X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that can be used to analyze the chemical composition and chemical state of materials. XPS works by irradiating a sample with X-rays and analyzing the kinetic energy of the emitted photoelectrons. This allows one to identify the elements present on the surface and determine the chemical environment and bonding of each element. XPS provides information down to a depth of 4-40 nm making it a useful technique for analyzing thin film and coating compositions.