This document summarizes research on optimizing patterns for digital image correlation (DIC) measurements. It discusses how morphological image processing and Fourier analysis can be used to characterize patterns based on their suitability for DIC. Key criteria include having large, distinct features while removing small features that cannot be resolved. The autocorrelation peak sharpness radius and margin are introduced to quantify a pattern's sensitivity and robustness for DIC. Optimized patterns can have sharp peaks and wide margins, making them well-suited for precise and spatially-resolved DIC measurements.