Aw 105 r plasma asher descum clean,Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107

1. Proven Qualified
40 Years
AW-105R Plasma Asher Descum Clean Equipment
All specification and information here are subject to change without notice and cannot be used for purchase and facility plan. All legacy equipment trademarks belong to O.E.M.. © 2021 Allwin21 Corp. All Rights Reserved.

2. Proven Qualified
Giant Fabs/Labs
AW-105R Plasma Asher Descum Clean Equipment

3. Proven Qualified
Production
For
Compound Materials
All specification and information here are subject to change without notice and cannot be used for purchase and facility plan. All legacy equipment trademarks belong to O.E.M.. © 2021 Allwin21 Corp. All Rights Reserved.
AW-105R Plasma Asher Descum Clean Equipment

4. Originated From
The Dominant
Plasma Asher Descum Clean
of 2-6” Single Wafer in 80’s,90’s
Proven Qualified
AW-105R Plasma Asher Descum Clean Equipment

5. Proven Qualified
AW-105R Plasma Asher Descum Clean Equipment

6. Advanced Technologies
Designed with
III-V Production
in mind
AW-105R Plasma Asher Descum Clean Equipment

7. Advanced Technologies
Downsream Single Wafer Process Design
AW-105R Plasma Asher Descum Clean Equipment
Gas Inlet
Quartz Chamber
Double Plasma BaffleWafer Chuck
Interleaved Electrode
Gas Distribution Manifold

8. Advanced Technologies
AW-105R Plasma Asher Descum Clean Equipment
Downstream Single Wafer Process Design

9. Advanced Technologies
3-axis Integrated
Solid Robotic
Wafer Transfer
AW-105R Plasma Asher Descum Clean Equipment

10. Advanced Technologies
Wafer Thickness:
• 50um-1000um
• Customized
AW-105R Plasma Asher Descum Clean Equipment

11. Advanced Technologies
Industrial Grade
Computer
with Large Hard Disk
Driver
AW-105R Plasma Asher Descum Clean Equipment

12. Advanced Technologies
Touch
Screen
GUI
AW-105R Plasma Asher Descum Clean Equipment

13. Advanced Technologies
Cassette Station
with Sensors
(Optional)
AW-105R Plasma Asher Descum Clean Equipment

14. Advanced Technologies
• Fixed Cassette
Station
• Rotated Cassette
Station(Optional)
AW-105R Plasma Asher Descum Clean Equipment

15. Advanced Technologies
Center
Aligner
Function
AW-105R Plasma Asher Descum Clean Equipment

16. Advanced Technologies
Modern
Electronic
Components
AW-105R Plasma Asher Descum Clean Equipment

17. Advanced Technologies
Allwin21 Software
Process Monitor WTM
AW-105R Plasma Asher Descum Clean Equipment

18. Advanced Technologies
Allwin21 Software
Recipe Edit Factory Set Up
AW-105R Plasma Asher Descum Clean Equipment

19. Advanced Technologies
Allwin21 Software
Board Test Pressure Calibration
AW-105R Plasma Asher Descum Clean Equipment

20. Advanced Technologies
Small Footprint
AW-105R Plasma Asher Descum Clean Equipment
•Width: 27.5”
•Depth:44”
•Height:62”

21. Substrate Capability:
• 2”,3”,4”,5”,6”,6.25”
• Round
• Multiple wafer sizes without hardware change
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment

22. RF Power and RF Matching:
• 13.56 MHz
• Air Cooling
• 300W/600W
• NRTL/CE Certificated
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment

23. Temperature:
• 60-200°C
• Customized
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment
• Chiller Cooling
• Element Heating

24. Gases:
• 1-3 Gases
• MFC
• Customized. Typical Gases are O2,N2
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment

25. GEM/SEC II Function:
• Optional
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment

26. EOP Function:
• Optional
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment

27. Asher Rate Capability
•~600 A/min (Descum)
•~1.5 um/min(Asher)
•Process Support if necessary.
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment

28. Uniformity Capability
• <±5~8%
• Process Dependent
• 6” wafer
Configurations and Typical Processes
AW-105R Plasma Asher Descum Clean Equipment

29. Let’s All win in the 21st Century
Email: sales@allwin21.com
Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107
AW-105R Plasma Asher Descum Clean Equipment