This document discusses the development of a new technology for monitoring nanoparticles in semiconductor processing solutions down to sizes of 5nm. It notes that current inspection tools have limitations of 40nm for pure chemicals and 150nm for slurries. The new method uses aerosol particle measurement technology to overcome these limitations. Key features include automatic online monitoring of particle size and concentration from 5nm to 1000nm in slurries, chemicals and ultra pure water. The technology has been in development since 2012 and prototypes are being tested with semiconductor manufacturers. Future work includes analyzing particle compositions.