1) The document describes a method for locally seeding and growing single-layer transition metal dichalcogenide (TMD) films into pre-fabricated substrate structures using chemical vapor deposition. 2) Photolithography is used to pattern holes in silicon dioxide substrates, which are then used to seed the localized growth of crystalline TMD islands. 3) Preliminary results show that TMD material grown suspended over holes exhibits higher photoluminescence intensity compared to non-suspended material, indicating suspended growth can produce higher quality material without substrate quenching effects.