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VISVESVARAYA NATIONAL INSTITUTE OF TECHNOLOGY
NAGPUR
DEPARTMENT OF MECHANICAL ENGINEERING
SEMINAR ON
“ ”
GUIDED BY:
PROF. Y. M. PURI
CAD/CAD ENGG.
PREPARED BY:
BHUPESH D. SARODE
CAD/CAM ENGG.
FIRST SEM
2012-13
Scope Of Presentation
What is Micromachining
Types of Machines in Micromachining
Various Micro Machines
Etching Process,
Bulk Micromachining,
Surface Micromachining,
LIGA Process
EDM
Application
MICRO-MACHINING
• Micromachining is the basic technology
for fabrication of micro-components of
size in the range of 1 to 500 micrometers
TYPES OF MACHINE IN MICROMACHINING
Tool based
Solid Tool Image ToolIsotropic
Process
Micromachining
Mask based
Anisotropic
Process
 Wet etching
 Ion beam
machining
 LIGA
 Laser beam
machining
 Laser beam
 Electron beam
 Ion beam
 Excimer laser
 Wet etching
 Plasma etching
 Electroforming
 Cutting
 Grinding
 Milling
 EDM
 ECM
 Punching
 Pressing
 Injection
Micro-Machining Processes
5
Micro-Machining
ETCHING
Bulk
Micro-
Machining
Surface
Micro-
Machining
LIGA EDM
ETCHING PROCESS
Etching process consists of three steps:
 Mass transport of reactants (through a boundary layer)
to the surface to be etched
 Reaction between reactants and the film(s) to be
etched at the surface
 Mass transport of reaction products from the surface
through the boundary layer
ETCHING PROCESS
• Isotropic vs. Anisotropic
• Isotropic– etch rate is same in all directions
• Anisotropic– etch rate is orientation dependent
• Dry vs. Wet
• Dry– uses gas-phase process
• Wet– uses liquid-phase process
WET ETCHING PROCESS
DESCRIPTION
The wet etching process involves :
 Performed in an immersion tank
 Wafers in wafer carrier are lowered into etchant solution
 Wafers remain in solution for specified amount of time
.referred to as etch duration
 Wafer carrier is removed from solution
 Wafers are rinsed in deionized water
 Wafers are dried
BULK MICROMACHINING
• Process for producing 3D MEMS
structures –older process
• Uses anisotropic etching of single crystal
silicon
Example: silicon cantilever beam for
atomic force microscope
Dopant Diffusion
Masking
Anisotropic Etching
BULK MICROMACHINING
• Newer process for producing MEMS structures
• Uses etching techniques to pattern micro-
scale structures from polycrystalline (poly)
silicon, or metal alloys
• Examples: accelerometers, pressure sensors,
micro gears and transmissions,micro mirrors
etc.
SURFACE MICROMACHINING
SURFACE MICROMACHINING
(a) DEPOSITION OF
POLYSILICON;
(b)ETCHING OF
POLYSILICON;
(c) SELECTIVE WET
ETCHING OF PSG,
LEAVING THE
SILICON
SUBSTRATE AND
DEPOSITED
POLYSILICON
UNAFFECTED
GERMANACRONYM
LITHOGRAPHIE -----------------LITHOGRAPHY
GALVANOFORMUNG -------------- ELECTROFORMING
ABFORMNG -----------------------------MOLDING
LIGA
LIGA
X-ray Irradiation
Resist Development
Electroforming
Resist Removal
VIDEO ON LIGA
workpiece +anode
-cathode
(a) Tool and workpiece immersed in
dielectric liquid.
(b) A spark is generated between tool and
workpiece.
(c) The high temperature causes the melting
and vaporization of electrodes.
(d) At the end of the pulse, the molten
material is ejected from surface, leaving a
shallow crater.
electrode
Material Removal Mechanism of EDM
Micro EDM Equipment
VIDEO ON EDM
1. Machine any conductive materials.
2. Single or medium size production.
3. Slots and Arbitrary 3D micro molds.
Capabilities of Micro EDM
MICRO-LATHE
MICRO-FACTORY
APPLICATIONS
 IC Packages with Micro Devices like computer
processors
 Fuel Injection Nozzle for Automobiles
 Biotechnology for micro-needles, drug delivery
systems
 Medical Applications for tablet camera
 Multifunctional Compact Devices like mobile, data
storage device,
 Micro sensors, actuators, etc
THANK YOU

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Cam seminar

  • 1. VISVESVARAYA NATIONAL INSTITUTE OF TECHNOLOGY NAGPUR DEPARTMENT OF MECHANICAL ENGINEERING SEMINAR ON “ ” GUIDED BY: PROF. Y. M. PURI CAD/CAD ENGG. PREPARED BY: BHUPESH D. SARODE CAD/CAM ENGG. FIRST SEM 2012-13
  • 2. Scope Of Presentation What is Micromachining Types of Machines in Micromachining Various Micro Machines Etching Process, Bulk Micromachining, Surface Micromachining, LIGA Process EDM Application
  • 3. MICRO-MACHINING • Micromachining is the basic technology for fabrication of micro-components of size in the range of 1 to 500 micrometers
  • 4. TYPES OF MACHINE IN MICROMACHINING Tool based Solid Tool Image ToolIsotropic Process Micromachining Mask based Anisotropic Process  Wet etching  Ion beam machining  LIGA  Laser beam machining  Laser beam  Electron beam  Ion beam  Excimer laser  Wet etching  Plasma etching  Electroforming  Cutting  Grinding  Milling  EDM  ECM  Punching  Pressing  Injection
  • 6. ETCHING PROCESS Etching process consists of three steps:  Mass transport of reactants (through a boundary layer) to the surface to be etched  Reaction between reactants and the film(s) to be etched at the surface  Mass transport of reaction products from the surface through the boundary layer
  • 7. ETCHING PROCESS • Isotropic vs. Anisotropic • Isotropic– etch rate is same in all directions • Anisotropic– etch rate is orientation dependent • Dry vs. Wet • Dry– uses gas-phase process • Wet– uses liquid-phase process
  • 8. WET ETCHING PROCESS DESCRIPTION The wet etching process involves :  Performed in an immersion tank  Wafers in wafer carrier are lowered into etchant solution  Wafers remain in solution for specified amount of time .referred to as etch duration  Wafer carrier is removed from solution  Wafers are rinsed in deionized water  Wafers are dried
  • 9. BULK MICROMACHINING • Process for producing 3D MEMS structures –older process • Uses anisotropic etching of single crystal silicon Example: silicon cantilever beam for atomic force microscope
  • 11. • Newer process for producing MEMS structures • Uses etching techniques to pattern micro- scale structures from polycrystalline (poly) silicon, or metal alloys • Examples: accelerometers, pressure sensors, micro gears and transmissions,micro mirrors etc. SURFACE MICROMACHINING
  • 12. SURFACE MICROMACHINING (a) DEPOSITION OF POLYSILICON; (b)ETCHING OF POLYSILICON; (c) SELECTIVE WET ETCHING OF PSG, LEAVING THE SILICON SUBSTRATE AND DEPOSITED POLYSILICON UNAFFECTED
  • 13. GERMANACRONYM LITHOGRAPHIE -----------------LITHOGRAPHY GALVANOFORMUNG -------------- ELECTROFORMING ABFORMNG -----------------------------MOLDING LIGA
  • 16. workpiece +anode -cathode (a) Tool and workpiece immersed in dielectric liquid. (b) A spark is generated between tool and workpiece. (c) The high temperature causes the melting and vaporization of electrodes. (d) At the end of the pulse, the molten material is ejected from surface, leaving a shallow crater. electrode Material Removal Mechanism of EDM
  • 19. 1. Machine any conductive materials. 2. Single or medium size production. 3. Slots and Arbitrary 3D micro molds. Capabilities of Micro EDM
  • 21.
  • 23. APPLICATIONS  IC Packages with Micro Devices like computer processors  Fuel Injection Nozzle for Automobiles  Biotechnology for micro-needles, drug delivery systems  Medical Applications for tablet camera  Multifunctional Compact Devices like mobile, data storage device,  Micro sensors, actuators, etc