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Slide 1
EE40 Fall 2007 Prof. Chang-Hasnain
EE40
Lecture 32
Prof. Chang-Hasnain
11/21/07
Reading: Supplementary Reader
Slide 2
EE40 Fall 2007 Prof. Chang-Hasnain
Electron and Hole Densities in Doped Si
( )
2
v f
E E kT
a v
i a
p N N e
p n N

 

• Instrinsic (undoped) Si
• N-doped Si
– Assume each dopant contribute to one electron
• p-doped Si
– Assume each dopant contribute to one hole
( )
2
f c
E E kT
d c
i d
n N N e
p n N

 

2
i
i
n p n
np n
 

Slide 3
EE40 Fall 2007 Prof. Chang-Hasnain
Summary of n- and p-type silicon
Pure silicon is an insulator. At high temperatures it conducts
weakly.
If we add an impurity with extra electrons (e.g. arsenic,
phosphorus) these extra electrons are set free and we have a
pretty good conductor (n-type silicon).
If we add an impurity with a deficit of electrons (e.g. boron) then
bonding electrons are missing (holes), and the resulting holes
can move around … again a pretty good conductor (p-type
silicon)
Now what is really interesting is when we join n-type and p-type
silicon, that is make a pn junction. It has interesting electrical
properties.
Slide 4
EE40 Fall 2007 Prof. Chang-Hasnain
Junctions of n- and p-type Regions
A silicon chip may have 108 to 109 p-n junctions today.
p-n junctions form the essential basis of all semiconductor devices.
How do they behave*? What happens to the electrons and holes?
What is the electrical circuit model for such junctions?
n and p regions are brought into contact :
n p
aluminum
aluminum
wire
?
*Note that the textbook has a very good explanation.
Slide 5
EE40 Fall 2007 Prof. Chang-Hasnain
The pn Junction Diode
Schematic diagram
p-type n-type
ID
+ VD –
Circuit symbol
Physical structure:
(an example)
p-type Si
n-type Si
SiO2
SiO2
metal
metal
ID
+
VD
–
net donor
concentration ND
net acceptor
concentration NA
For simplicity, assume that
the doping profile changes
abruptly at the junction.
cross-sectional area AD
Slide 6
EE40 Fall 2007 Prof. Chang-Hasnain
• When the junction is first formed, mobile carriers diffuse
across the junction (due to the concentration gradients)
– Holes diffuse from the p side to the n side,
leaving behind negatively charged immobile acceptor
ions
– Electrons diffuse from the n side to the p side,
leaving behind positively charged immobile donor ions
A region depleted of mobile carriers is formed at the junction.
• The space charge due to immobile ions in the depletion region
establishes an electric field that opposes carrier diffusion.
Depletion Region Approximation
+
+
+
+
+
–
–
–
–
–
p n
acceptor ions donor ions
Slide 7
EE40 Fall 2007 Prof. Chang-Hasnain
Summary: pn-Junction Diode I-V
• Under forward bias, the potential barrier is reduced, so
that carriers flow (by diffusion) across the junction
– Current increases exponentially with increasing forward bias
– The carriers become minority carriers once they cross the
junction; as they diffuse in the quasi-neutral regions, they
recombine with majority carriers (supplied by the metal contacts)
“injection” of minority carriers
• Under reverse bias, the potential barrier is increased, so
that negligible carriers flow across the junction
– If a minority carrier enters the depletion region (by thermal
generation or diffusion from the quasi-neutral regions), it will be
swept across the junction by the built-in electric field
“collection” of minority carriers  reverse current ID (A)
VD (V)
Slide 8
EE40 Fall 2007 Prof. Chang-Hasnain
quasi-neutral p region
Charge Density Distribution
+
+
+
+
+
–
–
–
–
–
p n
acceptor ions donor ions
depletion region quasi-neutral n region
charge density (C/cm3)
distance
Charge is stored in the depletion region.
Slide 9
EE40 Fall 2007 Prof. Chang-Hasnain
Two Governing Laws
2
2
( ) ( ) ( )
d x dE x x
dx dx
 

   
0
0
1
( ) ( ) ( )
x
x
E x E x x dx


  
dE
dx



1 encl
S V
Q
E dA dV

 
   
 
Gauss’s Law describes the relationship of charge (density) and
electric field.
Poisson’s Equation describes the relationship between electric
field distribution and electric potential
0
0
( ) ( ) ( )
x
x
x x E x dx
 
  

Slide 10
EE40 Fall 2007 Prof. Chang-Hasnain
Depletion Approximation 1
0 ( ) ( ) ( 0)
a
po po
s
qN
E x x x x x


    
 
 
 
   
0
0
0
0
0
0 ,
0
and
0
0
n
p
n
d
p
a
x
x
x
x
x
x
x
qN
x
x
qN
x 












 

xno
x
x
-xpo
ρo(x)
-qNa
qNd
xno x
x
-xpo
E0(x)
s
no
d
s
po
a x
qN
x
qN
E






)
0
(
0
0
0 0
0
( )
( ) ( ) ( ) 0
( ) ( )
(0 )
no
x
d
no no
x
s s
d
no
s
no
x qN
E x dx E x x x
qN
E x x x
x x

 


    
 
 

Gauss’s Law
p n
p n
Slide 11
EE40 Fall 2007 Prof. Chang-Hasnain
Depletion Approximation 2
p n
P=1018
n=104
n=1017
p=105
x
E0(x)
s
no
d
s
po
a x
qN
x
qN
E






)
0
(
0
xno
-xpo
2
2
2
2 po
s
a
no
s
d
x
qN
x
qN



0(x)
x
xno
-xpo
Poisson’s Equation
Slide 12
EE40 Fall 2007 Prof. Chang-Hasnain
EE40
Lecture 33
Prof. Chang-Hasnain
11/26/07
Reading: Supplementary Reader
Slide 13
EE40 Fall 2007 Prof. Chang-Hasnain
Depletion Approximation 3
0 0 0
( ) ( ) ( ) ( ) 0
po po
po po
x x
a
po po
x x
s
x x
a
po
x x
s
qN
x E x dx x x x dx
qN
xdx x dx
 


 
 
      
 
 
 
 
 
 
2
0 ( ) ( ) ( 0)
2
a
po po
s
qN
x x x x x


    
 
2
0 0 0
0 0
2
0 0
( ) ( ) (0) ( ) (0 )
2
2
x x
d a
no po
s s
x x
d a
no po
s s
qN qN
x E x dx x x dx x
qN qN
x dx x dx x
 
 
 
       
   
 
 
2 2
0 ( ) (2 ) (0 )
2 2
d a
no po no
s s
qN qN
x x x x x x x

 
    
Slide 14
EE40 Fall 2007 Prof. Chang-Hasnain
Effect of Applied Voltage
• The quasi-neutral p and n regions have low resistivity,
whereas the depletion region has high resistivity. Thus,
when an external voltage VD is applied across the
diode, almost all of this voltage is dropped across
the depletion region. (Think of a voltage divider
circuit.)
• If VD > 0 (forward bias), the potential barrier to carrier
diffusion is reduced by the applied voltage.
• If VD < 0 (reverse bias), the potential barrier to carrier
diffusion is increased by the applied voltage.
p n
+
+
+
+
+
–
–
–
–
–
VD
Slide 15
EE40 Fall 2007 Prof. Chang-Hasnain
Depletion Approx. – with VD<0 reverse bias
p n
P=1018
n=1017
x
E0(x)
s
no
d
s
po
a x
qN
x
qN
E






)
0
(
0
xno
-xpo
2
2
2
2 po
s
a
no
s
d
x
qN
x
qN



0(x)
x
xno
-xpo
bi
Built-in potential bi=
-xp xn
-xp xn
bi-qVD
Higher barrier and few holes in n-
type lead to little current! p=105
n=104
Slide 16
EE40 Fall 2007 Prof. Chang-Hasnain
Depletion Approx. – with VD>0 forward bias
Poisson’s Equation
p n
n=104
n=1017
p=105
x
E0(x)
s
no
d
s
po
a x
qN
x
qN
E






)
0
(
0
xno
-xpo
2
2
2
2 po
s
a
no
s
d
x
qN
x
qN



0(x)
x
xno
-xpo
bi
Built-in potential bi=
-xp xn
bi-qVD
Lower barrier and large hole (electron) density
at the right places lead to large current!
-xp xn
P=1018
Slide 17
EE40 Fall 2007 Prof. Chang-Hasnain
Forward Bias
• As VD increases, the potential barrier to carrier
diffusion across the junction decreases*, and
current increases exponentially.
ID (Amperes)
VD (Volts)
* Hence, the width of the depletion region decreases.
p n
+
+
+
+
+
–
–
–
–
–
VD > 0
The carriers that diffuse across the
junction become minority carriers in
the quasi-neutral regions; they then
recombine with majority carriers,
“dying out” with distance.
D
( 1)
qV kT
D S
I I e
 
Slide 18
EE40 Fall 2007 Prof. Chang-Hasnain
Reverse Bias
• As |VD| increases, the potential barrier to carrier
diffusion across the junction increases*; thus, no
carriers diffuse across the junction.
ID (Amperes)
VD (Volts)
* Hence, the width of the depletion region increases.
p n
+
+
+
+
+
–
–
–
–
–
VD < 0
A very small amount of reverse
current (ID < 0) does flow, due to
minority carriers diffusing from the
quasi-neutral regions into the depletion
region and drifting across the junction.
Slide 19
EE40 Fall 2007 Prof. Chang-Hasnain
• Light incident on a pn junction generates electron-hole pairs
• Carriers are generated in the depletion region as well as n-
doped and p-doped quasi-neutral regions.
• The carriers that are generated in the quasi-neutral regions
diffuse into the depletion region, together with the carriers
generated in the depletion region, are swept across the
junction by the electric field
• This results in an additional component of current flowing in
the diode:
where Ioptical is proportional to the intensity of the light
optical
kT
V
q
S
D I
e
I
I 

 )
1
( D
Optoelectronic Diodes
Slide 20
EE40 Fall 2007 Prof. Chang-Hasnain
Example: Photodiode
• An intrinsic region is placed
between the p-type and n-type
regions
 Wj  Wi-region, so that most of the
electron-hole pairs are generated
in the depletion region
 faster response time
(~10 GHz operation)
ID (A)
VD (V)
with incident light
in the dark
operating point
Slide 21
EE40 Fall 2007 Prof. Chang-Hasnain
Planck Constant
• Planck’s constant h = 6.625·10-34 J·s
• E=hnhc/l1.24 eV-mm/lmm)
• C is speed of light and hn is photon energy
• The first type of quantum effect is the quantization of
certain physical quantities.
• Quantization first arose in the mathematical formulae of
Max Planck in 1900. Max Planck was analyzing how the
radiation emitted from a body was related to its
temperature, in other words, he was analyzing the
energy of a wave.
• The energy of a wave could not be infinite, so Planck
used the property of the wave we designate as the
frequency to define energy. Max Planck discovered a
constant that when multiplied by the frequency of any
wave gives the energy of the wave. This constant is
referred to by the letter h in mathematical formulae. It is
a cornerstone of physics.
Slide 22
EE40 Fall 2007 Prof. Chang-Hasnain
Bandgap Versus Lattice Constant
Si

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  • 1. Slide 1 EE40 Fall 2007 Prof. Chang-Hasnain EE40 Lecture 32 Prof. Chang-Hasnain 11/21/07 Reading: Supplementary Reader
  • 2. Slide 2 EE40 Fall 2007 Prof. Chang-Hasnain Electron and Hole Densities in Doped Si ( ) 2 v f E E kT a v i a p N N e p n N     • Instrinsic (undoped) Si • N-doped Si – Assume each dopant contribute to one electron • p-doped Si – Assume each dopant contribute to one hole ( ) 2 f c E E kT d c i d n N N e p n N     2 i i n p n np n   
  • 3. Slide 3 EE40 Fall 2007 Prof. Chang-Hasnain Summary of n- and p-type silicon Pure silicon is an insulator. At high temperatures it conducts weakly. If we add an impurity with extra electrons (e.g. arsenic, phosphorus) these extra electrons are set free and we have a pretty good conductor (n-type silicon). If we add an impurity with a deficit of electrons (e.g. boron) then bonding electrons are missing (holes), and the resulting holes can move around … again a pretty good conductor (p-type silicon) Now what is really interesting is when we join n-type and p-type silicon, that is make a pn junction. It has interesting electrical properties.
  • 4. Slide 4 EE40 Fall 2007 Prof. Chang-Hasnain Junctions of n- and p-type Regions A silicon chip may have 108 to 109 p-n junctions today. p-n junctions form the essential basis of all semiconductor devices. How do they behave*? What happens to the electrons and holes? What is the electrical circuit model for such junctions? n and p regions are brought into contact : n p aluminum aluminum wire ? *Note that the textbook has a very good explanation.
  • 5. Slide 5 EE40 Fall 2007 Prof. Chang-Hasnain The pn Junction Diode Schematic diagram p-type n-type ID + VD – Circuit symbol Physical structure: (an example) p-type Si n-type Si SiO2 SiO2 metal metal ID + VD – net donor concentration ND net acceptor concentration NA For simplicity, assume that the doping profile changes abruptly at the junction. cross-sectional area AD
  • 6. Slide 6 EE40 Fall 2007 Prof. Chang-Hasnain • When the junction is first formed, mobile carriers diffuse across the junction (due to the concentration gradients) – Holes diffuse from the p side to the n side, leaving behind negatively charged immobile acceptor ions – Electrons diffuse from the n side to the p side, leaving behind positively charged immobile donor ions A region depleted of mobile carriers is formed at the junction. • The space charge due to immobile ions in the depletion region establishes an electric field that opposes carrier diffusion. Depletion Region Approximation + + + + + – – – – – p n acceptor ions donor ions
  • 7. Slide 7 EE40 Fall 2007 Prof. Chang-Hasnain Summary: pn-Junction Diode I-V • Under forward bias, the potential barrier is reduced, so that carriers flow (by diffusion) across the junction – Current increases exponentially with increasing forward bias – The carriers become minority carriers once they cross the junction; as they diffuse in the quasi-neutral regions, they recombine with majority carriers (supplied by the metal contacts) “injection” of minority carriers • Under reverse bias, the potential barrier is increased, so that negligible carriers flow across the junction – If a minority carrier enters the depletion region (by thermal generation or diffusion from the quasi-neutral regions), it will be swept across the junction by the built-in electric field “collection” of minority carriers  reverse current ID (A) VD (V)
  • 8. Slide 8 EE40 Fall 2007 Prof. Chang-Hasnain quasi-neutral p region Charge Density Distribution + + + + + – – – – – p n acceptor ions donor ions depletion region quasi-neutral n region charge density (C/cm3) distance Charge is stored in the depletion region.
  • 9. Slide 9 EE40 Fall 2007 Prof. Chang-Hasnain Two Governing Laws 2 2 ( ) ( ) ( ) d x dE x x dx dx        0 0 1 ( ) ( ) ( ) x x E x E x x dx      dE dx    1 encl S V Q E dA dV          Gauss’s Law describes the relationship of charge (density) and electric field. Poisson’s Equation describes the relationship between electric field distribution and electric potential 0 0 ( ) ( ) ( ) x x x x E x dx      
  • 10. Slide 10 EE40 Fall 2007 Prof. Chang-Hasnain Depletion Approximation 1 0 ( ) ( ) ( 0) a po po s qN E x x x x x                  0 0 0 0 0 0 , 0 and 0 0 n p n d p a x x x x x x x qN x x qN x                 xno x x -xpo ρo(x) -qNa qNd xno x x -xpo E0(x) s no d s po a x qN x qN E       ) 0 ( 0 0 0 0 0 ( ) ( ) ( ) ( ) 0 ( ) ( ) (0 ) no x d no no x s s d no s no x qN E x dx E x x x qN E x x x x x                Gauss’s Law p n p n
  • 11. Slide 11 EE40 Fall 2007 Prof. Chang-Hasnain Depletion Approximation 2 p n P=1018 n=104 n=1017 p=105 x E0(x) s no d s po a x qN x qN E       ) 0 ( 0 xno -xpo 2 2 2 2 po s a no s d x qN x qN    0(x) x xno -xpo Poisson’s Equation
  • 12. Slide 12 EE40 Fall 2007 Prof. Chang-Hasnain EE40 Lecture 33 Prof. Chang-Hasnain 11/26/07 Reading: Supplementary Reader
  • 13. Slide 13 EE40 Fall 2007 Prof. Chang-Hasnain Depletion Approximation 3 0 0 0 ( ) ( ) ( ) ( ) 0 po po po po x x a po po x x s x x a po x x s qN x E x dx x x x dx qN xdx x dx                            2 0 ( ) ( ) ( 0) 2 a po po s qN x x x x x          2 0 0 0 0 0 2 0 0 ( ) ( ) (0) ( ) (0 ) 2 2 x x d a no po s s x x d a no po s s qN qN x E x dx x x dx x qN qN x dx x dx x                       2 2 0 ( ) (2 ) (0 ) 2 2 d a no po no s s qN qN x x x x x x x        
  • 14. Slide 14 EE40 Fall 2007 Prof. Chang-Hasnain Effect of Applied Voltage • The quasi-neutral p and n regions have low resistivity, whereas the depletion region has high resistivity. Thus, when an external voltage VD is applied across the diode, almost all of this voltage is dropped across the depletion region. (Think of a voltage divider circuit.) • If VD > 0 (forward bias), the potential barrier to carrier diffusion is reduced by the applied voltage. • If VD < 0 (reverse bias), the potential barrier to carrier diffusion is increased by the applied voltage. p n + + + + + – – – – – VD
  • 15. Slide 15 EE40 Fall 2007 Prof. Chang-Hasnain Depletion Approx. – with VD<0 reverse bias p n P=1018 n=1017 x E0(x) s no d s po a x qN x qN E       ) 0 ( 0 xno -xpo 2 2 2 2 po s a no s d x qN x qN    0(x) x xno -xpo bi Built-in potential bi= -xp xn -xp xn bi-qVD Higher barrier and few holes in n- type lead to little current! p=105 n=104
  • 16. Slide 16 EE40 Fall 2007 Prof. Chang-Hasnain Depletion Approx. – with VD>0 forward bias Poisson’s Equation p n n=104 n=1017 p=105 x E0(x) s no d s po a x qN x qN E       ) 0 ( 0 xno -xpo 2 2 2 2 po s a no s d x qN x qN    0(x) x xno -xpo bi Built-in potential bi= -xp xn bi-qVD Lower barrier and large hole (electron) density at the right places lead to large current! -xp xn P=1018
  • 17. Slide 17 EE40 Fall 2007 Prof. Chang-Hasnain Forward Bias • As VD increases, the potential barrier to carrier diffusion across the junction decreases*, and current increases exponentially. ID (Amperes) VD (Volts) * Hence, the width of the depletion region decreases. p n + + + + + – – – – – VD > 0 The carriers that diffuse across the junction become minority carriers in the quasi-neutral regions; they then recombine with majority carriers, “dying out” with distance. D ( 1) qV kT D S I I e  
  • 18. Slide 18 EE40 Fall 2007 Prof. Chang-Hasnain Reverse Bias • As |VD| increases, the potential barrier to carrier diffusion across the junction increases*; thus, no carriers diffuse across the junction. ID (Amperes) VD (Volts) * Hence, the width of the depletion region increases. p n + + + + + – – – – – VD < 0 A very small amount of reverse current (ID < 0) does flow, due to minority carriers diffusing from the quasi-neutral regions into the depletion region and drifting across the junction.
  • 19. Slide 19 EE40 Fall 2007 Prof. Chang-Hasnain • Light incident on a pn junction generates electron-hole pairs • Carriers are generated in the depletion region as well as n- doped and p-doped quasi-neutral regions. • The carriers that are generated in the quasi-neutral regions diffuse into the depletion region, together with the carriers generated in the depletion region, are swept across the junction by the electric field • This results in an additional component of current flowing in the diode: where Ioptical is proportional to the intensity of the light optical kT V q S D I e I I    ) 1 ( D Optoelectronic Diodes
  • 20. Slide 20 EE40 Fall 2007 Prof. Chang-Hasnain Example: Photodiode • An intrinsic region is placed between the p-type and n-type regions  Wj  Wi-region, so that most of the electron-hole pairs are generated in the depletion region  faster response time (~10 GHz operation) ID (A) VD (V) with incident light in the dark operating point
  • 21. Slide 21 EE40 Fall 2007 Prof. Chang-Hasnain Planck Constant • Planck’s constant h = 6.625·10-34 J·s • E=hnhc/l1.24 eV-mm/lmm) • C is speed of light and hn is photon energy • The first type of quantum effect is the quantization of certain physical quantities. • Quantization first arose in the mathematical formulae of Max Planck in 1900. Max Planck was analyzing how the radiation emitted from a body was related to its temperature, in other words, he was analyzing the energy of a wave. • The energy of a wave could not be infinite, so Planck used the property of the wave we designate as the frequency to define energy. Max Planck discovered a constant that when multiplied by the frequency of any wave gives the energy of the wave. This constant is referred to by the letter h in mathematical formulae. It is a cornerstone of physics.
  • 22. Slide 22 EE40 Fall 2007 Prof. Chang-Hasnain Bandgap Versus Lattice Constant Si