XPS can be used to analyze bio-surfaces like amino acid multilayers and contact lenses. XPS depth profiling with cluster ions allows intact profiling of amino acid multilayers, observing the expected alternating layers. Batch analysis of contact lenses uses fluorine peaks to measure coating thickness variations across a batch. Angle-resolved XPS can also characterize ultra-thin coatings on curved surfaces like catheter coatings without changing analysis conditions.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject electrons from a material's surface and measure their kinetic energy to determine the elemental composition and chemical states. Kai Siegbahn developed XPS in the 1950s and won the Nobel Prize for his work. A study used XPS to analyze the surface chemistry of langasite crystals before and after vacuum annealing, finding that higher-temperature annealing reduced the surface concentration of gallium. XPS provides quantitative and chemical state information from the top 10-100 Angstroms of a surface.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject core electrons from the surface of a material. The kinetic energy of the ejected electrons is measured to identify the elemental composition of the outermost layers of the material. XPS is based on the photoelectric effect discovered by Einstein and was developed in the 1960s by Kai Siegbahn and his research group. It functions under ultra-high vacuum and allows identifying elements, chemical states, and empirical formulas of the top 1-10 nm of materials.
XPS can be used to characterize polymers at the surface. It provides both elemental and chemical information about the top 10 nm of a sample. Elemental identification and quantification is possible from survey spectra. High resolution region spectra can identify functional groups and chemical environments through chemical shifts. XPS can map the distribution of elements and chemical states across a sample surface. Depth profiling with cluster ion beams maintains chemical information during sputtering and allows buried layers and interfaces to be analyzed. XPS was used to characterize a fluoropolymer coating on PET and PTFE, identifying the chemical structure and confirming it matched the expected structure from the plasma deposition process.
Auger electron spectroscopy (AES) is an analytical technique used to analyze the surface chemistry of materials. It works by (1) removing a core electron from the sample using a high-energy electron beam, (2) causing an electron to fill the resulting vacancy and emit an Auger electron, and (3) analyzing the kinetic energy of the emitted Auger electrons to determine the elemental composition of the top 1-10 nanometers of the sample surface. AES can also be used to create depth profiles by combining it with argon ion sputtering to sequentially remove layers from the surface. Typical applications of AES include analyzing thin film layers, surface oxides, and corrosion processes.
Xps (x ray photoelectron spectroscopy)Zaahir Salam
The document provides an overview of X-ray photoelectron spectroscopy (XPS) technology. XPS works by irradiating a sample surface with x-rays and measuring the kinetic energy and number of electrons that escape from the top 1-10 nm of the material. This allows one to determine the sample's elemental composition and chemical/electronic states. Key aspects discussed include the use of ultra-high vacuum conditions to prevent surface contamination and allow for accurate analysis. Characteristic XPS spectra are produced that contain peaks corresponding to different elemental binding energies.
Instrumentation presentation - Auger Electron Spectroscopy (AES)Amirah Basir
Group 5-AES
Normaizatul Hanissa Binti Hamdan
Amirah Binti Basir
-Introduction/Backgroud /History, fundamental/basic principle and
elaboration of the principle, related pictures, related
equations/expressions/derivations, components and it functions,
related models/brands, technologies and applications
The document provides an overview of X-ray Photoelectron Spectroscopy (XPS) as a surface analysis technique. It describes how XPS works based on the photoelectric effect, and how it can be used to identify elements, chemical states, and compounds present on material surfaces. The key components of an XPS instrument are also outlined.
X-Ray photoelectron spectroscopy, XPS was used to investigate the chemistry at the surface of the samples. The basic mechanism behind an XPS instrument is that the photons of a specific energy are used to excite the electronic states of atoms at and just below the surface of the sample.
There are several areas suited to measurement by XPS:
1. Elemental composition
2. Empirical formula determination
3. Chemical state
4. Electronic state
5. Binding energy
6. Layer thickness in the upper portion of surfaces
XPS has many advantages, such as it is is good for identifying all but two elements, identifying the chemical state on surfaces, and is good with quantitative analysis. XPS is capable of detecting the difference in chemical state between samples. XPS is also able to differentiate between oxidations states of molecules.
XPS has also some limitations, for instance, samples for XPS must be compatible with the ultra high vacuum environment. XPS is limited to measurements of elements having atomic numbers of 3 or greater, making it unable to detect hydrogen or helium. XPS spectra also take a long time to obtain. The use of a monochromator can also reduce the time per experiment.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject electrons from a material's surface and measure their kinetic energy to determine the elemental composition and chemical states. Kai Siegbahn developed XPS in the 1950s and won the Nobel Prize for his work. A study used XPS to analyze the surface chemistry of langasite crystals before and after vacuum annealing, finding that higher-temperature annealing reduced the surface concentration of gallium. XPS provides quantitative and chemical state information from the top 10-100 Angstroms of a surface.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject core electrons from the surface of a material. The kinetic energy of the ejected electrons is measured to identify the elemental composition of the outermost layers of the material. XPS is based on the photoelectric effect discovered by Einstein and was developed in the 1960s by Kai Siegbahn and his research group. It functions under ultra-high vacuum and allows identifying elements, chemical states, and empirical formulas of the top 1-10 nm of materials.
XPS can be used to characterize polymers at the surface. It provides both elemental and chemical information about the top 10 nm of a sample. Elemental identification and quantification is possible from survey spectra. High resolution region spectra can identify functional groups and chemical environments through chemical shifts. XPS can map the distribution of elements and chemical states across a sample surface. Depth profiling with cluster ion beams maintains chemical information during sputtering and allows buried layers and interfaces to be analyzed. XPS was used to characterize a fluoropolymer coating on PET and PTFE, identifying the chemical structure and confirming it matched the expected structure from the plasma deposition process.
Auger electron spectroscopy (AES) is an analytical technique used to analyze the surface chemistry of materials. It works by (1) removing a core electron from the sample using a high-energy electron beam, (2) causing an electron to fill the resulting vacancy and emit an Auger electron, and (3) analyzing the kinetic energy of the emitted Auger electrons to determine the elemental composition of the top 1-10 nanometers of the sample surface. AES can also be used to create depth profiles by combining it with argon ion sputtering to sequentially remove layers from the surface. Typical applications of AES include analyzing thin film layers, surface oxides, and corrosion processes.
Xps (x ray photoelectron spectroscopy)Zaahir Salam
The document provides an overview of X-ray photoelectron spectroscopy (XPS) technology. XPS works by irradiating a sample surface with x-rays and measuring the kinetic energy and number of electrons that escape from the top 1-10 nm of the material. This allows one to determine the sample's elemental composition and chemical/electronic states. Key aspects discussed include the use of ultra-high vacuum conditions to prevent surface contamination and allow for accurate analysis. Characteristic XPS spectra are produced that contain peaks corresponding to different elemental binding energies.
Instrumentation presentation - Auger Electron Spectroscopy (AES)Amirah Basir
Group 5-AES
Normaizatul Hanissa Binti Hamdan
Amirah Binti Basir
-Introduction/Backgroud /History, fundamental/basic principle and
elaboration of the principle, related pictures, related
equations/expressions/derivations, components and it functions,
related models/brands, technologies and applications
The document provides an overview of X-ray Photoelectron Spectroscopy (XPS) as a surface analysis technique. It describes how XPS works based on the photoelectric effect, and how it can be used to identify elements, chemical states, and compounds present on material surfaces. The key components of an XPS instrument are also outlined.
X-Ray photoelectron spectroscopy, XPS was used to investigate the chemistry at the surface of the samples. The basic mechanism behind an XPS instrument is that the photons of a specific energy are used to excite the electronic states of atoms at and just below the surface of the sample.
There are several areas suited to measurement by XPS:
1. Elemental composition
2. Empirical formula determination
3. Chemical state
4. Electronic state
5. Binding energy
6. Layer thickness in the upper portion of surfaces
XPS has many advantages, such as it is is good for identifying all but two elements, identifying the chemical state on surfaces, and is good with quantitative analysis. XPS is capable of detecting the difference in chemical state between samples. XPS is also able to differentiate between oxidations states of molecules.
XPS has also some limitations, for instance, samples for XPS must be compatible with the ultra high vacuum environment. XPS is limited to measurements of elements having atomic numbers of 3 or greater, making it unable to detect hydrogen or helium. XPS spectra also take a long time to obtain. The use of a monochromator can also reduce the time per experiment.
Surface modification can be used to alter
or improve these characteristics, and so
surface analysis is used to understand
surface chemistry of material, and
investigate the efficacy of surface
engineering. From non-stick cookware
coatings to thin-film electronics and bioactive
surfaces, X-ray photoelectron
spectroscopy is one of the standard
tools for surface characterization.
X-ray photoelectron spectroscopy (XPS) or Electron spectroscopy for chemical analysis (ESCA) is used to investigate the chemistry at the surface of the samples. The basic mechanism behind an XPS instrument is that the photons of a specific energy are used to excite the electronic states of atoms at and just below the surface of the sample.
There are several areas suited to measurement by XPS:
1. Elemental composition
2. Empirical formula determination
3. Chemical state
4. Electronic state
5. Binding energy
6. Layer thickness in the upper portion of surfaces
XPS has many advantages, such as it is is good for identifying all but two elements, identifying the chemical state on surfaces, and is good with quantitative analysis. XPS is capable of detecting the difference in the chemical state between samples. XPS is also able to differentiate between oxidations states of molecules.
XPS has also some limitations, for instance, samples for XPS must be compatible with the ultra high vacuum environment. XPS is limited to measurements of elements having atomic numbers of 3 or greater, making it unable to detect hydrogen or helium. XPS spectra also take a long time to obtain. The use of a monochromator can also reduce the time per experiment.
This document provides information about a scanning tunneling microscope (STM) including its basic operating principles, design, modes of operation, applications, and related imaging techniques. The STM works by using the quantum tunneling effect to measure electric currents between a sharp tip and conductive sample surface. This allows it to image surfaces at the atomic level with high resolution. The document outlines the key components of an STM including the sample, scanning tip, piezoelectric scanner, and control electronics. It also describes the two main imaging modes of constant current and constant height. Common applications and examples of STM images showing atomic structures are also presented. Finally, related microscopy techniques developed from STM principles are briefly discussed.
Dielectrics are materials that have permanent electric dipole moments. They contain atoms or molecules with separated positive and negative charges. When an electric field is applied, the dipoles in dielectrics can become polarized through various processes. The main polarization processes are electronic, ionic, orientation and space charge polarization. Together they result in dielectric materials gaining an induced dipole moment and becoming polarized in the direction of an applied electric field. The dielectric constant of a material depends on its ability to polarize and is a measure of the amount of electric flux density it can sustain compared to a vacuum.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject core electrons from the surface of a sample. It can be used to identify the elements present in the sample and provide information about the chemical and electronic states of the elements. In XPS, X-rays eject core electrons, which are then analyzed based on their kinetic energy. This kinetic energy is related to the electron binding energy and can be used to identify the element and chemical environment. XPS requires ultra-high vacuum to avoid surface contamination and provide high-resolution spectra with sharp elemental peaks and broader Auger peaks.
The document describes the capabilities of an X-ray photoelectron spectroscopy (XPS) instrument called the K-Alpha XPS from Thermo Scientific. The K-Alpha provides high throughput analysis with micrometer-scale spatial resolution. It features an aluminum anode X-ray source for high chemical state resolution and a focused ion beam for sample cleaning and depth profiling. The document outlines how XPS can be used to identify elements, quantify elemental composition, and determine chemical bonding states at surfaces.
The document discusses the Auger process and Auger electron spectroscopy (AES) technique. It explains that the Auger process involves ejection of an inner shell electron by an incoming electron, followed by relaxation through emission of an Auger electron. AES can be used to identify elements on a sample surface through measurement of the kinetic energies of emitted Auger electrons. It also allows for elemental mapping, depth profiling, and quantification of elemental composition.
XPS is a surface-sensitive technique that uses X-rays to eject electrons from a material's surface and measure their kinetic energy. This provides information about the material's elemental composition, chemical state, and electronic structure within the top 10-100 angstroms. XPS works based on the photoelectric effect - X-rays eject core level electrons, and the electron binding energy is determined from the kinetic energy measurement and known X-ray energy. Each element produces characteristic peaks allowing identification. Chemical shifts provide information about chemical environment. XPS is widely used for materials characterization and analysis of thin films, corrosion, polymers, and more.
This document provides an overview of X-ray fluorescence (XRF) spectroscopy. It discusses XRF theory, instrumentation, hardware, and applications. XRF uses X-rays to excite a sample, and a detector then measures the fluorescent X-rays emitted from the sample that are characteristic of its elemental composition. The document compares wavelength dispersive XRF and energy dispersive XRF, and describes the components of XRF systems including X-ray sources, detectors, filters, and electronics. It provides examples of XRF applications in qualitative and quantitative elemental analysis across various industries.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject electrons from the surface of a material. An XPS instrument measures the kinetic energy of the ejected electrons to identify the elements present and analyze the chemical and electronic states of the surface. XPS can analyze the top 10-100 angstroms of a material in an ultra-high vacuum environment. The technique works by measuring the binding energy of electrons ejected from a material by X-ray photons, each element has characteristic binding energies that can be used for identification and analysis of oxidation states or impurities in the surface.
This document discusses the chemistry of nanoscale materials including their synthesis, properties, and applications. Key points include:
- Nanoparticles exhibit unusual properties due to their small size such as changes in melting points, optical properties, and surface reactivity.
- Semiconductor nanoparticles known as quantum dots exhibit quantum confinement effects which alter their band gap.
- Common synthetic methods for nanoparticles include chemical reduction, sonochemistry, and electrochemical routes. Stabilization is needed to prevent aggregation.
- Dendrimers can template the synthesis of metal nanoclusters within their cores. Monitoring by UV-vis spectroscopy allows observation of cluster formation.
This document provides an overview of electron spectroscopy techniques, including X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and ultraviolet photoelectron spectroscopy (UPS). It discusses the basic principles, instrumentation, applications, and advantages/limitations of each technique. XPS is described as using X-rays to eject core electrons and measure their kinetic energy to determine elemental composition. AES uses electrons to eject core electrons which cause additional electrons to fall into the vacancy, emitting energy measured to identify elements. UPS uses UV light to eject valence electrons and measure their kinetic energy to determine molecular orbital energies.
X-Ray Photoelectron Spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject electrons from the surface of a sample. An XPS instrument measures the kinetic energy of these ejected electrons to identify the elements present and the chemical and electronic states of the surface. XPS provides information only about the top 10-100 angstroms of the sample surface and requires ultra-high vacuum to prevent contamination. The technique produces characteristic peaks in spectra that can be matched to elemental binding energies to determine sample composition.
Raman spectroscopy analyzes the scattering of electromagnetic radiation by molecules and materials. It can provide information about molecular vibrations, rotations, and bond characteristics. Raman spectra contain peaks corresponding to Stokes lines at lower frequencies and anti-Stokes lines at higher frequencies relative to the incident radiation. Rotational Raman spectroscopy of linear molecules follows selection rules of ΔJ = 0, ±2. Vibrational Raman spectroscopy requires a change in molecular polarizability during vibration.
This document discusses low-energy electron diffraction (LEED), a technique used to determine the surface structure of single-crystalline materials. LEED works by bombarding a sample's surface with a low-energy electron beam and observing the diffraction pattern of scattered electrons on a fluorescent screen. The key components of a LEED system are an electron gun, sample holder, and detector. LEED provides structural information about a sample's surface and has the advantages of being relatively simple and highly surface sensitive, but requires an ultra-high vacuum environment and thin sample specimens.
Rutherford Backscattering Spectrometry: A Laboratory Didactic Path About the ...SEENET-MTP
The SEENET-MTP Seminar: Trends in Modern Physics
19–21 August 2011, Niš, Serbia
Talk by Frederico Corni, Faculty of Education, University of Modena аnd Reggio Emilia, Italy
Scanning electron microscopy (SEM) uses a focused beam of electrons to generate high-resolution images of surfaces. The document provides an overview of SEM, including its principles, components, electron-sample interactions, and techniques like energy-dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBSD) for analyzing samples. Key points covered include how SEM works at higher resolutions than light microscopes, the various signals generated from electron-sample interactions that provide information about topology and composition, and operational parameters that influence resolution and image quality.
Neutron diffraction is the application of neutron scattering to the determination of atomic/ magnetic structure of a material. The technique is similar to XRD but the different type of radiation gives complementary radiation. It is of different types and overcomes the demerit of XRD. It has a lot of applications such as structure determination, locating light atoms, magnetic properties study, study of atomic vibration and other excitations.
X ray photoelectron spectroscopy (xps) iit kgpak21121991
The document provides an overview of X-ray photoelectron spectroscopy (XPS) and its applications in analyzing semiconductor devices and materials. It discusses how XPS can be used to determine elemental composition, chemical state and electronic state. Examples are given of how XPS has been used to analyze metal-insulator-semiconductor contacts, high-k dielectric films, titanium dioxide structures, molybdenum disulfide, aluminum oxide thin films and nickel silicide. Both XPS and ultraviolet photoelectron spectroscopy are discussed. In summary, the document outlines the capabilities of XPS and gives several examples of its use in characterizing semiconductor materials and devices.
Breve descrição sobre a técnica de microtomografia de raios X e o modelo de microtomógrafo adquirido pelo Laboratório Nacional de Nanotecnologia (LNNano)
Surface modification can be used to alter
or improve these characteristics, and so
surface analysis is used to understand
surface chemistry of material, and
investigate the efficacy of surface
engineering. From non-stick cookware
coatings to thin-film electronics and bioactive
surfaces, X-ray photoelectron
spectroscopy is one of the standard
tools for surface characterization.
X-ray photoelectron spectroscopy (XPS) or Electron spectroscopy for chemical analysis (ESCA) is used to investigate the chemistry at the surface of the samples. The basic mechanism behind an XPS instrument is that the photons of a specific energy are used to excite the electronic states of atoms at and just below the surface of the sample.
There are several areas suited to measurement by XPS:
1. Elemental composition
2. Empirical formula determination
3. Chemical state
4. Electronic state
5. Binding energy
6. Layer thickness in the upper portion of surfaces
XPS has many advantages, such as it is is good for identifying all but two elements, identifying the chemical state on surfaces, and is good with quantitative analysis. XPS is capable of detecting the difference in the chemical state between samples. XPS is also able to differentiate between oxidations states of molecules.
XPS has also some limitations, for instance, samples for XPS must be compatible with the ultra high vacuum environment. XPS is limited to measurements of elements having atomic numbers of 3 or greater, making it unable to detect hydrogen or helium. XPS spectra also take a long time to obtain. The use of a monochromator can also reduce the time per experiment.
This document provides information about a scanning tunneling microscope (STM) including its basic operating principles, design, modes of operation, applications, and related imaging techniques. The STM works by using the quantum tunneling effect to measure electric currents between a sharp tip and conductive sample surface. This allows it to image surfaces at the atomic level with high resolution. The document outlines the key components of an STM including the sample, scanning tip, piezoelectric scanner, and control electronics. It also describes the two main imaging modes of constant current and constant height. Common applications and examples of STM images showing atomic structures are also presented. Finally, related microscopy techniques developed from STM principles are briefly discussed.
Dielectrics are materials that have permanent electric dipole moments. They contain atoms or molecules with separated positive and negative charges. When an electric field is applied, the dipoles in dielectrics can become polarized through various processes. The main polarization processes are electronic, ionic, orientation and space charge polarization. Together they result in dielectric materials gaining an induced dipole moment and becoming polarized in the direction of an applied electric field. The dielectric constant of a material depends on its ability to polarize and is a measure of the amount of electric flux density it can sustain compared to a vacuum.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject core electrons from the surface of a sample. It can be used to identify the elements present in the sample and provide information about the chemical and electronic states of the elements. In XPS, X-rays eject core electrons, which are then analyzed based on their kinetic energy. This kinetic energy is related to the electron binding energy and can be used to identify the element and chemical environment. XPS requires ultra-high vacuum to avoid surface contamination and provide high-resolution spectra with sharp elemental peaks and broader Auger peaks.
The document describes the capabilities of an X-ray photoelectron spectroscopy (XPS) instrument called the K-Alpha XPS from Thermo Scientific. The K-Alpha provides high throughput analysis with micrometer-scale spatial resolution. It features an aluminum anode X-ray source for high chemical state resolution and a focused ion beam for sample cleaning and depth profiling. The document outlines how XPS can be used to identify elements, quantify elemental composition, and determine chemical bonding states at surfaces.
The document discusses the Auger process and Auger electron spectroscopy (AES) technique. It explains that the Auger process involves ejection of an inner shell electron by an incoming electron, followed by relaxation through emission of an Auger electron. AES can be used to identify elements on a sample surface through measurement of the kinetic energies of emitted Auger electrons. It also allows for elemental mapping, depth profiling, and quantification of elemental composition.
XPS is a surface-sensitive technique that uses X-rays to eject electrons from a material's surface and measure their kinetic energy. This provides information about the material's elemental composition, chemical state, and electronic structure within the top 10-100 angstroms. XPS works based on the photoelectric effect - X-rays eject core level electrons, and the electron binding energy is determined from the kinetic energy measurement and known X-ray energy. Each element produces characteristic peaks allowing identification. Chemical shifts provide information about chemical environment. XPS is widely used for materials characterization and analysis of thin films, corrosion, polymers, and more.
This document provides an overview of X-ray fluorescence (XRF) spectroscopy. It discusses XRF theory, instrumentation, hardware, and applications. XRF uses X-rays to excite a sample, and a detector then measures the fluorescent X-rays emitted from the sample that are characteristic of its elemental composition. The document compares wavelength dispersive XRF and energy dispersive XRF, and describes the components of XRF systems including X-ray sources, detectors, filters, and electronics. It provides examples of XRF applications in qualitative and quantitative elemental analysis across various industries.
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject electrons from the surface of a material. An XPS instrument measures the kinetic energy of the ejected electrons to identify the elements present and analyze the chemical and electronic states of the surface. XPS can analyze the top 10-100 angstroms of a material in an ultra-high vacuum environment. The technique works by measuring the binding energy of electrons ejected from a material by X-ray photons, each element has characteristic binding energies that can be used for identification and analysis of oxidation states or impurities in the surface.
This document discusses the chemistry of nanoscale materials including their synthesis, properties, and applications. Key points include:
- Nanoparticles exhibit unusual properties due to their small size such as changes in melting points, optical properties, and surface reactivity.
- Semiconductor nanoparticles known as quantum dots exhibit quantum confinement effects which alter their band gap.
- Common synthetic methods for nanoparticles include chemical reduction, sonochemistry, and electrochemical routes. Stabilization is needed to prevent aggregation.
- Dendrimers can template the synthesis of metal nanoclusters within their cores. Monitoring by UV-vis spectroscopy allows observation of cluster formation.
This document provides an overview of electron spectroscopy techniques, including X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and ultraviolet photoelectron spectroscopy (UPS). It discusses the basic principles, instrumentation, applications, and advantages/limitations of each technique. XPS is described as using X-rays to eject core electrons and measure their kinetic energy to determine elemental composition. AES uses electrons to eject core electrons which cause additional electrons to fall into the vacancy, emitting energy measured to identify elements. UPS uses UV light to eject valence electrons and measure their kinetic energy to determine molecular orbital energies.
X-Ray Photoelectron Spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject electrons from the surface of a sample. An XPS instrument measures the kinetic energy of these ejected electrons to identify the elements present and the chemical and electronic states of the surface. XPS provides information only about the top 10-100 angstroms of the sample surface and requires ultra-high vacuum to prevent contamination. The technique produces characteristic peaks in spectra that can be matched to elemental binding energies to determine sample composition.
Raman spectroscopy analyzes the scattering of electromagnetic radiation by molecules and materials. It can provide information about molecular vibrations, rotations, and bond characteristics. Raman spectra contain peaks corresponding to Stokes lines at lower frequencies and anti-Stokes lines at higher frequencies relative to the incident radiation. Rotational Raman spectroscopy of linear molecules follows selection rules of ΔJ = 0, ±2. Vibrational Raman spectroscopy requires a change in molecular polarizability during vibration.
This document discusses low-energy electron diffraction (LEED), a technique used to determine the surface structure of single-crystalline materials. LEED works by bombarding a sample's surface with a low-energy electron beam and observing the diffraction pattern of scattered electrons on a fluorescent screen. The key components of a LEED system are an electron gun, sample holder, and detector. LEED provides structural information about a sample's surface and has the advantages of being relatively simple and highly surface sensitive, but requires an ultra-high vacuum environment and thin sample specimens.
Rutherford Backscattering Spectrometry: A Laboratory Didactic Path About the ...SEENET-MTP
The SEENET-MTP Seminar: Trends in Modern Physics
19–21 August 2011, Niš, Serbia
Talk by Frederico Corni, Faculty of Education, University of Modena аnd Reggio Emilia, Italy
Scanning electron microscopy (SEM) uses a focused beam of electrons to generate high-resolution images of surfaces. The document provides an overview of SEM, including its principles, components, electron-sample interactions, and techniques like energy-dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBSD) for analyzing samples. Key points covered include how SEM works at higher resolutions than light microscopes, the various signals generated from electron-sample interactions that provide information about topology and composition, and operational parameters that influence resolution and image quality.
Neutron diffraction is the application of neutron scattering to the determination of atomic/ magnetic structure of a material. The technique is similar to XRD but the different type of radiation gives complementary radiation. It is of different types and overcomes the demerit of XRD. It has a lot of applications such as structure determination, locating light atoms, magnetic properties study, study of atomic vibration and other excitations.
X ray photoelectron spectroscopy (xps) iit kgpak21121991
The document provides an overview of X-ray photoelectron spectroscopy (XPS) and its applications in analyzing semiconductor devices and materials. It discusses how XPS can be used to determine elemental composition, chemical state and electronic state. Examples are given of how XPS has been used to analyze metal-insulator-semiconductor contacts, high-k dielectric films, titanium dioxide structures, molybdenum disulfide, aluminum oxide thin films and nickel silicide. Both XPS and ultraviolet photoelectron spectroscopy are discussed. In summary, the document outlines the capabilities of XPS and gives several examples of its use in characterizing semiconductor materials and devices.
Breve descrição sobre a técnica de microtomografia de raios X e o modelo de microtomógrafo adquirido pelo Laboratório Nacional de Nanotecnologia (LNNano)
This document provides an overview of X-ray diffraction presented by Archana. It discusses the discovery of X-rays, the generation of X-rays, Bragg's law which describes the diffraction of X-rays by crystals, and the instrumentation used including X-ray sources, monochromators, detectors. It also describes different X-ray diffraction methods such as Laue, Bragg, rotating crystal and powder methods and their applications in determining crystal structures and lattice parameters.
EUROMAT 2013 - Tutorial on Helium Ion MicroscopyGiulio Lamedica
The document discusses Helium Ion Microscopy (HIM) and its applications in nanotechnology. Some key points:
1. HIM offers superior resolution to electron microscopy due to the particle-like nature of helium ions which have extremely small diffraction effects. This allows for sub-nanometer probe sizes.
2. HIM provides highly surface sensitive imaging as secondary electrons are generated within only a few nanometers of the sample surface.
3. The helium ion beam can be used for nanofabrication applications such as milling, lithography and etching due to its ability to remove material with high precision from within a few nanometers of the beam impact point.
4. Examples
The document discusses common scenarios for working with XPS (XML Paper Specification) documents, including printing XPS documents with or without access to print tickets, loading and serializing XPS documents using different techniques like deferred loading and the package store, and processing XPS documents through actions like displaying, signing, merging, and generating thumbnails. It highlights developer choices and risks of common mistakes when working with XPS.
The document summarizes a study that used synchrotron X-ray diffraction (XRD) and X-ray absorption spectroscopy (EXAFS) to characterize the local atomic structure of nickel-carbon catalyst materials with varying nickel concentrations (5-44% nickel). XRD showed different crystalline phases present before and after electrochemical treatment. EXAFS identified three structural regions - "Low" (5% Ni, large Ni-C bonds), "Medium" (11-24% Ni, mixture of Ni-Ni, Ni-C bonds), and "High" (35-44% Ni, crystalline Ni3C phase). The "High" Ni samples changed most after treatment, dissolving the Ni3C phase, while
This document describes how synchrotron-based X-ray spectroscopy techniques like XANES and STXM can provide insights into structure-performance relationships in battery materials to enable faster optimization. These techniques allow mapping of local chemistry, bonding structure, and phase distributions. Studies have shown how surface coatings and composite designs can influence properties like conductivity and stability. Chemical mapping of electrodes also revealed non-uniform reactions related to "hot spots" that correlate with performance. Faster screening of materials and correlation of structural properties with electrochemical data could significantly reduce battery development timelines.
This document discusses X-ray diffraction (XRD) spectroscopy and provides examples of applying XRD principles to characterize different materials. It describes the basic principles of how XRD works using Bragg's law and Miller indices to identify crystal planes. Examples are given for characterizing silver nanoparticles, graphite, graphene oxide, and zinc oxide nanoparticles using XRD, including estimating particle sizes from XRD peak widths and identifying functional groups from infrared spectroscopy. References are also provided for further reading.
Photoelectron spectroscopy
- a single photon in/ electron out process
• X-ray Photoelectron Spectroscopy (XPS)
- using soft x-ray (200-2000 eV) radiation to
examine core-levels.
• Ultraviolet Photoelectron Spectroscopy (UPS)
- using vacuum UV (10-45 eV) radiation to
examine valence levels.
X-ray diffraction is a technique used to characterize nanomaterials by analyzing the diffraction patterns produced when X-rays interact with the crystal structure of a material. The document discusses the history, principles, instrumentation, and applications of XRD. It describes how XRD can be used to determine properties like crystallite size, dislocation density, strain, and identify crystalline phases by comparing to known standards. XRD provides a non-destructive way to analyze crystal structures with high accuracy and is suitable for both powder and thin film samples.
This document provides an overview of x-ray diffraction (XRD) and how it can be used to analyze crystalline materials. It discusses how XRD works based on Bragg's law and diffraction of x-rays by crystal lattice planes. The document also describes how an XRD pattern acts as a "fingerprint" that can be used to identify unknown crystalline phases. Finally, it lists several applications of XRD such as qualitative and quantitative analysis of materials, determining crystal orientations, and measuring properties like crystallite size and thin film thickness.
This document provides an overview of X-ray diffraction (XRD). It begins with a brief introduction and description of the basic components and operating procedure for an XRD machine. It then discusses the shut down procedure and how to analyze an XRD pattern, including identifying the significance of peaks and applications of XRD. Key applications mentioned are identifying crystalline phases, determining structural properties, and measuring thin film thickness. References for further reading are also provided.
X-ray diffraction is a technique used to determine the atomic and molecular structure of crystals. When an X-ray beam hits a crystal, the beam diffracts into specific directions based on the atomic planes in the crystal. Bragg's law describes the diffraction pattern and is used to explain the angles and wavelengths of the diffracted X-rays. To collect diffraction data, crystals are mounted on a goniometer and bombarded with X-rays while being rotated, producing a diffraction pattern. The pattern can then be analyzed to determine information about the crystal structure like lattice parameters and atomic arrangement.
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Secondary Ion Mass Spectrometry (SIMS) uses a beam of high energy ions to bombard a solid surface, causing ejection of secondary ions. A mass spectrometer then analyzes the mass-to-charge ratios of these secondary ions to identify sample composition. SIMS can perform both qualitative and quantitative analysis with high sensitivity down to parts-per-million or billion. It is commonly used for depth profiling of dopants and contaminants in semiconductors with excellent depth resolution. SIMS operates in three main modes - static SIMS for minimal surface alteration, imaging SIMS to map analyte distributions, and dynamic SIMS for depth profiling.
ATOMIC ABSORPTION SPECTROSCOPY by Faizan AkramFaizan Akram
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1. The document discusses using synchrotron radiation for x-ray spectroscopy techniques to study 3d transition metal oxides.
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Charge exchange and spectroscopy with isolated highly-charged ionsAstroAtom
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Flame photometry is a technique that uses the characteristic emissions of light from elements introduced into a flame to determine the concentration of certain metal ions like sodium, potassium, calcium, and lithium. It works based on the principle that elements emit light at specific wavelengths when excited in a flame. The flame photometer instrument consists of a burner to generate the flame, a nebulizer to introduce the sample, an optical system to transmit and focus the light, filters to isolate wavelengths, and a photodetector to measure light intensity and relate it to concentration. Flame photometry can be used for both qualitative and quantitative analysis of metals in samples like soils, foods, beverages, and bodily fluids.
SIMS is a technique that uses a focused primary ion beam to bombard a sample surface, emitting secondary ions that are then analyzed using mass spectrometry. It allows for highly sensitive elemental and isotopic analysis of surfaces down to parts-per-billion. SIMS can be used in either static or dynamic mode to obtain spatial or depth profiles of sample composition. While very sensitive, it is also an expensive technique. Common applications include detecting trace impurities in semiconductors and generating high-resolution maps of elemental distributions.
Analytical Spectroscopic systems
Mass Spectrometry
Atomic mass to charge ratio
Laser Raman
Spectroscopy
Molecular vibrational modes
Laser Induced
Breakdown
Spectroscopy
Atomic emission
Visible Reflectance
Spectroscopy
Reflected color
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3. Interferences can occur from spectral overlap, molecular absorption, light scattering, chemical interactions that form non-volatile compounds, and physical properties affecting atomization efficiency. Various methods such as changing operating parameters, adding chemical modifiers,
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Similar to Xps simplified 4 biosurfaces q1 webinar_draft1 (20)
1. XPS Simplified
4. Analysis of Bio-surfaces using XPS
The world leader in serving science
1
2. Webinar overview
• Introduction
• Why are we interested in surfaces?
• How XPS can assist with surface
problems?
• What is XPS?
• Theory
• Instrumentation
• What can we learn about
biosurfaces with XPS?
• Application examples
• Summary
2
3. Why are we interested in the surface of bio-materials?
• The surface of a solid is the point where it interacts with it’s environment.
• Physical, electronic and chemical properties can all depend on the first few
atomic layers of a material.
3
5. What is XPS?
• Through the photoelectric effect, core
electrons are ejected from the surface
irradiated with the X-ray beam.
• These have a characteristic kinetic
energy depending on the
element, orbital and chemical state of
the atom
EBE = hn - EKE
• Layers up to ~10 nm thick can be
probed directly.
• Thicker layers can be analysed by ion
beam depth profiling
5
6. XPS instrumentation
• UHV System
• Ultra-high vacuum keeps surfaces clean Hemispherical
• Allows longer photoelectron path length analyser
• Electron analyser
• Lens system to collect photoelectrons
• Analyser to filter electron energies Detector
• Detector to count electrons
• X-ray source Ion gun
• Typically Al Ka radiation Electron transfer
• Monochromated using quartz crystal lens
• Low-energy electron flood gun
• Analysis of insulating samples
• Ion gun Mono
• Sample cleaning Flood gun crystal
• Depth profiling
• For polymers, cluster ion sources may be required
X-ray source
6
7. Application examples
• What can we learn about biosurfaces
with XPS?
• Depth profiling sensitive layers
• Amino acid biosensor
• Contact lens analysis
• Ultra-thin film analysis
• Using angle resolved XPS
• Catheter polymer coating
• Self-assembled monolayer
characterisation
7
8. XPS depth profiling
XPS depth profiling
XPS is extremely surface sensitive
Signals are observed from <10nm into the
sample
Many features of interest lie deeper into
sample
Layers of up to a few microns thickness are
common
There may be buried layers
The interfaces between these layers are often
of interest
8
9. XPS depth profiling
XPS depth profiling
How can we access the deeper layers for
analysis?
By progressively removing the material from
the surface and performing XPS analysis at
each step
Data collected after each etch period of milling
Monatomic argon ion (Ar+) beam milling is the
most common method, but can damage
chemistry of the remaining surface, especially
polymers
New Ar gas cluster ion sources minimise
chemical damage after sputtering – very useful
for biosurfaces
9
10. Cluster ions v monatomic ions
Monatomic ion beam Cluster ion beam
10
11. Monatomic v cluster profiling Cleaning polyimide
• Many polymers cannot be sputtered with monatomic argon
• Chemical information is destroyed & composition is modified
• C1s spectra shown for ion beam etched Kapton
Kapton4 keV clusters Kaptonmonatomic Ar+
C-O
C-C
N-C=O
C-N
Shake-up
296 292 288 284 280 296 292 288 284 280
Binding Energy (eV) Binding Energy (eV)
11
12. MAGCIS – Monatomic and Gas Cluster Ion Source
Cluster
Electrical Gas inlet
connections Skimmers
Nozzle
Ionization region
Monatomic
gas inlet
Focus & Mass selection
scanning
electrodes
12
13. 1. Amino acid multilayers for biosensor development
Biosensor applications of amino acid
multilayer films
Amino acid multilayer studied in this work
Multilayer of phenylalanine (Phe) and tyrosine (Tyr)
Films deposited by thermal evaporation
Schematic of expected structure of
amino acid multilayer
Phenylalanine (Phe)
Tyrosine (Tyr)
13
14. Amino acid multilayers Phe and Tyr references
Measured Expected Measured Expected
At% At% At% At%
Measured as received surface composition
Element Tyr Tyr Phe Phe is as expected for Tyr and Phe
C 69.67 69.23 74.05 75.00
O 21.62 23.08 15.85 16.67
N 8.71 7.69 10.11 8.33
Elemental quantification table
C1s
Tyr
O1s
N1s
CAuger OAuger
NAuger
1300 1200 1100 1000 900 800 700 600 500 400 300 200 100 0
Phe
Binding Energy (eV)
14
15. Amino acid multilayers Phe and Tyr references
Chemical analysis of amino acid films Phenylalanineas received
XPS is chemically sensitive
Spectrum of phenylalanine shows components due Aromatic
to aromatic ring, C-C-NH2 and OH-C=O groups
Quantitative chemical & elemental analysis
Observed At% Expected At%
Caromatic 53.34 50.00
CCCNH2 13.18 16.67
CCO2H 7.47 8.33
N 10.13 8.33
O 15.88 16.67 C-CNH2
Elemental quantification table
CO2H
p-p* shake-ups
298 296 294 292 290 288 286 284 282 280
Binding Energy (eV)
15
16. Amino acid multilayers Phe and Tyr references
Chemical analysis of amino acid films Tyrosineas received
XPS is chemically sensitive
Addition of a single OH group to phenyl ring shows Aromatic
clearly in hi-resolution C1s spectrum
XPS can easily chemically resolve carbon bonding
environments in Phe and Tyr
Aromatic-OH
Observed At% Expected At% and C-CNH2
Caromatic 40.50 38.46
CCCNH2 22.47 23.08
CCO2H 6.70 7.69
N 8.71 7.69
O 21.62 23.08
Elemental quantification table
CO2H
p-p* shake-up
296 292 288 284 280
Binding Energy (eV)
16
17. Amino acid multilayers Phe and Tyr references
Chemical analysis of amino acid films Pheas received and Tyras received
Oxygen chemical analysis
High energy resolution O1s spectra allow extra OH
group in Tyr to be tracked and quantified
Ratio of “red:blue” components in Tyr is Tyr
measured at 2:1, as expected
Small amount of “contaminant” oxygen in Phe O1s
spectrum
Phe
542 540 538 536 534 532 530 528 526
Binding Energy (eV)
17
18. Amino acid multilayers Profiling of amino acid films
Profiling of amino acid films
Amino acid films cannot be sputtered with
monatomic argon
Chemical information is destroyed & composition is
strongly modified
Cannot observe expected layer structure
Elemental composition strongly modified
Chemical information is destroyed
p-p* shake-up
disappears
Elemental profile of amino acid layers with 200eV
monatomic Ar+ beam
C1s spectra from monatomic Ar+ profile of amino acid layers
18
19. Amino acid multilayers Tyrosine reference
Profiling of Tyr films MAGCIS cluster profile of Tyr on Si
Chemical stability of Tyr during argon cluster 70
C
profiling
Chemistry of Tyr film NOT destroyed by cluster 60
profiling
50
Atomic percent (%)
40
30
p-p* peak O
retained
20
Depth Si
25nm 10 N
15nm
0 nm
0
0 10 20 30 40 50
Etch Depth (nm)
C1s spectra during profile
19
20. Amino acid multilayers Intact multilayer
Profiling of amino acid multilayer
Expected structure of multilayer 80
Alternating Phe/Tyr layers, with layer of Phe on top
surface and 3 Tyr layers 70
All three Tyr layers observed C
60 OPhe&Tyr
Quantification change between Phe and Tyr as
expected OTyr
Atomic percent (%)
50
N
Slight increase in carbon signal over 300nm depth
Si
(1.2 At%)
40
Chemical resolution of Phe and Tyr oxygen
throughout profile
30
Reasonable stability on OTyr quantification
Depth resolution on last Tyr layer slightly degraded 20
10
0
0 100 200 300 400
Etch Depth (nm)
MAGCIS cluster profile of intact amino acid multilayer
20
21. Amino acid multilayers Damaged multilayer
Profiling of amino acid multilayer
Expected structure of multilayer
Alternating Phe/Tyr layers, with layer of Phe on top 70
surface and 3 Tyr layers
Top Phe layer not observed 60
C
Damaged BEFORE analysis OPhe&Tyr
OTyr
All three Tyr layers observed 50
Atomic percent (%)
N
Quantification change between Phe and Tyr as Si
expected 40
Slight increase in carbon signal over 300nm depth
(1.2 At%) 30
Chemical resolution of Phe and Tyr oxygen
throughout profile 20
Excellent stability on OTyr quantification
10
0
0 500 150 250 350
Etch Depth (nm)
MAGCIS cluster profile of damaged amino acid multilayer
21
22. 2. Batch analysis – contact lens coating thickness
• Disposable contact lenses are commonly
manufactured from a composite of
silicone rubber and hydrogel monomers.
• Silicone is hydrophobic, which results in
poor performance and wear comfort.
• Lenses can be plasma-coated to give
good hydrophilic properties
• The coating thickness is known to vary
depending upon the position of the lens
during the coating process
• XPS depth profiling can be used to
investigate the coating thickness
throughout a batch of lenses
22
23. Batch analysis – contact lens coating thickness
• Fluorine is in different chemical states in the
coating and the substrate, making it an excellent
marker for the coating thickness.
• The experiment is configured to use a pre-defined
peak table to process the data after
acquisition, calibrate to a thickness scale, and
export to excel
F1s Snap
500
450
400
Counts / s
350
300
250
696 694 692 690 688 686 684 682 680 678
Binding Energy (eV)
23
24. Batch analysis – contact lens coating thickness
• The final result of the experiment is a simple chart which
enables a non-expert analyst to determine trends from the data
Thickness (nm)
Lens 14
Lens 15
Lens 16
Lens 10
Lens 11
Lens 12
Lens 13
Lens 5
Lens 6
Lens 7
Lens 8
Lens 9
Lens 1
Lens 2
Lens 3
Lens 4
24
25. ARXPS - Varying the collection angle
• Information depth varies with • Spectra from thin films on
collection angle substrates are affected by the
• I = Iexp(-d/lcosq) collection angle
Varying the angle between the surface normal and the electron
analyser changes the surface sensitivity – leads to identifying the
structure and thickness of ultra-thin layers
25
26. The Parallel ARXPS Solution
• Theta Probe
• Measures Energy and Angle simultaneously
• ARXPS without tilting the sample
• Allows mapping of ultra thin film structures
26
27. 3. Catheter surface coating analysis
Live optical view from Theta Probe camera
Fluoropolymer catheter
• ARXPS from a curved, insulating surface
• Live optical view for easy alignment of sample
• Analysis area DOES NOT change as a function of photoemission angle
• Charge neutralisation conditions DO NOT change as a function of
photoemission angle
• Depth distribution of carbon bonding states
27
28. Catheter surface coating analysis
Live optical view from Theta Probe camera
Fluoropolymer catheter
• ARXPS from a curved, insulating surface
• Live optical view for easy alignment of sample
• Analysis area DOES NOT change as a function of photoemission angle
• Charge neutralisation conditions DO NOT change as a function of
photoemission angle
• Depth distribution of carbon bonding states
CF2 C1s spectrum
Depth distribution of carbon bonding states C-C
C-O
• Depth integrated carbon chemistry
• High energy resolution spectrum of C1s region shows carbon O-*C=O
C-*C=O
bonding states within total XPS sampling depth (~10 nm)
• Fluorocarbon states easily observed CF3
• Excellent resolution due to high performance charge
neutralisation system
28
29. Catheter surface coating analysis
Live optical view from Theta Probe camera
Fluoropolymer catheter
• ARXPS from a curved, insulating surface
• Live optical view for easy alignment of sample
• Analysis area DOES NOT change as a function of photoemission angle
• Charge neutralisation conditions DO NOT change as a function of
photoemission angle
• Depth distribution of carbon bonding states
ARXPS C1s spectra
Depth distribution of carbon bonding states
• Depth distribution of carbon chemistry
• ARXPS C1s spectra acquired simultaneously at all angles
• Constant charge neutralisation conditions at all angles Bulk
• Constant analysis area at all angles
• ARXPS data was peak fit with the components shown on the
previous slide to generate a Relative Depth Plot
Surface
29
30. Catheter surface coating analysis
Live optical view from Theta Probe camera
Fluoropolymer catheter
• ARXPS from a curved, insulating surface
• Live optical view for easy alignment of sample
• Analysis area DOES NOT change as a function of photoemission angle
• Charge neutralisation conditions DO NOT change as a function of
photoemission angle
• Depth distribution of carbon bonding states
Layer ordering of carbon bonding states
CF3
C-*C=O
Depth distribution of carbon bonding states
CF2
• Depth distribution of carbon chemistry
• Relative depth plot shows the layer ordering of elements and
chemical states
• Method is model independent C-C
• Instant conversion of ARXPS data into depth information
O-*C=O
C-O
30
31. 4. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Molecular orientation information and depth profile of single molecules
ASEMBLON, INC
[1] www.asemblon.com
31
32. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Molecular orientation information and depth profile of single molecules
[1] www.asemblon.com
32
33. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Molecular orientation information and depth profile of single molecules
Theta Probe ARXPS measurement
• Experimental advantages
• Data from all angles comes from same analysis point
• Imaging ARXPS is possible, allowing film uniformity
to be studied
• Rapid snapshot acquisition reduces X-ray spot dwell 3 mm
time
Imaging ARXPS of samples damaged in transit
[1] www.asemblon.com
33
34. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Molecular orientation information and depth profile of single molecules
Self-assembled
monolayer materials
Nonanethiol Hydroxy undecanethiol used in this work
Dodecanethiol 1-mercapto-11-undecyl-tri(ethylene glycol)
Hexadecanethiol Images from AsemblonTM, 15340 NE 92nd Street, Suite B, Redmond, WA 98052-3521,
USA. www.asemblon.com
34
35. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Molecular orientation information and depth profile of single molecules
2.5
Non-destructive ARXPS thickness measurement 2
Layer Thickness
• Thickness as a function of organic chain length 1.5
• Film thickness measured on Theta Probe 1
• Thickness increases linearly with organic chain length 0.5
0
0 5 10 15 20
Number of Carbon Atoms
Theta Probe measured layer thickness
[1] www.asemblon.com
35
36. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Orientation information and depth profile of single molecules
Non-destructive ARXPS profile of alkanethiol on Au
100
100
Alkanethiols non-destructive depth profiles C Au
Concentration/%
80
Concentration/%
• Thickness and molecular orientation information 80
• Confirms that organic bonds to gold at sulphur 60
60
• Relative layer thickness is observed in profiles
40
40
20 S
20
0 Dodecanenanethiol
0
0 1 2
0 Depth / nm 1 2
Depth/nm
[1] www.asemblon.com Depth/nm
36
37. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Orientation information and depth profile of single molecules
Non-destructive ARXPS profile of hydroxy
undecanethiol on Au
100
100
Functionalised alkanethiols non-destructive depth Au
Concentration/%
80 CH2
Concentration/%
profiles 80
• Thickness and molecular orientation information 60
60
• Confirms that organic bonds to gold at sulphur
40
• Chemical state information is preserved 40
CH2OH
• Possible to observe CH2OH at top surface, then alkane 20
20
chain, then thiol group at Au interface S
0
0
0 1 2 3
0 Depth / nm
1 2 3
Depth/nm
[1] www.asemblon.com Depth/nm
37
38. Analysis of self-assembled monolayers
Self-assembled monolayers
• Non-destructive depth profiling of single molecule
• Self-assembled monolayers allow controlled modification of surface
properties1
• Possible application in molecular electronics and biomaterials1
• Organosulfur chemistry often used to form layers on gold
• Layer thickness as a function of organic chain length
Schematic of self-assembled monolayer
• Orientation information and depth profile of single molecules
Non-destructive ARXPS profile of 1-mercapto-11-
undecyl-tri(ethylene glycol) on Au
100
100
Functionalised alkanethiols non-destructive depth Au
Concentration/%
80 CH2
Concentration/%
profiles 80
• Thickness and molecular orientation information 60 C4H2O
60
• Confirms that organic bonds to gold at sulphur
40
• Chemical state information is preserved 40 CH2OH
• Possible to observe CH2OH at top surface, then alkane 20
chain, then thiol group at Au interface 20
0
S
0
0 1 2 3
0 Depth / nm
1 2 3
Depth/nm
[1] www.asemblon.com Depth/nm
38
40. Acknowledgements
Theta Probe
• J.J. Pireaux, P. Louette
• Laboratoire Interdisciplinaire de
Spectroscopie
Electronique, Facult´es
Universitaires Notre Dame de la
Paix, Namur, Belgium
• Dan Graham
• Assemblon Inc
• University of Washington
E250Xi
K-Alpha
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Editor's Notes
Introduce self: Hi I’m Dr Paul Mack, Senior XPS Application Specialist at Thermo Fisher ScientificThis is the 4th in a series of webinars designed to describe the important contribution that XPS surface analysis can make to the characterisation of modern materials.
In this webinar we will first discuss why it is important to be able to characterise the surfaces of polymers. Then I’ll give a brief overview of how X-ray photoelectron spectroscopy can be a key technique in performing surface analysis. The second section will discuss XPS in more detail, with a short introduction to the theoretical principals, the instrumentation required for XPS, the types of information that can be obtained, and a run through how the analysis is actually done – from loading the samples to collecting a spectrum.The final section will go through the kinds of data that can be collected and how it can be used. We’ll see how you can get both elemental and chemical composition information for the surface, and look at a couple of examples of how the XPS can be used.
So, why are we interested in the surface? The surface of a solid is the point which interacts with the external environment and other materials. Therefore the modification of surfaces can be used in a wide variety of applications to alter the performance and behaviour of a material.As the demand for high performance materials increases, so does the importance of surface engineering. Questions such as “how do you protect the surface?”, “how do layers interact?”, or, perhaps more frequently during development, “why doesn’t it work?” can all be investigated using surface analysis techniques
So what can XPS characterise, and how does it relate to today’s topic, the characterisation of polymers. The main areas would be:Elemental and chemical identification and quantification – establishing what is present at the surface of the sample, and how much of it is there.Following on from that, contaminants, both organic and inorganic can be identified.The uniformity of the surface can be investigated. This could be to identify features or patterns, but also includes the measurement of the thickness of ultra-thin filmsFinally, interfacial chemistry can be probed, by alternately removing material from the surface and measuring what remains.We’ll see how this all works in a moment, but first a quick primer on the theory and instrumentation.
This will be familiar to those of you that attended XPS Simplified #1 (those of you that didn’t, it is available to watch on demand from the Thermo Scientific Website!).First off the physics. XPS is electron spectroscopy and is often referred to as ESCA, electron spectroscopy for chemical analysis.XPS relies on the detection of electrons ejected from the surface of a material. These electrons are generated as a result of irradiation of the surface with X-rays. This is known as the photoelectric effect, discovered by Hertz in the 19th century, and explained by Einstein in a 1905 paper.The photoelectrons have a characteristic kinetic energy, which is related to the binding energy it had within the atom as shown in the equation, where the other term is the energy of the X-ray photon. The binding energy is characteristic of the element, orbital and chemical environment of the atom, and so by measuring the kinetic energy using XPS we can learn a great deal about our surface.Because of the strong interaction of electrons with solid materials, only electrons generated near the surface can escape without losing too much energy. This is the reason for the high degree of surface sensitivity of XPS.The effect of this is that all the information contained within the data is from the top 1-10nm, depending on the materials being analysed.To be able to extend the technique to thicker and multilayered samples we use XPS in combination with an Argon ion milling source.
Since XPS is a very surface sensitive technique, quite often a lot of information about a sample is buried deeper than we can measure using just XPS. Recall that the sampling depth of XPS is less than 10nm, whereas even ‘thin’ films can often be more than 1 or 2 microns in thickness. So we need a way of accessing the deeper layers
While alternative techniques can be used to measure the ‘bulk’ properties of the material, generally those techniques lose any depth information and may not provide the same level of chemical information. What is required is a way to access the information from deeper into the sample without losing the depth resolution that XPS provides. This is where XPS depth profiling comes in.With depth profiling, spectroscopy is interleaved with removing material from the surface. The data can then be analysed as before to generate an atomic concentration profile, which shows the variation in the chemistry with depth into the surface. Depths of up to a few microns can be investigated using this approach. We will show during this webinar that the material removal mechanism can affect the results obtained.
So the difference in our crater can be seen here. With the monatomic beam we have a damage zone which is similar to our analysis depth, and so our spectra are influenced as we saw before with PMMA. With the cluster ion beam, the damage zone is minimal, and does not unduly affect our analysis.
For example, here we can see a polymer which is particularly prone to damage during etching, polyimide. Following monatomic ion etching, the chemistry is significantly affected, but following cluster etching, the chemistry is maintained.
So how does the source differ. Well, firstly we need to generate some clusters. This is done by a supersonic gas expansion.Gas at high pressure is introduced behind a specially made nozzle, and expanded thorough the nozzle into a region at a much lower pressure.This expansion causes a rapid cooling of the gas, causing it to condense to form clusters. The gas continues expanding, but will collapse when it reaches a point called the Mach disc, when shockwaves from the supersonic beam will affect the beam. This is prevented by extracting the beam using a skimmer.The next section of the source is very similar to a regular ion gun. One atom in the cluster is ionised, which allows the beam to beam extracted, accelerated and focussed into the next section of the gun.The size of the cluster is selected by a mass filter (electromagnetic), and the beam is then focussed and rastered onto the sample just as it was for the monatomic beam.High pressure gas inlet 2-4 barNozzle skimmer arrangement for cluster formation.Nozzle dimensions and pressure differential will determine cluster size distribution3 stages of differential pumping required to ensure reasonable analysis chamber pressureElectron impact ionization and ion extraction stage.Magnetic sector Wien filter for cluster size collection.Final stages are similar in design to a conventional Ar ion source and are for ion beam focussing and raster.ing