Modular Process Technology MPT RTP-600xp Rapid Thermal Processing Serial# 95394
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Modular Process Technology MPT RTP-600xp Rapid Thermal Processing Serial# 95394: In Morgan Hill,CA USA. Subject to prior sale. Email us for more info pls.
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1) Timing closure is becoming increasingly challenging due to rising complexity in chip designs including more process variations, operational modes, and timing scenarios.
2) Traditional multi-machine signoff approaches are inefficient for advanced nodes below 28nm. A new single-machine timing closure approach enables concurrent multi-mode multi-corner analysis and layout-aware ECO optimization.
3) Tight integration of placement and routing, statistical timing analysis, and extraction allows for faster turnaround times, more accurate signoff, and reduced design margins and ECO cycles.
Allwin21 Product Brochures-Upgrade Kits-2024.5.pdf
Allwin21 Corp. has been focusing on providing solutions and enhancements to the following used semiconductor equipment. These OEM semiconductor equipment have been used in productions and R&D since 1990′s. They’ve each been PROCESS-PROVEN. Allwin21 Corp. can refurbish and/or upgrade these OEM systems with Allwin21′s comparable integrated process control system with PC, solid 3-axis robotic wafer transfer system (if applicable), and new critical components to achieve the goal of giving our customers a production edge with right cost.
We have been doing upgrade for many production proven equipment, such as Perkin-Elmer 2400, Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Matrix 105 , Matrix 106, Matrix 303, Matrix 303, Matrix 403, Matrix 205, Matrix 101, Matrix 102, Matrix 103, Matrix 104,Tegal 901e, Tegal 903e, Lam Research LAM AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Branson/IPC 2000, Branson IPC 3000, Branson/IPC 4000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Gasoncis Aura 1000, Gasonics AE 2001, AG Associates Heatpulse 610, AG Associates Heatpulse 410, AG Associates Minipulse 310, AG Associates Heatpulse 210 on the field for many cases. The reliability have been improved a lot for most of the tools after upgrading. We designed the upgrade kits for these working tools that can do plug and play and most of them only need 2 to 3 days include training. For PE sputter, since it is a little complicated, but we still target to upgrade within one week include training if the machine without other problems.
Why upgrade your old used semiconductor process equipment ?
Low cost solution of obsolete components and parts.
Use new air cooling RF generator to replace the obsolete water cooling RF Generator, avoiding water flood in Fab/Lab.
Use new integrated solid robotic wafer transfer to replace the obsolete index/frog robotic wafer transfer
Requirement of stability of the system
Requirement of network function (GEM/SECSII).
Requirement of PC control for data storage.
Requirement of GUI.
Requirement of more precise control.
Requirement of better repeatability, uniformity.
Requirement of easier maintenance, calibration, and trouble shooting.
Allwin21 Product Brochures-AWgage Metrology-2024.5.pdf
AWgage-150 measures sheet resistance in ohms per square or milliohms per square. If specific resistivity is known, the thickness of the deposited film layer can be computed from the sheet resistance. The choice of measurement data is easily get in the software. AWgage-150 can accommodate 150mm (6″) wafers as well as the standard 2″, 3″,4″, 5″ wafers without any hardware change.
Allwin21 AWgage-150 Features:
30 years proven Eddy Sheet Resistance Measurement technologies.
Non-contact Sheet Resistance Measurement technologies.
1mΩ/square to 19,990 Ω/square measurement range capability
Touch Screen Monitor and PC w/ Advanced Allwin21 control software.
Wafer carriage travel programmed with internal encoder step motor , without encoder disk.
Consistent wafer-to-wafer process cycle repeatability.
Small footprint and energy efficiency.
Made in U.S.A.
Specifications:
Test Sights: Single center-point, 5-point, or 9-point.5-9
Highly Conductive or Metal Sheet Resistance:
1 to 1,999 mΩ/square
1 to 1,999 Ω/square
Or
10 to 19,990 Ω/square
Highly Conductive or Metal Film ThicknessMinimum: 100 ÅngströmMaximum: Proportional to resistivity. Maximum for a resistivity of 2.7 mW-cm is 270 kÅ (27 mm
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Please help fill in the RFQ at our website for suitable model and configuration for your applications. Appreciate your time.
Allwin21 Corp. has been focusing on providing solutions and enhancements to Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 903e TTW,Lam AutoEtch 490 ,Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790 ,Lam Rainbow 44XX, 45XX, 46XX,47XX Series , Gasonics Aura 1000, Gasonics Aura 2000LL, Gasonics Aura 3010, Gasonics L3510 ,,Matrix 105, Matrix 105R, Matrix 205, Matrix 10 (1104, 1107, 1108), Matrix 303,Matrix 403 ,Matrix 10(1303, 1307), Branson/IPC 3000, Branson/IPC L3200 used Plasma Asher, Plasma Descum,plasma Etch, RIE semiconductor process equipment. These OEM Etch RIE semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system (Video) and new critical components to achieve the goal of giving our customers a production edge with right cost.
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Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Processing equipment. Allwin21 is manufacturing the new AccuThermo AW Series Atmospheric Rapid Thermal Processors and Vacuum Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours.
You can use MFC2 for wet N2 process with using bubbler on our RTP equipment during steady time. The chamber would be purged with dry N2 using MFC1 at the beginning and end of the process.
Please help fill in the RFQ at our website for suitable production proven Rapid Thermal Processor model and configuration for your applications. Please go through the Q and A if necessary before you fill in the RFQ below. Appreciate your time. Thank you very much.
For many years AG Associates was the dominant manufacturer of RTP systems. It was founded in 1981 and produced the first single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being used around the world in manufacturing, R&D and Universities. These RTP systems have a proven track record for reliability and simplicity.
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1) Timing closure is becoming increasingly challenging due to rising complexity in chip designs including more process variations, operational modes, and timing scenarios.
2) Traditional multi-machine signoff approaches are inefficient for advanced nodes below 28nm. A new single-machine timing closure approach enables concurrent multi-mode multi-corner analysis and layout-aware ECO optimization.
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Allwin21 Corp. has been focusing on providing solutions and enhancements to the following used semiconductor equipment. These OEM semiconductor equipment have been used in productions and R&D since 1990′s. They’ve each been PROCESS-PROVEN. Allwin21 Corp. can refurbish and/or upgrade these OEM systems with Allwin21′s comparable integrated process control system with PC, solid 3-axis robotic wafer transfer system (if applicable), and new critical components to achieve the goal of giving our customers a production edge with right cost.
We have been doing upgrade for many production proven equipment, such as Perkin-Elmer 2400, Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Matrix 105 , Matrix 106, Matrix 303, Matrix 303, Matrix 403, Matrix 205, Matrix 101, Matrix 102, Matrix 103, Matrix 104,Tegal 901e, Tegal 903e, Lam Research LAM AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Branson/IPC 2000, Branson IPC 3000, Branson/IPC 4000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Gasoncis Aura 1000, Gasonics AE 2001, AG Associates Heatpulse 610, AG Associates Heatpulse 410, AG Associates Minipulse 310, AG Associates Heatpulse 210 on the field for many cases. The reliability have been improved a lot for most of the tools after upgrading. We designed the upgrade kits for these working tools that can do plug and play and most of them only need 2 to 3 days include training. For PE sputter, since it is a little complicated, but we still target to upgrade within one week include training if the machine without other problems.
Why upgrade your old used semiconductor process equipment ?
Low cost solution of obsolete components and parts.
Use new air cooling RF generator to replace the obsolete water cooling RF Generator, avoiding water flood in Fab/Lab.
Use new integrated solid robotic wafer transfer to replace the obsolete index/frog robotic wafer transfer
Requirement of stability of the system
Requirement of network function (GEM/SECSII).
Requirement of PC control for data storage.
Requirement of GUI.
Requirement of more precise control.
Requirement of better repeatability, uniformity.
Requirement of easier maintenance, calibration, and trouble shooting.
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AWgage-150 measures sheet resistance in ohms per square or milliohms per square. If specific resistivity is known, the thickness of the deposited film layer can be computed from the sheet resistance. The choice of measurement data is easily get in the software. AWgage-150 can accommodate 150mm (6″) wafers as well as the standard 2″, 3″,4″, 5″ wafers without any hardware change.
Allwin21 AWgage-150 Features:
30 years proven Eddy Sheet Resistance Measurement technologies.
Non-contact Sheet Resistance Measurement technologies.
1mΩ/square to 19,990 Ω/square measurement range capability
Touch Screen Monitor and PC w/ Advanced Allwin21 control software.
Wafer carriage travel programmed with internal encoder step motor , without encoder disk.
Consistent wafer-to-wafer process cycle repeatability.
Small footprint and energy efficiency.
Made in U.S.A.
Specifications:
Test Sights: Single center-point, 5-point, or 9-point.5-9
Highly Conductive or Metal Sheet Resistance:
1 to 1,999 mΩ/square
1 to 1,999 Ω/square
Or
10 to 19,990 Ω/square
Highly Conductive or Metal Film ThicknessMinimum: 100 ÅngströmMaximum: Proportional to resistivity. Maximum for a resistivity of 2.7 mW-cm is 270 kÅ (27 mm
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Please help fill in the RFQ at our website for suitable model and configuration for your applications. Appreciate your time.
Allwin21 Corp. has been focusing on providing solutions and enhancements to Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 903e TTW,Lam AutoEtch 490 ,Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790 ,Lam Rainbow 44XX, 45XX, 46XX,47XX Series , Gasonics Aura 1000, Gasonics Aura 2000LL, Gasonics Aura 3010, Gasonics L3510 ,,Matrix 105, Matrix 105R, Matrix 205, Matrix 10 (1104, 1107, 1108), Matrix 303,Matrix 403 ,Matrix 10(1303, 1307), Branson/IPC 3000, Branson/IPC L3200 used Plasma Asher, Plasma Descum,plasma Etch, RIE semiconductor process equipment. These OEM Etch RIE semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system (Video) and new critical components to achieve the goal of giving our customers a production edge with right cost.
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Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Processing equipment. Allwin21 is manufacturing the new AccuThermo AW Series Atmospheric Rapid Thermal Processors and Vacuum Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours.
You can use MFC2 for wet N2 process with using bubbler on our RTP equipment during steady time. The chamber would be purged with dry N2 using MFC1 at the beginning and end of the process.
Please help fill in the RFQ at our website for suitable production proven Rapid Thermal Processor model and configuration for your applications. Please go through the Q and A if necessary before you fill in the RFQ below. Appreciate your time. Thank you very much.
For many years AG Associates was the dominant manufacturer of RTP systems. It was founded in 1981 and produced the first single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being used around the world in manufacturing, R&D and Universities. These RTP systems have a proven track record for reliability and simplicity.
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Allwin21 Corp. has been focusing on providing solutions and enhancements to Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480 used sputter deposition semiconductor process equipment. These OEM semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC and new critical components. We rebuild AccuSputter AW 4450 Series Sputter Deposition systems with our own integrated process control system, giving our customers the tools to achieve a production edge at very low cost impact.
Please help fill in the RFQ at our website for suitable configuration for your applications. Appreciate your time.
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Allwin21 Corp. was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / Descum, Plasma Etch/RIE, Sputter Deposition, and Metal Film Metrology semiconductor equipment, services and technical support in Semiconductor III-V, MEMS, Biomedical, Nanotechnology, Solar, & LED industries. We endeavor to be a leader in our product lines. To achieve this, we have been providing unique innovative and cost-effective technical solutions, high quality equipment, and on time spare parts delivery worldwide. We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world. We pride ourselves on developing and continuing lasting customer relationships.
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For many years AG Associates was the dominant manufacturer of RTP systems. It was founded in 1981 and produced the first single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being used around the world in manufacturing, R&D and Universities. These RTP systems have a proven track record for reliability and simplicity.
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Perkin-Elmer 4400, 4410, 4450 Proven Sputter Materials:
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AccuSputter AW 4450 Sputter Deposition Equipment
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AccuThermo AW 820V Vacuum Rapid Thermal Anneal Equipment
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Allwin21 Brochures for Rapid Thermal Processing equipment, Plasma Asher ,Plasma Descum Equipment, Plasma Etcher, RIE, Sputtering Deposition Equipment, Thin Film Metrology ,semiconductor equipment. Made in USA. All are production proven, the most popular semiconductor process equipment.
Allwin21 Corp. was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / Descum, Plasma Etch/RIE, Sputter Deposition, and Metal Film Metrology semiconductor equipment, services and technical support in Semiconductor III-V, MEMS, Biomedical, Nanotechnology, Solar, & LED industries. We endeavor to be a leader in our product lines. To achieve this, we have been providing unique innovative and cost-effective technical solutions, high quality equipment, and on time spare parts delivery worldwide. We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world. We pride ourselves on developing and continuing lasting customer relationships.
We understand that a timely responsive support and service are critical elements in semiconductor industries. Allwin21’s experienced engineer team is the best guarantee for high quality service and support. We provide on-site installation, training, maintenance, system optimization, retrofits, and/or customized upgrades.
For many years AG Associates was the dominant manufacturer of RTP systems. It was founded in 1981 and produced the first single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being used around the world in manufacturing, R&D and Universities. These RTP systems have a proven track record for reliability and simplicity.
Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Processing equipment. Allwin21 is manufacturing the new AccuThermo AW Series Atmospheric Rapid Thermal Processors and Vacuum Rapid Thermo Processors.Compared with traditional RTP systems, Allwin21″s AccuThermo AW RTPs have innovative software and more advanced temperature control technologies to achieve the best rapid thermal processing performance ( repeatability , uniformity and Stability etc.).
Upgrade kit for lam research lam rainbow 4420 4520 4620 4720 4400 4500 4600 4...
Upgrade kit for lam research lam rainbow 4420 4520 4620 4720 4400 4500 4600 4700 plasma etcher,Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728
Upgrade kit for gasonics aura 2000 ll plasma asher
Upgrade kit for gasonics aura 2000 ll plasma asher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010
AW-1008 plasma microwave 2.45GHz stripper asher
AW-1008 plasma microwave 2.45GHz stripper asher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010
Upgrade kits for branson ipc 2000 3000 4000 series manual batch asher clean
Upgrade kits for branson ipc 2000 3000 4000 series manual batch asher clean,Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher,
Upgrade kit for gasonics aura 1000 plasma asher
Upgrade kit for gasonics aura 1000 plasma asher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010
A wgage 150 awgage 200 thin film sheet resistance measurement instrument
A wgage 150 awgage 200 thin film sheet resistance measurement instrument,Mgage 200, Mgage 300, M-gage 200, M-gage 300,Sheet Resistant measurement, Metrology, Tencor M-Gage 300,Tencor M-Gage 200, sheet resistance, sheet resistance Measurement, Semiconductor Equipment, Semiconductor metrology Equipment, KLA-Tencor, Tencor
Aw b3000 plasma asher descum clean
Aw b3000 plasma asher descum clean,Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher,
Aw 303 r downstream plasma etcher for low plasma damage
Aw 303 r downstream plasma etcher for low plasma damage,Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107
Aw 105 r plasma asher descum clean
Aw 105 r plasma asher descum clean,Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107
Aw 90xer plasma etcher rie
Aw 90xer plasma etcher rie. Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Plasma RIE ,Reactive Ion Etch System, Reactive Ion Etch System, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e
Accu thermo aw 610 rapid thermal processor
The document describes the AccuThermo AW 610 Rapid Thermal Processor. It is a rapid thermal processor that has been in use for over 40 years with thousands of customers from 40 countries. It provides rapid and precise thermal processing and is used in applications such as semiconductor manufacturing.
AG Associates Heatpulse 410 RTA RTP RTO RTN Rapid Thermal Annealing
AG Associates Heatpulse 410 RTA RTP RTO RTN Rapid Thermal Annealing: In Morgan Hill,CA USA. Subject to prior sale. Email us for more info pls.
Allwin21 corp and main products 2015
Allwin21 Corp is a semiconductor equipment manufacturer located in Silicon Valley, USA. It provides semiconductor processing equipment such as rapid thermal processing, plasma ashing/descum, plasma etching, and sputter deposition. The company was founded in 2000 and has customers in over 40 countries. Allwin21 focuses on production-proven semiconductor equipment and offers local engineering support.
Upgrade kit for used semiconductor equipment
Upgrade Kits for :
AG Associates Heatpulse 210, Minipulse 310, Heatpulse 410, Heatpulse 610 Rapid Thermal Processing equipment; Tegal 901e, Tegal 903e, Gasonics AE 2001, Matrix 303, Matrix 403, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam AutoEtch 480, Lam AutoEtch 580, Lam AutoEtch 680, Lam AutoEtch 780 Plasma Etcher equipment;Matrix 105, Matrix 106,Matrix 205, Matrix 101,Matrix 102,Matrix 103, Matrix 104, Matrix 10, Gasonics Aura 1000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000 Plasma Asher ,Plasma Descum Equipment; Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Perkin-Elmer 2400 sputter deposition systems
Perkin-Elmer 4400,4410,4450 Sputtering Deposition Systems
With an installed base of more than thousands of systems, Perkin-Elmer was a leading supplier of sputter deposition equipment for high technology application in 1990's. The Perkin-Elmer 4400 Series, fully refurbished and upgraded by Allwin21 Corp., were designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every fully refurbished and upgraded Perkin Elmer sputtering system was supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service
Perkin-Elmer 4400, 4410, 4450 Proven Sputter Materials:
Al+W ,Cr/SiO2,SiC ,Ti+Au,InSnO ,SiO2 ,Ti/W ,Ti+Au+Ni,Al2O3 ,Mo ,SiO2+O2 ,Ni/Fe+Cu+SiO2,Ag MoSi2 ,Si+N2(Si3N4) ,Ti/W+Au,Au ,Mo2Si5 ,Si+N2+B4C, Ti/W+Au+Ta, C, Mo5Si3 ,Ta ,Ti/W+Al/Si,Cr Ni ,TaC, Ti/W+Ni/Cr+Au,Cr/Co ,Ni/Cr, Ta+Au , Ti/W+Pt,Cr/Au, Ni+Ni/Cr, TaSi2 ,Al+Ti/W+Ag, Cr+Cu, Ni/Fe ,Ta+SiO2 , W+Al2O3,Cr/Si ,Pt, Zr ,Zn,Cr/SiO, TiO2 ,TiO2+Cr, ZnO2
AccuSputter AW 4450 Sputter Deposition Equipment
Allwin21 Corp. is a leading supplier of sputter deposition equipment for high technology applications for Semiconductor III-V, II-VI, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. The AccuSputter AW 4450 is designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new real time AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every AccuSputter AW 4450 sputtering system is supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service
AccuThermo AW 820 Long Time Rapid Thermal Anneal Equipment
The document describes the AccuThermo AW820 rapid thermal processing system. It provides short heating periods from 1-900 seconds at precisely controlled temperatures using high intensity visible radiation. Key features include long steady time capability, advanced software for real-time control, consistent wafer-to-wafer repeatability, and fast heating and cooling rates. It is a production-proven standalone system for applications such as semiconductor manufacturing, compound semiconductors, MEMS, and more.
AccuThermo AW 820V Vacuum Rapid Thermal Anneal Equipment
The AccuThermo AW820V is a stand alone Vacuum RTP (Rapid Thermal Processing) system, which uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. The process periods are typically 1 900 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber's cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.
AccuThermo AW 810 Rapid Thermal Anneal Equipment
The AccuThermo AW810 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system. The system uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. The process periods are typically 1 600 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber's cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.
More from Peter Chen (20)
Upgrade kit for lam research lam rainbow 4420 4520 4620 4720 4400 4500 4600 4...
Upgrade kit for lam research lam rainbow 4420 4520 4620 4720 4400 4500 4600 4...
Upgrade kit for gasonics aura 2000 ll plasma asher
Upgrade kit for gasonics aura 2000 ll plasma asher
Upgrade kits for branson ipc 2000 3000 4000 series manual batch asher clean
Upgrade kits for branson ipc 2000 3000 4000 series manual batch asher clean
A wgage 150 awgage 200 thin film sheet resistance measurement instrument
A wgage 150 awgage 200 thin film sheet resistance measurement instrument
Aw 303 r downstream plasma etcher for low plasma damage
Aw 303 r downstream plasma etcher for low plasma damage
AG Associates Heatpulse 410 RTA RTP RTO RTN Rapid Thermal Annealing
AG Associates Heatpulse 410 RTA RTP RTO RTN Rapid Thermal Annealing
Perkin-Elmer 4400,4410,4450 Sputtering Deposition Systems
Perkin-Elmer 4400,4410,4450 Sputtering Deposition Systems
AccuThermo AW 820 Long Time Rapid Thermal Anneal Equipment
AccuThermo AW 820 Long Time Rapid Thermal Anneal Equipment
AccuThermo AW 820V Vacuum Rapid Thermal Anneal Equipment
AccuThermo AW 820V Vacuum Rapid Thermal Anneal Equipment
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みなさんこんにちはこれ何文字まで入るの？40文字以下不可とか本当に意味わからないけどこれ限界文字数書いてないからマジでやばい文字数いけるんじゃないの？えこ...
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