This document discusses contamination control in semiconductor fabrication. It identifies five major classes of contaminants: particles, metallic ions, chemicals, bacteria, and airborne molecular contaminants. Contamination can reduce device yield, affect performance and reliability. Sources of contamination include air, the production facility, cleanroom personnel, process water, chemicals, gases and static charge. The document describes techniques for maintaining cleanliness, such as cleanrooms, air filtration, garment protocols and chemical purification. It also outlines requirements for wafer cleaning and differences between front-end-of-line and back-end-of-line processing.
Cross contamination in Pharmaceuticals - by Jitendra J Jagtapjitendrajagtap1986
The document discusses cross contamination in pharmaceutical manufacturing. It states that the manufacturing environment is critical for product quality and can impact light, temperature, humidity, air movement and microbial and particulate contamination. Poorly designed or maintained air handling systems, inadequate cleaning procedures, and insufficient personnel and equipment procedures can lead to cross contamination originating from the environment, operators or equipment. Cross contamination can be minimized through skilled personnel, adequate facility design, closed production systems, validated cleaning procedures, and appropriate air pressure differentials in heating, ventilation and air conditioning systems.
This document discusses key considerations for the aseptic manufacturing of sterile pharmaceutical products. It covers classification of clean areas, environmental monitoring, preparation and filtration of solutions, personnel requirements, equipment sterilization, and validation of aseptic processes. The main objectives are to prevent microbial contamination and maintain sterility throughout manufacturing.
The document discusses aseptic processing, which involves bringing together sterile products, containers, and closures that have been separately sterilized and assembling them in a highly controlled environment using specialized personnel and equipment. Key elements of aseptic processing include facility design and control, equipment sterilization and material handling, the aseptic processing itself, personnel training, process verification through media fills and environmental monitoring, finished product testing, and comprehensive documentation.
Contamination control and sterile manufacturingGeorge Wild
Microorganisms like bacteria, viruses, and fungal spores pose a contamination risk in sterile manufacturing. Cleanrooms with strict particle and airflow controls are needed. Personnel procedures aim to minimize shedding of microbes. Sterilization methods like heat aim to achieve a sterility assurance level of 1 in 1 million by killing all microbes or reducing their number below acceptable levels. Key factors in sterilization include the bioburden level and resistance of the most durable microorganism strain present.
Aseptic / sterile - “ A state of control attained by using an aseptic work area and performing activities in a manner that precludes microbiological contamination of the exposed sterile product”
Validation of aseptic process should be designed to provide assurance through appropriate testing that all phases and activities of the process remain sterile and it is controlled within the predetermined parameters.
Drug product, container, and closure are subject to sterilization separately, and then brought together.
Process Validation is Key important factor for the Pharmaceutical Industry to maintain Consistent Quality in product which claimed by the manufacturer.
Sanitization & Hygiene in PharmaceuticalIqra Shafeeq
This document discusses sanitation and hygiene in the pharmaceutical industry. It outlines the importance of high sanitation standards across all aspects of manufacturing, including personnel, premises, equipment, materials and products. Specific hygiene practices for personnel are described, such as health examinations, illness reporting, protective clothing, and restrictions on eating or smoking in production areas. Design of premises and avoidance of cross-contamination through measures like segregated areas, ventilation, airlocks, clothing standards and cleaning validation are also covered. Production operation sanitation procedures including cleaning validation, water systems cleaning and maintenance activities are summarized.
This document discusses cross-contamination, mix-ups, and clean room practices. It defines key terms like contamination, cross-contamination, and mix-ups. It identifies sources of contamination like personnel, equipment, airflow, and discusses prevention methods like facility design, cleaning validation, and cleanroom classification systems. Personnel clothing, hygiene, and cleaning practices are important to prevent contamination from people. Proper airflow and HVAC systems also help control contamination. Regular monitoring and maintenance of cleanrooms is necessary to ensure quality manufacturing of pharmaceutical products.
Cross contamination in Pharmaceuticals - by Jitendra J Jagtapjitendrajagtap1986
The document discusses cross contamination in pharmaceutical manufacturing. It states that the manufacturing environment is critical for product quality and can impact light, temperature, humidity, air movement and microbial and particulate contamination. Poorly designed or maintained air handling systems, inadequate cleaning procedures, and insufficient personnel and equipment procedures can lead to cross contamination originating from the environment, operators or equipment. Cross contamination can be minimized through skilled personnel, adequate facility design, closed production systems, validated cleaning procedures, and appropriate air pressure differentials in heating, ventilation and air conditioning systems.
This document discusses key considerations for the aseptic manufacturing of sterile pharmaceutical products. It covers classification of clean areas, environmental monitoring, preparation and filtration of solutions, personnel requirements, equipment sterilization, and validation of aseptic processes. The main objectives are to prevent microbial contamination and maintain sterility throughout manufacturing.
The document discusses aseptic processing, which involves bringing together sterile products, containers, and closures that have been separately sterilized and assembling them in a highly controlled environment using specialized personnel and equipment. Key elements of aseptic processing include facility design and control, equipment sterilization and material handling, the aseptic processing itself, personnel training, process verification through media fills and environmental monitoring, finished product testing, and comprehensive documentation.
Contamination control and sterile manufacturingGeorge Wild
Microorganisms like bacteria, viruses, and fungal spores pose a contamination risk in sterile manufacturing. Cleanrooms with strict particle and airflow controls are needed. Personnel procedures aim to minimize shedding of microbes. Sterilization methods like heat aim to achieve a sterility assurance level of 1 in 1 million by killing all microbes or reducing their number below acceptable levels. Key factors in sterilization include the bioburden level and resistance of the most durable microorganism strain present.
Aseptic / sterile - “ A state of control attained by using an aseptic work area and performing activities in a manner that precludes microbiological contamination of the exposed sterile product”
Validation of aseptic process should be designed to provide assurance through appropriate testing that all phases and activities of the process remain sterile and it is controlled within the predetermined parameters.
Drug product, container, and closure are subject to sterilization separately, and then brought together.
Process Validation is Key important factor for the Pharmaceutical Industry to maintain Consistent Quality in product which claimed by the manufacturer.
Sanitization & Hygiene in PharmaceuticalIqra Shafeeq
This document discusses sanitation and hygiene in the pharmaceutical industry. It outlines the importance of high sanitation standards across all aspects of manufacturing, including personnel, premises, equipment, materials and products. Specific hygiene practices for personnel are described, such as health examinations, illness reporting, protective clothing, and restrictions on eating or smoking in production areas. Design of premises and avoidance of cross-contamination through measures like segregated areas, ventilation, airlocks, clothing standards and cleaning validation are also covered. Production operation sanitation procedures including cleaning validation, water systems cleaning and maintenance activities are summarized.
This document discusses cross-contamination, mix-ups, and clean room practices. It defines key terms like contamination, cross-contamination, and mix-ups. It identifies sources of contamination like personnel, equipment, airflow, and discusses prevention methods like facility design, cleaning validation, and cleanroom classification systems. Personnel clothing, hygiene, and cleaning practices are important to prevent contamination from people. Proper airflow and HVAC systems also help control contamination. Regular monitoring and maintenance of cleanrooms is necessary to ensure quality manufacturing of pharmaceutical products.
The document discusses validation in pharmaceutical manufacturing. It defines validation and equipment qualification, which includes design qualification, installation qualification, operational qualification, and performance qualification. The goals of equipment qualification are to ensure equipment works correctly and produces accurate results through documentation and control of any changes. Specific validation processes for an autoclave used in stem sterilization are also outlined.
Validation: Validation is a documented program that provides high degree of assurance that a specific process, method or system consistently produces a result meeting pre-determined acceptance criteria.
This document discusses analytical method validation. It defines analytical method validation as providing assurance that an analytical method can consistently and accurately determine the presence or quantity of attributes. The objectives of validation are to obtain consistent, reliable and accurate data. Key parameters that are assessed in validation include specificity, accuracy, precision, linearity, range, limits of detection and quantification, ruggedness and robustness. The validation process involves planning, testing method performance characteristics, selecting validation acceptance criteria, and documenting results in a validation report. Validation is important for analytical methods used in pharmaceutical analysis.
Sanitation in manufacturing premises is essential to prevent contamination of products. It requires keeping all areas clean, including the premises, manufacturing areas, equipment, and personnel. This involves removing dirt, waste, garbage and other sources of infection or disease. Cleaning and sanitation of premises and equipment helps ensure products are not contaminated during the manufacturing, processing, packing or holding of drug products.
Contamination control in pharmaceutical industryclientscomp
Contamination control is important in the pharmaceutical industry to ensure safety and efficacy. Contaminants can make medicines toxic or transmit pathogens. Strict sterilization and containment methods are used, including laminar airflow hoods, sealed hatches, and disposable systems. Decontamination is the first step, using autoclaving, dry heat, or hydrogen peroxide vapor sterilization. Cleanrooms provide isolated ventilation to limit contamination of chemicals, biologicals, and pharmaceutical products from the environment.
This document provides information about in-process quality control (IPQC) for a student named Pournima Ashok guided by Mrs. M. Harde. It defines IPQC as checks performed during production to monitor and adjust the process to ensure the product meets specifications. This may include controlling the environment or equipment. IPQC is intended to minimize errors, provide accurate procedures, detect errors, allow for corrective actions, identify responsibilities, and enforce established manufacturing and packing operations. Examples of IPQC for tablets include testing for container content uniformity, active ingredient content, tablet thickness, hardness, friability, and disintegration. Friability testing evaluates the tendency of tablets to fragment or powder during storage and handling.
Raw materials include all materials used in manufacturing a finished product, whether present in the final product or not. They must meet defined purchase specifications. Key steps in purchasing raw materials include requisition, supplier selection, quotation, order placement, receipt, and payment. Proper storage conditions must be maintained based on product requirements. Vendors are selected and qualified to ensure a consistent supply of materials meeting quality standards. Receipt, storage, and sampling of materials are controlled through standard operating procedures.
Aseptic / sterile- “ A state of control attained by using an aseptic work area and performing activities in a manner that precludes microbiological contamination of the exposed sterile product”
GMP is a set of principles and procedures that ensure products are consistently manufactured and controlled according to quality standards for their intended use. Key aspects of GMP include requirements for facilities, equipment, personnel, documentation, raw materials, production, packaging and labeling, quality control, self-inspection and product recalls. GMP regulations in India were introduced in 1988 and amended in 2001, embracing rules under the Drugs and Cosmetics Rules 1945. Facilities must be designed and maintained to allow production under hygienic conditions in order to prevent contamination and cross-contamination.
This document discusses concepts of cleaning in place (CIP) and facility cleaning. It begins with an introduction to cleaning and its importance in the pharmaceutical industry. It then discusses types of contamination and cleaning situations. The main focus is on CIP, including its regulatory requirements and factors influencing effective CIP cleaning like temperature, concentration, pressure and flow. It describes the typical CIP process and components of a CIP system. Other cleaning methods like agitated immersion, static immersion, automated parts washing, ultrasonic cleaning and high pressure spraying are also summarized. The document concludes with references on CIP and cleaning validation.
This document summarizes the clean-in-place (CIP) process, which automates internal cleaning of pipes and equipment without disassembly. It describes the typical CIP cycle, which includes pre-rinsing to remove residues, a caustic wash using alkaline detergents, intermediate and final rinsing, and optional sanitizing. Industries that rely on CIP include dairy, beverages, food processing, and pharmaceuticals. The CIP cycle aims to thoroughly clean surfaces through a sequence of washing, rinsing, and sanitizing steps customized for each system.
Cleaning validation is important to ensure safety and prevent contamination during pharmaceutical production. It involves collecting data to prove cleaning procedures consistently remove residues to acceptable limits. Key aspects of validation include defining cleaning procedures, acceptance criteria, sampling methods, and analytical techniques. Validation should continue if procedures or products change. Overall, cleaning validation demonstrates equipment is suitably cleaned between batches to maintain quality as required by cGMP regulations.
Validation is the process of checking of the process, equipment and method whereas qualification is solely done for equipment and qualification of instrument helps in quality of pharmaceutical product.
This document provides an overview of facility design considerations for advanced sterile product manufacturing. It discusses key areas like area planning based on product type, facility classification, environmental control zones, wall and floor treatments, change rooms, personnel flow, and utility locations. Proper facility design with controlled environments and aseptic practices is necessary to ensure sterility of pharmaceutical products like APIs, antibiotics, and biological products during manufacturing.
1. Auditing of microbiology laboratories is important to determine the quality systems, knowledge, capabilities, and culture of continuous improvement.
2. There are six principles of efficient auditing including correct preparation, documentation, adherence to requirements and procedures, and proficiency demonstrations.
3. Types of audits include those of contract manufacturers, laboratories, excipient/active ingredient manufacturers, and internal audits, with vertical audits encompassing more aspects of the process.
The document discusses aseptic filling techniques used to minimize contamination during manufacturing of sterile drug products. It outlines three main areas of control: environmental control through clean rooms and HVAC systems, equipment control using sterilization and sanitization, and individual control with personnel hygiene and gowning. Key aspects covered include clean room classification, HEPA filters, air locks, laminar flow hoods, sterilization methods, and environmental monitoring to ensure an aseptic environment is maintained.
I am uploading this GMP presentation to make aware who are working in pharma and help to maintain high standards in products manufacturing .
GMP Vs cGMP: It is my understanding that , Ultimately GMP & cGMP both the aim is same, means to prevention of the product from bad quality entering the market to endover peoples's life.
GMP applies to pharmaceutical and healthcare products and help to maintain high standards in these products.
cGMP is to remind accepting countries that all guidelines must be followed with latest and current production processes i.e employ technologies and systems which are up-to-date in order to comply with the regulation.
FDA (Food and Drug Administration) included the word “current” to ensure that regulated firms use the most current Good Manufacturing Practices (I believe that some firms would actually use outdated versions of the GMP’s to manufacture regulated products.
(the FDA have made their standards immediately identifiable i.e cGMP; Other international bodies such as the ICH, WHO use the term GMP, as do Canada, Japan and the EMEA (European authority). In FDA view cGMP means following 21 CFR 210 and 211 and no other.)
This document provides information about cleanrooms, their classification, design, and testing. It defines cleanrooms and classifications based on maximum allowable particle concentrations. ISO classification ranges from 1 to 9, with lower numbers indicating cleaner rooms. Design considerations include personnel and material flows, air flow patterns to minimize contamination, construction materials for cleanability, and HVAC systems for air filtration and pressure differentials between zones. Parameters like particle levels, air changes, temperature and humidity are monitored regularly to maintain cleanroom quality.
Contamination Control in Cleanrooms_Dr.A. AmsavelDr. Amsavel A
Basic’s of Contamination
Sources of Contamination
Environment Specification
Elements of Cleanroom Design and Qualification
Definitions
Control of Contaminations
People, Cleaning, Environment & Material
Operation, Monitoring and Control
Documents and Records
Semiconductor Fab Trends and Forecast - June 2013SEMI
The presentation contains Information and data on frontend semiconductor and LED fabs
fabs. The charts and tables are from an article published on May 31, 2013. Visit http://www.semi.org/en/node/45921 to read the entire article.
Other resources:
www.semi.org/fabs
www.semi.org/marketinfo
The document discusses validation in pharmaceutical manufacturing. It defines validation and equipment qualification, which includes design qualification, installation qualification, operational qualification, and performance qualification. The goals of equipment qualification are to ensure equipment works correctly and produces accurate results through documentation and control of any changes. Specific validation processes for an autoclave used in stem sterilization are also outlined.
Validation: Validation is a documented program that provides high degree of assurance that a specific process, method or system consistently produces a result meeting pre-determined acceptance criteria.
This document discusses analytical method validation. It defines analytical method validation as providing assurance that an analytical method can consistently and accurately determine the presence or quantity of attributes. The objectives of validation are to obtain consistent, reliable and accurate data. Key parameters that are assessed in validation include specificity, accuracy, precision, linearity, range, limits of detection and quantification, ruggedness and robustness. The validation process involves planning, testing method performance characteristics, selecting validation acceptance criteria, and documenting results in a validation report. Validation is important for analytical methods used in pharmaceutical analysis.
Sanitation in manufacturing premises is essential to prevent contamination of products. It requires keeping all areas clean, including the premises, manufacturing areas, equipment, and personnel. This involves removing dirt, waste, garbage and other sources of infection or disease. Cleaning and sanitation of premises and equipment helps ensure products are not contaminated during the manufacturing, processing, packing or holding of drug products.
Contamination control in pharmaceutical industryclientscomp
Contamination control is important in the pharmaceutical industry to ensure safety and efficacy. Contaminants can make medicines toxic or transmit pathogens. Strict sterilization and containment methods are used, including laminar airflow hoods, sealed hatches, and disposable systems. Decontamination is the first step, using autoclaving, dry heat, or hydrogen peroxide vapor sterilization. Cleanrooms provide isolated ventilation to limit contamination of chemicals, biologicals, and pharmaceutical products from the environment.
This document provides information about in-process quality control (IPQC) for a student named Pournima Ashok guided by Mrs. M. Harde. It defines IPQC as checks performed during production to monitor and adjust the process to ensure the product meets specifications. This may include controlling the environment or equipment. IPQC is intended to minimize errors, provide accurate procedures, detect errors, allow for corrective actions, identify responsibilities, and enforce established manufacturing and packing operations. Examples of IPQC for tablets include testing for container content uniformity, active ingredient content, tablet thickness, hardness, friability, and disintegration. Friability testing evaluates the tendency of tablets to fragment or powder during storage and handling.
Raw materials include all materials used in manufacturing a finished product, whether present in the final product or not. They must meet defined purchase specifications. Key steps in purchasing raw materials include requisition, supplier selection, quotation, order placement, receipt, and payment. Proper storage conditions must be maintained based on product requirements. Vendors are selected and qualified to ensure a consistent supply of materials meeting quality standards. Receipt, storage, and sampling of materials are controlled through standard operating procedures.
Aseptic / sterile- “ A state of control attained by using an aseptic work area and performing activities in a manner that precludes microbiological contamination of the exposed sterile product”
GMP is a set of principles and procedures that ensure products are consistently manufactured and controlled according to quality standards for their intended use. Key aspects of GMP include requirements for facilities, equipment, personnel, documentation, raw materials, production, packaging and labeling, quality control, self-inspection and product recalls. GMP regulations in India were introduced in 1988 and amended in 2001, embracing rules under the Drugs and Cosmetics Rules 1945. Facilities must be designed and maintained to allow production under hygienic conditions in order to prevent contamination and cross-contamination.
This document discusses concepts of cleaning in place (CIP) and facility cleaning. It begins with an introduction to cleaning and its importance in the pharmaceutical industry. It then discusses types of contamination and cleaning situations. The main focus is on CIP, including its regulatory requirements and factors influencing effective CIP cleaning like temperature, concentration, pressure and flow. It describes the typical CIP process and components of a CIP system. Other cleaning methods like agitated immersion, static immersion, automated parts washing, ultrasonic cleaning and high pressure spraying are also summarized. The document concludes with references on CIP and cleaning validation.
This document summarizes the clean-in-place (CIP) process, which automates internal cleaning of pipes and equipment without disassembly. It describes the typical CIP cycle, which includes pre-rinsing to remove residues, a caustic wash using alkaline detergents, intermediate and final rinsing, and optional sanitizing. Industries that rely on CIP include dairy, beverages, food processing, and pharmaceuticals. The CIP cycle aims to thoroughly clean surfaces through a sequence of washing, rinsing, and sanitizing steps customized for each system.
Cleaning validation is important to ensure safety and prevent contamination during pharmaceutical production. It involves collecting data to prove cleaning procedures consistently remove residues to acceptable limits. Key aspects of validation include defining cleaning procedures, acceptance criteria, sampling methods, and analytical techniques. Validation should continue if procedures or products change. Overall, cleaning validation demonstrates equipment is suitably cleaned between batches to maintain quality as required by cGMP regulations.
Validation is the process of checking of the process, equipment and method whereas qualification is solely done for equipment and qualification of instrument helps in quality of pharmaceutical product.
This document provides an overview of facility design considerations for advanced sterile product manufacturing. It discusses key areas like area planning based on product type, facility classification, environmental control zones, wall and floor treatments, change rooms, personnel flow, and utility locations. Proper facility design with controlled environments and aseptic practices is necessary to ensure sterility of pharmaceutical products like APIs, antibiotics, and biological products during manufacturing.
1. Auditing of microbiology laboratories is important to determine the quality systems, knowledge, capabilities, and culture of continuous improvement.
2. There are six principles of efficient auditing including correct preparation, documentation, adherence to requirements and procedures, and proficiency demonstrations.
3. Types of audits include those of contract manufacturers, laboratories, excipient/active ingredient manufacturers, and internal audits, with vertical audits encompassing more aspects of the process.
The document discusses aseptic filling techniques used to minimize contamination during manufacturing of sterile drug products. It outlines three main areas of control: environmental control through clean rooms and HVAC systems, equipment control using sterilization and sanitization, and individual control with personnel hygiene and gowning. Key aspects covered include clean room classification, HEPA filters, air locks, laminar flow hoods, sterilization methods, and environmental monitoring to ensure an aseptic environment is maintained.
I am uploading this GMP presentation to make aware who are working in pharma and help to maintain high standards in products manufacturing .
GMP Vs cGMP: It is my understanding that , Ultimately GMP & cGMP both the aim is same, means to prevention of the product from bad quality entering the market to endover peoples's life.
GMP applies to pharmaceutical and healthcare products and help to maintain high standards in these products.
cGMP is to remind accepting countries that all guidelines must be followed with latest and current production processes i.e employ technologies and systems which are up-to-date in order to comply with the regulation.
FDA (Food and Drug Administration) included the word “current” to ensure that regulated firms use the most current Good Manufacturing Practices (I believe that some firms would actually use outdated versions of the GMP’s to manufacture regulated products.
(the FDA have made their standards immediately identifiable i.e cGMP; Other international bodies such as the ICH, WHO use the term GMP, as do Canada, Japan and the EMEA (European authority). In FDA view cGMP means following 21 CFR 210 and 211 and no other.)
This document provides information about cleanrooms, their classification, design, and testing. It defines cleanrooms and classifications based on maximum allowable particle concentrations. ISO classification ranges from 1 to 9, with lower numbers indicating cleaner rooms. Design considerations include personnel and material flows, air flow patterns to minimize contamination, construction materials for cleanability, and HVAC systems for air filtration and pressure differentials between zones. Parameters like particle levels, air changes, temperature and humidity are monitored regularly to maintain cleanroom quality.
Contamination Control in Cleanrooms_Dr.A. AmsavelDr. Amsavel A
Basic’s of Contamination
Sources of Contamination
Environment Specification
Elements of Cleanroom Design and Qualification
Definitions
Control of Contaminations
People, Cleaning, Environment & Material
Operation, Monitoring and Control
Documents and Records
Semiconductor Fab Trends and Forecast - June 2013SEMI
The presentation contains Information and data on frontend semiconductor and LED fabs
fabs. The charts and tables are from an article published on May 31, 2013. Visit http://www.semi.org/en/node/45921 to read the entire article.
Other resources:
www.semi.org/fabs
www.semi.org/marketinfo
This document outlines standards of behavior and practices for cleanrooms and cleanzones. It defines key terms like cleanroom, cleanzone, critical activity, and aseptic processing. The document provides guidelines for behaviors in all cleanrooms and cleanzones, including proper gowning, minimizing contamination, and maintaining orderly work areas. It also outlines additional requirements for aseptic filling suites, such as proper glove sanitization procedures and using aseptic technique. The document states that compliance with these standards will be assessed through microbiological audits and is necessary to meet regulatory expectations for sterile drug production.
This document provides an overview of design-build project delivery and highlights some key advantages over traditional design-bid-build approaches. It notes that design-build can reduce costs, shorten project timelines, and place single-source responsibility on the builder. While still less common in the US, design-build is gaining acceptance as it has been shown to exceed quality expectations and reduce cost growth and schedule delays compared to other methods. The document also outlines various design-build strategies, contracting considerations, and cost comparisons between project delivery systems.
Step 5 Pressure Balancing of The Seven Steps of Building a Synergy Home. Air that is supplied to a room needs a return pathway back to the air handler when the door is closed.
Contamination Control And Electrostatics Primer Injection Moldingsemackler
This document discusses contamination control and electrostatics in cleanrooms. It provides information on particle sizes and settling rates, levels of static charge found in work areas, and how static charge can affect wafer contamination. Cleanrooms are prone to developing high levels of static charge due to the insulating materials used and triboelectric charging that occurs when dissimilar materials contact or separate. Proper control of electrostatics is important for preventing contamination.
Bioquell offers a range of automated room disinfection services including reactive, selective, and proactive options. The reactive service provides rapid emergency response to outbreaks. The selective service offers customized services tailored to a hospital's specific needs. The proactive service establishes an on-site Bioquell team and equipment to conduct regular disinfection and help reduce infection rates long-term.
Disinfecting Mobile Devices for use in Healthcare SettingsPhilip Gulan
The use of mobile technology is expected to have a profound impact on how care is delivered, the quality of patient experience and the cost of healthcare in general. Therefore, the quantity of mobile devices being used in healthcare environments is expanding significantly every year. Use of smartphones and tablets in the healthcare settings is rapidly expanding and contributing to improved healthcare and reduced costs around the globe. But this introduction of new technology into clinically sensitive areas creates the risk of passing along bacterial contamination throughout a hospital.
The present study was aimed to design a simple model to test efficacy of germicidal Ultraviolet light (UV-C) used inside ChargeMax as a charging cabinet designed for smartphones and tablets and made by Cetrix Technologies.
Based at London's ExCel centre, this is the only international exhibition & conference dedicated exclusively to the armoured vehicle community. International Armoured Vehicles brings together senior military and industry experts, providing opportunities to gain expert insights on armoured vehicle trends, global procurement activity and lessons learnt from the battlefield, as well as to conduct business with the world's leading vehicle, system and component manufacturers and smaller specialist suppliers.
Este documento describe el proceso de evaluación curricular de un programa educativo en cuatro etapas: evaluación de contexto y entrada, evaluación de proceso, evaluación de producto y conclusiones. Evaluará las competencias docentes, el plan de mejora para estudiantes con necesidades especiales, los logros de conducta de un grupo y concluye que la evaluación curricular busca mejorar la calidad educativa a través de un análisis objetivo y reflexivo.
Hydrogen peroxide vapor technology uses vaporized hydrogen peroxide to decontaminate spaces. It is a chemical sterilization process that is residue-free and does not require pre- or post-humidification. The technology was first used in the 1990s for decontaminating pharmaceutical isolators and is now used for decontaminating 95% of aseptic process isolators. It demonstrates material compatibility and is effective at inactivating various bacteria, viruses, and bacterial spores.
Cleanrooms | Minimizing Risk to ProcessesCleanrooms
The overarching objective of a cleanroom is to minimize risk to the process. The risk comes from a variety of pollutants such as dust, airborne microbes, aerosol particles and chemical vapors.
- Oerlikon Solar presented its THINFAB product for a 120 MWp thin film silicon solar module production facility.
- Key features of THINFAB include a module efficiency of 10% (143 Wp), annual output of 120 MWp, and industry-leading low costs of ownership of 0.50 EUR/Wp and capital expenditures of 1.00 EUR/Wp.
- Oerlikon Solar's end-to-end solution provides a complete and optimized production process from design to certification, enabling high throughput, yield and utilization for the most competitive production costs.
To prevent contamination in a PCR laboratory, strict protocols must be followed for pre-PCR and post-PCR activities. Key steps include maintaining separate rooms and equipment for pre- and post-PCR work, wearing dedicated protective clothing, using UV light and positive displacement pipette tips, and including no-template controls. Chemical methods like UV photolinking and uracil-DNA glycosylase can also inactivate contaminating amplicons. With diligence in following contamination control procedures, researchers can successfully operate a PCR lab free of contamination on a long-term basis.
This document summarizes the semiconductor and photovoltaic markets in China. It discusses trends in China's GDP growth and the drivers of demand for semiconductors. It provides an overview of wafer fabrication facilities and capacity in China by wafer size. The document also examines China's semiconductor materials market, equipment spending trends, and domestic equipment suppliers. Finally, it briefly touches on China's polysilicon production and solar cell manufacturing landscape.
Technical cleaning of data centers and communication rooms should only be performed by qualified personnel using specialized equipment and techniques. This helps remove contaminants without reintroducing dirt or disrupting operations. Key areas like under raised floors and between equipment racks accumulate dust and need thorough vacuuming. Regular cleaning extends equipment life, reduces fire risks and static discharge failures, and keeps the environment free from particles and chemicals that could damage hardware or pollute the air.
Important of clean room and hvac systemRonak654321
This document discusses the importance of clean rooms and HVAC systems in pharmaceutical industries. It provides definitions of clean rooms, describes different clean room classifications according to ISO and FS209E standards, and lists various contamination sources and methods to control contamination. It also explains the key components and functions of HVAC systems used to provide controlled environmental conditions like temperature, humidity and airflow in clean rooms.
The document describes a novel air purification method called NANOBIO® that can remove particles as small as 1 nm to 100 μm from air. It was developed in Finland and published in leading cleanroom technology journals in 2000. The process uses ionization and electric fields to charge and attract particles to collection surfaces without using filters. Testing showed it efficiently cleans air and reduces energy costs compared to other methods. The technology has applications in gene laboratories and other facilities requiring highly purified air.
This document provides an overview of HVAC system design for cleanroom facilities. It discusses the importance of indoor air quality in cleanrooms and outlines four fundamental rules for maintaining cleanroom environments. The document then describes key aspects of cleanroom HVAC system design, including filtration requirements, airflow patterns, temperature and humidity control, and monitoring systems. Maintaining proper pressurization, air exchange rates, and filtration are crucial for controlling airborne particle levels in cleanrooms.
This document provides an overview of HVAC design for cleanroom facilities. It discusses the importance of indoor air quality in cleanrooms and outlines the four fundamental rules that apply, including preventing contamination introduction, equipment generation of contaminants, accumulation of contaminants, and elimination of existing contaminants. The document then describes key elements of cleanroom design like architecture, HVAC systems, interaction technology, and monitoring systems. It also discusses filtration systems used in cleanrooms like HEPA and ULPA filters and the principles of filtration like impaction, interception, diffusion, and electrostatic attraction.
1) An aseptic area is a sterile environment designed to prevent microbial contamination of products. It must control dust and avoid provisions for microbes to enter.
2) Laminar flow equipment uses HEPA filters to blow sterile air and prevent contamination when performing sensitive tasks. It maintains sterile conditions.
3) Sources of contamination in an aseptic area include airborne microbes, operators, raw materials, and equipment that are not properly sterilized or stored. Maintaining aseptic technique and conditions is important to prevent contamination.
This document discusses bacteria in air and methods of air sampling. It notes that air is a mixture of gases with typical composition by volume being nitrogen 78%, oxygen 20.93%, and trace amounts of other gases. Indoor air undergoes physical and chemical changes from factors like temperature, humidity, and metabolic processes. Bacteria are present in all air and can be transmitted person-to-person in aerosols. The size of particles impacts where they are deposited in the respiratory system. Various methods are described for sampling and quantifying bacteria in air, as well as strategies to control airborne bacteria like isolation systems, air filtration, UV irradiation, and engineering controls.
Cleanroom Basics design and requirement .pptmedhatmakkawi
This document provides an overview of effective contamination control in cleanrooms and laboratories. It discusses key topics such as cleanroom definitions, facility design principles, airflow, contamination measurement, cleaning protocols, and the important role of users in maintaining cleanroom cleanliness standards. The presentation emphasizes that while cleanroom design is important, user behavior and adherence to cleanroom protocols can significantly impact overall process yields. Strict gowning procedures and contamination control practices are necessary for all cleanroom users.
The document discusses the requirements and layout for producing sterile parenterals. It describes the different sections needed - cleanup, compounding, aseptic, quarantine, and packing/labeling. Specific requirements for the aseptic area are outlined, including environmental controls like particle counting, slit to agar sampling, and Rodac plates to evaluate air quality. Floors, walls, and benches must be smooth, impervious, and easy to clean. Proper ventilation and filtration of air is essential to maintain sterility. Sources of contamination and prevention methods are also covered.
Clean Rooms require very high quality air as even minor impurities can affect the manufacturing processes. This presentation explains the concept of a Clean Room and the role Air Purifiers play in such environments. This presentation helps explain how air purification for Clean Rooms is done and how it can be a facilitator for obtaining ISO 14644 standards.
The document discusses Amcorp Mall and provides details about its mechanical and air conditioning systems. It notes that Amcorp Mall has a centralized ventilation system using chillers, condenser pumps, and diffusers to control temperature. The carpark uses mechanical ventilation with air vents and ducting to address vehicle emissions. Fire protection systems including alarms, detectors, sprinklers and other active and passive methods are also outlined. Issues with the current ventilation system and recommendations to replace it with an impulse ventilation system are provided to address problems like poor air flow and unpleasant odors.
HVAC systems are an integral part of environmental control and include air handling units. AHU are large metal boxes that condition and circulate air, containing components like blowers, filters, and controls for temperature and humidity. Proper filtration is important for pharmaceutical facilities, utilizing filters like HEPA that can remove 99.97% of particles over 0.3 microns through mechanisms like impingement, diffusion, and interception. Dust collectors are also used to control air pollution and maintain clean environments through various collection methods. Regular inspection and maintenance of air handling systems is crucial to ensure quality pharmaceutical production.
HVAC systems are an integral part of environmental control and include air handling units, filters, and controls for temperature and humidity. Air handling units are large metal boxes that condition and circulate air using components like blowers, coils, and filter racks. Proper filtration is important for pharmaceutical facilities to produce dust-free environments using filter types like HEPA that can remove 99.97% of particles over 0.3 microns. Inspection and maintenance of air handling systems and their documentation is critical because they play a major role in pharmaceutical quality.
This document discusses the layout and design of buildings and equipment for parenteral manufacturing facilities. It covers various topics like plant layout, types of layout, area planning with different zones of environmental control, design of filling areas, wall and floor treatments, classification of clean rooms, air flow patterns, and types of equipment used. The key aspects addressed are maintaining aseptic conditions, minimizing contamination, and ensuring smooth material flow.
Design, Installation and Commissioning Of Clean Room and Hvac Facility for St...IOSR Journals
Today, many manufacturing process requires that spaces to be designed to control particulate and
microbial contamination while maintaining clean room facility with reasonable installation and operating
costs. Clean room facilities are typically used in manufacturing, packaging and research facilities associated
with these industries: Semiconductor, Pharmaceutical, Hospitals, Aerospace and Miscellaneous applications.
This project deals with “Design, Installation and Commissioning of Clean room and HVAC facility for Stem
cell technologies and Regenerative Medicine”. In this thesis, the system design thermal loads , filtration level
and cleanness, pressures produced in the constructed building by varying normal brick wall ,brick wall with
attached panels are calculated..Clean rooms are designed as per ISO14644-4 guidelines to maintain proper air
flow in order to used proper cleanness. The HVAC facility shall be achieved by using the equipments like Air
cooled condensing unit, Air handling units and etc..As a First step towards the project, the system design load
calculations will be done. Air Quantity calculation, Supply/Return air Diffusers, Return Air Risers and Terminal
filters selection, Temperature, RH, Lighting and Fan requirements are as per attached design data sheets. The
classes of cleanliness, filtration and other requirements are to be as per the room list, layout drawings .The
minimum fresh air quantities shall be as per the basis of design above while the exhaust air quantities shall be
as based on the quantities of the leakages and pressures to be maintained in the rooms and Also the leakage
rates considered through the doors to be through the doors to be through a normal single leaf door or double
leaf door for the suggested pressure differentials to be suitably considered.
There are three main cleanroom designs: ballroom, tunnel, and mini-environments. The ballroom design had all processes in a common area but took up too much space. The tunnel design separated areas with walls but also used excess space. The current design uses mini-environments within tools to isolate wafers from the cleanroom air and automated transfer to reduce human exposure. Water must also be highly purified before use through deionization to remove ions and particles. Wafers require cleaning after each process step to remove particulates, organics, inorganics, and layers without damage using techniques like chemicals, mechanical removal, and rinses.
This document summarizes research comparing two methods for testing the air barrier in biological safety cabinets: the potassium iodide (KI) discus method and the aerosol liquid method. The research found that the aerosol liquid method provided a more effective and practical test that simulated operator movements and tested across the entire sash, while the KI discus method only tested a localized area. Testing of cabinets using both methods showed that maintaining the proper exhaust fan speed was key to preserving the air barrier and that lowering the main fan speed disrupted the barrier. The research concluded that the aerosol liquid method should be endorsed in Australian standards as a more informative qualitative test of a biological safety cabinet's air barrier performance.
This document discusses biosafety and biosafety cabinets. It defines biosafety as safety precautions that reduce risk of exposure to infectious materials. There are 4 biosafety levels depending on the risk of the microbe, with level 4 being the highest risk. Biosafety cabinets provide protection to personnel, environment, and products being handled. There are 3 classes of biosafety cabinets - Class I provides personnel and environmental protection; Class II provides personnel, environmental, and product protection; Class III provides highest level of containment for dangerous pathogens. The document outlines practices for different biosafety levels and cabinet classes.
A Visual Guide to 1 Samuel | A Tale of Two HeartsSteve Thomason
These slides walk through the story of 1 Samuel. Samuel is the last judge of Israel. The people reject God and want a king. Saul is anointed as the first king, but he is not a good king. David, the shepherd boy is anointed and Saul is envious of him. David shows honor while Saul continues to self destruct.
The chapter Lifelines of National Economy in Class 10 Geography focuses on the various modes of transportation and communication that play a vital role in the economic development of a country. These lifelines are crucial for the movement of goods, services, and people, thereby connecting different regions and promoting economic activities.
Temple of Asclepius in Thrace. Excavation resultsKrassimira Luka
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Chapter wise All Notes of First year Basic Civil Engineering.pptxDenish Jangid
Chapter wise All Notes of First year Basic Civil Engineering
Syllabus
Chapter-1
Introduction to objective, scope and outcome the subject
Chapter 2
Introduction: Scope and Specialization of Civil Engineering, Role of civil Engineer in Society, Impact of infrastructural development on economy of country.
Chapter 3
Surveying: Object Principles & Types of Surveying; Site Plans, Plans & Maps; Scales & Unit of different Measurements.
Linear Measurements: Instruments used. Linear Measurement by Tape, Ranging out Survey Lines and overcoming Obstructions; Measurements on sloping ground; Tape corrections, conventional symbols. Angular Measurements: Instruments used; Introduction to Compass Surveying, Bearings and Longitude & Latitude of a Line, Introduction to total station.
Levelling: Instrument used Object of levelling, Methods of levelling in brief, and Contour maps.
Chapter 4
Buildings: Selection of site for Buildings, Layout of Building Plan, Types of buildings, Plinth area, carpet area, floor space index, Introduction to building byelaws, concept of sun light & ventilation. Components of Buildings & their functions, Basic concept of R.C.C., Introduction to types of foundation
Chapter 5
Transportation: Introduction to Transportation Engineering; Traffic and Road Safety: Types and Characteristics of Various Modes of Transportation; Various Road Traffic Signs, Causes of Accidents and Road Safety Measures.
Chapter 6
Environmental Engineering: Environmental Pollution, Environmental Acts and Regulations, Functional Concepts of Ecology, Basics of Species, Biodiversity, Ecosystem, Hydrological Cycle; Chemical Cycles: Carbon, Nitrogen & Phosphorus; Energy Flow in Ecosystems.
Water Pollution: Water Quality standards, Introduction to Treatment & Disposal of Waste Water. Reuse and Saving of Water, Rain Water Harvesting. Solid Waste Management: Classification of Solid Waste, Collection, Transportation and Disposal of Solid. Recycling of Solid Waste: Energy Recovery, Sanitary Landfill, On-Site Sanitation. Air & Noise Pollution: Primary and Secondary air pollutants, Harmful effects of Air Pollution, Control of Air Pollution. . Noise Pollution Harmful Effects of noise pollution, control of noise pollution, Global warming & Climate Change, Ozone depletion, Greenhouse effect
Text Books:
1. Palancharmy, Basic Civil Engineering, McGraw Hill publishers.
2. Satheesh Gopi, Basic Civil Engineering, Pearson Publishers.
3. Ketki Rangwala Dalal, Essentials of Civil Engineering, Charotar Publishing House.
4. BCP, Surveying volume 1
This document provides an overview of wound healing, its functions, stages, mechanisms, factors affecting it, and complications.
A wound is a break in the integrity of the skin or tissues, which may be associated with disruption of the structure and function.
Healing is the body’s response to injury in an attempt to restore normal structure and functions.
Healing can occur in two ways: Regeneration and Repair
There are 4 phases of wound healing: hemostasis, inflammation, proliferation, and remodeling. This document also describes the mechanism of wound healing. Factors that affect healing include infection, uncontrolled diabetes, poor nutrition, age, anemia, the presence of foreign bodies, etc.
Complications of wound healing like infection, hyperpigmentation of scar, contractures, and keloid formation.
Leveraging Generative AI to Drive Nonprofit InnovationTechSoup
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Philippine Edukasyong Pantahanan at Pangkabuhayan (EPP) CurriculumMJDuyan
(𝐓𝐋𝐄 𝟏𝟎𝟎) (𝐋𝐞𝐬𝐬𝐨𝐧 𝟏)-𝐏𝐫𝐞𝐥𝐢𝐦𝐬
𝐃𝐢𝐬𝐜𝐮𝐬𝐬 𝐭𝐡𝐞 𝐄𝐏𝐏 𝐂𝐮𝐫𝐫𝐢𝐜𝐮𝐥𝐮𝐦 𝐢𝐧 𝐭𝐡𝐞 𝐏𝐡𝐢𝐥𝐢𝐩𝐩𝐢𝐧𝐞𝐬:
- Understand the goals and objectives of the Edukasyong Pantahanan at Pangkabuhayan (EPP) curriculum, recognizing its importance in fostering practical life skills and values among students. Students will also be able to identify the key components and subjects covered, such as agriculture, home economics, industrial arts, and information and communication technology.
𝐄𝐱𝐩𝐥𝐚𝐢𝐧 𝐭𝐡𝐞 𝐍𝐚𝐭𝐮𝐫𝐞 𝐚𝐧𝐝 𝐒𝐜𝐨𝐩𝐞 𝐨𝐟 𝐚𝐧 𝐄𝐧𝐭𝐫𝐞𝐩𝐫𝐞𝐧𝐞𝐮𝐫:
-Define entrepreneurship, distinguishing it from general business activities by emphasizing its focus on innovation, risk-taking, and value creation. Students will describe the characteristics and traits of successful entrepreneurs, including their roles and responsibilities, and discuss the broader economic and social impacts of entrepreneurial activities on both local and global scales.
Level 3 NCEA - NZ: A Nation In the Making 1872 - 1900 SML.pptHenry Hollis
The History of NZ 1870-1900.
Making of a Nation.
From the NZ Wars to Liberals,
Richard Seddon, George Grey,
Social Laboratory, New Zealand,
Confiscations, Kotahitanga, Kingitanga, Parliament, Suffrage, Repudiation, Economic Change, Agriculture, Gold Mining, Timber, Flax, Sheep, Dairying,
Level 3 NCEA - NZ: A Nation In the Making 1872 - 1900 SML.ppt
contamination control
1. EBB 323 Semiconductor
Fabrication Technology
Contamination
control
Dr Khairunisak Abdul Razak
Room 2.16
School of Material and Mineral Resources Engineering
Universiti Sains Malaysia
khairunisak@eng.usm.my
2. Topic outcomes
At the end of this topic, students should be able to:
1. Identify 3 major effects of contamination on
semiconductor devices and processing
2. Describe contamination sources in a fabrication area
3. Define the “class number” of a cleanroom
4. Describe the role of positive pressure, air showers, and
adhesive mats in maintaining cleanliness levels
5. List 3 techniques to minimise contamination from
fabrication personnel
6. Describe the differences between normal industrial
chemicals and semiconductor-grade chemicals
7. Name 2 problems associated with high static levels, and 2
methods of static control
8. Describe a typical FEOL and BEOL wafer cleaning
process
9. List typical wafer rinsing techniques
6. 5 major classes of
contaminants
1. Particles
2. Metallic ions
3. Chemicals
4. Bacteria
5. Airborne molecular contaminants
(AMCs)
7. 1. Particles
• Small feature size and thinness of deposited
layer of semiconductor devices make them
vulnerable to all kinds of contaminations
• Particle size must be 10 times smaller than the
minimum feature size e.g. 0.30µm feature size
device is vulnerable to 0.03µm diameter
particles
• Killer defects
– Particles present in a critical part of the device and
destroy its functioning
– Crystal defects and other process induced problems
• If contaminants present in less sensitive area
→ do not harm the device
9. 2. Metallic ions
• Controlled resistivity is required in
semiconductor wafers; in N, P and N-P
junction
• The presence of a small amount
electrically active contaminants in the
wafer could results in
– Change device electrical characteristics
– Change performance
– Reliability parameters
• The contaminants that cause this problem
is called Mobile Ionic Contaminants (MIC)
– Metal atoms that exist in an ironic form in the
wafer
10. •MIC is highly mobile: metallic
ions can move inside the
device even after passing
electrical testing and shipping
→ cause device fails
•MIC must be in < 1010
atoms/cm2
•Sodium is the most common
MIC especially in MOS
devices → look for low-
sodium-grade chemicals
Trace Metal Parts per
Billion (ppb) Impurity
Sodium 50
Potassium 50
Iron 50
Copper 60
Nickel 60
Aluminum 60
Manganese 60
Lead 60
Zinc 60
Chlorides 1000
11. 3. Chemicals
• Unwanted chemical contamination
could occur during process
chemicals and process water
• This may result in:
– Unwanted etching of the surface
– Create compound that cannot be
removed from the device
– Cause non-uniform process
• Chlorine is the major chemical
contaminant
14. 4. Bacteria
• Can be defined as organisms that
grow in water systems or on surfaces
that are not cleaned regularly
• On semiconductor device, bacteria
acts as particulate contamination or
may contribute unwanted metallic
ions to the device surface
15. 5. Airborne molecular
contaminants (AMCs)
• AMCs- fugitive molecules that escape from process tools,
chemical delivery systems, or are carried out into a
fabrication area on materials or personnel
• AMCs: gasses, dopants, and process chemicals used in
fabrication area e.g. oxygen, moisture, organics, acids,
bases etc..
• Problems:
– Harmful to process that requires delicate chemical
reactions such as the exposure of photoresist in the
patterning operations
– Shift etch rates
– Unwanted dopants that shift device electrical parameters
– Change the wetting characteristics of etchants leading to
incomplete etching
17. The effects of contamination
on semiconductor devices
1. Device processing yield
- contaminants may change the dimensions device parts
- change cleanliness of the surfaces
- pitted layers
⇒ reduce overall yield through various quality checks
2. Device performance
- This may due to the presence of small pieces of
contamination that is not detectable during quality checks
- may also come from unwanted chemicals or AMCs in the
process steps ⇒ alter device dimensions or material
quality
- high amount of mobile ionic contaminants in the wafer
can change the electrical performance of the device
18. 3. Device reliability
- Failure of device due to the presence of a small amount
of metallic contaminants that get into the wafer during
processing and not detected during device testing. These
contaminants can travel inside the device and end up in
electrically sensitive areas and cause device failure
19. Contamination sources
1. Air
2. The production facility
3. Cleanroom personnel
4. Process water
5. Process chemicals
6. Process gasses
7. Static charge
20. 1. Air
• Normal air contains contaminants → must be
treated before entering a cleanroom
• Major contaminant is airborne particles;
particulates or aerosols
– They float and remain in air for long period of
time
• Air cleanliness levels of cleanroom is determined
by the
– Particulate diameters
– Density in air
• Federal standard 209E: class number of the air in
the area
– Number of particles 0.5µm or larger in a cubic foot of air
• In normal city with smoke, smog and fumes can contains up
to 5 million particles per cubic foot: class number 5 million
21. • Federal 209E:
– Specify cleanliness level down to class 1
levels
Relative size of airborne particulates (in microns)
22. Environment Class number Maximum particle size
(µm)
Projected-256 merit 0.01 << 0.1
Mini environment 0.1 < 0.1
ULSI fab 1 0.1
VLSI fab 10 0.3
VLF station 100 0.5
Assembly area 1000-10 000 0.5
House room 100 000
Outdoors > 500 000
Typical class numbers for various environments
24. • Clean air strategies
1. Clean workstation
2. Tunnel design
3. Total cleanroom
4. Mini-environments
25. 2. Production facility
Clean room strategy
• Fabrication area consists of a large room with
workstations (called hoods) arranged in rows so
that the wafers could move sequentially through
the process without being exposed to dirty air
• Use high-efficiency particulate attenuation (HEPA)
filters or ultra-low-particle (ULPA) filters
– Allow passage of large volumes of air at low velocity
– Low velocity contributes to the cleanliness of the hood
by not causing air currents, and also for operators
comfort
– HEPA and ULPA filters efficiency: 99.9999+ % at
0.12micron particle size
– Typical flow 90-100 ft/min
26. • HEPA and ULPA filters mounted on a clean
hood
– Vertical laminar flow (VLF) → air leave the
system in a laminar pattern, and at the work
surface, it turns and exits the hood
– Horizontal laminar flow (HLF) → HEPA filter is
placed in the back of the work surface
– Both VLF and HLF stations keep the wafer
cleans:
• Filtered air inside the hood
• Cleaning action inside is the slight positive pressure
built up in the station → prevent airborne dirt from
operators and from aisle area from entering the hood
28. Cleanroom construction
• Primary design is to produce a sealed room that is
supplied with clean air, build with materials that
are non contaminating, and includes the system
to prevent accidental contamination from the
outside or from operators
• All materials must be non-shedding including
wall covering, process station materials and
floors coverings
• All piping holes are sealed and all light fixtures
must have solid covers
• Design should minimise flat surfaces that can
collect dust
• Stainless steel is favourable for process stations
and work surfaces
30. Cleanroom elements:
1. Adhesive floor mats
– At every entrance to pull off and holds dirt
adhered at the bottom of the shoes
2. Gowning area
– Buffer between cleanroom and the plant
– Always supply with filtered air from ceiling HEPA
filters
– Store cleanroom apparel and change to
cleanroom garments
3. Air pressure
– Highest pressure in cleanroom, second highest
in gowning area and the lowest in factory
hallways
– Higher pressure in cleanroom causes a low flow
of air out of the doors and blow airborne particle
back into the dirtier hall way
31. 4. Air showers
- Air shower is located between the governing
room and the cleanroom
- High velocity air jets blow off particles from the
outside of the garments
- Air shower possesses interlocking system to
prevent both doors from being opened at the
same time
4. Service bay
- Semi-clean area for storage materials and
supplies
- Service bay has Class 1000 or class 10 000
- Bay area contains process chemical pipes,
electrical power lines and cleanroom materials
- Critical process machines are backed up to the
wall dividing the cleanroom and the bay →
allows technician to service the equipment from
the back without entering the cleanroom
32. 6. Double-door-pass-through
- Simple double-door boxes or may have a supply
of positive-pressure filtered air with interlocking
devices to prevent both doors from being
opened at the same time
- Often fitted with HEPA filters
6. Static control
33. 7. Static charge
• Static charge → attracts smaller particles to the
wafer
• The static charge may build up on wafers, storage
boxes, work surfaces and equipment
– May generate up to 50 000V static charge → attract
aerosols out of the air and personal garment →
contaminate the wafers
• Particles held by static charge is hard to remove
using a standard brush or wet cleaning system
• Most static charge is produced by triboelectric
charging
– 2 materials initially in contact are separated
– 1 surface possesses positive charge because it losses
electron
– 1 surface becomes negative because it gains electron
36. • Electrostatic Discharge (ESD):
– rapid transfer of electrostatic charge between two
objects, usually resulting when two objects at different
potentials come into direct contact with each other.
– ESD can also occur when a high electrostatic field
develops between two objects in close proximity.
• Control static
– Prevent charge build up
• Use antistatic materials in garments and in-process storage
boxes
• Apply antistatic solution on certain walls to prevent charge
build up- not use in critical station due to possible
contamination
– Use discharge technique
• Use ionisers and grounded static-discharge
37. Eliminating static charge:
•Air ioniser – neutralise nonconductive materials
•Grounding of conducting surfaces
•Increasing conductivity of materials
•Humidity control
•Surface treatment with topical antistat solutions
38. 6. Shoe cleaners
- Removal of dirt from the sides of shoes and
shoes cover
- Rotating brushes to remove the dirt
- Typical machines feature an internal vacuum to
capture the loosened dirt, and bags to hold the
dirt for removal from the area
6. Glove cleaners
- Discard gloves when they are contaminated or
dirty or after every shift
- Some fabrication areas use glove cleaners that
clean and dry the gloves in an enclosure
42. 3. Cleanroom personnel
• Even after shower and sitting: 100 000-1
000 000 particles/minute
– Increase dramatically when moving e.g.
generate 5 million particles/min with movement
of 2 miles/hr
• Example of human contaminants:
– Flakes of dead hair
– Normal skin flaking
– Hair sprays
– Cosmetics
– Facial hair
– Exposed clothing
43. 4. Process water
• During fabrication process
– Repeated chemical etch and clean
– Water rinse is essential after etching/ cleaning
step → several hours in the whole system
• Unacceptable contaminants in normal city water
– Dissolves minerals
– Particles
– Bacteria
– Organics
– Dissolved O2
– Silica
44. • Dissolve minerals
– Comes from salt in normal water Na+
Cl-
– Can be removed by reverse osmosis (RO) and ion
exchange systems
• Remove electrically active ions → change water
from conductive medium to resistive medium
• It is a must to monitor resistivity of all process
water in the fabrication area
– Need to obtain between 15-18 MΩ
• Remove contaminants
– Solid particles: sand filtration, earth filtration, membrane
– Bacteria: sterilise using UV radiation and filter out the
particles
– Organics (plant & fecal materials): carbon bed filtration
– Dissolved O2 & CO2: force draft decarbonators and
vacuum degasifiers
45. •Cleaning cost is a major operating cost
–Certain acceptable water quality: recycle in
a water system for clean up
–Too dirty water: treated and discharge from
plant
Resistivity Ohms-cm 25° Dissolved
solids (ppm)
18,000,000 0.0277
15,000,000 0.0333
10,000,000 0.0500
1,000,000 0.500
100,000 5.00
10,000 50.00
Resistivity of water vs concentration of
dissolved solids (ppm)
47. 5. Process chemicals
• Highest purity of acids, bases and solvents are used for
etching and cleaning wafers and equipment
• Chemical grades:
– Commercial
– Reagent
– Electronic
– Semiconductor
• Main concerns: metallic mobile ionic contaminants (MIC) →
must be < 1 ppm
• To date, can obtain chemicals with 1ppb MIC
• Check assay no e.g. assay 99.9% purity
• Other steps:
– Clean inside containers
– Use containers that do not dissolve
– Use particulate free labels
– Place clean bottles in bags before shipping
48. 6. Process gasses
• Semiconductor fabrication uses many gases:
– Air separation gases: O2, N2, H2
– Specialty gases: arsine and carbon
tetrafluoride
• Determination of gas quality
– Percentage of purity
– Water vapour content
– Particulates
– Metallic ions
• Semicnductor fabrication requires extremely high
purity process gasses for oxidation, sputtering,
plasma etch, chemical vapour deposition (CVD),
reactive ion gas, ion implantation and diffusion
49. • If gas is contaminated, wafer
properties could be altered due to
chemical reaction
• Gas quality is also shown in assay
no; 99.99-99.999999. The highest
quality is called “six 9s pure”
50. Requirements for Si wafer
cleaning process
1. Effective removal of all types of surface
contaminants
2. Not etching or damaging Si and SiO2
3. Use of contamination-free and volatilisation
chemicals
4. Relatively safe, simple, and economical for
production applications
5. Ecologically acceptable, free of toxic waste
products
6. Implementable by a variety of techniques
51. Wafer surface cleaning
4 general types of contaminants:
1. Particulates
2. Organic residues
3. Inorganic residues
4. Unwanted oxide layers
• Wafer cleaning process must
– Remove all surface contaminants
– Not etch or damage the wafer surface
– Be safe and economical in a production
setting
– Be ecological acceptable
• 2 primary wafer conditions:
1. Front end of the line (FEOL)
2. Back end of the line (BEOL)
52. FEOL
• Wafer fabrication steps used to form the
active electrical components on the wafer
surface
– Wafer surface especially gate areas of MOS
transistors, are exposed and vulnerable
• Surface roughness: excessive roughness
results in degradation of device
performance and compromise the
uniformity
• Electrical conditions of bare surface
– Metal contaminants
• Na, Ni, Cu, Zn, Fe etc: cleaning process need to
reduce the concentration to < 2.5 x 109
atoms /cm2
• Al and Ca contaminants: need to reduce to 5 x 109
atoms/cm2
level
53. Typical FEOL cleaning process
steps
1. Particle removal (mechanical
2. General chemical clean (such as
sulphuric acid/H2/O2
3. Oxide removal (typically dilute HF)
4. Organic and metal removal
5. Alkali metal and metal hydroxide
removal
6. Rinse steps
7. Wafer drying
54. BEOL
• Main concerns: particles, metals,
anions, polysilicon gate integrity,
contact resistance, via holes
cleanliness, organics, numbers of
shorts and opens in the metal system
55. Particulate removal
• Spray: blow off the water surface
using spray of filtered high pressure
nitrogen from a hand-held gun
located in the cleaning station
– In fabrication area/small particles:
nitrogen guns are fitted with ioniser that
strip static charges from the nitrogen
stream and neutralise the wafer surface
• Wafer scrubbers-combination of
brush and wafer surface.
• High pressure water cleaning
56. Organic residues
• Organic residues- compounds that
contain carbon such as oils in
fingerprints
• Can be removed in solvent baths
such as acetone, alcohol or TCE
• Solvent cleaning is avoided:
– difficulty of drying the solvent
completely
– Solvents always contain some
impurities that may cause contamination
58. Chemical cleaning
solutions
• For both organic and inorganic
contaminants
• General chemical cleaning
1. Sulphuric acid
• Hot sulphuric acid with added oxidant
• Also a general photoresist stripper
• H2SO4 is an effective cleaner in 90-125°C → remove
most inorganic residues and particulates from the
surface
• Oxidants are added to remove carbon residues
• Chemical reaction converts C to CO2
• Typical oxidants: hydrogen peroxide (H2O2),
ammonium persulfate [(NH4)2S2O8]
• Nitric acid (HNO3), and ozone (O2)
59. RCA clean
• RCA clean- H2O2 is used with some base
or acid
• Standard clean 1 (SC-1)
– Solution of water, hydrogen peroxide,
ammonium hydroxide = 5:1:1, 7:2:1, heated to
75-85°C
– SC-1 removes organic residues and set up a
condition for desorption of trace metals from
the surface
– Oxide films keep forming and dissolving
• SC-2
– Solution of water, hydrogen peroxide and
hydrochloric acid = 6:1:1 to 8:2:1, 75-85°C
– Remove alkali ions and hydroxides and
complex residual metals
– Leave a protective oxide layer
60. • Order of SC-1 and SC-2 can be
reversed
• If oxide-free surface is required, HF
step is used before, in between, or
after the RCA cleans