Aw b3000 plasma asher descum clean
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Aw b3000 plasma asher descum clean,Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher,
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Aw b3000 plasma asher descum clean
- 1. Proven Qualified Dry Asher Descum Clean 40 Years AW-B3000 Plasma Asher Descum Equipment All specification and information here are subject to change without notice and cannot be used for purchase and facility plan. All legacy equipment trademarks belong to O.E.M.. © 2021 Allwin21 Corp. All Rights Reserved.
- 2. Proven Qualified Dry Asher Descum Clean Hundreds of Customers AW-B3000 Plasma Asher Descum Equipment U.S.A. • Archcom • Bridgelux, Inc. • Cree • Emcore Copration • Facebook Technologies, LLC • GE Global Research • Infinera Corporation • JDSU Lumentum • Keysight Technologies • Novati Technologies Inc. • On Semiconductor • Quantum Devices, Inc. • Raytheon Vision Systems • SVTC Technologies • Teledyne Micralyne • Texas Tech University • University of Delaware • Western Digital China, Mainland • Chengdu University of Electronic Science • Chengdu Yaguang Electronics CO.,Ltd. • Chongqing University • Hong Kong University of Science & Technology • Hongkong Meridian Innovation Limited • Ori-Chip Optoelectronics Technology • Shanghai Institute of Microsystem and Information Canada/Taiwan/Singapore • Broadcom • Excelitas • Teledyne Micralyne • Vishay
- 3. Proven Qualified Dry Asher Descum Clean Giant Fabs/Labs • Universities • Institutes • Companies • IC • MEMS • Biomedical • Nanotechnology • Sensors • Solar • LED • … AW-B3000 Plasma Asher Descum Equipment
- 4. Proven Qualified Dry Asher Descum Clean Production AW-B3000 Plasma Asher Descum Equipment
- 5. Originated From The Dominant Manufacturer of Desktop, Manual Load, Batch Asher in 80’s,90’s Proven Qualified Dry Asher Descum Clean AW-B3000 Plasma Asher Descum Equipment
- 6. Proven Qualified Dry Asher Descum Clean AW-B3000 Plasma Asher Descum Equipment
- 7. Suitable for: • Low Cost • Thick Photoresist • Long Time Processes Proven Qualified Dry Asher Descum Clean AW-B3000 Plasma Asher Descum Equipment • Different Photoresist Thickness • Get Rid of All Photoresist • No Uniformity Requirements
- 8. Advanced Technologies Industrial Grade Computer with Large Hard Disk Driver AW-B3000 Plasma Asher Descum Equipment
- 9. Advanced Technologies Touch Screen GUI AW-B3000 Plasma Asher Descum Equipment
- 10. Advanced Technologies Easy Maintenance Design AW-B3000 Plasma Asher Descum Equipment 3-pieces Covers Backside RF matching Tuning
- 11. AW-B3000 Plasma Asher Descum Equipment Advanced Technologies Allwin21 Software Recipe Edit Factory Set Up
- 12. Advanced Technologies AW-B3000 Plasma Asher Descum Equipment Allwin21 Software Process Monitor TC Gauge Calibration
- 13. AW-B3000 Plasma Asher Descum Equipment Advanced Technologies Allwin21 Software Board Test Pressure Calibration
- 14. Substrate Capability: Small Samples, 2”,3”,4”,5”,6”,8” Any Shape, Thickness Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 15. RF Power and RF Matching: • 13.56 MHz • Air Cooling • 300/600/1000W Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 16. Gas Lines: 1-5 with MFCs Typical Gas Types: O2,O2,N2 Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 17. Faraday Cage: • “Downstream” Asher • Low RF Plasma Damage • Better Uniformity • Low Asher Rate Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 18. Pressure Measurement and Control: • Optional Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment +
- 19. Quartz Boats and Tray: • Optional • Customized Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 20. Temperature Sensor: • Optional • For Chamber Inside Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 21. GEM/SEC II Function: • Optional Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 22. EOP Function: • Optional Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 23. Small Footprint Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment Desktop Stand Alone(Optional) Main Body 28(W) X 34(D) X 35(H) inch Controller 19(W) X 26(D) X 15(H) inch Main Body 28(W) X 34(D) X 25(H) inch Controller 19(W) X 26(D) X 15(H) inch
- 24. Process Parameters and Performance: • Pressure: 250 Mtorr to 3 Torr • Process Time: 5-120 minutes • Temperature: Not control. >100°C Process Dependent • Throughput: 1-100 pieces/batch • Asher Rate: ~ 0.5um/minute, Process Dependent • Uniformity: ~25%, Process Dependent Configurations and Typical Processes AW-B3000 Plasma Asher Descum Equipment
- 25. Let’s All-win in the 21st Century Email: sales@allwin21.com Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, AW-B3000 Plasma Asher Descum Equipment