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02/19/15 1
VLSI Design and Layout PracticeVLSI Design and Layout Practice
Lect5 – Stick Diagram & ScalableLect5 – Stick Diagram & Scalable
Design RulesDesign Rules
Danny Wen-Yaw ChungDanny Wen-Yaw Chung
Institute of Electronic EngineeringInstitute of Electronic Engineering
Chung-Yuan Christian UniversityChung-Yuan Christian University
Sept. 2008Sept. 2008
02/19/15 2Wen-Yaw Chung/Chung-Yuan University VLSI Design
IC Layout Concept and Examples
 I. Stick Diagram
 II. Design Rules
 III. Layout Verification
Ref: http://140.135.9.56/XMS/
02/19/15 3Wen-Yaw Chung/Chung-Yuan University VLSI Design
02/19/15 4Wen-Yaw Chung/Chung-Yuan University VLSI Design
02/19/15 5Wen-Yaw Chung/Chung-Yuan University VLSI Design
A. Basic Concept
 1. Based on the view point of IC layout, the stick
diagram can help us understand the circuit function
and its geometrical location relative to other circuit
blocks.

Legend:
contact
metal 2
metal 1
poly
ndiff
pdiff
VDD
in
VSS
out
■
02/19/15 6Wen-Yaw Chung/Chung-Yuan University VLSI Design
A. Basic Concept
 2. Although the stick diagram is an abstract
presentation of real layout, it can use
graphical symbols or legend to allocate the
circuit to 2-diomensional plane and reach the
aim same as the physical layout does.
 3. The stick diagram is similar to a
backbone of the real layout but without the
real size and aspect ratio of the devices, it
still can reflect the real condition to layout of
the silicon chip.
02/19/15 7Wen-Yaw Chung/Chung-Yuan University VLSI Design
B. Notations of the stick diagram
02/19/15 8Wen-Yaw Chung/Chung-Yuan University VLSI Design
Stick Diagram
 Intermediate representation
 between the transistor level and the mask (layout)
level.
 Gives topological information
 (identifies different layers and their relationship)
 Assumes that wires have no width.
 It is possible
 to translate stick diagram automatically to layout
with correct design rules.
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 9Wen-Yaw Chung/Chung-Yuan University VLSI Design
Stick Diagram
 1. When the same material (on the same layer) touch or cross,
they are connected and belong to the same electrical node.
 2. When polysilicon crosses N or P diffusion, an N or P
transistor is formed.
 Polysilicon is drawn on top of diffusion.
 Diffusion must be drawn connecting the source and the drain.
 Gate is automatically self-aligned during fabrication.
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 10Wen-Yaw Chung/Chung-Yuan University VLSI Design
Stick Diagram
 3. When a metal line needs to be connected to one of
the other three conductors, a contact cut (via) is
required.
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 11Wen-Yaw Chung/Chung-Yuan University VLSI Design
Stick Diagram
 4. Manhattan geometrical rule: When we use only vertical
and horizontal lines In orthogonal to describe circuitry.
 Boston geometrical rule: The stick diagram also allows
curves to describe circuitry.
 5. In order to describe N/PMOS more completely, to
add n-well 、 P+ select 、 well contact and substrate
contact are optional for 4-terminal notation.
02/19/15 12Wen-Yaw Chung/Chung-Yuan University VLSI Design
Conclusion
 1. Stick diagram is a draft of real layout, it serves
as an abstract view between the schematic and
layout.
 2. Stick diagram uses different lines, colors and
geometrical shapes to present circuit nodes,
devices, and their relative location.
 3. Stick diagram doesn’t include information about
the accurate coordinates and sizes of device, the
length and width of conductors and the real size of
well region.
02/19/15 13Wen-Yaw Chung/Chung-Yuan University VLSI Design
CMOS Inverter Stick
Diagrams
 Basic layout
․ More area efficient layout
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 14Wen-Yaw Chung/Chung-Yuan University VLSI Design
 CMOS inverter described in other way.
VDD
in
VSS
out
CMOS Inverter Stick
Diagrams
02/19/15 15Wen-Yaw Chung/Chung-Yuan University VLSI Design
CMOS Transmission Gate
The transmission gate Circuit schematic Stick diagram
02/19/15 16Wen-Yaw Chung/Chung-Yuan University VLSI Design
CMOS Stick Diagrams NAND/NOR
02/19/15 17Wen-Yaw Chung/Chung-Yuan University VLSI Design
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
CMOS Stick Diagrams NAND
02/19/15 18Wen-Yaw Chung/Chung-Yuan University VLSI Design
< Exercise 1 >
To draw the following circuitry by using a stick diagram
02/19/15 19Wen-Yaw Chung/Chung-Yuan University VLSI Design
< Exercise 2 >
To draw the stick diagram and the schematic for the following layout
NWELL
NSELECT
PSELECT
POLY
ACTIVE
METAL1
NWELL
NSELECT
PSELECT
POLY
ACTIVE
METAL1
02/19/15 20Wen-Yaw Chung/Chung-Yuan University VLSI Design
CMOS Stick Diagrams
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
NOR
02/19/15 21Wen-Yaw Chung/Chung-Yuan University VLSI Design
CMOS Inverter Mask Layout
Min. spacing and
line width consideration
02/19/15 22Wen-Yaw Chung/Chung-Yuan University VLSI Design
Lambda-based Design Rules
 Lambda design rules are based on a
reference metric λthat has units of um.
 All widths, spacing and distances are
written in the form  Value = m λ
Where m is scaling multiplier.
<e.g.> λ= 1um  w = 2 λ=2um
s = 3λ=3um
02/19/15 23Wen-Yaw Chung/Chung-Yuan University VLSI Design
Lambda based design: half of technology since 1985. As technology
changes with smaller dimensions, a simple change in the value of λ can
be used to produce a new mask set.
All device mask dimensions are based on multiples of λ, e.g., polysilicon
minimum width = 2λ. Minimum metal to metal spacing = 3λ
6λ
2λ
6λ
λ
3λ
3λ
Lambda-based Design Rules
02/19/15 24Wen-Yaw Chung/Chung-Yuan University VLSI Design
Active Contact and Surround Rule
02/19/15 25Wen-Yaw Chung/Chung-Yuan University VLSI Design
Potential Problem - Misalignment
02/19/15 26Wen-Yaw Chung/Chung-Yuan University VLSI Design
Potential Problem – Short between Source and Drain
02/19/15 27Wen-Yaw Chung/Chung-Yuan University VLSI Design
Degree of anisotropy A = 1 – rlat/rvert
Where r  respective etch rates
Physical Limitations
02/19/15 28Wen-Yaw Chung/Chung-Yuan University VLSI Design
Design Rule (0)
 Due to the photo resolution, concentration,
temperature and reaction time of the chemical
reagents, the layout should tolerate some errors
caused by process environment.
 In order to avoid the influence from process
variation, the layout of the circuit schematics
should follow the design Rule 。
02/19/15 29Wen-Yaw Chung/Chung-Yuan University VLSI Design
The purpose of design rules
 Ref. Jan M. Rabaey, et. al, © Digital
Integrated Circuits 2nd Edition
 Interface between designer and process
engineer
 Guidelines for constructing process masks
 Unit dimension: Minimum line width
 scalable design rules: lambda parameter
 absolute dimensions (micron rules)
02/19/15 30Wen-Yaw Chung/Chung-Yuan University VLSI Design
Design Rules(1)
 Layout rules are used for preparing the masks for
fabrication.
 Fabrication processes have inherent limitations in
accuracy.
 Design rules specify geometry of masks to optimize yield
and reliability (trade-offs: area, yield, reliability).
 Three major rules:
 Wire width: Minimum dimension associated with a
given feature.
 Wire separation: Allowable separation.
 Contact: overlap rules.
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 31Wen-Yaw Chung/Chung-Yuan University VLSI Design
Design Rules(2)
 Two major approaches:
 “Micron” rules: stated at micron resolution.
 λ rules: simplified micron rules with
limited scaling attributes.
 λ may be viewed as the size of minimum
feature.
 Design rules represents a tolerance which
insures very high probability of correct
fabrication (not a hard boundary between
correct and incorrect fabrication).
 Design rules are determined by experience.
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 32Wen-Yaw Chung/Chung-Yuan University VLSI Design
Terminology & Definition
 Min. Width : The min. width of the line
(layer)
 <Example> Wpoly(min.) = 0.5um
 Min. Space : The min. spacing between
lines with same material
 <Example> Spoly-poly(min.) = 0.5um
02/19/15 33Wen-Yaw Chung/Chung-Yuan University VLSI Design
 <Min. Extension : The min. extension over different
layers
 <Example> Poly-gate extension over diffusion area =
0.55um
 Min. Overlap : The overlap between different layers
 <Example> Poly1 overlap Poly2 min. = 0.7um
Terminology & Definition
02/19/15 34Wen-Yaw Chung/Chung-Yuan University VLSI Design
Terminology & Definition
 Max. area of the specific region.
 <Example> Bonding Pad Area, max. = 100um x
100um
02/19/15 35Wen-Yaw Chung/Chung-Yuan University VLSI Design
Conventional Layer Definition
Layer
Polysilicon
Metal1
Metal2
Contact To Poly
Contact To Diffusion
Via
Well (p,n)
Active Area (n+,p+)
Color Representation
Yellow
Green
Red
Blue
Magenta
Black
Black
Black
Select (p+,n+) Green
Layer
Polysilicon
Metal1
Metal2
Contact To Poly
Contact To Diffusion
Via
Well (p,n)
Active Area (n+,p+)
Color Representation
Yellow
Green
Red
Blue
Magenta
Black
Black
Black
Select (p+,n+) Green
Layer
Polysilicon
Metal1
Metal2
Contact To Poly
Contact To Diffusion
Via
Well (p,n)
Active Area (n+,p+)
Color Representation
Yellow
Green
Red
Blue
Magenta
Black
Black
Black
Select (p+,n+) Green
02/19/15 36Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCMOS Design Rules
IntraIntra--Layer Design RulesLayer Design Rules
Metal2
4
3
Ref. Jan M. Rabaey, et. al, © Digital Integrated Circuits 2nd Edition
02/19/15 37Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCMOS Design Rules
1
2
1
Via
Metal to
Poly ContactMetal to
Active Contact
1
2
5
4
3 2
2
02/19/15 38Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCMOS Design Rules
1
3 3
2
2
2
Well
Substrate
Select
3
5
02/19/15 39Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCMOS Design Rules
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 40Wen-Yaw Chung/Chung-Yuan University VLSI Design
MOSIS Layout Design Rules
 MOSIS design rules (SCMOS rules) are available at
http://www.mosis.org.
 3 basic design rules:
 Wire width
 Wire separation
 Contact rule
 MOSIS design rule examples
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 41Wen-Yaw Chung/Chung-Yuan University VLSI Design
III. Layout Verification
 A. Definition
 DRC – Design Rule Check
 ERC – Electrical Rule Check
 LVS – Layout Versus Schematic
 LPE – Layout Parameter
Extraction
02/19/15 42Wen-Yaw Chung/Chung-Yuan University VLSI Design
Layout Verification
 B. DRC(Design Rule Check) :
 => To check the min. line width and
spacing based on the design rules.
C. ERC(Electrical Rule Check) :
 => To check the short circuit
between Power and Ground, or check
the floating node or devices.
02/19/15 43Wen-Yaw Chung/Chung-Yuan University VLSI Design
Layout Verification
D. LVS(Layout versus Schematic) :
 => To verify the consistency between Schematic
and Layout. For example : to check the amount of
transistor numbers, sizes of W/L.
E. LPE or PEX(Layout Parameter
Extraction) :
 => From the database of layout, to extract the
devices with parasitics including effective W/L,
parasitic capacitances and series resistance. The
extracted file is in SPICE format and can be used
for Post-Layout Simulation 。
02/19/15 44Wen-Yaw Chung/Chung-Yuan University VLSI Design
Layout Verification
F. Simulations
Pre-Layout Simulation - before layout work
Post-Layout Simulation – after layout work, post layout
simulation will reflect more realistic circuit performance.
02/19/15 45Wen-Yaw Chung/Chung-Yuan University VLSI Design
Layout Verification
The complete design environment of Fill-Custom Design
Design database – Cadence Design Framework II
Circuit Editor – Text editor/Schematic editor (S-edit,
Composer)
Circuit Simulator – SPICE,TSPICE, HSPICE
Layout Editor – Cadence Virtuoso, Laker, L-edit
Layout Verification Diva, Dracula, Calibre, Hercules
02/19/15 46Wen-Yaw Chung/Chung-Yuan University VLSI Design
Concluding Remarks
 Milestones technology in silicon era
 Transistor  Integrated Circuits  CMOS
Technology
 Key weapons in SOC era
 Design Automation
 Design Reuse
 Breakthrough techniques in design automation
 Simulation (e.g., SPICE, Verilog-XL, etc.)
 Automatic Placement and Routing (APR)
 Logic Synthesis (e.g., Design Compiler)
 Formal Verification
 Test Pattern Generation
It is EDA that pushes the IC design technology forward !
[Ref]: 教育部顧問室
「超大型積體電路與系統設計」教育改進計畫
EDA 聯盟 – 推廣課程 Chap.1
02/19/15 47Wen-Yaw Chung/Chung-Yuan University VLSI Design
[Ref.] John P. Uyemura, “Physical Design of CMOS
Integrated Circuits Using L-EDIT”, PWS Publishing Company, 1995.
SCNA Layout Rules
02/19/15 48Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCNA Layout Rules
02/19/15 49Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCNA Layout Rules
02/19/15 50Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCNA Layout Rules
02/19/15 51Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCNA Layout Rules
02/19/15 52Wen-Yaw Chung/Chung-Yuan University VLSI Design
SCNA Layout Rules
02/19/15 53Wen-Yaw Chung/Chung-Yuan University VLSI Design
LAB. 3
 Set#1 – Stick Diagram Practice
 Set#2 – Reverse Engineering

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Lect5stickdiagramlayoutrules 1226994677707873-9

  • 1. 02/19/15 1 VLSI Design and Layout PracticeVLSI Design and Layout Practice Lect5 – Stick Diagram & ScalableLect5 – Stick Diagram & Scalable Design RulesDesign Rules Danny Wen-Yaw ChungDanny Wen-Yaw Chung Institute of Electronic EngineeringInstitute of Electronic Engineering Chung-Yuan Christian UniversityChung-Yuan Christian University Sept. 2008Sept. 2008
  • 2. 02/19/15 2Wen-Yaw Chung/Chung-Yuan University VLSI Design IC Layout Concept and Examples  I. Stick Diagram  II. Design Rules  III. Layout Verification Ref: http://140.135.9.56/XMS/
  • 3. 02/19/15 3Wen-Yaw Chung/Chung-Yuan University VLSI Design
  • 4. 02/19/15 4Wen-Yaw Chung/Chung-Yuan University VLSI Design
  • 5. 02/19/15 5Wen-Yaw Chung/Chung-Yuan University VLSI Design A. Basic Concept  1. Based on the view point of IC layout, the stick diagram can help us understand the circuit function and its geometrical location relative to other circuit blocks.  Legend: contact metal 2 metal 1 poly ndiff pdiff VDD in VSS out ■
  • 6. 02/19/15 6Wen-Yaw Chung/Chung-Yuan University VLSI Design A. Basic Concept  2. Although the stick diagram is an abstract presentation of real layout, it can use graphical symbols or legend to allocate the circuit to 2-diomensional plane and reach the aim same as the physical layout does.  3. The stick diagram is similar to a backbone of the real layout but without the real size and aspect ratio of the devices, it still can reflect the real condition to layout of the silicon chip.
  • 7. 02/19/15 7Wen-Yaw Chung/Chung-Yuan University VLSI Design B. Notations of the stick diagram
  • 8. 02/19/15 8Wen-Yaw Chung/Chung-Yuan University VLSI Design Stick Diagram  Intermediate representation  between the transistor level and the mask (layout) level.  Gives topological information  (identifies different layers and their relationship)  Assumes that wires have no width.  It is possible  to translate stick diagram automatically to layout with correct design rules. [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 9. 02/19/15 9Wen-Yaw Chung/Chung-Yuan University VLSI Design Stick Diagram  1. When the same material (on the same layer) touch or cross, they are connected and belong to the same electrical node.  2. When polysilicon crosses N or P diffusion, an N or P transistor is formed.  Polysilicon is drawn on top of diffusion.  Diffusion must be drawn connecting the source and the drain.  Gate is automatically self-aligned during fabrication. [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 10. 02/19/15 10Wen-Yaw Chung/Chung-Yuan University VLSI Design Stick Diagram  3. When a metal line needs to be connected to one of the other three conductors, a contact cut (via) is required. [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 11. 02/19/15 11Wen-Yaw Chung/Chung-Yuan University VLSI Design Stick Diagram  4. Manhattan geometrical rule: When we use only vertical and horizontal lines In orthogonal to describe circuitry.  Boston geometrical rule: The stick diagram also allows curves to describe circuitry.  5. In order to describe N/PMOS more completely, to add n-well 、 P+ select 、 well contact and substrate contact are optional for 4-terminal notation.
  • 12. 02/19/15 12Wen-Yaw Chung/Chung-Yuan University VLSI Design Conclusion  1. Stick diagram is a draft of real layout, it serves as an abstract view between the schematic and layout.  2. Stick diagram uses different lines, colors and geometrical shapes to present circuit nodes, devices, and their relative location.  3. Stick diagram doesn’t include information about the accurate coordinates and sizes of device, the length and width of conductors and the real size of well region.
  • 13. 02/19/15 13Wen-Yaw Chung/Chung-Yuan University VLSI Design CMOS Inverter Stick Diagrams  Basic layout ․ More area efficient layout [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 14. 02/19/15 14Wen-Yaw Chung/Chung-Yuan University VLSI Design  CMOS inverter described in other way. VDD in VSS out CMOS Inverter Stick Diagrams
  • 15. 02/19/15 15Wen-Yaw Chung/Chung-Yuan University VLSI Design CMOS Transmission Gate The transmission gate Circuit schematic Stick diagram
  • 16. 02/19/15 16Wen-Yaw Chung/Chung-Yuan University VLSI Design CMOS Stick Diagrams NAND/NOR
  • 17. 02/19/15 17Wen-Yaw Chung/Chung-Yuan University VLSI Design [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1 CMOS Stick Diagrams NAND
  • 18. 02/19/15 18Wen-Yaw Chung/Chung-Yuan University VLSI Design < Exercise 1 > To draw the following circuitry by using a stick diagram
  • 19. 02/19/15 19Wen-Yaw Chung/Chung-Yuan University VLSI Design < Exercise 2 > To draw the stick diagram and the schematic for the following layout NWELL NSELECT PSELECT POLY ACTIVE METAL1 NWELL NSELECT PSELECT POLY ACTIVE METAL1
  • 20. 02/19/15 20Wen-Yaw Chung/Chung-Yuan University VLSI Design CMOS Stick Diagrams [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1 NOR
  • 21. 02/19/15 21Wen-Yaw Chung/Chung-Yuan University VLSI Design CMOS Inverter Mask Layout Min. spacing and line width consideration
  • 22. 02/19/15 22Wen-Yaw Chung/Chung-Yuan University VLSI Design Lambda-based Design Rules  Lambda design rules are based on a reference metric λthat has units of um.  All widths, spacing and distances are written in the form  Value = m λ Where m is scaling multiplier. <e.g.> λ= 1um  w = 2 λ=2um s = 3λ=3um
  • 23. 02/19/15 23Wen-Yaw Chung/Chung-Yuan University VLSI Design Lambda based design: half of technology since 1985. As technology changes with smaller dimensions, a simple change in the value of λ can be used to produce a new mask set. All device mask dimensions are based on multiples of λ, e.g., polysilicon minimum width = 2λ. Minimum metal to metal spacing = 3λ 6λ 2λ 6λ λ 3λ 3λ Lambda-based Design Rules
  • 24. 02/19/15 24Wen-Yaw Chung/Chung-Yuan University VLSI Design Active Contact and Surround Rule
  • 25. 02/19/15 25Wen-Yaw Chung/Chung-Yuan University VLSI Design Potential Problem - Misalignment
  • 26. 02/19/15 26Wen-Yaw Chung/Chung-Yuan University VLSI Design Potential Problem – Short between Source and Drain
  • 27. 02/19/15 27Wen-Yaw Chung/Chung-Yuan University VLSI Design Degree of anisotropy A = 1 – rlat/rvert Where r  respective etch rates Physical Limitations
  • 28. 02/19/15 28Wen-Yaw Chung/Chung-Yuan University VLSI Design Design Rule (0)  Due to the photo resolution, concentration, temperature and reaction time of the chemical reagents, the layout should tolerate some errors caused by process environment.  In order to avoid the influence from process variation, the layout of the circuit schematics should follow the design Rule 。
  • 29. 02/19/15 29Wen-Yaw Chung/Chung-Yuan University VLSI Design The purpose of design rules  Ref. Jan M. Rabaey, et. al, © Digital Integrated Circuits 2nd Edition  Interface between designer and process engineer  Guidelines for constructing process masks  Unit dimension: Minimum line width  scalable design rules: lambda parameter  absolute dimensions (micron rules)
  • 30. 02/19/15 30Wen-Yaw Chung/Chung-Yuan University VLSI Design Design Rules(1)  Layout rules are used for preparing the masks for fabrication.  Fabrication processes have inherent limitations in accuracy.  Design rules specify geometry of masks to optimize yield and reliability (trade-offs: area, yield, reliability).  Three major rules:  Wire width: Minimum dimension associated with a given feature.  Wire separation: Allowable separation.  Contact: overlap rules. [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 31. 02/19/15 31Wen-Yaw Chung/Chung-Yuan University VLSI Design Design Rules(2)  Two major approaches:  “Micron” rules: stated at micron resolution.  λ rules: simplified micron rules with limited scaling attributes.  λ may be viewed as the size of minimum feature.  Design rules represents a tolerance which insures very high probability of correct fabrication (not a hard boundary between correct and incorrect fabrication).  Design rules are determined by experience. [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 32. 02/19/15 32Wen-Yaw Chung/Chung-Yuan University VLSI Design Terminology & Definition  Min. Width : The min. width of the line (layer)  <Example> Wpoly(min.) = 0.5um  Min. Space : The min. spacing between lines with same material  <Example> Spoly-poly(min.) = 0.5um
  • 33. 02/19/15 33Wen-Yaw Chung/Chung-Yuan University VLSI Design  <Min. Extension : The min. extension over different layers  <Example> Poly-gate extension over diffusion area = 0.55um  Min. Overlap : The overlap between different layers  <Example> Poly1 overlap Poly2 min. = 0.7um Terminology & Definition
  • 34. 02/19/15 34Wen-Yaw Chung/Chung-Yuan University VLSI Design Terminology & Definition  Max. area of the specific region.  <Example> Bonding Pad Area, max. = 100um x 100um
  • 35. 02/19/15 35Wen-Yaw Chung/Chung-Yuan University VLSI Design Conventional Layer Definition Layer Polysilicon Metal1 Metal2 Contact To Poly Contact To Diffusion Via Well (p,n) Active Area (n+,p+) Color Representation Yellow Green Red Blue Magenta Black Black Black Select (p+,n+) Green Layer Polysilicon Metal1 Metal2 Contact To Poly Contact To Diffusion Via Well (p,n) Active Area (n+,p+) Color Representation Yellow Green Red Blue Magenta Black Black Black Select (p+,n+) Green Layer Polysilicon Metal1 Metal2 Contact To Poly Contact To Diffusion Via Well (p,n) Active Area (n+,p+) Color Representation Yellow Green Red Blue Magenta Black Black Black Select (p+,n+) Green
  • 36. 02/19/15 36Wen-Yaw Chung/Chung-Yuan University VLSI Design SCMOS Design Rules IntraIntra--Layer Design RulesLayer Design Rules Metal2 4 3 Ref. Jan M. Rabaey, et. al, © Digital Integrated Circuits 2nd Edition
  • 37. 02/19/15 37Wen-Yaw Chung/Chung-Yuan University VLSI Design SCMOS Design Rules 1 2 1 Via Metal to Poly ContactMetal to Active Contact 1 2 5 4 3 2 2
  • 38. 02/19/15 38Wen-Yaw Chung/Chung-Yuan University VLSI Design SCMOS Design Rules 1 3 3 2 2 2 Well Substrate Select 3 5
  • 39. 02/19/15 39Wen-Yaw Chung/Chung-Yuan University VLSI Design SCMOS Design Rules [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 40. 02/19/15 40Wen-Yaw Chung/Chung-Yuan University VLSI Design MOSIS Layout Design Rules  MOSIS design rules (SCMOS rules) are available at http://www.mosis.org.  3 basic design rules:  Wire width  Wire separation  Contact rule  MOSIS design rule examples [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 41. 02/19/15 41Wen-Yaw Chung/Chung-Yuan University VLSI Design III. Layout Verification  A. Definition  DRC – Design Rule Check  ERC – Electrical Rule Check  LVS – Layout Versus Schematic  LPE – Layout Parameter Extraction
  • 42. 02/19/15 42Wen-Yaw Chung/Chung-Yuan University VLSI Design Layout Verification  B. DRC(Design Rule Check) :  => To check the min. line width and spacing based on the design rules. C. ERC(Electrical Rule Check) :  => To check the short circuit between Power and Ground, or check the floating node or devices.
  • 43. 02/19/15 43Wen-Yaw Chung/Chung-Yuan University VLSI Design Layout Verification D. LVS(Layout versus Schematic) :  => To verify the consistency between Schematic and Layout. For example : to check the amount of transistor numbers, sizes of W/L. E. LPE or PEX(Layout Parameter Extraction) :  => From the database of layout, to extract the devices with parasitics including effective W/L, parasitic capacitances and series resistance. The extracted file is in SPICE format and can be used for Post-Layout Simulation 。
  • 44. 02/19/15 44Wen-Yaw Chung/Chung-Yuan University VLSI Design Layout Verification F. Simulations Pre-Layout Simulation - before layout work Post-Layout Simulation – after layout work, post layout simulation will reflect more realistic circuit performance.
  • 45. 02/19/15 45Wen-Yaw Chung/Chung-Yuan University VLSI Design Layout Verification The complete design environment of Fill-Custom Design Design database – Cadence Design Framework II Circuit Editor – Text editor/Schematic editor (S-edit, Composer) Circuit Simulator – SPICE,TSPICE, HSPICE Layout Editor – Cadence Virtuoso, Laker, L-edit Layout Verification Diva, Dracula, Calibre, Hercules
  • 46. 02/19/15 46Wen-Yaw Chung/Chung-Yuan University VLSI Design Concluding Remarks  Milestones technology in silicon era  Transistor  Integrated Circuits  CMOS Technology  Key weapons in SOC era  Design Automation  Design Reuse  Breakthrough techniques in design automation  Simulation (e.g., SPICE, Verilog-XL, etc.)  Automatic Placement and Routing (APR)  Logic Synthesis (e.g., Design Compiler)  Formal Verification  Test Pattern Generation It is EDA that pushes the IC design technology forward ! [Ref]: 教育部顧問室 「超大型積體電路與系統設計」教育改進計畫 EDA 聯盟 – 推廣課程 Chap.1
  • 47. 02/19/15 47Wen-Yaw Chung/Chung-Yuan University VLSI Design [Ref.] John P. Uyemura, “Physical Design of CMOS Integrated Circuits Using L-EDIT”, PWS Publishing Company, 1995. SCNA Layout Rules
  • 48. 02/19/15 48Wen-Yaw Chung/Chung-Yuan University VLSI Design SCNA Layout Rules
  • 49. 02/19/15 49Wen-Yaw Chung/Chung-Yuan University VLSI Design SCNA Layout Rules
  • 50. 02/19/15 50Wen-Yaw Chung/Chung-Yuan University VLSI Design SCNA Layout Rules
  • 51. 02/19/15 51Wen-Yaw Chung/Chung-Yuan University VLSI Design SCNA Layout Rules
  • 52. 02/19/15 52Wen-Yaw Chung/Chung-Yuan University VLSI Design SCNA Layout Rules
  • 53. 02/19/15 53Wen-Yaw Chung/Chung-Yuan University VLSI Design LAB. 3  Set#1 – Stick Diagram Practice  Set#2 – Reverse Engineering