 V/η ) -1] 36
Problems
When a reverse bias is applied to a germanium PN junction diode,
the reverse saturation current at room temperature is 0.3 micro
amps. Determines the current flowing in the diode when 0.15 V
forward bias is applied at room temperature.
Given I0 = 0.3 X 10 -6 A
Vf = 0.15 V
I = Io [e(40 V/η ) -1]
I = 0.3 * 10-6 (e(40 * 0.15) -1)
I = 0.120 mA
37
Problems
The reverse saturation current of a silicon PN junction diode is 10
micro A. Calcualte the diode current for the forward bias voltage
0.6 V at 25oC
VT = T/ 11,600
= (273 + 25)/11600
= 0.0257 V
I = 1.174 A
38
Drift Current Density
EqnJ
EqpJ
nn
pp
Drift
Drift



 A/cm2
A/cm2
The flow of electric current due to the motion of the charge carriers under
The influence of an external electric field is called Drift Current
DriftDriftDrift
np JJJ 
EqnEqpJ npDrift  
EnpqJ npDrift )(  
EJDrift . 39
Diffusion Current Density
 In a semiconductor material, the charge carriers have the tendency
to move from the region of the higher concentration to that of lower
concentration of the same type of charge carriers.
 This movement results in a current called Diffusion Current
40
Diffusion Current Density
Concentration Gradients
Diffusion Coefficients
41
Total Current
Total Current in P type semiconductor
Jp = Jp Drift + Jp Diffusion
Total Current in N type semiconductor
Jn = Jn Drift + Jn Diffusion
42
Energy Band Diagram – Intrinsic Semiconductor
EC
EV
EfiEg
ni = NC e[-(Ec – Efi)/KT)
43
Energy Band Diagram – N type and P type
44
qVbi
E1
E2
E0 =
p n
Energy Band Diagram
Vbi = |E1| + |E2|
E1 = EFi - EFp
E2 = EFn - EFi
45
Energy Band Diagram
)ln(2
in
N
q
KT
V
D

46
Energy Band Diagram
)ln(1
in
N
q
KT
V
A

47
Energy Band Diagram
)ln( 2
i
bi
n
NN
q
KT
V
DA

Vbi = |E1| + |E2|
)ln(2
in
N
q
KT
V
D
)ln(1
in
N
q
KT
V
A

48
Energy Band Diagram – Forward Bias
49
Energy Band Diagram – Reverse Bias
50
Transition Capacitance
• The parallel layers of oppositely charged
immobile ions on the two side of the junction
form the capacitance CT
• CT is Transition or Space charge or depletion
region capacitance.
• The Total Charge density of a p type material
with area of the junction A is given by,
Q = q NA W A
Where dQ is the increase in charge and
dV is the change in voltage.
51
Transition Capacitance
52
Transition Capacitance
• The relation between potential and charge
density is given by the Poisson's equation.
• At x = Wp, V = VB,
q
53
Transition Capacitance
• Differentiating w.r.to V, we get .
q
q
A q NA
= A q NA
q
54
Transition Capacitance
CT = 20 pF // zero bias
CT = 5 to 200 pF
55
Diffusion Capacitance
• The capacitance that exists in a forward biased
junction is called a diffusion or storage
capacitance (CD)
• CD >> CT
Where dQ represents change in the
number of minority carrier when
change in voltage.
56
Diffusion Capacitance
Diffusion hole current in the N side Ipn(x)
At, x = 0
Ipn(0) ≈ I
57
Diffusion Capacitance
Diff. w.r.to V
58
Diffusion Capacitance
• CD increases for forward bias.
• CD is negligible for reverse bias.
• CD ranges from 10 pF to 1000pF
• CD is high for low frequency
• CD is low for high frequency
59
Switching Characteristics
• Recovery time
–Forward Recovery Time
–Reverse Recover Time
60
Switching Characteristics
VF/RL
VR/RL
IO
61
Switching Characteristics
• When the applied voltage to the PN junction
diode is suddenly reversed in the opposite
direction, the diode response reaches a
steady state after an interval of time.
• This is called recover time.
• The forward recovery time tfr, is defined as the
time required for forward voltage or current
to reach a specified value after switching
diode from its reverse to forward biased state
• Forward recovery time posses no serious
problem
62
Switching Characteristics
• When the PN junction diode is forward biased, the
minority electron concentration in the P region is
approximately linear.
• If the junction is suddenly reverse biased, at t1, then
because of this stored electronic charge, the reverse
current IR is initially of the same magnitude as the
forward current
• The injected minority carrier have remained stored and
have to reach the equilibrium state, this is called
storage time (ts)
• The time required for the diode for nominal recovery
to reach its steady state is called transition time (tt)
tRR = ts + tt
63
Switching Characteristics
• For commercial switching type diodes the
reverse recovery time trr ranges from less than
1 ns to as high as 1 µs.
• The operating frequency should be a
minimum of approximately 10 times trr.
• If a diode has trr of 2ns, the maximum
operating frequency is
fmax = 1/T  1/(10*2*10-9)  50 MHz
64
Break down in PN Junction Diodes
65
Avalanche Break Down
• Thermally generated minority carriers cross the
depletion region and acquire sufficient kinetic energy
from the applied potential to produce new carrier by
removing valence electrons from their bonds. These
new carrier will in turn collide with other atoms and
will increase the number of electrons and holes
available for conduction.
• The multiplication effect of free carrier may
represented by
66
Zener Break down
• Zener breakdown occurs in highly doped PN junction
through tunneling mechanism
• In a highly doped junction, the conduction and valance
bands on opposite sides of the junction are sufficiently
close during reverse bias that electrons may tunnel
directly from the valence band of the P side into the
conduction band on the n side
67
Diode Ratings
• Maximum Forward Current
– Highest instantaneous current under forward bias condition that can
flow through the junction.
• Peak Inverse Voltage (PIV)
– Maximum reverse voltage that can be applied to the PN junction
– If the voltage across the junction exceeds PIV, under reverse bias
condition, the junction gets damaged. (1000 V)
• Maximum Power Rating
– Maximum power that can be dissipated at the junction without
damaging the junction.
– It is the product of voltage across the junction and current through the
junction. 68
Diode Ratings
• Maximum Average Forward Current
– Maximum amount of average current that can be permitted to flow in the
forward direction at a special temperature (25o C)
• Repetitive Peak Forward Current
– Maximum peak current that can be permitted to flow in the forward direction
in the form of recurring pulses.
– Limiting value of the current is 450 mA
• Maximum Surge Current
– Maximum current permitted to flow in the forward direction in the form of
nonrecurring pulses.
– It should not be more that a few milliseconds. (30 A for 8.3 ms) 69
Diode Ratings
• D.C. or Static Resistance (RF)
– It is defined as the ratio of the voltage to the current
(V/I) in the forward bias characteristics of PN junction
Diode
RF = V / I
• A.C. or Dynamic resistance (rf)
– It is defined as the reciprocal of the slope of the volt-
ampere characteristics
rf = change in voltage / resulting change in current
rf = ∆V/ ∆I
70
Reference
1. Donald A Neaman, “Semiconductor Physics and
Devices”, Fourth Edition, Tata Mc GrawHill
Inc.2012.
2. Salivahanan. S, Suresh Kumar. N, Vallavaraj.A,
“Electronic Devices and circuits”, Third Edition,
Tata Mc Graw- Hill Inc.2008.

Semiconductor diode

  • 1.
  • 2.
    Semiconductor Diode • PNjunction diode • Current equations • Diffusion and Drift Current Densities • Energy Band diagram • Forward and Reverse bias characteristics • Transition and Diffusion Capacitances • Switching Characteristics • Breakdown in PN Junction Diodes 2
  • 3.
    Semiconductor Diode • Introductionto Semiconductors • PN junction diode Constructions • Zero Bias - Built in Voltage Calculation and Depletion Width calculation • Forward Bias Characteristics • Reverse Bias Characteristics • Current equations • Diffusion and Drift Current Densities • Energy Band diagram • Transition and Diffusion Capacitances • Switching Characteristics • Breakdown in PN Junction Diodes 3
  • 4.
  • 5.
    Semiconductor • A semiconductoris a material which has electrical conductivity to a degree between that of a metal and that of an insulator. • Conductivity of – Silicon  50 X 103 Ω–cm – germanium  50 Ω-cm • Semiconductors are the foundation of modern electronics including – transistors, – solar cells, – light -emitting diodes (LEDs), – quantum dots, – digital and analog integrated circuits 5
  • 6.
    Silicon Vs Germanium Silicon(14) Germanium (32) 6
  • 7.
    Classification of Semiconductor •Intrinsic Semiconductor • Extrinsic Semiconductor 7
  • 8.
    Intrinsic Semiconductor • Apure form of Semiconductor • The concentration of electrons (ni) in the conduction band = concentration of holes (pi) in the valance band. (ni = pi) • Conductivity is poor • Eg. Pure Silicon, Pure Germanium (Tetravalent) 8
  • 9.
    Extrinsic Semiconductor • AImpure form of Semiconductor • To increase the conductivity of intrinsic semiconductor, a small amount of impurity (Pentavalent or Trivalent) is added. • This process of adding impurity is known as Doping. • 1 or 2 atoms of impurity for 106 intrinsic atoms. • Electron concentration ≠ Hole concentration • One type of carrier will predominate in an extrinsic semiconductor 9
  • 10.
    Classification of ExtrinsicSemiconductor • N Type Semiconductor • P Type Semiconductor 10
  • 11.
    N Type Semiconductor •A small amount of pentavalent impurities is added • It is denoting one extra electron for conduction, so it is called donor impurity (Donors) • +ve charged Ions • Electron concentration > Hole Concentration • Most commonly used dopants are – Arsenic, – Antimony and – Phosphorus 11
  • 12.
    P Type Semiconductor •A small amount of trivalent impurities is added • It accepts free electrons in the place of hole, so it is called Acceptor impurity (Acceptors) • - ve charged Ions • Hole concentration > Electron Concentration • Most commonly used dopants are – Aluminum, – Boron, and – Gallium 12
  • 13.
    Mass Action Law •Under thermal equilibrium the product of the free electron concentration and the free hole concentration is equal to a constant equal to the square of intrinsic carrier concentration. np = ni 2 13
  • 14.
    Electrical Neutrality inSemiconductor Positive Charge Density p  Hole Concentration N D  Concentration of donor ions Negative Charge Density n  Electron Concentration N A  Concentration of Acceptor ions Total + ve charged density = Total – ve charged density p + ND = n + NA 14
  • 15.
    Charge Density ina Semiconductor P Type Material NA > ND {ND ≈ 0} pp + ND = np + NA NA = pp – np { pp >> np} NA = pp Mass action Law: np pp = ni 2 N Type Material ND > NA {NA ≈ 0} pn + ND = nn + NA ND = nn – pn { nn >> pn} ND = nn Mass action Law: nn pn = ni 2 D i N n pn 2  A i p N n n 2  15
  • 16.
  • 17.
    Conductivity of Semiconductor   1 TheResistivity of a semiconductor is np qnqp  The Conductivity of a semiconductor is q = 1.6*10-19 coulomb 17
  • 18.
    Problems Consider an IntrinsicSilicon bar of cross section 5 cm2 and length 0.5 cm at room temperature 300o K. An average field of 20 V/cm is applied across the ends of the silicon bar. Assume, Electron mobility = 1400 cm2/v-s Hole mobility = 450 cm2/v-s Intrinsic carrier concentration = 1.5*1010 cm3 Calculate, I. Electron hole component of current density II. Total current in the bar III. Resistivity of the Bar 18
  • 19.
  • 20.
    Dopant distribution inPN Junction Diode 20
  • 21.
    Dopant distribution inPN Junction Diode E n~0, and donor ions are exposed p~0, and acceptor ions are exposed Space Charge Region 21
  • 22.
  • 23.
  • 24.
  • 25.
    Calculation of DepletionWidth Similarly, In N side region, Therefore, the total built in potential Vbi W.K.T, Thermal Equilibrium, Substituting in the above equation, 25
  • 26.
  • 27.
  • 28.
  • 29.
  • 30.
    Reverse bias Characteristics +VR( ) Reverse Saturation Current 30
  • 31.
  • 32.
    Diode Current Equation TheDiode equation relating the voltage V and current I is given by, 32
  • 33.
    Diode Current Equation Atx= 0 At Thermal Equilibrium At Forward Bias 33
  • 34.
  • 35.
    Diode Current Equation ConsideringCarrier generation and recombination, 35
  • 36.
    Diode Current Equation Atroom temperature, VT = 25.8 mv Therefore, I = Io [e(40 V/η ) -1] 36
  • 37.
    Problems When a reversebias is applied to a germanium PN junction diode, the reverse saturation current at room temperature is 0.3 micro amps. Determines the current flowing in the diode when 0.15 V forward bias is applied at room temperature. Given I0 = 0.3 X 10 -6 A Vf = 0.15 V I = Io [e(40 V/η ) -1] I = 0.3 * 10-6 (e(40 * 0.15) -1) I = 0.120 mA 37
  • 38.
    Problems The reverse saturationcurrent of a silicon PN junction diode is 10 micro A. Calcualte the diode current for the forward bias voltage 0.6 V at 25oC VT = T/ 11,600 = (273 + 25)/11600 = 0.0257 V I = 1.174 A 38
  • 39.
    Drift Current Density EqnJ EqpJ nn pp Drift Drift    A/cm2 A/cm2 The flow of electric current due to the motion of the charge carriers under The influence of an external electric field is called Drift Current DriftDriftDrift np JJJ  EqnEqpJ npDrift   EnpqJ npDrift )(   EJDrift . 39
  • 40.
    Diffusion Current Density In a semiconductor material, the charge carriers have the tendency to move from the region of the higher concentration to that of lower concentration of the same type of charge carriers.  This movement results in a current called Diffusion Current 40
  • 41.
    Diffusion Current Density ConcentrationGradients Diffusion Coefficients 41
  • 42.
    Total Current Total Currentin P type semiconductor Jp = Jp Drift + Jp Diffusion Total Current in N type semiconductor Jn = Jn Drift + Jn Diffusion 42
  • 43.
    Energy Band Diagram– Intrinsic Semiconductor EC EV EfiEg ni = NC e[-(Ec – Efi)/KT) 43
  • 44.
    Energy Band Diagram– N type and P type 44
  • 45.
    qVbi E1 E2 E0 = p n EnergyBand Diagram Vbi = |E1| + |E2| E1 = EFi - EFp E2 = EFn - EFi 45
  • 46.
  • 47.
  • 48.
    Energy Band Diagram )ln(2 i bi n NN q KT V DA  Vbi = |E1| + |E2| )ln(2 in N q KT V D )ln(1 in N q KT V A  48
  • 49.
    Energy Band Diagram– Forward Bias 49
  • 50.
    Energy Band Diagram– Reverse Bias 50
  • 51.
    Transition Capacitance • Theparallel layers of oppositely charged immobile ions on the two side of the junction form the capacitance CT • CT is Transition or Space charge or depletion region capacitance. • The Total Charge density of a p type material with area of the junction A is given by, Q = q NA W A Where dQ is the increase in charge and dV is the change in voltage. 51
  • 52.
  • 53.
    Transition Capacitance • Therelation between potential and charge density is given by the Poisson's equation. • At x = Wp, V = VB, q 53
  • 54.
    Transition Capacitance • Differentiatingw.r.to V, we get . q q A q NA = A q NA q 54
  • 55.
    Transition Capacitance CT =20 pF // zero bias CT = 5 to 200 pF 55
  • 56.
    Diffusion Capacitance • Thecapacitance that exists in a forward biased junction is called a diffusion or storage capacitance (CD) • CD >> CT Where dQ represents change in the number of minority carrier when change in voltage. 56
  • 57.
    Diffusion Capacitance Diffusion holecurrent in the N side Ipn(x) At, x = 0 Ipn(0) ≈ I 57
  • 58.
  • 59.
    Diffusion Capacitance • CDincreases for forward bias. • CD is negligible for reverse bias. • CD ranges from 10 pF to 1000pF • CD is high for low frequency • CD is low for high frequency 59
  • 60.
    Switching Characteristics • Recoverytime –Forward Recovery Time –Reverse Recover Time 60
  • 61.
  • 62.
    Switching Characteristics • Whenthe applied voltage to the PN junction diode is suddenly reversed in the opposite direction, the diode response reaches a steady state after an interval of time. • This is called recover time. • The forward recovery time tfr, is defined as the time required for forward voltage or current to reach a specified value after switching diode from its reverse to forward biased state • Forward recovery time posses no serious problem 62
  • 63.
    Switching Characteristics • Whenthe PN junction diode is forward biased, the minority electron concentration in the P region is approximately linear. • If the junction is suddenly reverse biased, at t1, then because of this stored electronic charge, the reverse current IR is initially of the same magnitude as the forward current • The injected minority carrier have remained stored and have to reach the equilibrium state, this is called storage time (ts) • The time required for the diode for nominal recovery to reach its steady state is called transition time (tt) tRR = ts + tt 63
  • 64.
    Switching Characteristics • Forcommercial switching type diodes the reverse recovery time trr ranges from less than 1 ns to as high as 1 µs. • The operating frequency should be a minimum of approximately 10 times trr. • If a diode has trr of 2ns, the maximum operating frequency is fmax = 1/T  1/(10*2*10-9)  50 MHz 64
  • 65.
    Break down inPN Junction Diodes 65
  • 66.
    Avalanche Break Down •Thermally generated minority carriers cross the depletion region and acquire sufficient kinetic energy from the applied potential to produce new carrier by removing valence electrons from their bonds. These new carrier will in turn collide with other atoms and will increase the number of electrons and holes available for conduction. • The multiplication effect of free carrier may represented by 66
  • 67.
    Zener Break down •Zener breakdown occurs in highly doped PN junction through tunneling mechanism • In a highly doped junction, the conduction and valance bands on opposite sides of the junction are sufficiently close during reverse bias that electrons may tunnel directly from the valence band of the P side into the conduction band on the n side 67
  • 68.
    Diode Ratings • MaximumForward Current – Highest instantaneous current under forward bias condition that can flow through the junction. • Peak Inverse Voltage (PIV) – Maximum reverse voltage that can be applied to the PN junction – If the voltage across the junction exceeds PIV, under reverse bias condition, the junction gets damaged. (1000 V) • Maximum Power Rating – Maximum power that can be dissipated at the junction without damaging the junction. – It is the product of voltage across the junction and current through the junction. 68
  • 69.
    Diode Ratings • MaximumAverage Forward Current – Maximum amount of average current that can be permitted to flow in the forward direction at a special temperature (25o C) • Repetitive Peak Forward Current – Maximum peak current that can be permitted to flow in the forward direction in the form of recurring pulses. – Limiting value of the current is 450 mA • Maximum Surge Current – Maximum current permitted to flow in the forward direction in the form of nonrecurring pulses. – It should not be more that a few milliseconds. (30 A for 8.3 ms) 69
  • 70.
    Diode Ratings • D.C.or Static Resistance (RF) – It is defined as the ratio of the voltage to the current (V/I) in the forward bias characteristics of PN junction Diode RF = V / I • A.C. or Dynamic resistance (rf) – It is defined as the reciprocal of the slope of the volt- ampere characteristics rf = change in voltage / resulting change in current rf = ∆V/ ∆I 70
  • 71.
    Reference 1. Donald ANeaman, “Semiconductor Physics and Devices”, Fourth Edition, Tata Mc GrawHill Inc.2012. 2. Salivahanan. S, Suresh Kumar. N, Vallavaraj.A, “Electronic Devices and circuits”, Third Edition, Tata Mc Graw- Hill Inc.2008.