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Similar to CMOS fabrication n well process
CMOS fabrication n well process
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- 6. Removal of solublephotoresist p-substrate Oxidation Photoresist
- 7. Removal of exposedSiO2 p-substrate Oxidation Photo-resist
- 8. Removal of remainingphotoresist p-substrate Oxidation
- 9. N-well formation usingdiffusion p-substrate Oxidation n-well
- 10. Removal of remainingSiO2 p-substrate n-well
- 11. Gate oxide andPolysilicon Layer p-substrate n-well Thin gate oxide Polysilicon layer
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- 13. Removal of solublepolysilicon p-substrate n-well
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- 16. Removal of exposedgate oxide p-substrate n-well
- 17. Ion implantation ofn+ dopants p-substrate n-well n+ n+ n+
- 18. Ion implantation ofp+ dopants p-substrate n-well n+ n+ n+p+ p+ p+ (similar way)
- 19. Metallization p-substrate n-well n+ n+ n+p+p+ p+ (uses Aluminum)
- 20. Removal of excessmetal p-substrate n-well n+ n+ n+p+ p+ p+
- 21. Terminals: pMOS andnMOS p-substrate n-well n+ n+ n+p+ p+ p+ B S G D D G S B