2. JFET
โข IT IS A JUNCTION EILD EFFECT TRANSISTOR
โข VOLTAGE CONTROLLED TRANSISTOR
โข IT IS A UNIPOLAR DEVICE
โข FET IS A DEVICE IN WHICH THE FLOW OF
CURRENT THROUGH THE CONDUCTING
REGION IS CONTROLLED BY AN ELECTRIC
FIELD.
9. OPERATION
โข VGS=0 AND VDS=0
โข NO VOLTAGE APPLIED BETWEEN THE DRAIN
AND SOURCE,GATE AND SOURCE
โข THE THICKNESS OF DEPLETION REGIONS
ROUND THE PN JUNCTION IS UNIFORM
10. VGS=0 AND VDS INCREASED ROM
ZERO
โข Drain is positive with respect to the source
with vgs=0.
โข Now the majority cariers(electrons)flow
through the N- channel from source to drain.
11. Vgs is negative and vds is increased
โข When the gate is maintained at a negative
voltage less than the negative cutoff voltage,
reverse voltage across the junction is further
increased.
โข JFET is suitable for voltage amplifier similr to
transistor amplifier
โข Vds=vp the drain curent is not reduced to
zero.
12. OPERATION
โข A negative supply VGS is connected between the gate
and the source. This reverse bias sets up a depletion
layer or transition layer around the P-region and this
makes the conducting channel thin dipicted.
โข As the reverse bias across the gate junction is
increased, the width of the channel will be decreased
because the depletion layer gets increased.
Accordingly, for a fixed drain to source voltage (VDS),
the drain current ID will be a function of the
reversebiasing voltage across the gate junction.
15. condition
โข AS VDS INCREASED FROM ZERO,ID INCREASES ALONG
OP,AND THE RATE OF INCREASE OF ID WTH VDS
DECREASES.THE REGION FROM VDS=0V TO VDS=VP IS
CALLED OHMIC REGION.THIS IS UEFUL FOR VOLTAGE
VARIABLE RESISTOR(VVR).
โข WHEN VDS=VP,ID BECOMES MAXIMUM.WHEN VDS IS
INCREASED BEYOND VP,THE LENGTH OF PINCH OFF OR
SATURATION REGION INCREASES.
โข AT A CERTAIN VOLTAGE CORRESPONDING TO THE POINT
B,ID SUDDENLY INCREASES.THIS EFFECT IS DUE TO THE
AVALANCHE MULTIPLICATION OF ELECTRONS CAUSED BY
BREAKING OF COVALENT BOND OF SILICON ATOMS IN THE
DEPLETION REGION BETWEEN THE GATE AND DRAIN.