This document discusses different sputtering technologies for producing ultraclean metal coatings and their applications. It describes magnetron sputtering, which allows high deposition rates of pure and uniform films onto various substrates. Sustained self-sputtering intensifies the plasma using small magnets and works well with high-yield metals like silver and copper. High power impulse magnetron sputtering uses extremely high power densities in short pulses for coatings. Potential applications include ultrapure metallization, thin film deposition in space, and new space propulsion options using solid fuel.
1. Sputtering in Vacuum: A Technology for
Ultraclean Metallization and Space
Propulsion
Mirza Taimoor Sultan Baig
2. CONTENT
INTRODUCTION AND BACKGROUND
A) MAGNETRON SPUTTERING
B) SUSTAINED SELF-SPUTTERING
C) HIGH POWER IMPULSE MAGNETRON SPUTTERING
APPLICATIONS
CONCLUSIONS
3. MAGNETRON SPUTTERING
There are various advantages of magnetron sputtering such as
•high deposition rates
•ease of sputtering any metal, alloy, or compound
•high-purity films
•excellent coverage of steps and small features
•ability to coat heat-sensitive substrates
•ease of automation
•excellent uniformity on large-area substrates
4. SUSTAINED SELF-SPUTTERING
The density of the plasma in the region of the
magnet assembly of the magnetron is intensified
for a fixed target power by reducing the size of
the magnet.
The demonstration works best with silver and
copper because those materials have a high
self-sputtering yield; the sputtering process was
done as usual, with argon gas present, using
high power.
5. HIGH POWER IMPULSE MAGNETRON
SPUTTERING
High-power impulse magnetron sputtering (HIPIMS or HiPIMS, also
known as high-power pulsed magnetron sputtering, ). HIPIMS utilizes
extremely high power densities of the order of kW.cm in short pulses
(impulses) of tens of microseconds at low duty cycle (on/off time ratio)
9. Some Application
At high power
The small risk
For coating applications
For coating applications
Another potential, future use is metallization in space
10. Conclusion
In this demonstration copper was used for its very high self-sputtering
yield, which significantly exceeds unity at sputtering voltages over
500 V. Short (20 µs) arc pulses initiated long (several ms) SSS pulses at
very high nominal peak power density of about 3 kW/cm2 , with the
actual peak power density in the racetrack area exceeding 10 kW/cm2
Magnetron operation in high vacuum opens the door for some
applications, including ultrapure metallization, thin film deposition in
space, and new options for space propulsion using a solid, non-
combustible and non-toxic fuel.
