The document summarizes a method for determining the optical constants (refractive index and extinction coefficient) of highly absorbing thin films using only spectral reflectance measurements. It describes using Kramers-Kronig relations to calculate the phase angle from reflectance data, and then determining the real refractive index and extinction coefficient. The method is applied to rhodium films of different thicknesses, and the calculated optical constants are found to agree to within 5% of literature values and those from an interference-based method.
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Thin film of Zinc Selenide (ZnSe) was deposited onto transparent glass substrate by thermal evaporation technique. ZnSe thin film was characterized by UV-Visible spectrophotometer within the wavelength range of 310 nm-1080 nm. The Linear optical parameters (linear optical absorption, extinction coefficient, refractive index and complex dielectric constant) of ZnSe thin film were analyzed from absorption spectra. The optical band gap and Urbach energy were obtained by Tauc’s equation. The volume and surface energy loss function of ZnSe thin film were obtained by complex dielectric constant. The Dispersion parameters (dispersion energy, oscillation energy, moment of optical dispersion spectra, static dielectric constant and static refractive index) were calculated using theoretical Wemple-DiDomenico model. The oscillation strength, oscillator wavelength, high frequency dielectric constant and high frequency refractive index were calculated by single Sellmeier oscillator model. Also, Lattice dielectric constant, N/m* and plasma resonance frequency were obtained. The electronic polarizibility of ZnSe thin film was estimated by Clausius-Mossotti local field polarizibility. The non-linear optical parameters (non-linear susceptibility and non-linear refractive index) were estimated.
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Ultrafast Studies of the Photophysics of Cis and Trans States of the Green Fluorescent Protein Chromophore
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The optical constants of highly absorbing films using the spectral reflectance measured by double beam spectrophotometer
1. Journal of Natural Sciences Research www.iiste.org
ISSN 2224-3186 (Paper) ISSN 2225-0921 (Online)
Vol.1, No.4, 2011
The optical constants of highly absorbing films using the
spectral reflectance measured by double beam
spectrophotometer
ElSayed Moustafa
Faculty of science , El-Azhar university, physics department, Assuit, 71511, Egypt
e-mail: Sayed19652000@yahoo.com
Abstract:
The optical constants of the metal thin films of Rhodium have been determined, the phase angles was
determined using the measured spectral reflectance R(λ) by Kramers-Kronig relations. Then, the real part
of the refractive index is calculated by the approach of Heavens when the film is highly absorbing, in that
range the real refractive was found to be in order of the extinction coefficient k.
The interference reflectance spectra at normal incidence for different thicknesses of amorphous metal films
deposited by thermal evaporation have been obtained in the spectral range 400–800 nm. We propose a
method for determination of the refractive index and extinction coefficients of highly absorbing films. This
method is based on measurements of reflectance of the film at normal incidence alone, simulations of the
theoretical accuracy and the effect of the error of the spectral reflectance measurements in the
determination of the optical constants of the film are analyzed.
Keywords: optical constants , refractive index , thin film ,reflectance and absorption coefficient .
Introduction:
The determination of the optical properties of thin films is a topic of fundamental and technological
importance ( Jyh-Jian Chen, et al ,1999 ). Most of the optical applications of metal coating are based on the
knowledge of the optical constants. For the metal coating (Rh) film which was used, this metal is inert , so
changes due to oxidations should be minimal. The optical constants are important parameters for predicting
the performance of an optical system. The optical constants are sensitive to the microstructure, which is
effected by the deposition conditions.
A good knowledge of film parameters is necessary for the design and manufacture of new optical coatings
and devices such as multilayers coatings and regulate filters[J.C. Manifacier, J. Gasiot and J.P. Fillard,
1976 ]. An optical constant is sometimes called a complex refractive index and is described by the
expression of (n-ik), where n and k are the refractive index and the extinction coefficient respectively of
the film. Measurements of the optical constants of highly absorbing thin films on transparent or slightly
absorbing substrates have been extensively investigated. Especially the method based on only a single
measurements of the transmission spectrum at normal incidence is widely used to determine the refractive
index and extinction coefficient of a film(R. Swanepoel,1984 ). Also, there are the method of interference
of the spectral transmittance and reflectance ( Özcan Bazkir,2007 ).
Theoretical considerations:
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2. Journal of Natural Sciences Research www.iiste.org
ISSN 2224-3186 (Paper) ISSN 2225-0921 (Online)
Vol.1, No.4, 2011
In the highly absorbing films, according to the notation of Heaven, the reflectance can approach to the
following formula :
(n − 1) 2 − k 2
Rf = (1)
(n + 1) 2 + k 2
In the above approach the sample is considered to be in air so n0=1, the refractive index of vacuum and
practically the incident rays are quasi-parallel.
In the fundamental absorption region (i.e., αf ≥ 105 cm-1 or αfdf ≥ 1), transmission measurements become
impractical and the optical constants have to be determined from reflectivity measurements alone. This is
possible, in principle, when the amplitude r and phase angle θ of the complex reflectivity are both
determined as a function of hω as follows:
−
r (ω ) = r (ω )e iθ (2)
It is achieved in ellipsometry where the polarization state of a light beam impinging at non-normal
incidence onto the specimen surface is a analyzed ( J.D .Joannopoulos and G.Lucovsky, 1984). Since
ellipsometry is very surface sensitive, it has so far been applied to study the growth and the oxidation of
plasma deposited amorphous films. An ε2 spectrum of HF etched a-SiH is given in (J.D .Joannopoulos and
G.Lucovsky ,1984). It is possible to derive both r(ω) and θ(ω) from measurements of |r2|2 at normal
incidence alone using the Kramers-Kronig dispersion relationship between r and θ (Özcan Bazkir,2007 ),
as follows:
ω0 ln r (ω )
θ (ω0 ) = − ∫
∞
dω (3 )
π 0
ω 2 − ω02
On the other hand the phase angle θ = 2π/λ( n - ik ).d ( 4)
d is the film thickness.
df nf film nf = (n -ik)
n1 ≡ ns substrate
no =1 d2
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3. Journal of Natural Sciences Research www.iiste.org
ISSN 2224-3186 (Paper) ISSN 2225-0921 (Online)
Vol.1, No.4, 2011
Figure ( 1 ) demonstrates the optical constants used in the calculation of thin highly absorbing film
The Kramers-Kronig relationship links the value of θ at a particular frequency ω0 to an integral over
reflectivities extending over all energies hω. The latter is, however, only known over a limited region in ω
and methods have therefore been developed to extrapolate r(ω) to very low or very high frequencies in a
physically reasonable way.
The sum rules relations are considerable help in this procedure. The most useful of these in the present
work is that which relates ε∞, the long wavelength dielectric constant to an integral over ε2 (ω) .
The advantage of the methods that use the envelope of transmittance or reflectance measurements is that
the dispersion of the complex refractive index of the index of a thin film is obtained easily. The
disadvantage. However, is that the thin film must be thick (J.M.Gonzalez-leal,R.Prieto-
Alcon,M.Stuchlik,M.Vlcek,S.R.Elliott,E.Marquez,2004 ). Here there is no new method for n and k
determination of the film . But an improvement to obtain the accurate values of the optical constants by
comparing two methods, one of them is the interference method and the other is a method depends on the
spectral reflectance of the film involved the correction of the multi-reflections inside the substrate.
The theoretical idea of this work is the determination of the optical constants nf and kf for the highly
absorbing films using the measured reflectance Rf at normal incidence using KK relations.
Results and discussions:
The reflectance of the samples has been measured by double beam spectrophotometer with high accuracy
± 1% as shown in figure ( 2 ). To obtain the accurate values of the optical constants by comparing two
methods, one of them is the interference method which depends on the maxima and minima of the
transmittance and reflectance (Yanfi Zheng and Kazuo kikuchi,1997), the other is a method depends on the
spectral reflectance of the film involved the correction of the multi-reflections inside the substrate. Figures
( 2 ) shows the experimental spectral reflectance of Rh film, by applying equation (3),we calculated the
values of the phase angle using the measured reflectance data, the value of θ has been found to be 1.8435 .
Then by substitution in equation ( 2 ) and computing the Fresnel coefficients, the real refractive index n
and k have been determined, it is noted that the values of n and k are nearly equal as the thickness of the
film decreases and the wavelength λ increases.
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4. Journal of Natural Sciences Research www.iiste.org
ISSN 2224-3186 (Paper) ISSN 2225-0921 (Online)
Vol.1, No.4, 2011
0 2 4 6 8 10
0.44 10
Rh-film 14 nm
8
reflectaance %
6
0.43
4
2
0.42 0
400 500 600 700 800
wavelength λ
Figure ( 2a) illustrates the spectral reflectance of Rh film (14nm ) meaured
by the spectrophotometer
0 2 4 6 8 10
10
0.59
B
8
0.58
Reflectance %
0.57 6
0.56 4
0.55
2
0.54
0
350 400 450 500 550 600 650 700 750 800
wavelength λ
Figure ( 2b) illustrates the spectral reflectance of Rh film (27 nm ) meaured
by the spectrophotometer
In this work the values of θ have been calculated from the integral ( 3 ) over the range from 1.55 - 4.14
eV. By solving equations ( 1 ) and ( 4 ), the real refractive index n can be determined , then the extinction
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ISSN 2224-3186 (Paper) ISSN 2225-0921 (Online)
Vol.1, No.4, 2011
coefficient k can be estimated by equation ( 1 ). Where d is the film thickness and λ is the incidence
wavelength.
ω0 in the calculations has been taken to be around 0.75*1015 Hz , and the interval dω was 1 Hz. As the
extrapolation of the reflectance increases , this means more accuracy.
The integral ( 3 ) has been estimated numerically using a computerizing program, the uncertainty of
estimation within ± 2%.
Table. ( 1 ) : A comparison between the calculated and reported values of the refractive index n and the
extinction coefficient K for the Rh films
Material Wavelength Thickness Measured Refractive Extinction
λ reflectivity coefficient k
t R index nkk kk
nf Kf
nm
Rh 450 0.4367 2.550 2.551 2.4 3.28
500 0.4322 2.500 2.522 2.6 3.40
550 14.2 0.4311 2.50 2.51 2.78 3.53
600 0.4294 2.50 2.51 2.95 3.65
650 0.4284 2.50 2.50 3.11 3.77
700 0.4282 2.497 2.50 3.23 3.91
450 0.5597 2.50 3.54 2.27 3.25
500 0.5649 2.56 3.58 2.39 3.41
Rh 550 27.1 0.5698 2.60 3.62 2.51 3.58
600 0.5745 2.62 3.69 2.62 3.74
650 0.5770 2.65 3.70 2.75 3.88
700 0.5797 2.70 3.76 2.78 4.03
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ISSN 2224-3186 (Paper) ISSN 2225-0921 (Online)
Vol.1, No.4, 2011
*Reported n and k according to ( Arndt D.P, Borgongo . J. P. et al,1984).
Table (1) illustrates the values of the calculated refractive index nkk and the extinction coefficient kkk of the
absorbing film comparing them with that determined by interference method of R(λ) and T(λ). It is clear
that the error between the two values is acceptable with respect to this type of measurements around ± 5%.
The advantage of this method its accuracy because the optical constants directly determine from the
measured spectral reflectance R(λ) of the film especially the metal films at normal incidence.
Conclusions:
-From the previous analysis it was conclude that the optical constants of film depend on the method of
calculation. The accuracy of the suggested method depends on the extrapolation of the curve of the
spectral reflectance of the sample.
-It is preferable to use the spectral reflectance measured by the spectrophotometer at normal incidence as
the film is highly absorbing and the thickness is thin.
-Table ( 1 ) are very important in the calculation of the optical constants of the highly absorbing films.
References:
Arndt.D.P,Borgongo.J.P.,Azzam.R.M,Bennett.J.P,(1984),(Multiple determination of the optical constants
of thin-film coating materials),Applied Optics,vol.23,No.20,3571-3580.
Borgongo . J. P. , Lazarides . B., and Pelletier . E,(1982),( Automatic determination of the optical constants
of inhomogeneous thin films ), Applied optics , vol . 21, No. 22, page 4020.
D.A.Minkov, (1989). ( Calculation of the optical constants of a layer upon a transparent substrate from the
reflection spectra ),J.Phys.D:Appl.Phys.22,1157.
J.C. Manifacier, J. Gasiot and J.P. Fillard, (1976 ), ( A simple method for the determination of the optical
constants and thickness of weakly absorbing films ), J. Phys. E., 9, 1002-1004 .
J.D .Joannopoulos and G.Lucovsky, (1984),(The physics of hydrogenated amorphous silicon II ), Springer-
Verlag ,Berlin Heidelberg.
Jyh-Jian Chen, Jenn- Der Lin, Long-Jye Sheu, (1999), (Simultaneous measurements of spectral optical
properties and thickness of an absorbing thin films on a substrate ),Thin Solid Films, 354, 176 -186.
J.M.Gonzalez-leal,R.Prieto-Alcon,M.Stuchlik,M.Vlcek,S.R.Elliott,E.Marquez,(2004),.
Optical Material, 27,147.
Özcan Bazk,ir, (2007),(Determination of optical constants of silicon photodiode from reflectivity
measurements at normal incidence of light),optics and laser engineering vol.45,issue 1,245.
R. Swanepoel,(1983),( Determination of the thickness and optical constants of amorphous silicon),
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R. Swanepoel, (1984),( Determination of the thickness and optical constants of the films using transmission
spectrum ),J.Phys.E:Sci.Instrum.17,896.
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Vol.1, No.4, 2011
Yanfi Zheng and Kazuo kikuchi,(1997), ( Analytical method of determining optical constants of weakly
absorbing thin film ),Applied optics vol,36,No.25,6325-6326.
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