1) Micromachining involves fabrication of micro-components sized 1-500 micrometers. Common processes include etching, LIGA, EDM, and various types of lithography.
2) Etching can be isotropic or anisotropic, wet or dry. Bulk micromachining uses anisotropic etching of silicon while surface micromachining layers materials like polysilicon.
3) LIGA uses X-ray lithography combined with electroforming or molding to create high aspect ratio microstructures. EDM can machine any conductive material including complex 3D shapes.
CFD Simulation of By-pass Flow in a HRSG module by R&R Consult.pptx
Cam seminar
1. VISVESVARAYA NATIONAL INSTITUTE OF TECHNOLOGY
NAGPUR
DEPARTMENT OF MECHANICAL ENGINEERING
SEMINAR ON
“ ”
GUIDED BY:
PROF. Y. M. PURI
CAD/CAD ENGG.
PREPARED BY:
BHUPESH D. SARODE
CAD/CAM ENGG.
FIRST SEM
2012-13
2. Scope Of Presentation
What is Micromachining
Types of Machines in Micromachining
Various Micro Machines
Etching Process,
Bulk Micromachining,
Surface Micromachining,
LIGA Process
EDM
Application
6. ETCHING PROCESS
Etching process consists of three steps:
Mass transport of reactants (through a boundary layer)
to the surface to be etched
Reaction between reactants and the film(s) to be
etched at the surface
Mass transport of reaction products from the surface
through the boundary layer
7. ETCHING PROCESS
• Isotropic vs. Anisotropic
• Isotropic– etch rate is same in all directions
• Anisotropic– etch rate is orientation dependent
• Dry vs. Wet
• Dry– uses gas-phase process
• Wet– uses liquid-phase process
8. WET ETCHING PROCESS
DESCRIPTION
The wet etching process involves :
Performed in an immersion tank
Wafers in wafer carrier are lowered into etchant solution
Wafers remain in solution for specified amount of time
.referred to as etch duration
Wafer carrier is removed from solution
Wafers are rinsed in deionized water
Wafers are dried
9. BULK MICROMACHINING
• Process for producing 3D MEMS
structures –older process
• Uses anisotropic etching of single crystal
silicon
Example: silicon cantilever beam for
atomic force microscope
11. • Newer process for producing MEMS structures
• Uses etching techniques to pattern micro-
scale structures from polycrystalline (poly)
silicon, or metal alloys
• Examples: accelerometers, pressure sensors,
micro gears and transmissions,micro mirrors
etc.
SURFACE MICROMACHINING
12. SURFACE MICROMACHINING
(a) DEPOSITION OF
POLYSILICON;
(b)ETCHING OF
POLYSILICON;
(c) SELECTIVE WET
ETCHING OF PSG,
LEAVING THE
SILICON
SUBSTRATE AND
DEPOSITED
POLYSILICON
UNAFFECTED
16. workpiece +anode
-cathode
(a) Tool and workpiece immersed in
dielectric liquid.
(b) A spark is generated between tool and
workpiece.
(c) The high temperature causes the melting
and vaporization of electrodes.
(d) At the end of the pulse, the molten
material is ejected from surface, leaving a
shallow crater.
electrode
Material Removal Mechanism of EDM
23. APPLICATIONS
IC Packages with Micro Devices like computer
processors
Fuel Injection Nozzle for Automobiles
Biotechnology for micro-needles, drug delivery
systems
Medical Applications for tablet camera
Multifunctional Compact Devices like mobile, data
storage device,
Micro sensors, actuators, etc