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FET
(FIELD EFFECT
TRANSISTOR)
Prepared:
Engr. Jesus Rangcasajo
ECE 321 Instructor
FETโ€™S VS. BJTโ€™S
Similarities:
๏ƒ˜Amplifiers
๏ƒ˜Switching Device
๏ƒ˜Impedance Matching Circuits
DIFFERENCES
๏ƒผ Voltage controlled
devices
๏ƒผ Higher input impedance
๏ƒผ Less sensitive to temp.
variations
๏ƒผ Unipolar device
๏ƒผ Smaller/ Easily
Integrated Chips
๏ƒผ Current controlled devices
๏ƒผ Lower impedance
๏ƒผ Higher sensitive
๏ƒผ Bipolar device
๏ƒผ Bigger IC
FETโ€™s BJTโ€™s
TYPES OF FET
1. JFET (Junction FET)
2. MESFET (metal-semiconductor FET)
3. MOSFET (metal-oxide-semiconductor
FET)
a. D-MOSFET (Depletion)
b. E-MOSFET (Enhancement)
DR. IAN MUNRO ROSS
&
G.C DACEY
- Jointly developed an experimental
procedure for measuring the
characteristics of FET in 1955
JFET
(JUNCTION FET)
CONSTRUCTION AND CHARACTERISTICS OF
JFET
๏ƒ˜ Is a three-terminal device with one terminal capable
of controlling the current between the other two.
3 terminals are:
1. DRAIN (D)
2. SOURCE (S) โ€“ connected to n-channel
3. GATE (G) โ€“ connected to p-channel
Two types of JFET
1.n-channel
2.p-channel
Note:
๏ƒ˜ n-channel is more widely used.
Drain
Gate
Source
Drain
Gate
Source
n-channel p-channel
D
G
S
D
G
S
Water Analogy for the JFET control mechanisms
JFET OPERATING
CHARACTERISTICS
๏ƒ˜JFET is always operated with the gate-source PN
junction reversed biased.
๏ƒ˜Reverse biasing of the gate source junction with the
negative voltage produces a depletion region along the
PN junction which extends into the n-channel and thus
increases its resistance by restricting the channel width
as shown in the preceding figure.
๐‘ฝ ๐‘ฎ๐‘บ = ๐ŸŽ, ๐‘ฝ ๐‘ซ๐‘บ SOME POSITIVE VALUE
When ๐• ๐†๐’ = ๐ŸŽ ๐š๐ง๐ ๐• ๐ƒ๐’ is increased from
0 to a more positive voltage.
๏ƒ˜ The depletion region between p-gate
and n-channel increases
๏ƒ˜ Increasing the depletion region,
decreases the size of the n-channel
which increases the resistance of the
n-channel.
๏ƒ˜ Even though the n-channel resistance
is increasing, the current (ID) from
source to drain through the n-channel
is increasing. This is because VDS is
increasing.
Recall from DIODE discussion:
- The greater the applied reverse bias, the wider is the depletion region.
IG = 0
REGIONS OF JFET ACTION
1. Ohmic Region โ€“ linear region
๏ƒ˜ JFET behaves like an ordinary resistor
2. Pinch Off Region
๏ƒ˜ Saturation or Amplifier Region
๏ƒ˜ JFET operates as a constant current device because Id
is relatively independent of Vds
๏ƒ˜ Idss โ€“ drain current with gate shorted to source.
3. Breakdown Region
๏ƒ˜ If Vds is increased beyond its value corresponding to Va
โ€“ avalanche breakdown voltage.
๏ƒ˜ JFET enters the breakdown region where Id increases to
an excessive value.
4. Cut Off Region
๏ƒ˜As Vgs is made more and more negative, the gate
reverse bias increases which increases the thickness
of the depletion region.
๏ƒ˜As negative value of Vgs is increased, a stage comes
when the 2 depletion regions touch each other.
Vgs (off) = -Vp
/Vp/ = /Vgsoff/
JFET OPERATING CHARACTERISTICS: PINCH OFF
๏ƒ˜ If VGS = 0 and VDS is further
increased to a more positive
voltage, then the depletion zone
gets so large that it pinches off the
n-channel.
๏ƒ˜ As VDS is increased beyond |VP |,
the level of ID remains the same
(ID= IDSS)
๐‘ฝ ๐‘ฎ๐‘บ โ‰ฅ ๐ŸŽ
Voltage from gate to source is controlling
voltage of the JFET.
๏ƒ˜ As ๐• ๐†๐’ becomes more negative, the
depletion region increases.
๏ƒ˜ The more negative ๐• ๐†๐’, the
resulting level for ๐ˆ ๐ƒ is reduced.
๏ƒ˜ Eventually, when ๐• ๐†๐’ = ๐•๐ฉ [Vp = VGS
(off)], ID is 0 mA. (the device is
โ€œturned offโ€.
JFET OPERATING CHARACTERISTICS
n-Channel JFET characteristics with IDSS = 8 mA and VP = -4 V.
JFET OPERATING CHARACTERISTICS: VOLTAGE-
CONTROLLED RESISTOR
The region to the left of the
pinch-off point is called the
ohmic region/Voltage controlled
resistance region.
The JFET can be used as a variable resistor, where VGS controls the drain-
source resistance (rd). As VGS becomes more negative, the resistance (rd)
increases
where ro is the resistance with VGS=0 and rd is the
resistance at a particular level of VGS.
1. For an n-channel JFET with ๐‘Ÿ๐‘œ = 10๐‘˜ฮฉ ๐‘‰๐บ๐‘† =
FOR EXAMPLE:
๐‘Ÿ๐‘‘ =
10๐‘˜ฮฉ
(1 โˆ’
โˆ’3
โˆ’6
)2
๐‘Ÿ๐‘‘ = 40๐‘˜ฮฉ
P-CHANNEL JFETS
The p-channel JFET
behaves the same as the
n-channel JFET, except the
voltage polarities and
current directions are
reversed.
P-CHANNEL JFET CHARACTERISTICS
Also note that at high levels of VDS
the JFET reaches a breakdown
situation: ID increases uncontrollably
if VDS > VDSmax
JFET SYMBOLS
JFET symbols: (a) n-channel; (b) p-channel.
SUMMARY:
Important parameters to remember:
VGS = 0V, ID = IDSS
Cutoff (๐ผ ๐ท = 0๐ด)
๐‘‰๐บ๐‘† less than the pinch
off level
๐ผ ๐ท is between 0 A and ๐ผ ๐ท๐‘†๐‘† ๐‘“๐‘œ๐‘Ÿ ๐‘‰๐บ๐‘† โ‰ค
0๐‘‰ ๐‘Ž๐‘›๐‘‘ ๐‘”๐‘Ÿ๐‘’๐‘Ž๐‘ก๐‘’๐‘Ÿ ๐‘กโ„Ž๐‘Ž๐‘› ๐‘กโ„Ž๐‘’ ๐‘๐‘–๐‘๐‘›โ„Ž ๐‘œ๐‘“๐‘“ ๐‘™๐‘’๐‘ฃ๐‘’๐‘™.
JFET TRANSFER CHARACTERISTICS
In a BJT, ๐›ฝ indicates the relationship between ๐ผ ๐ต (input) and ๐ผ ๐ถ (output).
๐ผ ๐ถ = ๐‘“ ๐ผ ๐ต = ๐›ฝ๐ผ ๐‘
Constant
Control variable
In a JFET, the relationship of ๐‘‰๐บ๐‘† (input) and ๐ผ ๐ท (output) is defined by
Shockleyโ€™s Equation
๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’
๐‘‰๐บ๐‘†
๐‘‰๐‘
2
Constant
Control variable
William Bradford Shockley
(1910โ€“1989)
Co-inventor of the first
transistor and formulator of
the โ€œfield effectโ€ theory
employed in the
development of the
transistor and the FET
This graph shows the value of ๐‘ฐ ๐‘ซ for a given value of ๐‘ฝ ๐‘ฎ๐‘บ.
PLOTTING THE JFET TRANSFER CURVE
Using ๐ผ ๐ท๐‘†๐‘† and ๐‘‰๐‘ (๐‘‰๐บ๐‘†(๐‘œ๐‘“๐‘“)) values found in a specification sheet, the transfer
curve can be plotted according to these three steps:
Step 1:
Solving for ๐‘‰๐บ๐‘† = 0, ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’
๐‘‰๐บ๐‘†
๐‘‰๐‘
2
, ID = IDSS
Step 2:
Solving for ๐‘‰๐บ๐‘† = ๐‘‰๐‘(๐‘‰๐บ๐‘† ๐‘œ๐‘“๐‘“ ), ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’
๐‘‰๐บ๐‘†
๐‘‰๐‘
2
, ID = 0 A
Step 3:
Solving for ๐ผ ๐ท if we substitute ๐‘‰๐บ๐‘† = โˆ’1 ๐‘‰ , ๐ผ ๐ท๐‘†๐‘† = 8mA and ๐‘‰๐‘ =-4
๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’
๐‘‰๐บ๐‘†
๐‘‰๐‘
2
, ๐ผ ๐ท = 8๐‘š๐ด 1 โˆ’
(โˆ’1)
(โˆ’4)
2
,
ID = 4.5mA
Conversely, for a given
๐ผ ๐ท, ๐‘‰๐บ๐‘† can be obtained:
๐‘‰๐บ๐‘† = ๐‘‰๐‘ 1 โˆ’
๐ผ ๐ท
๐ผ ๐ท๐‘†๐‘†
๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’
๐‘‰๐บ๐‘†
๐‘‰๐‘
2
Shorthand
Method:
๐ผ ๐ท =
๐ผ ๐ท๐‘†๐‘†
4
๐‘‰๐บ๐‘† =
๐‘‰๐‘
2
๐‘‰๐บ๐‘† โ‰… 0.3๐‘‰๐‘ ๐ผ ๐ท =
๐ผ ๐ท๐‘†๐‘†
2
Sketch the transfer curve defined by ๐ผ ๐ท๐‘†๐‘† = 12๐‘š๐ด and ๐‘‰๐‘ = โˆ’6๐‘‰.
For Example:
By shorthand method,
๐‘‰๐บ๐‘† =
๐‘‰๐‘
2
= โˆ’6
2 = โˆ’๐Ÿ‘๐‘ฝ
๐ผ ๐ท =
๐ผ ๐ท๐‘†๐‘†
4
= 12๐‘š๐ด
4 = ๐Ÿ‘๐’Ž๐‘จ
@
@
๐ผ ๐ท =
๐ผ ๐ท๐‘†๐‘†
2
= 12๐‘š๐ด
2 = ๐Ÿ”๐’Ž๐‘จ
๐‘‰๐บ๐‘† โ‰… 0.3๐‘‰๐‘ = 0.3 โˆ’6๐‘‰ = โˆ’๐Ÿ. ๐Ÿ–๐‘ฝ
IMPORTANT RELATIONSHIPS
MOSFET
(METAL-OXIDE-
SEMICONDUCTOR FET)
THERE ARE TWO TYPES OF MOSFETS:
๏ƒ˜ Depletion-Type
๏ƒ˜ Enhancement-Type
DEPLETION-TYPE MOSFET CONSTRUCTION
๏ƒ˜ The Drain (D) and Source (S)
connect to the to n-doped regions.
๏ƒ˜ These n-doped regions are
connected via an n-channel.
๏ƒ˜ This n-channel is connected to the
Gate (G) via a thin insulating layer
of SiO2.
๏ƒ˜ The n-doped material lies on a p-
doped substrate that may have an
additional terminal connection
called Substrate (SS).
n-Channel depletion-type
MOSFET
Dielectric
insulator
SILICON DIOXIDE:
๏ƒ˜ Insulator refer to as DIELECTRIC.
๏ƒ˜ It sets up opposing electric field within the dielectric
when exposed to an externally applied field.
๏ƒ˜ The fact that SiO2 layer is an insulating layer
means that:
There is no direct electrical connection between the
gate terminal and the channel of a MOSFET.
It is the insulating layer of SiO2 in the MOSFET
construction that accounts for the very desirable high
input impedance of the device
WHY MOSFET?
๏ƒ˜ Metal:
๏ถ For the drain, source, and gate connection for the proper
surface โ€“ in particular, the gate terminal and the control to be
offered by the surface area of the contact.
๏ƒ˜ Oxide:
๏ถ For the Silicon dioxide insulating layer.
๏ƒ˜ Semiconductor:
๏ถ For the basic structure on which the n- and p-type region are
DIFFUSED.
MOSFET is also called
INSULATED GATE-FET or IGFET
DEPLETION-TYPE MOSFET :BASIC OPERATION
AND CHARACTERISTICS
๏ƒผ VGS = 0 and VDS is applied
across the drain to source
terminals.
๏ƒผ This results to attraction of
free electrons of the n-
channel to the drain, and
hence current flows.
Continuationโ€ฆ.
๏ƒ˜ ๐‘‰๐บ๐‘† is set at a negative
voltage such as -1 V
๏ƒ˜ The negative potential at the
gate pressure electrons
toward the p-type substrate
and attract the holes for the
p-type substrate.
๏ƒ˜ This will reduce the number
of free electrons in the n-
channel available for
conduction.
๏ƒ˜ The more negative the ๐‘‰๐บ๐‘† ,
the resulting level of drain
current ๐ผ ๐ท is reduced.
๏ƒ˜ When ๐‘‰๐บ๐‘† is reduced to ๐‘‰๐‘ƒ
(pinch off voltage), then ๐ผ ๐ท =
0๐‘š๐ด.
When ๐‘‰๐บ๐‘† is reduced to ๐‘‰๐‘ƒ (pinch off) {i.e ๐‘‰๐‘ƒ = โˆ’6๐‘‰} then ๐ผ ๐ท = 0๐‘š๐ด.
For positive values of ๐‘‰๐บ๐‘†, the positive gate will draw additional
electrons (free carriers from the p-type substarte and hence ๐ผ ๐ท
increases.)
DEPLETION-TYPE MOSFET CAN OPERATE IN TWO
MODES:
๏ƒ˜ Depletion mode
๏ƒ˜ Enhancement mode
D-TYPE MOSFET IN DEPLETION MODE
The characteristics are similar to a JFET.
๏ƒ˜ When ๐‘‰๐บ๐‘† = 0๐‘‰, ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘†
๏ƒ˜ When ๐‘‰๐บ๐‘† < 0๐‘‰, ๐ผ ๐ท < ๐ผ ๐ท๐‘†๐‘†
๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’
๐‘‰๐บ๐‘†
๐‘‰๐‘
2
D-TYPE MOSFET IN ENHANCEMENT MODE
@ ๐‘‰๐บ๐‘† > 0
๐ผ ๐ท increase above the ๐ผ ๐ท๐‘†๐‘†
๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’
๐‘‰๐บ๐‘†
๐‘‰๐‘
2
Note:
๐‘‰๐บ๐‘† is now positive polarity
D-TYPE MOSFET SYMBOLS
ENHANCEMENT-TYPE
MOSFET
ENHANCEMENT-TYPE MOSFET CONSTRUCTION
๏ƒ˜ The Drain (D) and Source (S)
connect to the to n-doped
regions.
๏ƒ˜ The Gate (G) connects to the
p-doped substrate via a thin
insulating layer of SiO2
๏ƒ˜ There is no channel
๏ƒ˜ The n-doped material lies on
a p-doped substrate that may
have an additional terminal
connection
๏ƒ˜ For ๐‘‰๐บ๐‘† = 0, ๐ผ ๐ท = 0(no channel)
๏ƒ˜ For ๐‘‰๐ท๐‘† some positive voltage
and ๐‘‰๐บ๐‘† = 0, two reversed biased
n-junctions and no significant
flow between drain and source.
๏ƒ˜ For ๐‘‰๐บ๐‘† > 0 and ๐‘‰๐บ๐‘† > 0, the
positive voltage at gate pressure
holes to enter deeper regions of
the p-substrate, and the electrons
in p-substrate and the electrons
in p-substrate will be attracted to
the positive gate.
๏ƒ˜ The level of ๐‘‰๐บ๐‘† that results in the
significant increase in drain
current in called:
THRESHOLD VOLTAGE (Vt)
๏ƒ˜ For ๐‘‰๐บ๐‘† < ๐‘‰๐‘‡, ๐ผ ๐ท = 0๐‘š๐‘Ž
BASIC OPERATION OF THE E-TYPE MOSFETNote:
The enhancement-type
MOSFET operates only in the
enhancement mode
๏ƒ˜ ๐‘‰๐บ๐‘† is always positive
๏ƒ˜ As ๐‘‰๐บ๐‘† increases, ๐ผ ๐ท increases
๏ƒ˜ As ๐‘‰๐บ๐‘† is kept constant and ๐‘‰๐ท๐‘† is
increased, then ๐ผ ๐ท saturates (๐ผ ๐ท๐‘†๐‘†)
and the saturation level, ๐‘‰๐ท๐‘†๐‘ ๐‘Ž๐‘ก is
reached.
๏ƒ˜ ๐‘‰๐ท๐‘†๐‘ ๐‘Ž๐‘ก can be calculated by
๐‘‰๐ท๐‘ ๐‘Ž๐‘ก = ๐‘‰๐บ๐‘† โˆ’ ๐‘‰๐‘‡
E-TYPE MOSFET TRANSFER CURVE
To determine ๐ผ ๐ท given ๐‘‰๐บ๐‘†:
Where,
๐‘‰๐‘‡ is the threshold voltage or voltage at which the MOSFET turns on.
๐‘˜, a constant, can be determined by using values at a specific point and the
formula:
FOR EXAMPLE:
Substituting ๐ผ ๐ท(๐‘œ๐‘›) = 10๐‘š๐ด ๐‘คโ„Ž๐‘’๐‘› ๐‘‰๐บ๐‘†(๐‘œ๐‘›) = 8๐‘‰
The level of ๐‘‰๐‘‡ is 2V, as revealed by
the fact that the drain current has
dropped to 0 mA.
๐‘˜ =
10๐‘š๐ด
(8๐‘‰ โˆ’ 2๐‘‰)2
= ๐ŸŽ. ๐Ÿ๐Ÿ•๐Ÿ–๐’™๐Ÿ๐ŸŽโˆ’๐Ÿ‘ ๐‘จ
๐‘ฝ ๐Ÿ
Note:
For values of ๐‘‰๐บ๐‘† less than the threshold level, the drain current of an
enhancement type MOSFET is 0 mA.
Substituting the ๐‘‰๐บ๐‘† from the general equation:
๐ผ ๐ท = ๐‘˜(๐‘‰๐บ๐‘† โˆ’ ๐‘‰๐‘‡)2
๐‘˜ = 0.278๐‘ฅ10โˆ’3
๐ผ ๐ท = 0.278๐‘š๐ด/๐‘‰2
(๐‘‰๐บ๐‘† โˆ’ 2๐‘‰)2
i.e substituting ๐‘‰๐บ๐‘† = 4๐‘‰, we find that
๐ผ ๐ท = 0.278๐‘š๐ด/๐‘‰2(4๐‘‰ โˆ’ 2๐‘‰)2
๐‘ฐ ๐‘ซ = ๐Ÿ. ๐Ÿ๐Ÿ๐’Ž๐‘จ
MOSFET SYMBOLS
VMOS
VERTICAL MOSFETS
VMOS CHARACTERISTICS:
๏ƒ˜ Compared with commercially available planar
MOSFETs, VMOS FETs have reduced channel
resistance levels and higher current and power
ratings
๏ƒ˜ VMOS FETs have a positive temperature
coefficient that will combat the possibility of
thermal runaway
๏ƒ˜ The reduced charge storage levels result in faster
switching times for VMOS construction compared
to those for conventional planar construction
CMOS
COMPLEMENTARY MOSFETS
CMOS CHARACTERISTICS:
๏ƒ˜ Extensive application in computer logic
design
๏ƒ˜ Relatively high input impedance
๏ƒ˜ Fast switching speeds
๏ƒ˜ Lower operating power levels โ€“ CMOS
logic design
MESFETS
Metal semiconductor FETs
ASSIGNMENT:
1. In what ways is the construction of a depletion type
of MOSFET similar to that of a JFET? In what ways is
it different?
2. What is the significant difference between the
construction of an enhancement type MOSFET and a
depletion type MOSFET?
3. Sketch the transfer characteristics of a p-channel
enhancement type MOSFET if ๐‘‰๐‘‡ = โˆ’5๐‘‰ and ๐‘˜ =
0.45๐‘ฅ10โˆ’3 ๐ด ๐‘‰2.
SOURCE:
Electronic Devices and Circuit Theory, 10th Ed., R.
Boylestad & L. Nashelsky, Copyright ยฉ2009 by
PEARSON Education, Inc.

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Field Effect Transistor (FET)

  • 3. DIFFERENCES ๏ƒผ Voltage controlled devices ๏ƒผ Higher input impedance ๏ƒผ Less sensitive to temp. variations ๏ƒผ Unipolar device ๏ƒผ Smaller/ Easily Integrated Chips ๏ƒผ Current controlled devices ๏ƒผ Lower impedance ๏ƒผ Higher sensitive ๏ƒผ Bipolar device ๏ƒผ Bigger IC FETโ€™s BJTโ€™s
  • 4. TYPES OF FET 1. JFET (Junction FET) 2. MESFET (metal-semiconductor FET) 3. MOSFET (metal-oxide-semiconductor FET) a. D-MOSFET (Depletion) b. E-MOSFET (Enhancement)
  • 5. DR. IAN MUNRO ROSS & G.C DACEY - Jointly developed an experimental procedure for measuring the characteristics of FET in 1955
  • 7. CONSTRUCTION AND CHARACTERISTICS OF JFET ๏ƒ˜ Is a three-terminal device with one terminal capable of controlling the current between the other two. 3 terminals are: 1. DRAIN (D) 2. SOURCE (S) โ€“ connected to n-channel 3. GATE (G) โ€“ connected to p-channel
  • 8. Two types of JFET 1.n-channel 2.p-channel Note: ๏ƒ˜ n-channel is more widely used. Drain Gate Source Drain Gate Source
  • 10.
  • 11. Water Analogy for the JFET control mechanisms
  • 13. ๏ƒ˜JFET is always operated with the gate-source PN junction reversed biased. ๏ƒ˜Reverse biasing of the gate source junction with the negative voltage produces a depletion region along the PN junction which extends into the n-channel and thus increases its resistance by restricting the channel width as shown in the preceding figure.
  • 14. ๐‘ฝ ๐‘ฎ๐‘บ = ๐ŸŽ, ๐‘ฝ ๐‘ซ๐‘บ SOME POSITIVE VALUE When ๐• ๐†๐’ = ๐ŸŽ ๐š๐ง๐ ๐• ๐ƒ๐’ is increased from 0 to a more positive voltage. ๏ƒ˜ The depletion region between p-gate and n-channel increases ๏ƒ˜ Increasing the depletion region, decreases the size of the n-channel which increases the resistance of the n-channel. ๏ƒ˜ Even though the n-channel resistance is increasing, the current (ID) from source to drain through the n-channel is increasing. This is because VDS is increasing. Recall from DIODE discussion: - The greater the applied reverse bias, the wider is the depletion region. IG = 0
  • 15.
  • 16. REGIONS OF JFET ACTION 1. Ohmic Region โ€“ linear region ๏ƒ˜ JFET behaves like an ordinary resistor 2. Pinch Off Region ๏ƒ˜ Saturation or Amplifier Region ๏ƒ˜ JFET operates as a constant current device because Id is relatively independent of Vds ๏ƒ˜ Idss โ€“ drain current with gate shorted to source. 3. Breakdown Region ๏ƒ˜ If Vds is increased beyond its value corresponding to Va โ€“ avalanche breakdown voltage. ๏ƒ˜ JFET enters the breakdown region where Id increases to an excessive value.
  • 17. 4. Cut Off Region ๏ƒ˜As Vgs is made more and more negative, the gate reverse bias increases which increases the thickness of the depletion region. ๏ƒ˜As negative value of Vgs is increased, a stage comes when the 2 depletion regions touch each other. Vgs (off) = -Vp /Vp/ = /Vgsoff/
  • 18.
  • 19. JFET OPERATING CHARACTERISTICS: PINCH OFF ๏ƒ˜ If VGS = 0 and VDS is further increased to a more positive voltage, then the depletion zone gets so large that it pinches off the n-channel. ๏ƒ˜ As VDS is increased beyond |VP |, the level of ID remains the same (ID= IDSS)
  • 20. ๐‘ฝ ๐‘ฎ๐‘บ โ‰ฅ ๐ŸŽ Voltage from gate to source is controlling voltage of the JFET. ๏ƒ˜ As ๐• ๐†๐’ becomes more negative, the depletion region increases. ๏ƒ˜ The more negative ๐• ๐†๐’, the resulting level for ๐ˆ ๐ƒ is reduced. ๏ƒ˜ Eventually, when ๐• ๐†๐’ = ๐•๐ฉ [Vp = VGS (off)], ID is 0 mA. (the device is โ€œturned offโ€.
  • 21. JFET OPERATING CHARACTERISTICS n-Channel JFET characteristics with IDSS = 8 mA and VP = -4 V.
  • 22. JFET OPERATING CHARACTERISTICS: VOLTAGE- CONTROLLED RESISTOR The region to the left of the pinch-off point is called the ohmic region/Voltage controlled resistance region. The JFET can be used as a variable resistor, where VGS controls the drain- source resistance (rd). As VGS becomes more negative, the resistance (rd) increases
  • 23. where ro is the resistance with VGS=0 and rd is the resistance at a particular level of VGS.
  • 24. 1. For an n-channel JFET with ๐‘Ÿ๐‘œ = 10๐‘˜ฮฉ ๐‘‰๐บ๐‘† = FOR EXAMPLE: ๐‘Ÿ๐‘‘ = 10๐‘˜ฮฉ (1 โˆ’ โˆ’3 โˆ’6 )2 ๐‘Ÿ๐‘‘ = 40๐‘˜ฮฉ
  • 25. P-CHANNEL JFETS The p-channel JFET behaves the same as the n-channel JFET, except the voltage polarities and current directions are reversed.
  • 26. P-CHANNEL JFET CHARACTERISTICS Also note that at high levels of VDS the JFET reaches a breakdown situation: ID increases uncontrollably if VDS > VDSmax
  • 27. JFET SYMBOLS JFET symbols: (a) n-channel; (b) p-channel.
  • 28. SUMMARY: Important parameters to remember: VGS = 0V, ID = IDSS Cutoff (๐ผ ๐ท = 0๐ด) ๐‘‰๐บ๐‘† less than the pinch off level
  • 29. ๐ผ ๐ท is between 0 A and ๐ผ ๐ท๐‘†๐‘† ๐‘“๐‘œ๐‘Ÿ ๐‘‰๐บ๐‘† โ‰ค 0๐‘‰ ๐‘Ž๐‘›๐‘‘ ๐‘”๐‘Ÿ๐‘’๐‘Ž๐‘ก๐‘’๐‘Ÿ ๐‘กโ„Ž๐‘Ž๐‘› ๐‘กโ„Ž๐‘’ ๐‘๐‘–๐‘๐‘›โ„Ž ๐‘œ๐‘“๐‘“ ๐‘™๐‘’๐‘ฃ๐‘’๐‘™.
  • 30. JFET TRANSFER CHARACTERISTICS In a BJT, ๐›ฝ indicates the relationship between ๐ผ ๐ต (input) and ๐ผ ๐ถ (output). ๐ผ ๐ถ = ๐‘“ ๐ผ ๐ต = ๐›ฝ๐ผ ๐‘ Constant Control variable In a JFET, the relationship of ๐‘‰๐บ๐‘† (input) and ๐ผ ๐ท (output) is defined by Shockleyโ€™s Equation ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’ ๐‘‰๐บ๐‘† ๐‘‰๐‘ 2 Constant Control variable
  • 31. William Bradford Shockley (1910โ€“1989) Co-inventor of the first transistor and formulator of the โ€œfield effectโ€ theory employed in the development of the transistor and the FET
  • 32. This graph shows the value of ๐‘ฐ ๐‘ซ for a given value of ๐‘ฝ ๐‘ฎ๐‘บ.
  • 33. PLOTTING THE JFET TRANSFER CURVE Using ๐ผ ๐ท๐‘†๐‘† and ๐‘‰๐‘ (๐‘‰๐บ๐‘†(๐‘œ๐‘“๐‘“)) values found in a specification sheet, the transfer curve can be plotted according to these three steps: Step 1: Solving for ๐‘‰๐บ๐‘† = 0, ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’ ๐‘‰๐บ๐‘† ๐‘‰๐‘ 2 , ID = IDSS Step 2: Solving for ๐‘‰๐บ๐‘† = ๐‘‰๐‘(๐‘‰๐บ๐‘† ๐‘œ๐‘“๐‘“ ), ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’ ๐‘‰๐บ๐‘† ๐‘‰๐‘ 2 , ID = 0 A Step 3: Solving for ๐ผ ๐ท if we substitute ๐‘‰๐บ๐‘† = โˆ’1 ๐‘‰ , ๐ผ ๐ท๐‘†๐‘† = 8mA and ๐‘‰๐‘ =-4 ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’ ๐‘‰๐บ๐‘† ๐‘‰๐‘ 2 , ๐ผ ๐ท = 8๐‘š๐ด 1 โˆ’ (โˆ’1) (โˆ’4) 2 , ID = 4.5mA
  • 34. Conversely, for a given ๐ผ ๐ท, ๐‘‰๐บ๐‘† can be obtained: ๐‘‰๐บ๐‘† = ๐‘‰๐‘ 1 โˆ’ ๐ผ ๐ท ๐ผ ๐ท๐‘†๐‘† ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’ ๐‘‰๐บ๐‘† ๐‘‰๐‘ 2 Shorthand Method: ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 4 ๐‘‰๐บ๐‘† = ๐‘‰๐‘ 2 ๐‘‰๐บ๐‘† โ‰… 0.3๐‘‰๐‘ ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 2
  • 35. Sketch the transfer curve defined by ๐ผ ๐ท๐‘†๐‘† = 12๐‘š๐ด and ๐‘‰๐‘ = โˆ’6๐‘‰. For Example: By shorthand method, ๐‘‰๐บ๐‘† = ๐‘‰๐‘ 2 = โˆ’6 2 = โˆ’๐Ÿ‘๐‘ฝ ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 4 = 12๐‘š๐ด 4 = ๐Ÿ‘๐’Ž๐‘จ @ @ ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 2 = 12๐‘š๐ด 2 = ๐Ÿ”๐’Ž๐‘จ ๐‘‰๐บ๐‘† โ‰… 0.3๐‘‰๐‘ = 0.3 โˆ’6๐‘‰ = โˆ’๐Ÿ. ๐Ÿ–๐‘ฝ
  • 38. THERE ARE TWO TYPES OF MOSFETS: ๏ƒ˜ Depletion-Type ๏ƒ˜ Enhancement-Type
  • 39. DEPLETION-TYPE MOSFET CONSTRUCTION ๏ƒ˜ The Drain (D) and Source (S) connect to the to n-doped regions. ๏ƒ˜ These n-doped regions are connected via an n-channel. ๏ƒ˜ This n-channel is connected to the Gate (G) via a thin insulating layer of SiO2. ๏ƒ˜ The n-doped material lies on a p- doped substrate that may have an additional terminal connection called Substrate (SS). n-Channel depletion-type MOSFET Dielectric insulator
  • 40. SILICON DIOXIDE: ๏ƒ˜ Insulator refer to as DIELECTRIC. ๏ƒ˜ It sets up opposing electric field within the dielectric when exposed to an externally applied field. ๏ƒ˜ The fact that SiO2 layer is an insulating layer means that: There is no direct electrical connection between the gate terminal and the channel of a MOSFET. It is the insulating layer of SiO2 in the MOSFET construction that accounts for the very desirable high input impedance of the device
  • 41. WHY MOSFET? ๏ƒ˜ Metal: ๏ถ For the drain, source, and gate connection for the proper surface โ€“ in particular, the gate terminal and the control to be offered by the surface area of the contact. ๏ƒ˜ Oxide: ๏ถ For the Silicon dioxide insulating layer. ๏ƒ˜ Semiconductor: ๏ถ For the basic structure on which the n- and p-type region are DIFFUSED. MOSFET is also called INSULATED GATE-FET or IGFET
  • 42. DEPLETION-TYPE MOSFET :BASIC OPERATION AND CHARACTERISTICS ๏ƒผ VGS = 0 and VDS is applied across the drain to source terminals. ๏ƒผ This results to attraction of free electrons of the n- channel to the drain, and hence current flows.
  • 43. Continuationโ€ฆ. ๏ƒ˜ ๐‘‰๐บ๐‘† is set at a negative voltage such as -1 V ๏ƒ˜ The negative potential at the gate pressure electrons toward the p-type substrate and attract the holes for the p-type substrate. ๏ƒ˜ This will reduce the number of free electrons in the n- channel available for conduction. ๏ƒ˜ The more negative the ๐‘‰๐บ๐‘† , the resulting level of drain current ๐ผ ๐ท is reduced. ๏ƒ˜ When ๐‘‰๐บ๐‘† is reduced to ๐‘‰๐‘ƒ (pinch off voltage), then ๐ผ ๐ท = 0๐‘š๐ด.
  • 44. When ๐‘‰๐บ๐‘† is reduced to ๐‘‰๐‘ƒ (pinch off) {i.e ๐‘‰๐‘ƒ = โˆ’6๐‘‰} then ๐ผ ๐ท = 0๐‘š๐ด. For positive values of ๐‘‰๐บ๐‘†, the positive gate will draw additional electrons (free carriers from the p-type substarte and hence ๐ผ ๐ท increases.)
  • 45. DEPLETION-TYPE MOSFET CAN OPERATE IN TWO MODES: ๏ƒ˜ Depletion mode ๏ƒ˜ Enhancement mode
  • 46. D-TYPE MOSFET IN DEPLETION MODE The characteristics are similar to a JFET. ๏ƒ˜ When ๐‘‰๐บ๐‘† = 0๐‘‰, ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† ๏ƒ˜ When ๐‘‰๐บ๐‘† < 0๐‘‰, ๐ผ ๐ท < ๐ผ ๐ท๐‘†๐‘† ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’ ๐‘‰๐บ๐‘† ๐‘‰๐‘ 2
  • 47. D-TYPE MOSFET IN ENHANCEMENT MODE @ ๐‘‰๐บ๐‘† > 0 ๐ผ ๐ท increase above the ๐ผ ๐ท๐‘†๐‘† ๐ผ ๐ท = ๐ผ ๐ท๐‘†๐‘† 1 โˆ’ ๐‘‰๐บ๐‘† ๐‘‰๐‘ 2 Note: ๐‘‰๐บ๐‘† is now positive polarity
  • 50. ENHANCEMENT-TYPE MOSFET CONSTRUCTION ๏ƒ˜ The Drain (D) and Source (S) connect to the to n-doped regions. ๏ƒ˜ The Gate (G) connects to the p-doped substrate via a thin insulating layer of SiO2 ๏ƒ˜ There is no channel ๏ƒ˜ The n-doped material lies on a p-doped substrate that may have an additional terminal connection
  • 51. ๏ƒ˜ For ๐‘‰๐บ๐‘† = 0, ๐ผ ๐ท = 0(no channel) ๏ƒ˜ For ๐‘‰๐ท๐‘† some positive voltage and ๐‘‰๐บ๐‘† = 0, two reversed biased n-junctions and no significant flow between drain and source. ๏ƒ˜ For ๐‘‰๐บ๐‘† > 0 and ๐‘‰๐บ๐‘† > 0, the positive voltage at gate pressure holes to enter deeper regions of the p-substrate, and the electrons in p-substrate and the electrons in p-substrate will be attracted to the positive gate. ๏ƒ˜ The level of ๐‘‰๐บ๐‘† that results in the significant increase in drain current in called: THRESHOLD VOLTAGE (Vt) ๏ƒ˜ For ๐‘‰๐บ๐‘† < ๐‘‰๐‘‡, ๐ผ ๐ท = 0๐‘š๐‘Ž
  • 52. BASIC OPERATION OF THE E-TYPE MOSFETNote: The enhancement-type MOSFET operates only in the enhancement mode ๏ƒ˜ ๐‘‰๐บ๐‘† is always positive ๏ƒ˜ As ๐‘‰๐บ๐‘† increases, ๐ผ ๐ท increases ๏ƒ˜ As ๐‘‰๐บ๐‘† is kept constant and ๐‘‰๐ท๐‘† is increased, then ๐ผ ๐ท saturates (๐ผ ๐ท๐‘†๐‘†) and the saturation level, ๐‘‰๐ท๐‘†๐‘ ๐‘Ž๐‘ก is reached. ๏ƒ˜ ๐‘‰๐ท๐‘†๐‘ ๐‘Ž๐‘ก can be calculated by ๐‘‰๐ท๐‘ ๐‘Ž๐‘ก = ๐‘‰๐บ๐‘† โˆ’ ๐‘‰๐‘‡
  • 53. E-TYPE MOSFET TRANSFER CURVE To determine ๐ผ ๐ท given ๐‘‰๐บ๐‘†: Where, ๐‘‰๐‘‡ is the threshold voltage or voltage at which the MOSFET turns on. ๐‘˜, a constant, can be determined by using values at a specific point and the formula:
  • 54. FOR EXAMPLE: Substituting ๐ผ ๐ท(๐‘œ๐‘›) = 10๐‘š๐ด ๐‘คโ„Ž๐‘’๐‘› ๐‘‰๐บ๐‘†(๐‘œ๐‘›) = 8๐‘‰ The level of ๐‘‰๐‘‡ is 2V, as revealed by the fact that the drain current has dropped to 0 mA. ๐‘˜ = 10๐‘š๐ด (8๐‘‰ โˆ’ 2๐‘‰)2 = ๐ŸŽ. ๐Ÿ๐Ÿ•๐Ÿ–๐’™๐Ÿ๐ŸŽโˆ’๐Ÿ‘ ๐‘จ ๐‘ฝ ๐Ÿ
  • 55. Note: For values of ๐‘‰๐บ๐‘† less than the threshold level, the drain current of an enhancement type MOSFET is 0 mA. Substituting the ๐‘‰๐บ๐‘† from the general equation: ๐ผ ๐ท = ๐‘˜(๐‘‰๐บ๐‘† โˆ’ ๐‘‰๐‘‡)2 ๐‘˜ = 0.278๐‘ฅ10โˆ’3 ๐ผ ๐ท = 0.278๐‘š๐ด/๐‘‰2 (๐‘‰๐บ๐‘† โˆ’ 2๐‘‰)2 i.e substituting ๐‘‰๐บ๐‘† = 4๐‘‰, we find that ๐ผ ๐ท = 0.278๐‘š๐ด/๐‘‰2(4๐‘‰ โˆ’ 2๐‘‰)2 ๐‘ฐ ๐‘ซ = ๐Ÿ. ๐Ÿ๐Ÿ๐’Ž๐‘จ
  • 58. VMOS CHARACTERISTICS: ๏ƒ˜ Compared with commercially available planar MOSFETs, VMOS FETs have reduced channel resistance levels and higher current and power ratings ๏ƒ˜ VMOS FETs have a positive temperature coefficient that will combat the possibility of thermal runaway ๏ƒ˜ The reduced charge storage levels result in faster switching times for VMOS construction compared to those for conventional planar construction
  • 60. CMOS CHARACTERISTICS: ๏ƒ˜ Extensive application in computer logic design ๏ƒ˜ Relatively high input impedance ๏ƒ˜ Fast switching speeds ๏ƒ˜ Lower operating power levels โ€“ CMOS logic design
  • 62. ASSIGNMENT: 1. In what ways is the construction of a depletion type of MOSFET similar to that of a JFET? In what ways is it different? 2. What is the significant difference between the construction of an enhancement type MOSFET and a depletion type MOSFET? 3. Sketch the transfer characteristics of a p-channel enhancement type MOSFET if ๐‘‰๐‘‡ = โˆ’5๐‘‰ and ๐‘˜ = 0.45๐‘ฅ10โˆ’3 ๐ด ๐‘‰2.
  • 63. SOURCE: Electronic Devices and Circuit Theory, 10th Ed., R. Boylestad & L. Nashelsky, Copyright ยฉ2009 by PEARSON Education, Inc.