Semiconductor Equipment Inventory.Please email us for more info/ the availability of these equipment. These are subject to prior sale.Appreciate your time! sales@semistarcorp.com
6. 228 EO Technics WTM200 Laser Scribe
229 ESCO Ltd. EMD-WA1000S Temperature Desorption Analyzer
230 Espec IPHH-201 Environmental Chamber
231 Espec IPHH-201 Environmental Chamber
232 Espec EGNU28-12CWL Environmental Chamber
233 Espec ESX-3CW Environmental Chamber
234
FA Systems Automation (S) Pte
Ltd. Wire Bond Inspection Wire bond inspection (3VI/3O)
235 Felicity Technology (FSE) FSE-CS-300 Evaporator Deposition Equipment
236 GDO 1862-14 Abatement - CDO Scrubber
237 GS Industry Parts Cleaner (Organic) Parts Cleaner/Dryer
238 Hamamatsu iPHEMOS-TP Electrical Failure Analysis
239 Hermes Microvision (HMI) eP3 XP E-beam Inspection
240 Hermes Microvision (HMI) eP3 XP E-beam Inspection
241 Hitachi RCF3550AZP1 Chiller/Heat Exchanger
242 Hitachi (Semiconductor) U-702 Metal Etch
243 Hitachi (Semiconductor) CG5000 SEM
244 Hitachi (Semiconductor) CG5000 SEM
245 Hitachi (Semiconductor) CG5000 SEM
246 Hitachi (Semiconductor) S-9380 II SEM - Critical Dimension (CD) Measurement
247 Hitachi (Semiconductor) RS-6000 SEM - Defect Review (DR)
248 Hitachi (Semiconductor) CG5000 SEM
249 Hitachi (Semiconductor) CG5000 SEM
250 Hitachi (Semiconductor) U-7050A Metal Etch
251 Hitachi (Semiconductor) CG-4100 SEM - Critical Dimension (CD) Measurement
252 Hitachi (Semiconductor) CG-4100 SEM - Critical Dimension (CD) Measurement
253 Hitachi (Semiconductor) CG-4100 SEM - Critical Dimension (CD) Measurement
254 HSEB Dresden GMBH Axiospect 300 Optical Review System
255 JEOL JWS-7555 SEM - Defect Review (DR)
256 kaijo KRF-300 Carrier/Pod Cleaner
257 kaijo KRF-300 Carrier/Pod Cleaner
258 kaijo KRF-300 Carrier/Pod Cleaner
259 kaijo KRF-300 Carrier/Pod Cleaner
260 kaijo KRF-300 Carrier/Pod Cleaner
261 kaijo KRF-300 Carrier/Pod Cleaner
262 kaijo KRF-300 Carrier/Pod Cleaner
263 kaijo KRF-300 Carrier/Pod Cleaner
264 Kaijo Corporation SFT-305e Batch Wafer Processing
265 Kaijo Corporation SFT-305 Batch Wafer Processing
266 Kaijo Corporation SFT-300 Batch Wafer Processing
267 Kashiyama Ind., Ltd. MU100XU Dry Pump
268 Kashiyama Ind., Ltd. MU100XU Dry Pump
269 Kashiyama Ind., Ltd. MU100XU Dry Pump
270 Kashiyama Ind., Ltd. NeoDry36C Dry Pump
271 KLA-Tencor Corp.
KLA-TENCOR DUAL SMIF
HANDLER Parts/Options
272 KLA-Tencor Corp.
KLA-TENCOR DUAL SMIF
HANDLER Parts/Options
273 KLA-Tencor Corp. Puma 9650 Darkfield Inspection
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 6 of 13 Appreciate your time! sales@semistarcorp.com
7. 274 KLA-Tencor Corp. Puma 9120 Darkfield Inspection
275 KLA-Tencor Corp. eS20XP E-beam Inspection
276 KLA-Tencor Corp. eS32 E-beam Inspection
277 KLA-Tencor Corp. eS32 E-beam Inspection
278 KLA-Tencor Corp. ASET-F5x Film Thickness Measurement System
279 KLA-Tencor Corp. ASET-F5x Film Thickness Measurement System
280 KLA-Tencor Corp. ASET-F5x Film Thickness Measurement System
281 KLA-Tencor Corp. ASET-F5x Film Thickness Measurement System
282 KLA-Tencor Corp. Archer 300 Overlay Measurement System
283 KLA-Tencor Corp. Archer 300 Overlay Measurement System
284 KLA-Tencor Corp. Archer 300 Overlay Measurement System
285 KLA-Tencor Corp. Archer XT+ Overlay Measurement System
286 KLA-Tencor Corp. Archer XT+ Overlay Measurement System
287 KLA-Tencor Corp. AIT UV Darkfield Inspection
288 KLA-Tencor Corp. AIT UV Darkfield Inspection
289 KLA-Tencor Corp. Archer 300 Overlay Measurement System
290 KLA-Tencor Corp.
KLA-TENCOR DUAL OPEN
HANDLER Parts/Options
291 KLA-Tencor Corp. SpectraCD 100 Film Thickness Measurement System
292 KLA-Tencor Corp. Puma 9130 Darkfield Inspection
293 KLA-Tencor Corp. Puma 9130 Darkfield Inspection
294 KLA-Tencor Corp. Puma 9120 Darkfield Inspection
295 Kokusai Electric Co., Ltd. Quixace II Doped Poly Vertical LPCVD Furnace
296 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
297 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
298 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
299 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
300 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
301 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
302 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
303 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
304 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
305 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
306 Kokusai Electric Co., Ltd. Quixace Nitride Vertical LPCVD Furnace
307 Kokusai Electric Co., Ltd. Quixace II ALD High-k Vertical LPCVD Furnace
308 Kokusai Electric Co., Ltd. Quixace II ALD High-k Vertical LPCVD Furnace
309 Kokusai Electric Co., Ltd. Quixace II ALD High-k Vertical LPCVD Furnace
310 Kokusai Electric Co., Ltd. Quixace II ALD High-k Vertical LPCVD Furnace
311 Kokusai Electric Co., Ltd. Quixace II Vertical Diffusion Furnace
312 Kokusai Electric Co., Ltd. Quixace II Poly Vertical LPCVD Furnace
313 Kokusai Electric Co., Ltd. Quixace II Doped Poly Vertical LPCVD Furnace
314 Kokusai Electric Co., Ltd. Quixace II Doped Poly Vertical LPCVD Furnace
315 Kokusai Electric Co., Ltd. Quixace II Doped Poly Vertical LPCVD Furnace
316 Kokusai Electric Co., Ltd. Quixace II Nitride Vertical LPCVD Furnace
317 Kokusai Electric Co., Ltd. Quixace Nitride Vertical LPCVD Furnace
318 Kulicke & Soffa Ind. Inc. (ADT) 7500 Wafer Dicing Saw
319 Kulicke & Soffa Ind. Inc. (ADT) 7500 Wafer Dicing Saw
320 Kulicke & Soffa Ind. Inc. (ADT) 7500 Wafer Dicing Saw
321 Kulicke & Soffa Ind. Inc. (ADT) 7500 Wafer Dicing Saw
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 7 of 13 Appreciate your time! sales@semistarcorp.com
8. 322 Kulicke & Soffa Ind. Inc. (ADT) 7500 Wafer Dicing Saw
323 Kulicke & Soffa Ind. Inc. (KnS) AT Premier PLUS Wire Bonder
324 LAM Research 2300e5 KIYO 45 Polysilicon Etch
325 LAM Research 2300e5 KIYO 45 Polysilicon Etch
326 LAM Research 2300e5 KIYO 45 Polysilicon Etch
327 LAM Research 2300e5 KIYO 45 Polysilicon Etch
328 LAM Research 2300e5 KIYO 45 Polysilicon Etch
329 LAM Research 2300e5 KIYO 45 Polysilicon Etch
330 LAM Research 2300e5 KIYO 45 Polysilicon Etch
331 LAM Research 2300 Exelan Flex EX Dielectric Etch
332 LAM Research 2300 Exelan Flex 45 Dielectric Etch
333 LAM Research 2300 Exelan Flex EX Dielectric Etch
334 LAM Research 2300 SELIS - Chamber Only Dielectric Etch
335 LAM Research 2300 Exelan Flex 45 Dielectric Etch
336 LAM Research 2300 Exelan Flex 45 Dielectric Etch
337 LAM Research 2300 Exelan Flex EX+ Dielectric Etch
338 LAM Research 2300 Exelan Flex EX Dielectric Etch
339 LAM Research 2300 Exelan Flex EX Dielectric Etch
340 LAM Research 2300 Exelan Flex EX+ Dielectric Etch
341 LAM Research
2300 Exelan Flex - Chamber
Only Dielectric Etch
342 LAM Research
2300 Exelan Flex - Chamber
Only Dielectric Etch
343 LAM Research
2300 Exelan Flex - Chamber
Only Dielectric Etch
344 LAM Research 2300 Exelan Flex EX+ Dielectric Etch
345 LAM Research 2300 Exelan Flex EX+ Dielectric Etch
346 LAM Research 2300 KIYO 45 Multi-Process Etch
347 LAM Research 2300 KIYO MCX Metal Etch
348 LAM Research 2300e4 KIYO MCX Metal Etch
349 LAM Research
2300 Exelan Flex - Chamber
Only Dielectric Etch
350 LAM Research 2300 Exelan Flex EX+ Dielectric Etch
351 LAM Research 2300 Exelan Flex EX+ Dielectric Etch
352 LAM Research 2300 Exelan Flex 45 Dielectric Etch
353 LAM Research 2300 Exelan Flex EX Dielectric Etch
354 LAM Research 2300 Exelan - TM Only Dielectric Etch
355 Leica Inc. INS10 Microscope
356 Leica Inc. INM20 Microscope
357 Leica Inc. LDS3300C Macro-Defect
358 Leica Inc. INS3300 Macro-Defect
359 Matheson Tri-Gas, Inc. SEMI-GAS Chemical/Gas Storage & Delivery
360 Mattson Technology, Inc. Aspen III ICPHT Stripper/Asher
361 miscellaneous furniture Office Tables and Chairs Office
362 Mitsubishi DWC-90 Wire EDM (Electrical Discharge Machine)
363 MPI Corporation LEDA P6801 LED Die Prober
364 Muratec Murata Machinery, SRC330 Wafer Stocker
365 Nanometrics Inc. Atlas II+
Critical Dimension (CD) Measurement (non
SEM)
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 8 of 13 Appreciate your time! sales@semistarcorp.com
9. 366 Nanometrics Inc. Atlas II+
Critical Dimension (CD) Measurement (non
SEM)
367 Nanometrics Inc. Atlas Film Thickness Measurement System
368 Nanometrics Inc. Atlas II+
Critical Dimension (CD) Measurement (non
SEM)
369 Nextest Systems Corporation Maverick I PT Design Verification Tester
370 Nextest Systems Corporation Maverick I PT Design Verification Tester
371 Nikon AMI-3500 Macro-Defect
372 Nikon AMI-3300 Macro-Defect
373 Nikon AMI-3300 Macro-Defect
374 Nikon OPTIPHOT 200 Microscope
375 Nikon AMI-3000 Macro-Defect
376 Nikon AMI-3000 Macro-Defect
377 Nikon AMI-3500 Macro-Defect
378 Nikon NSR-S308F 193nm (ArF) Scanner
379 Nikon OPTISTATION V Optical Review System
380 Nikon OPTISTATION V Optical Review System
381 Nikon OPTISTATION 3100 Optical Review System
382 Nikon OPTISTATION 3100 Optical Review System
383 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
384 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
385 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
386 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
387 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
388 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
389 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
390 Nissin Electric Co., Ltd. EXCEED 3000AH Mid Current Implanter
391 Nissin Electric Co., Ltd. EXCEED 2300 Mid Current Implanter
392 Nissin Electric Co., Ltd. EXCEED 2300 Mid Current Implanter
393 Nissin Electric Co., Ltd. Exceed 2300AV Mid Current Implanter
394 Nissin Electric Co., Ltd. Exceed 2300AV Mid Current Implanter
395 Nissin Electric Co., Ltd. Exceed 2300AV Mid Current Implanter
396 Novellus Systems Inc. VECTOR Express PECVD (Chemical Vapor Deposition)
397 Novellus Systems Inc. VECTOR Express PECVD (Chemical Vapor Deposition)
398 Novellus Systems Inc.
Concept Three Altus
Inflection FFWA - Chamber WCVD (Chemical Vapor Deposition)
399 Novellus Systems Inc. VECTOR Express PECVD (Chemical Vapor Deposition)
400 Novellus Systems Inc. Concept Three Altus Max EFX WCVD (Chemical Vapor Deposition)
401 Novellus Systems Inc. GAMMA 2130 Stripper/Asher
402 Novellus Systems Inc. GAMMA Express Stripper/Asher
403 Novellus Systems Inc. GAMMA Express Stripper/Asher
404 Novellus Systems Inc. GAMMA Express Stripper/Asher
405 Novellus Systems Inc. Concept Three Altus Max WCVD (Chemical Vapor Deposition)
406 Novellus Systems Inc. VECTOR SOLA UV Cure PECVD (Chemical Vapor Deposition)
407 Oxford Instruments Plasmalab 80 Plus Multi-Process Etch
408 Oxford Instruments X-Strata980 X-ray Fluorescence Spectrometer
409 P.S.K. Tech Inc. Supra IV Stripper/Asher
410 P.S.K. Tech Inc. Tigma N Stripper/Asher
411 Plasma System Corp. DES-220 Stripper/Asher
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 9 of 13 Appreciate your time! sales@semistarcorp.com
10. 412 Plasma System Corp. SA-2000 Stripper/Asher
413 Plasma-Therm I.P. Inc. 790 Etch Multi-Process Etch
414 Rasco SO3000 Gravity Feed SOC Handler
415 Rasco SO3000 Gravity Feed SOC Handler
416 RECIF Technologies SPP300 Wafer Sorter
417 RECIF Technologies SRT300 Wafer Sorter
418 RECIF Technologies SPP300 Wafer Sorter
419 RECIF Technologies SPP300 Wafer Sorter
420 RECIF Technologies SIS300 Wafer Sorter
421 ReVera RVX1000 Film Thickness Measurement System
422 ReVera RVX1000 Film Thickness Measurement System
423 ReVera RVX1000 Film Thickness Measurement System
424 Rigaku MFM310 X-ray Reflectivity (XRR)
425 Rudolph Technologies, Inc. Axi 930 Macro-Defect
426 Rudolph Technologies, Inc. Axi 930 Macro-Defect
427 Rudolph Technologies, Inc. Axi 935 Macro-Defect
428 Rudolph Technologies, Inc. ultra-II Ellipsometer
429 Rudolph Technologies, Inc. S3000A Ellipsometer
430 Rudolph Technologies, Inc. S3000A Ellipsometer
431 Rudolph Technologies, Inc. S3000A Ellipsometer
432 S.E.S. CO., LTD. BW3000X Batch Wafer Processing
433 S.E.S. CO., LTD. BW3000X Batch Wafer Processing
434 Semitool Inc. Raider SP310 Single Wafer Processing
435 SEZ Group SP323 Single Wafer Processing
436 Shibaura Engineering Works Ltd. CDE-300 Metal Etch
437 Sokudo Co., Ltd. RF-300A Multi Block (Resist Coater/Developer)
438 SRM INTEGRATION (M) Sdn. XD248 Test Handler
439 SRM INTEGRATION (M) Sdn. XD248 Test Handler
440 Standard Research Systems
SR560 — Low-noise voltage
preamplifier Parts/Peripherals
441 Sumitomo Eaton Nova (SEN) NV-GSD-HE3 High Energy Implanter
442 Sumitomo Eaton Nova (SEN) NV-GSD-HE3 High Energy Implanter
443 Sun Yang Tech Sdn Bhd AFR-01 Strip Sorter
444 Sun Yang Tech Sdn Bhd AFR-01 Strip Sorter
445 Sun Yang Tech Sdn Bhd AFR-01 Strip Sorter
446 Tecdia Inc. TEC-1228AL Wafer Breaker
447 Teikoku Taping System Co., Ltd. DXL2-800HS-BL-CE Tape Laminator
448 Tescan FERA3 XMH FE SEM
449 Tokyo Electron Limited. C355 Chiller for Cold Temp Prober
450 Tokyo Electron Limited. C355 Chiller for Cold Temp Prober
451 Tokyo Electron Ltd. Telius 305 SCCM Dielectric Etch
452 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
453 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
454 Tokyo Electron Ltd. Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition)
455 Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace - Other
456 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
457 Tokyo Electron Ltd. TELFORMULA Anneal Vertical Anneal Furnace
458 Tokyo Electron Ltd. TELFORMULA Anneal Vertical Anneal Furnace
459 Tokyo Electron Ltd. TELFORMULA Anneal Vertical Anneal Furnace
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 10 of 13 Appreciate your time! sales@semistarcorp.com
11. 460 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
461 Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace - Other
462 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
463 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
464 Tokyo Electron Ltd. Tactras Vigus Dielectric Etch
465 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
466 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
467 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
468 Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
469 Tokyo Electron Ltd. Cellesta+ Single Wafer Processing
470 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
471 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
472 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
473 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
474 Tokyo Electron Ltd. Expedius Batch Wafer Processing
475 Tokyo Electron Ltd. Telius SP-305 SCCM Dielectric Etch
476 Tokyo Electron Ltd. Telius SP-305 SCCM Dielectric Etch
477 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
478 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
479 Tokyo Electron Ltd. CLEAN TRACK LITHIUS i+ Multi Block (Resist Coater/Developer)
480 Tokyo Electron Ltd. Tactras Vigus Dielectric Etch
481 Tokyo Electron Ltd. ALPHA-303i Nitride Vertical Nitride Furnace
482 Tokyo Electron Ltd. UW200Z Batch Wafer Processing
483 Tokyo Electron Ltd. Tactras RLSA Poly Polysilicon Etch
484 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
485 Tokyo Electron Ltd. ALPHA-303i Nitride Vertical Nitride Furnace
486 Tokyo Electron Ltd. ALPHA-303i Nitride Vertical Nitride Furnace
487 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
488 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
489 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
490 Tokyo Electron Ltd. NS 300 Wafer Scrubber
491 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
492 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
493 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
494 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide Vertical LPCVD Furnace
495 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
496 Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
497 Tokyo Electron Ltd. Telius 305 DRM Dielectric Etch
498 Tokyo Electron Ltd.
Tactras Vigus RK3 - Chamber
Only Dielectric Etch
499 Tokyo Electron Ltd. CLEAN TRACK ACT 8 Single Block (Coat/Develop)
500 Tokyo Electron Ltd. CLEAN TRACK ACT 8 Multi Block (Resist Coater/Developer)
501 Tokyo Electron Ltd.
Tactras Vigus RK3 - Chamber
Only Dielectric Etch
502 Tokyo Electron Ltd. UW300Z Batch Wafer Processing
503 Tokyo Electron Ltd. Trias W - Chamber Only Metal CVD (Chemical Vapor Deposition)
504 Tokyo Electron Ltd. TELFORMULA Vertical Diffusion Furnace
505 Tokyo Electron Ltd. TELFORMULA Vertical Diffusion Furnace
506 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 11 of 13 Appreciate your time! sales@semistarcorp.com
12. 507 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
508 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
509 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
510 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
511 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
512 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
513 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
514 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
515 Tokyo Electron Ltd. Trias W MOCVD
516 Tokyo Electron Ltd. ALPHA-303i Nitride Vertical Nitride Furnace
517 Tokyo Electron Ltd. ALPHA-303i Nitride Vertical Nitride Furnace
518 Tokyo Electron Ltd. Telius 305 DRM Dielectric Etch
519 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
520 Tokyo Electron Ltd. ALPHA-303i Nitride Vertical Nitride Furnace
521 Tokyo Electron Ltd. Trias Chamber Parts/Peripherals
522 Tokyo Electron Ltd. Trias Chamber Parts/Peripherals
523 Tokyo Electron Ltd. Trias Chamber Parts/Peripherals
524 Tokyo Electron Ltd. Trias Chamber Parts/Peripherals
525 Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
526 Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
527 Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
528 Tokyo Electron Ltd. Telius 305 DRM Dielectric Etch
529 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
530 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
531 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
532 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
533 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
534 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
535 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
536 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
537 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
538 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
539 Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
540 Tokyo Electron Ltd. Trias W MOCVD
541 Tokyo Electron Ltd. Triase+ SPA Metal CVD (Chemical Vapor Deposition)
542 Tokyo Electron Ltd. CLEAN TRACK ACT 12 Single Block (Resist Coater/Developer)
543 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
544 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
545 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
546 Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
547 Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
548 Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
549 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
550 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
551 Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
552 Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace - Other
553 Tokyo Electron Ltd. NEXX Apollo Sputtering System
554 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
555 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 12 of 13 Appreciate your time! sales@semistarcorp.com
13. 556 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
557 Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
558 Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace - Other
559 Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace - Other
560 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
561 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
562 Tokyo Electron Ltd. ALPHA-303i Vertical Diffusion Furnace
563 Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
564 Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
565 Tokyo Electron Ltd. ALPHA-303i Nitride Vertical Nitride Furnace
566 Tokyo Electron Ltd. Telius SP 305 DRM Dielectric Etch
567 Tokyo Electron Ltd. (TEL) P-12XLn Production Wafer Prober
568 Tokyo Electron Ltd. (TEL) Precio Production Wafer Prober
569 Tokyo Electron Ltd. (TEL) Precio Production Wafer Prober
570 Tokyo Electron Ltd. (TEL) Precio Production Wafer Prober
571 Tokyo Electron Ltd. (TEL) Precio Production Wafer Prober
572 Tokyo Electron Ltd. (TEL) Precio Production Wafer Prober
573 Tokyo Electron Ltd. (TEL) Precio Production Wafer Prober
574 Tokyo Electron Ltd. (TEL) Precio Production Wafer Prober
575 Tokyo Electron Ltd. (TEL) P-12XL Production Wafer Prober
576 Tokyo Electron Ltd. (TEL) P-12XL Production Wafer Prober
577 Tokyo Electron Ltd. (TEL) P-12XL Production Wafer Prober
578 Tokyo Electron Ltd. (TEL) P-12XL Production Wafer Prober
579 Tokyo Electron Ltd. (TEL) P-12XL Production Wafer Prober
580 Tokyo Electron Ltd. (TEL) P-12XL Production Wafer Prober
581 Tokyo Electron Ltd. (TEL) P-12XL Production Wafer Prober
582 Tokyo Ohka Kogyo Co., Ltd. TWM8233 Fully-Automated Wafer Bonder
583 Toyota Industries Corporation T100L Dry Pump
584 Toyota Industries Corporation T-1000 Dry Pump
585 Toyota Industries Corporation T-1000 Dry Pump
586 Toyota Industries Corporation T100L Dry Pump
587 Toyota Industries Corporation T100L Dry Pump
588 Toyota Industries Corporation T100L Dry Pump
589 Toyota Industries Corporation T100L Dry Pump
590
Varian Semiconductor
Equipment Associates VIISta PLAD High Dose Implant
591
Varian Semiconductor
Equipment Associates VIISta 3000XP High Energy Implanter
592 Veeco Instruments Inc. Dimension 7000 Atomic Force Microscope (AFM)
593 Veeco Instruments Inc. Dimension X1D Atomic Force Microscope (AFM)
594 Veeco Instruments Inc. Dimension X1D Atomic Force Microscope (AFM)
595 Veeco Instruments Inc. Dimension Vx 340 Atomic Force Profiler (AFP)
596 Veeco Instruments Inc. Dimension X3D Atomic Force Microscope (AFM)
597 Verigy (Agilent) V4400 Memory Tester
598 Verigy (Agilent) V4400 Memory Tester
599 Verigy (Agilent) V4400 Memory Tester
600 Verigy (Agilent) V4400 Memory Tester
Please email us for more info/ the availability of these equipment. These are subject to prior sale.
ID-5319-0-4 13 of 13 Appreciate your time! sales@semistarcorp.com