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IOSR Journal of Engineering (IOSRJEN) www.iosrjen.org
ISSN (e): 2250-3021, ISSN (p): 2278-8719
Vol. 05, Issue 04 (April. 2015), ||V1|| PP 06-08
International organization of Scientific Research 6 | P a g e
Effect of Annealing on Optical Properties of CdS Thin Films
Ravangave L. S, Mahewar R. B.
Department of Physics, Shri Sant Gadge Maharaj College, Loha, Dist. Nanded, (MS), India
Abstract: - Cadmium sulphide (CdS) thin films have been deposited by using Chemical Bath Deposition (CBD)
Technique. Initially bath parameters such as deposition temperature, pH of the precursor, deposition time,
molarities of the precursors were optimized for deposition of CdS thin films. The prepared CdS thin films were
annealed at different temperatures (100, 200, 300, 400 0
C). As deposited and annealed CdS thin films were
characterized by Uv-Visible spectrophotometer. The effect of annealing temperature on interaction of light with
deposited material was investigated.
Keywords: - Chemical Bath Deposition, CdS thin films, Optical properties, optical band gap.
I. INTRODUCTION
In last few decades efforts have been devoted to preparing II-IV semiconductor thin films because of
their wide range of application in the fabrication of solar cells and other optoelectronic devices. The CdS
material is an important candidate used as a window layer in solar cell architecture [1]. In thin-film form, CdS
can be combined with other layers for use in certain types of solar cells[2]. CdS was also one of the first
semiconductor materials to be used for thin-film transistors (TFTs)[3].
Over the past few years, several deposition methods have been employed including radio-frequency
sputtering [4], hydrothermal [5], SILAR [6] and chemical bath deposition method [7-9] to prepare cadmium
sulphide thin films. Among various deposition methods, chemical bath deposition method has been identified as
simple and low cost thin films deposition method with many advantages. Up-to-date, chemical bath deposition
method has been successfully used to deposit various thin films including ZnSe [10], CdS, CdZnS[11,12],
Ni4S3 [13] and As2S3 [14]. Chemical bath deposition method is based on the controlled precipitation from
solution of a compound on a suitable substrate. CBD is a technique in which thin films are deposited on
substrates immersed in dilute solutions containing metal ions and either sulfide or selenide ions. This process
usually uses a chelating agent to control the release of metal ions and sulfide ions to produce the controlled
homogeneous precipitation of the film on the solid substrate. CBD is well suited for producing large-area thin
films and has many other advantages. Firstly, it does not require sophisticated instruments or other expensive
equipment, such as a vacuum system, and the starting chemicals are commonly available and inexpensive.
Secondly, low temperature deposition avoids oxidation and corrosion of metallic substrates and so various
substrates can be used, including insulators, semiconductors and metals. Thirdly, the preparation parameters are
easily controlled.
In the present paper Chemical Bath deposition technique was used for deposition of CdS thin films.
The prepared CdS thin films were annealed at different temperatures in air. As deposited and annealed CdS
films were characterized by using Uv-Visible spectrophotometer. Effect of annealing on optical properties was
studied.
II. EXPERIMENTAL
i. Materials and Method: In order to prepare CdS thin films, cadmium chloride (CdCl2), and thiourea
(NH2CSNH2) were used as Cd+2
and S-2
ions respectively. The stock solutions of CdCl2 (1M), and NH2-CS-NH2
(1M) were prepared. Five different baths were prepared each containing 10ml of 1M CdCl2, 10ml of 1M NH2-
CS-NH2 , 2ml triethyleneamide (TEA) was added as a chelating agent with continuous stirring. pH of the
precursors was adjusted to 10.5 by drop wise addition of Ammonia to slowed down the reaction. The above
prepared chemical baths were kept in constant temperature bath, maintained at constant optimized temperature
45 0
C. The glass substrates used for deposition of CdS films were previously cleaned, immersed in each bath.
After optimized deposition time 12 hours the substrates were taken out of the baths. The deposited substrates
were washed twice with doubly deionised water and dried in air. The uniform yellow colored films were
deposited over substrates.
ii. Mechanism CdS Thin Film Formation: The method which is used to prepare cadmium Zinc sulphide
(CdZnS) includes the reaction of Cd2+
, Zn2+
ions and S2-
ions were found in solution from thiourea is as:
(NH2)2 CS + OH-
↔SH-
+ CN2H2 + H2O --------------1
SH-
+ OH-
↔S2-
+ H2O --------------2
Effect of Annealing on Optical Properties of CdS Thin Films
International organization of Scientific Research 7 | P a g e
Dissolving CdCl2 in water made both cadmium ions available in the solution and formation of
complexes of those ions as: In case of NH3 as complexing agents, the Cd2+
exist predominantly in the form of
ion complex. The ratesof CdS formation are determined by the concentration of Cd2+
provided by [Cd(NH3)4]2+
,
and the concentration of S2−
from the hydrolysis of SC(NH2)2, respectively. The general reaction can be
expressed as :
NH3 +H2 O ↔ NH4
+
+ OH-
[Cd(NH3)4]2+
↔ Cd2+
+4 NH3
[Cd (NH3)4] 2+
+ S2-
+ NH3 → CdS + Remaining product. --------3
The prepared CdS thin films were rinsed with deionized water to remove the loosely bound particles and dried
in air. The film sample are numbered 1through 5. Film sample 1was kept as deposited, sample 2, 3, 4 and 5
were heated in air for100, 200, 300, 400 0
C. The as deposited and annealed films are characterized by Uv-
Visible spectroscopy.
III. RESULTS AND DISCUSSION
Deposited films were characterized by using systronics double beam 2201 spectrophotometer; the
percentage absorption was plotted against wavelengths (nm) as shown in fig. 13. All the films show that
absorption decreased with increase in wavelengths. The annealed CdS thin films show the significant blue shift
of absorption edge as compared to the as-deposited CdS thin film. The film annealed at 400 0C exhibit
significant blue shift as compared to other samples. It was reported that blue shifting of absorption edge
indicates that the prepared film exhibit low absorption in the blue region which is the advantage for solar cell
application [23]. The optical band gap [24] was obtained by using the relation(1).
α = A (hν -Eg)n
/ hν (1)
Where A is constant depending upon the transition probability, for direct allowed transition n=2, Eg is band
gap energy and hυ is the photon energy. The band gap energy ‘Eg’ is determined by extrapolating the linear
portion of the plot of (αhν)2
against hν to the energy axis at α= 0. where α absorption Coefficient can be
obtained from equation (1).
The figure shows 2. the plot of (αhν)2
as a function of photon energy hν. The variation of band gap is plotted as
a function deposition temperature is shown in Fig 3.
The CdS is a wide band gap material and exhibits band gap of 2.42 eV in bulk form however the deposited films
show higher band gap. The increase of band gap is
related to particle size and quantum confinement effect which is the scope of the work. The band gap was found
increased significantly from 3.63 to 3.8 eV on annealing. The variation of optical band gap with annealing
temperature was presented in Fig. 3.
Fig. 4 shows the plot of percentage transmittance verses wavelengths (nm). The significant increase in
transmittance was observed with increasing the annealing temperature. The annealed films show higher
transmittance as compared to as-deposited CdS thin films. The film sample annealed at 400 0
C exhibit 64%
transmittance in red and infrared region of the electromagnetic spectrum. The high transmittance and wide band
gap are the important characteristics of solar cell devices. The study of optical properties of deposited CdS thin
films concluded that the interaction of photon energy is related to structural changes of CdS material deposited
on the substrate.
Effect of Annealing on Optical Properties of CdS Thin Films
International organization of Scientific Research 8 | P a g e
IV. CONCLUSION
Thin uniform CdS thin films were deposited using Chemical Bath technique. The optical study show that
annealed films exhibits significant blue shift of absorption edge as compared to as-deposited film. The increase
in band gap and percentage transmittance on annealing concluded that interaction of light with matter related to
the structural changes of deposited CdS material on annealing.
V. ACKNOWLEDGEMENT
Authors are acknowledges to Principal, Dr, A. B. Gawate, Shri Sant Gadge Maharaj College Loha, for providing
laboratory facilities, authors are also acknowledges to principal Mahatma Gandhi College for providing research
facilities at their physics research centerAcknowadgement
REFERENCES
[1] K. L. Chopra, Thin Film Phenomena, (McGraw Hill, New York 1969)
[2] R. Agarwal, C. J. Barrelet, C. M. Lieber, Lasing in Single Cadmium Sulfide Nanowire, Optical Cavities. Nano
Letters 5 (5), (2005).917
[3] P.K. Weimar, The TFT a new thin-film transistor: Proc. IRE, 50, (6) (1962),1462-1469.
[4] H. M.Pathan, S. S. Kale, C. D. Lokhande, S. H.,Han, O. S. Joo, Preparation and characterization of amorphous
manganese sulfide thin films by SILAR method. Mater Res Bull, 42 (2007) 1565-1569.
[5] C. D. Lokhande A. Ennaoui, P. S. Patil, M.Giersig, M. Muller, K. Diesner, H. Tributsch, Process and characterization
of chemical bath deposited manganese sulphide (MnS) thin films. Thin Solid Films, 330, (1998), 70-75.
[6] D. B. Fan, X. D. Yang, H. Wang, Y. C. Zhang, H.Yan, Photoluminescence of MnS thin film prepared by chemical
bath deposition. Physica B: Condensed Matter 33, (2003) 165-169.
[7] C.Gumus, C. Ulutas, R. Esen, O. M. Ozkendir, Y, Ufuktepe. Preparation and characterization crystalline MnS thin
films by chemical bath deposition. Thin Solid Films, 492, (2005) 1-5.
[8] S. N. Agbo, F. I. Ezema, Analysis of chemically deposited MnS thin films. The Pacific J Sci Technol, 8, (2007) 150-
154.
[9] L. Raniero, C. L. Ferreira, L. R. Cruz, A. L. Pinto, Photoconductivity activation in PbS thin films grown at room
temperature by chemical bath deposition. Physica B: Condensed Matter, 405, (2010) 1283-1286.
[10] K. M. Garadkar, S. J. Pawar, P. P.Hankare, A. A. Patil, Effect of annealing on chemically deposited polycrystalline
CdTe thin films. J Alloys Compd, 491,(2010), 77-80.
[11] C.Mehta, G. S. Saini, J. M. Abbas, S. K. Tripathi Effect of deposition parameters on structural, optical and electrical
properties of nanocrystalline ZnSe thin films. 517, Appl Surf Sci., 256, (2009), 608-614. 25.
[12] W. Y. Li, X. Cai, Q. L. Chen, Z. B. Zhou, Influence of growth process on the structural, optical and electrical
properties of CBD CdS films. Mater Lett; 59, (2005),1-5.
[13] K. Anuar, N. Saravanan, W. T. Tan, S. M. Ho, D. Teo, Chemical bath deposition of nickel sulphide (Ni4S3) thin
films. Leonardo J Sci., 16, (2010) 1-12.
[14] R. S.Mane, V. V. Todkar, C. D. Lokhande, Low temperature synthesis of nanocrystalline As2S3 thin films using
novel chemical bath deposition route. Appl Surf Sci., 227, (2004), 48-55.
[15] J. Pankove, Optical Processes in Semiconductors, (Prentice – Hall, Inc., Englewoodcliffs, 1971) 285, 111.

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B05410608

  • 1. IOSR Journal of Engineering (IOSRJEN) www.iosrjen.org ISSN (e): 2250-3021, ISSN (p): 2278-8719 Vol. 05, Issue 04 (April. 2015), ||V1|| PP 06-08 International organization of Scientific Research 6 | P a g e Effect of Annealing on Optical Properties of CdS Thin Films Ravangave L. S, Mahewar R. B. Department of Physics, Shri Sant Gadge Maharaj College, Loha, Dist. Nanded, (MS), India Abstract: - Cadmium sulphide (CdS) thin films have been deposited by using Chemical Bath Deposition (CBD) Technique. Initially bath parameters such as deposition temperature, pH of the precursor, deposition time, molarities of the precursors were optimized for deposition of CdS thin films. The prepared CdS thin films were annealed at different temperatures (100, 200, 300, 400 0 C). As deposited and annealed CdS thin films were characterized by Uv-Visible spectrophotometer. The effect of annealing temperature on interaction of light with deposited material was investigated. Keywords: - Chemical Bath Deposition, CdS thin films, Optical properties, optical band gap. I. INTRODUCTION In last few decades efforts have been devoted to preparing II-IV semiconductor thin films because of their wide range of application in the fabrication of solar cells and other optoelectronic devices. The CdS material is an important candidate used as a window layer in solar cell architecture [1]. In thin-film form, CdS can be combined with other layers for use in certain types of solar cells[2]. CdS was also one of the first semiconductor materials to be used for thin-film transistors (TFTs)[3]. Over the past few years, several deposition methods have been employed including radio-frequency sputtering [4], hydrothermal [5], SILAR [6] and chemical bath deposition method [7-9] to prepare cadmium sulphide thin films. Among various deposition methods, chemical bath deposition method has been identified as simple and low cost thin films deposition method with many advantages. Up-to-date, chemical bath deposition method has been successfully used to deposit various thin films including ZnSe [10], CdS, CdZnS[11,12], Ni4S3 [13] and As2S3 [14]. Chemical bath deposition method is based on the controlled precipitation from solution of a compound on a suitable substrate. CBD is a technique in which thin films are deposited on substrates immersed in dilute solutions containing metal ions and either sulfide or selenide ions. This process usually uses a chelating agent to control the release of metal ions and sulfide ions to produce the controlled homogeneous precipitation of the film on the solid substrate. CBD is well suited for producing large-area thin films and has many other advantages. Firstly, it does not require sophisticated instruments or other expensive equipment, such as a vacuum system, and the starting chemicals are commonly available and inexpensive. Secondly, low temperature deposition avoids oxidation and corrosion of metallic substrates and so various substrates can be used, including insulators, semiconductors and metals. Thirdly, the preparation parameters are easily controlled. In the present paper Chemical Bath deposition technique was used for deposition of CdS thin films. The prepared CdS thin films were annealed at different temperatures in air. As deposited and annealed CdS films were characterized by using Uv-Visible spectrophotometer. Effect of annealing on optical properties was studied. II. EXPERIMENTAL i. Materials and Method: In order to prepare CdS thin films, cadmium chloride (CdCl2), and thiourea (NH2CSNH2) were used as Cd+2 and S-2 ions respectively. The stock solutions of CdCl2 (1M), and NH2-CS-NH2 (1M) were prepared. Five different baths were prepared each containing 10ml of 1M CdCl2, 10ml of 1M NH2- CS-NH2 , 2ml triethyleneamide (TEA) was added as a chelating agent with continuous stirring. pH of the precursors was adjusted to 10.5 by drop wise addition of Ammonia to slowed down the reaction. The above prepared chemical baths were kept in constant temperature bath, maintained at constant optimized temperature 45 0 C. The glass substrates used for deposition of CdS films were previously cleaned, immersed in each bath. After optimized deposition time 12 hours the substrates were taken out of the baths. The deposited substrates were washed twice with doubly deionised water and dried in air. The uniform yellow colored films were deposited over substrates. ii. Mechanism CdS Thin Film Formation: The method which is used to prepare cadmium Zinc sulphide (CdZnS) includes the reaction of Cd2+ , Zn2+ ions and S2- ions were found in solution from thiourea is as: (NH2)2 CS + OH- ↔SH- + CN2H2 + H2O --------------1 SH- + OH- ↔S2- + H2O --------------2
  • 2. Effect of Annealing on Optical Properties of CdS Thin Films International organization of Scientific Research 7 | P a g e Dissolving CdCl2 in water made both cadmium ions available in the solution and formation of complexes of those ions as: In case of NH3 as complexing agents, the Cd2+ exist predominantly in the form of ion complex. The ratesof CdS formation are determined by the concentration of Cd2+ provided by [Cd(NH3)4]2+ , and the concentration of S2− from the hydrolysis of SC(NH2)2, respectively. The general reaction can be expressed as : NH3 +H2 O ↔ NH4 + + OH- [Cd(NH3)4]2+ ↔ Cd2+ +4 NH3 [Cd (NH3)4] 2+ + S2- + NH3 → CdS + Remaining product. --------3 The prepared CdS thin films were rinsed with deionized water to remove the loosely bound particles and dried in air. The film sample are numbered 1through 5. Film sample 1was kept as deposited, sample 2, 3, 4 and 5 were heated in air for100, 200, 300, 400 0 C. The as deposited and annealed films are characterized by Uv- Visible spectroscopy. III. RESULTS AND DISCUSSION Deposited films were characterized by using systronics double beam 2201 spectrophotometer; the percentage absorption was plotted against wavelengths (nm) as shown in fig. 13. All the films show that absorption decreased with increase in wavelengths. The annealed CdS thin films show the significant blue shift of absorption edge as compared to the as-deposited CdS thin film. The film annealed at 400 0C exhibit significant blue shift as compared to other samples. It was reported that blue shifting of absorption edge indicates that the prepared film exhibit low absorption in the blue region which is the advantage for solar cell application [23]. The optical band gap [24] was obtained by using the relation(1). α = A (hν -Eg)n / hν (1) Where A is constant depending upon the transition probability, for direct allowed transition n=2, Eg is band gap energy and hυ is the photon energy. The band gap energy ‘Eg’ is determined by extrapolating the linear portion of the plot of (αhν)2 against hν to the energy axis at α= 0. where α absorption Coefficient can be obtained from equation (1). The figure shows 2. the plot of (αhν)2 as a function of photon energy hν. The variation of band gap is plotted as a function deposition temperature is shown in Fig 3. The CdS is a wide band gap material and exhibits band gap of 2.42 eV in bulk form however the deposited films show higher band gap. The increase of band gap is related to particle size and quantum confinement effect which is the scope of the work. The band gap was found increased significantly from 3.63 to 3.8 eV on annealing. The variation of optical band gap with annealing temperature was presented in Fig. 3. Fig. 4 shows the plot of percentage transmittance verses wavelengths (nm). The significant increase in transmittance was observed with increasing the annealing temperature. The annealed films show higher transmittance as compared to as-deposited CdS thin films. The film sample annealed at 400 0 C exhibit 64% transmittance in red and infrared region of the electromagnetic spectrum. The high transmittance and wide band gap are the important characteristics of solar cell devices. The study of optical properties of deposited CdS thin films concluded that the interaction of photon energy is related to structural changes of CdS material deposited on the substrate.
  • 3. Effect of Annealing on Optical Properties of CdS Thin Films International organization of Scientific Research 8 | P a g e IV. CONCLUSION Thin uniform CdS thin films were deposited using Chemical Bath technique. The optical study show that annealed films exhibits significant blue shift of absorption edge as compared to as-deposited film. The increase in band gap and percentage transmittance on annealing concluded that interaction of light with matter related to the structural changes of deposited CdS material on annealing. V. ACKNOWLEDGEMENT Authors are acknowledges to Principal, Dr, A. B. Gawate, Shri Sant Gadge Maharaj College Loha, for providing laboratory facilities, authors are also acknowledges to principal Mahatma Gandhi College for providing research facilities at their physics research centerAcknowadgement REFERENCES [1] K. L. Chopra, Thin Film Phenomena, (McGraw Hill, New York 1969) [2] R. Agarwal, C. J. Barrelet, C. M. Lieber, Lasing in Single Cadmium Sulfide Nanowire, Optical Cavities. Nano Letters 5 (5), (2005).917 [3] P.K. Weimar, The TFT a new thin-film transistor: Proc. IRE, 50, (6) (1962),1462-1469. [4] H. M.Pathan, S. S. Kale, C. D. Lokhande, S. H.,Han, O. S. Joo, Preparation and characterization of amorphous manganese sulfide thin films by SILAR method. Mater Res Bull, 42 (2007) 1565-1569. [5] C. D. Lokhande A. Ennaoui, P. S. Patil, M.Giersig, M. Muller, K. Diesner, H. Tributsch, Process and characterization of chemical bath deposited manganese sulphide (MnS) thin films. Thin Solid Films, 330, (1998), 70-75. [6] D. B. Fan, X. D. Yang, H. Wang, Y. C. Zhang, H.Yan, Photoluminescence of MnS thin film prepared by chemical bath deposition. Physica B: Condensed Matter 33, (2003) 165-169. [7] C.Gumus, C. Ulutas, R. Esen, O. M. Ozkendir, Y, Ufuktepe. Preparation and characterization crystalline MnS thin films by chemical bath deposition. Thin Solid Films, 492, (2005) 1-5. [8] S. N. Agbo, F. I. Ezema, Analysis of chemically deposited MnS thin films. The Pacific J Sci Technol, 8, (2007) 150- 154. [9] L. Raniero, C. L. Ferreira, L. R. Cruz, A. L. Pinto, Photoconductivity activation in PbS thin films grown at room temperature by chemical bath deposition. Physica B: Condensed Matter, 405, (2010) 1283-1286. [10] K. M. Garadkar, S. J. Pawar, P. P.Hankare, A. A. Patil, Effect of annealing on chemically deposited polycrystalline CdTe thin films. J Alloys Compd, 491,(2010), 77-80. [11] C.Mehta, G. S. Saini, J. M. Abbas, S. K. Tripathi Effect of deposition parameters on structural, optical and electrical properties of nanocrystalline ZnSe thin films. 517, Appl Surf Sci., 256, (2009), 608-614. 25. [12] W. Y. Li, X. Cai, Q. L. Chen, Z. B. Zhou, Influence of growth process on the structural, optical and electrical properties of CBD CdS films. Mater Lett; 59, (2005),1-5. [13] K. Anuar, N. Saravanan, W. T. Tan, S. M. Ho, D. Teo, Chemical bath deposition of nickel sulphide (Ni4S3) thin films. Leonardo J Sci., 16, (2010) 1-12. [14] R. S.Mane, V. V. Todkar, C. D. Lokhande, Low temperature synthesis of nanocrystalline As2S3 thin films using novel chemical bath deposition route. Appl Surf Sci., 227, (2004), 48-55. [15] J. Pankove, Optical Processes in Semiconductors, (Prentice – Hall, Inc., Englewoodcliffs, 1971) 285, 111.