Silica mesospheres were deposited on a silicon substrate to form a surface mask. Inorganic nanoparticles were deposited onto the mask and arranged during drying to form ring patterns. The mask was then removed, leaving behind only the nanoparticle rings. Atomic force microscopy was used to image the ring patterns of various inorganic nanoparticles, such as iron oxide, on the surface at high resolution. This particle lithography technique allows for the fabrication of well-defined circular arrangements of nanoparticles that could be useful for applications requiring ordered inorganic nanostructures.