Master thesis: Characterization and Optimization of an Electron Cyclotron Resonance Ion Source
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This document summarizes research characterizing and optimizing an electron cyclotron resonance ion source (ECRIS). Key findings include: 1) X-ray spectroscopy showed the electron distribution in the plasma varies with parameters like RF power, pressure, and bias voltage. The ion charge state distribution is also affected. 2) Emittance measurements of the extracted ion beam found values around 0.166 mm-mrad, depending on beamline optics. Better emittance may be possible with improved measurement techniques. 3) While bias enhanced the charge states extracted, it did not change the underlying plasma properties. Gas mixing also impacted the ion current. In summary, extensive testing optimized the ECRIS
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Master thesis: Characterization and Optimization of an Electron Cyclotron Resonance Ion Source
- 1. Characterization and Optimization of an Electron Cyclotron Resonance Ion Source J.Rabinder Henry External: Dr. Stefhan Facsko(FZR Rossendorf) Dip-Ing. Gerald Staats Professor: Prof. Dr.-Ing. Christian Schäffer
- 2. Outlook • Introduction Electron Cyclotron Resonance Ion Source (ECRIS) FZR 14.5 GHz source • Characterization and Optimization Plasma –X-ray Spectroscopy Results • Beam Emittance Results • Summary and outlook
- 3. RFce meB ωω == / Principle of ECRIS ●Electron Cyclotron Resonance Heating ●Electron impact ionization ●Magnetic confinement Magnetic Field FZR 14.5 GHz Supernanogan RF Power 3 RF Power ECR Zone Gas Inlet ECR Source Working Principle Extraction Electrode Electron Cyclotron Emission
- 4. FC2 Microwave source BL1 BL2 Target Chamber BPM2 SL2 FZR 14.5 GHz ECR Source and Beam Line 4 ECRISSL1BPM1FC1 MD EL1 EBIT Multielectrode extraction MS1 SL2
- 5. RF Power (x) Pressure (y) Biased disc (z) I extracted (Iex)ECRIS Characterization and Optimization Max f (Iex) = min (x, y, z) 5 Gas mixing (a) Plasma Characterization X-ray Spectroscopy Ion beam quality Emittance Electron Distribution Charge State Distribution } Source Parameters x, y, z, a
- 6. X-ray Spectroscopy Electron –Bremsstrahlung Measurement Ion charge state –Characteristics X-ray Measurement Germanium Detector Attenuation of Radiation Be window Air column Collimation Extraction Voltage 6 Analyzing Magnet HPGe Detector ECRIS Faraday Cup Beryllium Window
- 7. 4000 6000 ElectronicPeak Counts Nocollimation Withcollimation1mm 2000 4000 Counts US=25KV US=0V Bremsstrahlung Measurement Collimation Extraction Voltage 7 0 50 100 150 200 0 2000 Energy(keV) 0 50 100 150 200 0 2000 E(keV)
- 8. 0 50 100 150 200 0 2000 4000 6000 8000 10000 25W 50W 75W 100W 125W 175W 200W 250W Counts E(keV) 0 50 100 150 200 0 1000 2000 3000 0V -100V -200v -300V -400V -600V Counts E ( keV) Photon Distribution Analysis Power Bias 8 0 50 100 150 200 0 2000 4000 6000 8000 1x10 -5 mbar 2.5x10 -5 mbar 5X10 -5 mbar 4.210 -5 mbar 7.5x10 -5 mbar 1x10 -4 mbar Counts E(keV) 0 50 100 150 200 0 2000 4000 6000 8000 Counts E (keV) Argon+Oxygen Argon Photon Distribution Analysis Pressure Gas mixing
- 9. Bremsstrahlung Spectra for Varying Power 6000 8000 10000 25W 50W 75W 100W 125W 175W 200W 250W Counts Xenon Plasma Pressure 9.8x10-5mbar Bias voltage -200 V 9 0 50 100 150 200 0 2000 4000 Counts E(keV)
- 10. 4000 6000 8000 1x10 -5 mbar 2.5x10 -5 mbar 5X10 -5 mbar 4.210 -5 mbar 7.5x10 -5 mbar 1x10 -4 mbar Counts Bremsstrahlung Spectra for Varying Pressure Argon Plasma Power 100 W Bias voltage -164 V 10 0 50 100 150 200 0 2000 4000 1x10 mbar Counts E(keV)
- 11. 2000 3000 0V -100V -200v -300V -400V -600V Counts Bremsstrahlung Spectra for Varying Bias Xenon Plasma Pressure 9.8x10-5mbar Power 100 W 11 0 50 100 150 200 0 1000 Counts E ( keV)
- 12. 4000 6000 8000 Counts Argon+Oxygen Argon Bremsstrahlung Spectra for Gas Mixing Power 50 W Pressure 3.9x 10-5 mbar Bias voltage of -200V 12 0 50 100 150 200 0 2000 4000 Counts E (keV)
- 13. 0 50 100 150 200 0 1 2 3 4 5 6 7 F(E)(RealtiveCounts) Energy 50W 100W 200W 40 50 60 70 80 90 100 110 120 0,0 0,2 0,4 0,6 0,8 1,0 F(E)RelativeCounts Energy (keV) -200V -300V -400V -500V -600V Electron Distribution Analysis Power Bias 130 50 100 150 200 250 0,0 0,2 0,4 0,6 0,8 1,0 1,2 1,4 1,6 F(E)(RelativeCounts) Energy (keV) 1x10 -4 mbar 5x10 -5 mbar 1X10 -5 mbar 50 100 150 200 0 1 2 F(E)RelativeCounts Energy (kev) Argon Argon+Oxygen Electron Distribution Analysis Pressure Gas mixing
- 14. 10000 15000 20000 18054ev 17061ev 16401ev XeLα14104ev Counts Characteristics X-ray Measurements Xenon Power 120 W Pressure 9.7 x 10-5 mbar Bias -200V 14 0 5000 10000 15000 20000 25000 30000 35000 40000 0 5000 XeKβ133384ev XeKα129779ev CuKβ18904ev CuKα18054ev FeKβ17061ev FeKα16401ev Counts E(eV)
- 15. 0 10000 20000 30000 40000 0 5000 10000 15000 20000 60W 200W 20W 60W 80W 100W 120W 140W 160W 180W 200W Counts 0 10000 20000 30000 40000 0 2000 4000 6000 8000 10000 12000 14000 2.7x10 -6 mbar 1.03X -4 mbar Kseries Lseries 1.03x10 -4 mbar 6.5x10 -5 mbar 4.5x10 -5 mbar 3.9x10 -5 mbar 2.4x10 -5 mbar 1.5x10 -5 mbar 4.1x10 -6 mbar 9.8x10 -6 mbar 2.7x10 -6 mbar Counts X-ray Spectra Power Pressure 15 0 10000 20000 30000 40000 E (eV) 0 10000 20000 30000 40000 E(eV) 0 20 40 60 80 100 120 140 160 180 200 0,02 0,04 0,06 0,08 0,10 IntensityRatio RF-Power(watts) 0,0 2,0x10 -5 4,0x10 -5 6,0x10 -5 8,0x10 -5 1,0x10 -4 1,2x10 -4 0,00 0,01 0,02 0,03 0,04 0,05 0,06 Ik/ILIntensityratio Pressure mbar
- 16. 10000 15000 20000 60W 200W 20W 60W 80W 100W 120W 140W 160W 180W 200W Counts X-ray Spectra For Varying Power Xenon plasma Pressure1.03 x 10-4 mbar Bias voltage -200 V 16 0 10000 20000 30000 40000 0 5000 10000 Counts E (eV)
- 17. 8000 10000 12000 14000 Lseries 1.03x10 -4 mbar 6.5x10 -5 mbar 4.5x10 -5 mbar 3.9x10 -5 mbar 2.4x10 -5 mbar 1.5x10 -5 mbar 4.1x10 -6 mbar 9.8x10 -6 mbar 2.7x10 -6 mbar Counts X-ray Spectra For Varying Pressure Xenon plasma Power 100 W Bias voltage -200 V 17 0 10000 20000 30000 40000 0 2000 4000 6000 2.7x10 -6 mbar 1.03X -4 mbar Kseries 2.7x10 mbar Counts E(eV)
- 18. 6000 8000 10000 XeLSeries Counts -50V -250V -400V -600V 2000 FeKα CuKα1,2 XeLα1,2 Counts Xe27%/O20% Xe27%/O21.50% Xe27%/O25.20% X-ray Spectra Bias Gas mixing 18 0 10000 20000 30000 40000 0 2000 4000 XeKSeries Counts E(eV) 0 10000 20000 30000 40000 0 1000 XeKβ CuKβ FeKβ XeLβ Counts E(eV)
- 19. X-ray Spectra For Varying Bias 6000 8000 10000 XeLSeries Counts -50V -250V -400V -600V Xenon plasma Pressure1.03 x 10-4 mbar Power 100 W 19 0 10000 20000 30000 40000 0 2000 4000 XeKSeries Counts E (eV )
- 20. 200 0 FeKα CuKα1,2 β XeLα1,2 Counts X e 27 % /O 2 0% X e 27 % /O 2 1.50% X e 27 % /O 2 5.20% X-ray Spectra For Gas Mixing Xenon and Oxygen Pressure 1.6x 10-6 mbar Power 100 W Bias voltage -200 V 20 0 10000 2000 0 300 00 4 0000 0 100 0 XeKβ CuKβ FeKβ XeLβ Counts E (eV )
- 21. 60 80 Ar2+ Ar3+ Ar4+ IextracteduA 40W 60W 80W 100W Mass Spectra For Varying Power Argon Pressure 1x 10-4 mbar Bias voltage -400 V 21 200 250 300 350 400 450 500 0 20 40 Ar9+ Ar8+ Ar7+ Ar5+ Ar6+ IextracteduA B mT
- 22. 200 250 300 350 400 450 500 0 20 40 60 80 Ar9+ Ar8+ Ar7+ Ar6+ Ar5+ Ar4+ Ar3+ Ar2+ IextracteduA B m T 1x10 -5 m bar 1x10 -4 m bar 5x10 -5 m bar Mass Spectra For Varying Pressure Argon Power 100 W Bias voltage -400 V 22 B m T 2 3 4 5 6 7 8 9 0 20 40 60 80 IuA Charge State 1x10 -5 mbar 5x10 -5 mbar 1x10 -4 mbar Charge State Distribution
- 23. 200 250 300 350 400 450 500 0 10 20 30 40 50 60 70 80 Ar2+ Ar3+ Ar4+ Ar5+ Ar6+ Ar7+ Ar8+ Ar9+ IextracteduA 0V -400V -200V Mass Spectra For Varying Bias Argon Power 100 W Pressure 1x 10-4 mbar 23 B m T 1 2 3 4 5 6 7 8 9 10 0 10 20 30 40 50 60 70 80 IuA C harge State Ar 0V -200V -400V Charge State Distribution
- 24. α σ z y x Current Profile d Emittance calculation πε /xx A= ασε .2 xx = ( )d/tan 1 σα − = 24 FC1 SL1 ECRIS z d Pin hole Einzel lens Steerer Measurement Setup
- 25. 0 2 4 6 8 0,0 0,2 0,4 0,6 0,8 1,0 1,2 FCCurrentmA Slit Position mm Slit +X Slit -X Slit +Y Slit -Y -x +x Z +y -y Emittance Measurement 250 2 4 6 8 10 12 14 16 0,00 0,05 0,10 0,15 0,20 0,25 Peak3 Peak 2 Peak1 M1S1 dI/dx Current Profile σ =0.24149 σ =0.40832 σ =0.35993 σ =0.4551 RelativeIntensitymA Slit position mm Pea ks Peak width 2σ mm Peak half width σ mm Divergenc e Angle α Phase space area 2σ* α mmrad 1 0.72 0.36 0.147 0.001 2 0.92 0.46 0.188 0.003 3 0.80 0.40 0.163 0.002 Mea n = 0.81 = 0.40 =0.166 0.002
- 26. Summary Plasma Two different population of electrons below 30 keV and 100 keV Stable plasma at nominal power Unstable plasma at very low pressure Charge state distribution Enhanced with bias voltage but no change in plasma characteristics Ion current extracted depends on gas mixing ratio Emittance 26 Emittance Ion beam emittance depends on extraction and beam line elements Outlook Longmuir probe measurements Better emittance with pin hole and CCD camera
- 27. Thank you ! 27