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Sree Vidyanikethan Engineering
College
Rotational Capacitive
Micromachined
Ultrasonic Transducers
Guided by
Mrs.A.Yasmine Begum
By
D.Sai lohith
11121A1017
Contents
Transducers- Acostic transducers
What are MEMS?
Difference between normal UT and CMUT
CMUT- Structure, principle, fabrication
Comparison of piezo-electric and CMUT
Rotational CMUT- Fabrication,experiment and it’s
results
Applications
conclusion
References
 Acoustic Transducers
 Ultrasonic transducers
What is the difference between normal
ultrasonic transducer and CMUT?
• Piezoelectric property
• Capacitive transducer
Where ,C is the capacitance, ε0 is the permittivity of free space constant, K is
the dielectric constant of the material in the gap, A is the area of the plates,
and d is the distance between the plates.
where S is the area of capacitor plates, V is the applied
bias voltage, is the permittivity of free space between capacitor
plates, and d is the distance between the capacitor plates.
CMUT structure
Operation priciple
Fabrication
• Sacrificial release process
• Wafer bonding,etc
Step 1: Starting waferStep 2: Deposition of sacrificial layerStep 3: Deposition of structural layerStep 4: Pattern the top polysilicon layerStep 5: Deposit a second sacrificial layerStep 6: Pattern and Etch the sacrificial layersStep 7: Deposit polysilicon structural layer.Step 8: Pattern Polysilicon.Step 9: Sacrificial layer removal and freeing of
structures
Why we are going to CMUT over
Piezoelectric Ultrasonic transducer?
 batch-production
 wide bandwidth
 easier to fabricate
 integration with supporting electronic
circuits
 Wider temperature range
Why we are going to Rotational CMUT
instead of normal CMUT?
• no internal damping
• negligible thermal mechanical noise
• enables lower resonant frequencies
• higher compliance to acoustic signals
• frequency response up to 200 kHz
Rotational Capacitive Micromachined Ultrasonic
Transducers
 Sacrificial release Process
SEMs
Applications
2D and 3D arrays
Intravascular ultrasound (IVUS)
Second-harmonic imaging
Hydrophones
Photo-Acostic imaging
Conclusion
 Rigorous modeling and acoustic
characterization of the rotational
cMUT
 as does a detailed comparison of the
device technology against other
airborne ultrasonic transducers
 1 μm deflection, implying that at least
10× higher compliance diaphragms
are realizable by use of the beam-
coupled design.
References
Some referable websites about cMUTs
• http://www.kyg.stanford.edu/khuriyakub/opencms/en/research/c
muts/Principles/
• http://www.microfab.de/mems/ultrasonictransducers/cmut.html
• http://www-
kyg.stanford.edu/khuriyakub/opencms/en/research/cmuts/general
/index.html
• http://www.ncbi.nlm.nih.gov/pmc/articles/PMC3158704/
• http://www-old.me.gatech.edu/mist/cmut.htm
Thank you

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Cpacitive Micromachined Ultrasonic Transducers-Rotational type of CMUT

  • 1. Sree Vidyanikethan Engineering College Rotational Capacitive Micromachined Ultrasonic Transducers Guided by Mrs.A.Yasmine Begum By D.Sai lohith 11121A1017
  • 2. Contents Transducers- Acostic transducers What are MEMS? Difference between normal UT and CMUT CMUT- Structure, principle, fabrication Comparison of piezo-electric and CMUT Rotational CMUT- Fabrication,experiment and it’s results Applications conclusion References
  • 3.  Acoustic Transducers  Ultrasonic transducers
  • 4.
  • 5. What is the difference between normal ultrasonic transducer and CMUT?
  • 6. • Piezoelectric property • Capacitive transducer Where ,C is the capacitance, ε0 is the permittivity of free space constant, K is the dielectric constant of the material in the gap, A is the area of the plates, and d is the distance between the plates. where S is the area of capacitor plates, V is the applied bias voltage, is the permittivity of free space between capacitor plates, and d is the distance between the capacitor plates.
  • 8.
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  • 11. Fabrication • Sacrificial release process • Wafer bonding,etc
  • 12. Step 1: Starting waferStep 2: Deposition of sacrificial layerStep 3: Deposition of structural layerStep 4: Pattern the top polysilicon layerStep 5: Deposit a second sacrificial layerStep 6: Pattern and Etch the sacrificial layersStep 7: Deposit polysilicon structural layer.Step 8: Pattern Polysilicon.Step 9: Sacrificial layer removal and freeing of structures
  • 13. Why we are going to CMUT over Piezoelectric Ultrasonic transducer?
  • 14.  batch-production  wide bandwidth  easier to fabricate  integration with supporting electronic circuits  Wider temperature range
  • 15. Why we are going to Rotational CMUT instead of normal CMUT?
  • 16. • no internal damping • negligible thermal mechanical noise • enables lower resonant frequencies • higher compliance to acoustic signals • frequency response up to 200 kHz
  • 17. Rotational Capacitive Micromachined Ultrasonic Transducers
  • 19.
  • 20.
  • 21.
  • 22. SEMs
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  • 24.
  • 25.
  • 26. Applications 2D and 3D arrays Intravascular ultrasound (IVUS) Second-harmonic imaging Hydrophones Photo-Acostic imaging
  • 27. Conclusion  Rigorous modeling and acoustic characterization of the rotational cMUT  as does a detailed comparison of the device technology against other airborne ultrasonic transducers  1 μm deflection, implying that at least 10× higher compliance diaphragms are realizable by use of the beam- coupled design.
  • 29. Some referable websites about cMUTs • http://www.kyg.stanford.edu/khuriyakub/opencms/en/research/c muts/Principles/ • http://www.microfab.de/mems/ultrasonictransducers/cmut.html • http://www- kyg.stanford.edu/khuriyakub/opencms/en/research/cmuts/general /index.html • http://www.ncbi.nlm.nih.gov/pmc/articles/PMC3158704/ • http://www-old.me.gatech.edu/mist/cmut.htm