9. Multichip Modules
MCM (multichip module technique)
->reducing the layers
->die directly on the wired
backplane
Advantages:
->C=0.1pF
->L=0.1pF
->reduced I/O pads
10. Thermal consideration
Temperature:
->Reverse biased diodes
->Electro migration
->Hot electron trapping
Commercial: (0-70)degree C
Industrial : ((-15) to 85) degree C
Military : ((-55) to 125) degree C
11. Trends in process technology
LDD (Lightly Doped Drain)
->Silicide (TiSi2)
Short term developments
Copper and low-K dielectrics
->Conductivity: Cu>Al
->Copper easily diffused in silicon.
->Insulated copper (Titanium Nitride)
12. SOI
Silicon On Insulator:
->Very thin silicon layer,
deposited on the top of thick
SiO2 layer.
->Parasitic effect reduced
->Better on-off transistor
characteristic
->Performance :22%
13. Long term developments
Truly 3D Integrated circuits
->Getting signals in/out (challenge)
->Need extra active layers,between
the metals
->Voltage
->Performance
->Heat dissipation
14. Summary
Thus chip packaging creates good
impact in designing