MOSFETs are field-effect transistors where the conductivity of the device is controlled by the amount of voltage applied to the gate. There are two main types - n-channel and p-channel MOSFETs. MOSFETs operate by inducing an n-type or p-type channel between the source and drain when a sufficient voltage is applied to the gate, allowing current to flow. Proper biasing of the MOSFET is important to establish a stable operating point and ensure the device operates in saturation for all expected input signals.
Mosfet
MOSFETs have characteristics similar to JFETs and additional characteristics that make them very useful.
There are 2 types:
• Depletion-Type MOSFET
• Enhancement-Type MOSFET
Mosfet
MOSFETs have characteristics similar to JFETs and additional characteristics that make them very useful.
There are 2 types:
• Depletion-Type MOSFET
• Enhancement-Type MOSFET
The electronics industry has achie ved assuser6feece1
The electronics industry has achieved a phenomenal growth over the last few decades, mainly due to the rapid advances in large scale integration technologies and system design applications. With the advent of very large scale integration (VLSI) designs, the number of applications of integrated circuits (ICs) in high-performance computing, controls, telecommunications, image and video processing, and consumer electronics has been rising at a very fast pace.
Enhancement type Metal Oxide Semiconductor Field Effect Transistor, Basic Operation, Drain Characteristics, Transfer Characteristics, Regions of Operation
Prepare A ppt
Topic: Resistance Welding Contentts of the presentation ppt
1, Introduction definition and type
2,Mechanism, schematically
3,processparameters and control
4,Materials and applications
5,Advantage and challenge
Title: Resistance Welding: Process, Parameters, and Applications
Slide 1: Introduction
- Definition: Resistance welding is a process that generates heat through the resistance of metal to the localized flow of electric current[3].
- Types: Resistance Spot Welding (RSW), Resistance Seam Welding (RSEW), Resistance Projection Welding (PW or RPW), High Frequency Resistance Welding (HFRW), Percussion Welding (PEW), and Stud Welding (SW)[1].
Slide 2: Mechanism
- The resistance of metal to the localized flow of current produces heat[3].
- Process variables: Current, time, and force[3].
- Electrodes: Copper base materials, divided into classes. Truncated cone, dome point, and pointed electrodes[3].
Slide 3: Process Parameters and Control
- Operating window: Lobe curve, constant electrode force, acceptable nugget size, time (cycles of current), nugget too small, expulsion, current (1000’s of amperes), roll spot weld, overlapping seam weld, and continuous seam weld[3].
- Electrode tips wear during service, causing nugget size to decrease[3].
Slide 4: Materials and Applications
- High speed, < 0.1 seconds in automotive spot welds[3].
- Excellent for sheet metal applications, < ¼-inch[3].
- No filler metal process, suitable for joining similar and dissimilar metals[3][4].
- Common applications: Automobile, aircraft, machinery manufacturing, and structural/ship building[5].
Slide 5: Advantages and Challenges
- Advantages: High production rates, no filler metal required, lends itself to mechanization and automation, lower operator skill, and high production rates possible[4].
- Challenges: Higher equipment costs than arc welding, power line demands, nondestructive testing, low tensile and fatigue strength, not portable, electrode wear, and lap joint requires additional metal[3].
Citations:
[1] Resistance Welding PowerPoint Presentation, free download https://www.slideserve.com/chapa/resistance-welding
[2] Resistance welding | PPT - SlideShare https://www.slideshare.net/slideshow/resistance-welding-91956561/91956561
[3] Resistance Welding PowerPoint Presentation, free download https://www.slideserve.com/shanae/resistance-welding
[4] WELDING PROCESSES Arc Welding Resistance Welding Oxyfuel Gas ... https://slideplayer.com/slide/5702123/
[5] PPT PRESENTATION OF WELDING - SlideShare https://www.slideshare.net/SurendraKumarDewanga/ppt-presentation-of-welding
Design of up converter at 2.4GHz using Analog VLSI with 22nm Technologyijsrd.com
Up converter has been designed in 0.18μm technology at 2.4GHz Frequency. I am trying to design up converter with 22nm technology. The problems related to Up converter is often difficult to solve, and may allow different solutions, so the choice is not always simple for those engineers and professionals who are not trained in Analog VLSI. The optimal solution of Problem of Power dissipation is usually a mix of solutions for a specific situation. In such a situation, it is necessary to identify that problem and propose different solutions. Initially the thesis gives a basic idea of up converter and also about CMOS. Later on it tries to simulate the basic gates. And a detailed insight is provided with the help of a simulation using Tspice Simulator. Power Dissipation in 0.18μm Technology using current mirror gilbert mixer is 4.5 mW and in 0.25μm Technology using current mirror gilbert mixer is 3.5mW and Power Dissipation in 0.18μm Technology is 8.1mW using Gilbert mixer. Now I am trying to design mixer with low power dissipation with 22nm technology which is recent technology.
Field Effect Transistor is a transistor that is voltage controlled devices. It has higher input impedance and less sensitive to temperature variations.
Unit 8 - Information and Communication Technology (Paper I).pdfThiyagu K
This slides describes the basic concepts of ICT, basics of Email, Emerging Technology and Digital Initiatives in Education. This presentations aligns with the UGC Paper I syllabus.
Welcome to TechSoup New Member Orientation and Q&A (May 2024).pdfTechSoup
In this webinar you will learn how your organization can access TechSoup's wide variety of product discount and donation programs. From hardware to software, we'll give you a tour of the tools available to help your nonprofit with productivity, collaboration, financial management, donor tracking, security, and more.
The electronics industry has achie ved assuser6feece1
The electronics industry has achieved a phenomenal growth over the last few decades, mainly due to the rapid advances in large scale integration technologies and system design applications. With the advent of very large scale integration (VLSI) designs, the number of applications of integrated circuits (ICs) in high-performance computing, controls, telecommunications, image and video processing, and consumer electronics has been rising at a very fast pace.
Enhancement type Metal Oxide Semiconductor Field Effect Transistor, Basic Operation, Drain Characteristics, Transfer Characteristics, Regions of Operation
Prepare A ppt
Topic: Resistance Welding Contentts of the presentation ppt
1, Introduction definition and type
2,Mechanism, schematically
3,processparameters and control
4,Materials and applications
5,Advantage and challenge
Title: Resistance Welding: Process, Parameters, and Applications
Slide 1: Introduction
- Definition: Resistance welding is a process that generates heat through the resistance of metal to the localized flow of electric current[3].
- Types: Resistance Spot Welding (RSW), Resistance Seam Welding (RSEW), Resistance Projection Welding (PW or RPW), High Frequency Resistance Welding (HFRW), Percussion Welding (PEW), and Stud Welding (SW)[1].
Slide 2: Mechanism
- The resistance of metal to the localized flow of current produces heat[3].
- Process variables: Current, time, and force[3].
- Electrodes: Copper base materials, divided into classes. Truncated cone, dome point, and pointed electrodes[3].
Slide 3: Process Parameters and Control
- Operating window: Lobe curve, constant electrode force, acceptable nugget size, time (cycles of current), nugget too small, expulsion, current (1000’s of amperes), roll spot weld, overlapping seam weld, and continuous seam weld[3].
- Electrode tips wear during service, causing nugget size to decrease[3].
Slide 4: Materials and Applications
- High speed, < 0.1 seconds in automotive spot welds[3].
- Excellent for sheet metal applications, < ¼-inch[3].
- No filler metal process, suitable for joining similar and dissimilar metals[3][4].
- Common applications: Automobile, aircraft, machinery manufacturing, and structural/ship building[5].
Slide 5: Advantages and Challenges
- Advantages: High production rates, no filler metal required, lends itself to mechanization and automation, lower operator skill, and high production rates possible[4].
- Challenges: Higher equipment costs than arc welding, power line demands, nondestructive testing, low tensile and fatigue strength, not portable, electrode wear, and lap joint requires additional metal[3].
Citations:
[1] Resistance Welding PowerPoint Presentation, free download https://www.slideserve.com/chapa/resistance-welding
[2] Resistance welding | PPT - SlideShare https://www.slideshare.net/slideshow/resistance-welding-91956561/91956561
[3] Resistance Welding PowerPoint Presentation, free download https://www.slideserve.com/shanae/resistance-welding
[4] WELDING PROCESSES Arc Welding Resistance Welding Oxyfuel Gas ... https://slideplayer.com/slide/5702123/
[5] PPT PRESENTATION OF WELDING - SlideShare https://www.slideshare.net/SurendraKumarDewanga/ppt-presentation-of-welding
Design of up converter at 2.4GHz using Analog VLSI with 22nm Technologyijsrd.com
Up converter has been designed in 0.18μm technology at 2.4GHz Frequency. I am trying to design up converter with 22nm technology. The problems related to Up converter is often difficult to solve, and may allow different solutions, so the choice is not always simple for those engineers and professionals who are not trained in Analog VLSI. The optimal solution of Problem of Power dissipation is usually a mix of solutions for a specific situation. In such a situation, it is necessary to identify that problem and propose different solutions. Initially the thesis gives a basic idea of up converter and also about CMOS. Later on it tries to simulate the basic gates. And a detailed insight is provided with the help of a simulation using Tspice Simulator. Power Dissipation in 0.18μm Technology using current mirror gilbert mixer is 4.5 mW and in 0.25μm Technology using current mirror gilbert mixer is 3.5mW and Power Dissipation in 0.18μm Technology is 8.1mW using Gilbert mixer. Now I am trying to design mixer with low power dissipation with 22nm technology which is recent technology.
Field Effect Transistor is a transistor that is voltage controlled devices. It has higher input impedance and less sensitive to temperature variations.
Unit 8 - Information and Communication Technology (Paper I).pdfThiyagu K
This slides describes the basic concepts of ICT, basics of Email, Emerging Technology and Digital Initiatives in Education. This presentations aligns with the UGC Paper I syllabus.
Welcome to TechSoup New Member Orientation and Q&A (May 2024).pdfTechSoup
In this webinar you will learn how your organization can access TechSoup's wide variety of product discount and donation programs. From hardware to software, we'll give you a tour of the tools available to help your nonprofit with productivity, collaboration, financial management, donor tracking, security, and more.
Francesca Gottschalk - How can education support child empowerment.pptxEduSkills OECD
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The Roman Empire, a vast and enduring power, stands as one of history's most remarkable civilizations, leaving an indelible imprint on the world. It emerged from the Roman Republic, transitioning into an imperial powerhouse under the leadership of Augustus Caesar in 27 BCE. This transformation marked the beginning of an era defined by unprecedented territorial expansion, architectural marvels, and profound cultural influence.
The empire's roots lie in the city of Rome, founded, according to legend, by Romulus in 753 BCE. Over centuries, Rome evolved from a small settlement to a formidable republic, characterized by a complex political system with elected officials and checks on power. However, internal strife, class conflicts, and military ambitions paved the way for the end of the Republic. Julius Caesar’s dictatorship and subsequent assassination in 44 BCE created a power vacuum, leading to a civil war. Octavian, later Augustus, emerged victorious, heralding the Roman Empire’s birth.
Under Augustus, the empire experienced the Pax Romana, a 200-year period of relative peace and stability. Augustus reformed the military, established efficient administrative systems, and initiated grand construction projects. The empire's borders expanded, encompassing territories from Britain to Egypt and from Spain to the Euphrates. Roman legions, renowned for their discipline and engineering prowess, secured and maintained these vast territories, building roads, fortifications, and cities that facilitated control and integration.
The Roman Empire’s society was hierarchical, with a rigid class system. At the top were the patricians, wealthy elites who held significant political power. Below them were the plebeians, free citizens with limited political influence, and the vast numbers of slaves who formed the backbone of the economy. The family unit was central, governed by the paterfamilias, the male head who held absolute authority.
Culturally, the Romans were eclectic, absorbing and adapting elements from the civilizations they encountered, particularly the Greeks. Roman art, literature, and philosophy reflected this synthesis, creating a rich cultural tapestry. Latin, the Roman language, became the lingua franca of the Western world, influencing numerous modern languages.
Roman architecture and engineering achievements were monumental. They perfected the arch, vault, and dome, constructing enduring structures like the Colosseum, Pantheon, and aqueducts. These engineering marvels not only showcased Roman ingenuity but also served practical purposes, from public entertainment to water supply.
Synthetic Fiber Construction in lab .pptxPavel ( NSTU)
Synthetic fiber production is a fascinating and complex field that blends chemistry, engineering, and environmental science. By understanding these aspects, students can gain a comprehensive view of synthetic fiber production, its impact on society and the environment, and the potential for future innovations. Synthetic fibers play a crucial role in modern society, impacting various aspects of daily life, industry, and the environment. ynthetic fibers are integral to modern life, offering a range of benefits from cost-effectiveness and versatility to innovative applications and performance characteristics. While they pose environmental challenges, ongoing research and development aim to create more sustainable and eco-friendly alternatives. Understanding the importance of synthetic fibers helps in appreciating their role in the economy, industry, and daily life, while also emphasizing the need for sustainable practices and innovation.
How to Make a Field invisible in Odoo 17Celine George
It is possible to hide or invisible some fields in odoo. Commonly using “invisible” attribute in the field definition to invisible the fields. This slide will show how to make a field invisible in odoo 17.
A Strategic Approach: GenAI in EducationPeter Windle
Artificial Intelligence (AI) technologies such as Generative AI, Image Generators and Large Language Models have had a dramatic impact on teaching, learning and assessment over the past 18 months. The most immediate threat AI posed was to Academic Integrity with Higher Education Institutes (HEIs) focusing their efforts on combating the use of GenAI in assessment. Guidelines were developed for staff and students, policies put in place too. Innovative educators have forged paths in the use of Generative AI for teaching, learning and assessments leading to pockets of transformation springing up across HEIs, often with little or no top-down guidance, support or direction.
This Gasta posits a strategic approach to integrating AI into HEIs to prepare staff, students and the curriculum for an evolving world and workplace. We will highlight the advantages of working with these technologies beyond the realm of teaching, learning and assessment by considering prompt engineering skills, industry impact, curriculum changes, and the need for staff upskilling. In contrast, not engaging strategically with Generative AI poses risks, including falling behind peers, missed opportunities and failing to ensure our graduates remain employable. The rapid evolution of AI technologies necessitates a proactive and strategic approach if we are to remain relevant.
2. FET
EE, UEM Jaipur 2
Field Effect Transistor (FET)
• The conductivity (or resistivity) of the path between two contacts, the
source and the drain, is altered by the voltage applied to the gate.
– Device is also known as a voltage controlled resistor.
3. MOSFETs
EE, UEM Jaipur 3
A metal–oxide–semiconductor field-effect transistor (MOSFET, MOS-
FET, or MOS FET) is a field-effect transistor where the voltage
determines the conductivity of the device.
The ability to change conductivity with the amount of applied voltage can
be used for amplifying or switching electronic signals.
MOSFETs are now even more common than BJTs (bipolar junction
transistors) in digital and analog circuits.
6. MOSFET : Structure
Typically L = 0.03 μm to 1 μm, W = 0.05
μm to 100 μm, and the thickness of the
oxide layer (tox) is in the range of 1 to
10 nm.
EE, UEM Jaipur 6
perspective view;
Cross section.
7. MOSFET : Operation
EE, UEM Jaipur 7
Operation with Zero Gate Voltage:
• With zero voltage applied to the gate, two back-to-back diodes exist in
series between drain and source.
• n+ drain region and the p-type substrate,
• p-type substrate and the n+ source region.
• These back-to-back diodes prevent current conduction from drain to
source when a voltage VDS isapplied.
• The path between drain and source has a very high resistance (of the
order of 1012 Ω).
8. MOSFET : Operation
Channel for Current Flow:
• Source & Drain are grounded and
applied a positive voltage to the
gate (VGS).
VGS
• repells the free holes from the
• Positive VGS attracts electrons from
the n+ source and drain regions
into the channel region
region of the substrate under the
gate (the channel region).
• These holes are pushed downward
into the substrate, leaving behind a
carrier-depletion region.
• When a sufficient number of electrons
EE, UEM Jaipur 8
accumulate near the surface of the
substrate under the gate, an n region is
in effect created, connecting the source
and drain regions,
10. MOSFET : Operation
• The channel is created by inverting
the substrate surface from p type
to n type. Hence the induced
channel is also called an inversion
layer.
Channel for Current Flow:
• If a voltage is applied between
drain and source, current flows
through this induced n region.
• The induced n region thus forms a
channel for current flow from
drain to source
• This is called an n-channel
MOSFET or an NMOS transistor.
The excess of VGS over Vt is termed the
EE, UEM Jaipur 10
effective voltage or the overdrive
voltage and is the quantity that
determines the charge in the channel.
Here, VGS −Vt ≡VOV
Note: An n-channel MOSFET is formed in a p-type
substrate
11. MOSFET
EE, UEM Jaipur 11
• Gate and Channel region of the MOSFET form a parallel-plate
capacitor, with the oxide layer acting as the capacitor dielectric.
• Positive gate voltage causes positive charge to accumulate on the top
plate of the capacitor (the gate electrode).
• Negative charge on the bottom plate is formed by the electrons in the
induced channel.
• This field controls the amount of charge in the channel hence it
determines the channel conductivity when a voltage VDS isapplied.
• This is the origin of the name “field-effect transistor” (FET).
12. MOSFET : Operation
Applying a Small VDS:
• The voltage VDS causes a
current iD to flow through the
induced n channel.
• Current is carried by free
electrons traveling from source
to drain
• An NMOS transistor with VGS >
Vt and with a small VDS applied.
The device acts as a resistance
whose value is determined by
VGS.
• Specifically, the channel
conductance is proportional to
VGS – Vt , and thus iD is
proportional to (VGS –Vt)VDS. depletion region is not
shown for simplicity.
EE, UEM Jaipur 12
13. MOSFET : Operation
EE, UEM Jaipur 13
• Applying a Small VDS:
• The iD – VDS characteristics of
the MOSFET when the voltage
applied between drain and
source, vDS, is kept small.
• The device operates as a
linear resistance whose value
is controlled by VGS.
14. MOSFET : Operation
Operation of the enhancement NMOS
transistor as VDS is increased. The induced
channel acquires a tapered shape, and its
vDS
resistance increases as is increased.
Here, vGS is kept constant at a value > Vt ;
VGS = Vt +VOV.
The drain current iD Vs VDS for an
enhancement-type NMOS transistor
operated with
VGS = Vt +VOV.
EE, UEM Jaipur 14
20. Biasing in MOS Amplifier Circuits
EE, UEM Jaipur 20
• An essential step in the design of a MOSFET amplifier circuit is the
establishment of an appropriate dc operating point for the transistor.
• This step is also known as biasing or bias design.
• An appropriate dc operating point or bias point is characterized by a
stable and predictable dc drain current ID and by a dc drain-to-source
voltage VDS that ensures operation in the saturation region for all
expected input-signal levels.
• Types of Biasing:
– Biasing by Fixing VGS
– Biasing by Fixing VG and Connecting a Resistance in the Source
– Biasing Using a Drain-to-Gate Feedback Resistor
– Biasing Using a Constant-Current Source
21. Biasing in MOS Amplifier Circuits
Biasing by Fixing VGS:
• The most common approach to biasing a MOSFET is to fix its gate-to-
source voltage VGS to the value required to provide the desiredID.
• This voltage is derived from the power supply voltage VDD through the
use of an appropriate voltage divider.
• Independent of how the voltage VGS may be generated, this is not a
good approach to biasing a MOSFET.
Because we know that,
And the threshold voltage VO the oxide-capacitance COX, and transistor
aspect ratio W/L vary widely among devices of same size and type.
EE, UEM Jaipur 21
22. Biasing in MOS Amplifier Circuits
• Biasing by Fixing VGS:
• Biasing by fixing VGS is not a
good technique.
• Figure two iD-vGS characteristic
curves representing extreme
values in a batch of MOSFETs
of the same type.
• For the fixed value of VGS, the
resultant spread in the values
of the drain current can be
substantial.
EE, UEM Jaipur 22
23. Biasing in MOS Amplifier Circuits
EE, UEM Jaipur 23
Biasing by Fixing VG and Connecting a
Resistance in the Source:
• An excellent biasing technique for discrete
MOSFET circuits consists of fixing the dc voltage
at the gate, VG, and connecting a resistance in the
source lead, as shown in figure.
We can write,
VG = VGS + RSID
24. Biasing in MOS Amplifier Circuits
EE, UEM Jaipur 24
Biasing by Fixing VG and Connecting a
Resistance in the Source:
• If VG >> VGS, ID will be determined by the values
of VG and RS.
• If VG > VGS, resistor Rs provides negative
feedback, which will stabilize the value of the bias
current ID.
• From equation, when ID increases & VG is
constant, VGS will decrease. Which will further
decrease ID.
• Thus the Rs works to keep ID as constant as
possible.
• This negative feedback action of Rs gives it the
name degeneration resistance.
VG = VGS + RSID
25. Biasing in MOS Amplifier Circuits
EE, UEM Jaipur 25
Biasing by Fixing VG and Connecting a Resistance in the Source:
• Figure shows the iD – vGS characteristics
for two devices that represent the
extremes of a batch of MOSFETs.
• A straight line that represents the
constraint imposed by the bias circuit—
namely.
• The intersection of this straight line with
the iD –vGS characteristic curve provides
the coordinates (ID and VGS) of the bias
point.
• In this case, the variability obtained in ID
is much smaller. Also, note that the
variability decreases as VG and Rs are
made larger.
26. Biasing in MOS Amplifier Circuits
Biasing by Fixing VG and Connecting a
Resistance in the Source:
Practical implementation using a single
supply:
• The circuit utilizes one power-supply VDD and
derives VG through a voltage divider (RG1,RG2).
• Since IG = 0, RG1 and RG2 can b e selected to b e
very large (in the M Ω range), allowing the
MOSFET to present a large input resistance to a
signal source
EE, UEM Jaipur 26
27. Biasing in MOS Amplifier Circuits
Biasing Using a Drain-to-Gate Feedback
Resistor:
• A simple and effective biasing arrangement utilizing
a feedback resistor connected between the drain
and the gate is shown in figure.
• Here the large feedback resistance RG (usually in
the M Ω range) forces the dc voltage at the gate to
be equal to that at the drain (because IG =0).
Thus we can write
VGS = VDS = VDD – RDID
Which can be rewritten in the form
VDD = VGS + RDID
EE, UEM Jaipur 27
28. Biasing in MOS Amplifier Circuits
• Biasing Using a Drain-to-Gate Feedback
Resistor:
• If ID increases due to any reason, then VGS must
decrease.
• The decrease in VGS in turn causes a decrease in
ID.
• Thus the negative feedback or degeneration
provided by RG works to keep the value of ID as
constant as possible.
VGS = VDS = VDD – RDID
VDD = VGS + RDID
EE, UEM Jaipur 28
29. Biasing in MOS Amplifier Circuits
Biasing Using a Constant-Current Source:
• The most effective scheme for biasing a MOSFET
amplifier is that using a constant-current source, as
shown in figure.
• Here RG (usually in M Ω range) establishes a dc
ground at the gate and presents a large resistance
to an input signal source that can be capacitively
coupled to the gate.
• Resistor RD establishes an appropriate dc voltage
at the drain to allow for the required output signal
swing while ensuring that the transistor always
remains in the saturation region.
EE, UEM Jaipur 29
31. Small-Signal Operation and Models
EE, UEM Jaipur 31
• Consider the conceptual amplifier circuit
shown in figure.
• Here the MOS transistor is biased by
applying a dc voltage VGS, and the input
signal to be amplified, vgs, is superimposed
on the dc bias voltage VGS.
• The output voltage is taken at the drain.
Conceptual circuit to
study the operation
of the MOSFET as a
small-signal amplifier
32. Small-Signal Operation and Models
• DC Bias Point:
• The dc bias current ID can be found by setting the
signal vgs to zero;
Thus,
Here, VOV = VGS −Vt is the overdrive voltage at
which the MOSFET is biased to operate.
The dc voltage at the drain, VDS, will be
VDS = VDD −RDID
EE, UEM Jaipur 32
33. Small-Signal Operation and Models
• DC Bias Point:
• T
o ensure saturation-region
must have
VDS > VOV
operation, we
• Furthermore, since the total voltage at the
drain will have a signal component
superimposed on VDS, VDS has to be
sufficiently greater than VOV to allow for the
required negative signal swing.
EE, UEM Jaipur 33
34. Small-Signal Operation and Models
Signal Current in the Drain Terminal:
• Consider the situation with the input signal vgs
applied.
• The total instantaneous gate-to-source voltage
will be
vGS = VGS + vgs
resulting in a total instantaneous drain current
iD,
dc bias current ID
current component that is directly proportional to the input signal vgs
represents nonlinear distortion.
EE, UEM Jaipur 34
35. Small-Signal Operation and Models
• Signal Current in the Drain Terminal:
• To reduce the nonlinear distortion introduced by the MOSFET, the input
signal should be kept small so that
resulting in
or, equivalently,
If this small-signal condition is satisfied, then iD can be expressedas
iD ≈ ID +id
where
id = kn(VGS −Vt)vgs
EE, UEM Jaipur 35
36. Small-Signal Operation and Models
The parameter that relates id and vgs is the MOSFET transconductance
gm,
or in terms of the overdrive voltage VOV ,
gm = kn VOV
EE, UEM Jaipur 36
37. Small-Signal Operation and Models
shows a
• Figure
graphical
of the
interpretation
small-signal
operation of the
MOSFET amplifier.
• Note that gm is equal to
the slope of the iD–vGS
characteristic at the bias
point,
Small-signal operation
of the MOSFET amplifier
EE, UEM Jaipur 37
38. Small-Signal Operation and Models
Voltage Gain:
• Total instantaneous drain voltage vDS asfollows:
vDS = VDD −RDiD
• Under the small-signal condition, we have
vDS = VDD −RD(ID +id)
• which can be rewritten as
vDS = VDD −Rdid
• Thus the signal component of the drain voltage is
Vds =−idRD =−gmvgsRD
which indicates that the voltage gain is given by
The minus sign indicates that the output signal vds is 180° out of phase with respect
to the input signal vgs.
Conceptual circuit to
study operation of the
MOSFET
EE, UEM Jaipur 38
39. Small-Signal Operation and Models
Voltage Gain:
• The input signal is assumed to have a triangular
waveform with an amplitude much smaller than
2(VGS – Vt), the small-signal condition to ensure
linear operation.
• For operation in the saturation (active) region at
all times, the minimum value of vDS should not
fall below the corresponding value of vGS by
more than Vt.
• The maximum value of vDS should be smaller
than VDD; otherwise the FET will enter the cutoff
region and the peaks of the output signal
waveform will be clipped off.
Conceptual circuit to
study operation of
the MOSFET
EE, UEM Jaipur 39
40. Small-Signal Operation and Models
Voltage Gain:
Conceptual circuit to study
operation of the MOSFET
EE, UEM Jaipur 40
Total instantaneous voltages vGS and vDS
41. Small-Signal Operation and Models
EE, UEM Jaipur 41
Small-Signal Equivalent-Circuit Models:
• The FET behaves as a voltage-controlled current source.
• It accepts a signal vgs between gate and source and provides a current
gm.vgs at the drainterminal.
• The input resistance of this controlled source is very high — ideally,
infinite.
• The output resistance — is also high.
42. Small-Signal Operation and Models
Small-Signal Equivalent-Circuit Models:
Small-signal models for the MOSFET:
Neglecting the dependence of iD
on vDS in the active region
including the
modulation,
resistance
effect of channel-length
modeled by output
EE, UEM Jaipur 42
43. Small-Signal Operation and Models
Small-Signal Equivalent-Circuit Models:
• In the analysis of a MOSFET amplifier circuit,
the transistor can be replaced by the
equivalent-circuit model shown in Figure.
• The rest of the circuit remains unchanged
except that ideal constant dc voltage sources
are replaced by short circuits.
• Most serious shortcoming of this model is that
it assumes the drain current in saturation to
be independent of the drain voltage, but
actually drain current depends on vDS in a
linear manner.
• Such dependence was modeled by a finite
resistance ro between drain andsource,
Neglecting the
dependence of iD on vDS in
the active region
EE, UEM Jaipur 43
including the effect of channel-
length modulation,
46. MOSFET as Amplifier
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• In the saturation region, the MOSFET acts as a voltage-controlled
current source: Changes in the gate-to-source voltage vGS gives rise to
changes in the drain current iD.
• Thus the saturated MOSFET can be used to implement a
transconductance amplifier
47. MOSFET as Amplifier
Large-Signal Operation:
The Transfer Characteristic:
• Grounded source terminal is common to
both the input and output.
• Here, changes in v1 (vGS = v1) give rise to
changes in iD, we are using a resistor RD to
obtain an output voltage v0
v0 = vDS = VDD – RD.iD
In this way the transconductance amplifier
is converted into a voltage amplifier.
• To determine the voltage transfer
characteristic of the CS amplifier, we will
assume vj to be in the range of 0 toVDD.
Basic structure of
common-source amplifier
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48. MOSFET as Amplifier
Large-Signal Operation-The Transfer Characteristic:
Basic structure of
common-source amplifier
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Transfer characteristic of the amplifier
49. MOSFET as Amplifier
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Large-Signal Operation:
The Transfer Characteristic:
vDS = VDD – RD.iD
• Straight line on iD-vDS characteristics
curves shows the iD - vDS relationship.
• Since vGS = v1 , for v1 < Vt the transistor
will be cut off, iD will be zero, and v0 =
vDS = VDD (pointA).
• As Vi exceeds Vt the transistor turns on,
iD increases, and v0 decreases.
• This corresponds to points along the
segment of the load line from A to B.
• We have identified a particular point in
this region of operation and labeled it
Q. It is obtained for VGS = VIQ and has
the coordinates V0Q = VDSQ and IDQ.
Transfer characteristic
of the amplifier
50. MOSFET as Amplifier
of the amplifier
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Large-Signal Operation:
The Transfer Characteristic:
• Saturation-region operation continues
until v0 decreases below Vt.
• At this point, vDS = vGS - VD and the
MOSFET enters its triode region.
• This is refers to point B in graph.
Point B is defined by v0B = v1B – Vt.
• For Vi > VIB, the transistor is driven
deeper into the triode region.
• The characteristic curves in the triode
region are bunched together, the output
voltage decreases slowly towards zero.
• Here we have identified a particular
operating point C obtained for v1 = VDD.
• The corresponding output voltage VOC will
usually be very small. Transfer characteristic
51. MOSFET as Amplifier
Large-Signal Operation-The Transfer Characteristic:
Basic structure of
common-source amplifier
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Transfer Characteristics
52. MOSFET as Amplifier
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Large-Signal Operation:
The Transfer Characteristic:
Point C obtained for vi = VDD.
The corresponding output voltage
VOC will usually be very small.
This point-by-point determination of
the transfer characteristic results in
the transfer curve shown in figure.
Observe that we have delineated
its three distinct segments, each
corresponding to one of the three
regions of operation of MOSFET
Q1.
Transfer Characteristics
53. MOSFET as Amplifier
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MOSFET as a Switch:
• When the MOSFET is used as a switch, it is operated at the extreme
points of the transfer curve.
• The device is turned off by keeping, v < Vt. Here, v0 =VDD.
• The switch is turned on by applying a voltage close to VDD. Here, v0 is
very small.
• The common-source MOS circuit can be used as a logic inverter with
the "low" voltage level close to 0 V and the "high" level close to VDD.
54. MOSFET as Amplifier
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MOSFET as a Switch:
Operation as a Linear Amplifier
• To operate the MOSFET as an amplifier, saturation-mode is maintained.
• The device is biased at a somewhere near to the middle of the transfer
curve. The voltage signal to be amplified vt is then superimposed on the
dc voltage VIQ.
• By keeping vt sufficiently small to restrict operation to an almost linear
segment of the transfer curve, the resulting output voltage signal v0 will
be proportional to vt.
• That is, the amplifier will be very nearly linear, and vQ will have the same
waveform as vt except that it will be larger by a factor equal to the
voltage gain of the amplifier at Q.
55. MOSFET as Amplifier
MOSFET as a Switch:
Operation as a Linear Amplifier
Thus the voltage gain is equal to the slope of the transfer curve at the
bias point Q.
The slope is negative, hence the basic CS amplifier is inverting.
If the amplitude of the input signal v, the output signal will become
distorted since operation will no longer be restricted to an almost linear
segment of the transfer Curve.
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56. MOSFET as Amplifier
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MOSFET as a Switch:
Analytical Expressions for the
Transfer Characteristic:
• From the i-v relationships we can see
that, the MOSFET operates in three
regions — cutoff, saturation, and
triode.
• Cutoff – Region Segment, XA:
Here, vi < Vt, and v0 = VDD.
• Saturation – Region Segment, AQB:
Here, vi, ≥ Vt and
v0 ≥ vi - Vt
• Triode-Region Segment, BC:
Here, vi ≥ Vt and v0 ≤ vi – Vt
Transfer characteristic
of the amplifier
58. Single Stage MOS Amplifier
• The Basic Structure:
• Figure shows the basic circuit to implement
the various configurations of discrete-circuit
MOS amplifiers.
• Due to effectiveness and simplicity constant-
current biasing technique is used for biasing
the MOS transistor.
• Figure indicates the dc current and the dc
voltages resulting at various nodes.
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59. Single Stage MOS Amplifier
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Characterizing Amplifiers:
1. The amplifier is with a signal source having an open-circuit voltage vsig
and an internal resistance Rsig. These are the parameters of an actual
signal source. Similarly, RL is an loadresistance.
2. Parameters Ri, R0, Avs, Ais, and Gm pertain to the amplifier proper; that is,
they do not depend on the values of Rsig and RL. By contrast, Rin, Rout,
Av, Ai, Gv0, and Gv may depend on one or both of Rsig and RL.
3. As mentioned above, for nonunilateral amplifiers, Rin may depend on RL,
and Rout may depend on Rsig. No such dependencies exist for unilateral
amplifiers, for which Rin = Ri and Rout = R0.
4. The loading of the amplifier on the signal source is determined by the
input resistance Rin. The value of Rin determines the current that the
amplifier draws from the signal source. It also determines the proportion
of the signal vsig that appears at the input of the amplifier.
60. Single Stage MOS Amplifier
• Characterizing Amplifiers:
• Figure shows an amplifier fed with a signal source having an open-
circuit voltage vsig and an internal resistanceRsig.
• These can be the parameters of an actual signal source,
• The amplifier is shown with a load resistance RL connected to the output
terminal.
• Here, RL can be an actual load resistance or the input resistance of a
succeeding amplifier stage in a cascade amplifier.
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61. Single Stage MOS Amplifier
• Characterizing Amplifiers:
• Figure shows the amplifier circuit with the amplifier block replaced by its
equivalent-circuit model.
• The input resistance Rin represents the loading effect of the amplifier
input on the signal source.
Rin and Rsig forms a voltage divider that reduces vsig to the value vi
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62. Single Stage MOS Amplifier
• Characterizing Amplifiers:
• The second parameter in characterizing amplifier performance is the
open-circuit voltage gain Avo, defined as
The last parameter is the output resistance Ro. From figure, Ro is the
resistance seen looking back into the amplifier output terminal with vi set
to zero.
As Ro is determined with vi = 0, the value of Ro does not depend on Rsig.
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63. Single Stage MOS Amplifier
• CharacterizingAmplifiers:
Output voltage vo
Voltage gain of the amplifier, Av
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Overall voltage gain, Gv
65. Single Stage MOS Amplifier
CS Amplifier:
• Figure shows a common-source (CS) amplifier fed with a signal source
vsig having a source resistanceRsig.
• Analyze this circuit to determine Rin, Avo , and Ro. Here, assume RD is
part of the amplifier; thus if a load resistance RL is connected to the
amplifier output, RL appears in parallel with RD. In such a case, we wish
to determine Av and Gv as well.
• Replacing the MOSFET with its hybrid-π model (without ro), we obtain
the CS amplifier equivalent circuit as shown in second figure.
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68. MOSFET Internal Capacitances
• Various internal
capacitances, are shown
for n-channel MOSFET
operating in the
saturation region.
• There are four internal
capacitances:
Cgs
• and Cgd, result from
the gate-capacitance
effect;
• Csb and Cdb, are the
depletion capacitances of
the pn junctions formed
by the source region and
the substrate, and the
drain region and the
substrate, respectively.
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69. MOSFET Internal Capacitances
• The polysilicon gate forms a parallel-plate capacitor with the channel
region, where oxide layer works as dielectric.
• The gate (or oxide) capacitance per unit gate area is denoted Cox. When
the channel is tapered and pinched off, the gate capacitance is given by
2/3 WLCox.
• There are two other small capacitances resulting from the overlap of the
gate with the source region (or source diffusion) and the drain region (or
drain diffusion).
• Each of these overlaps has a length Lov and thus the resulting overlap
capacitances Cov are givenby
Typically, Lov = 0.05 to0.1L.
We can now express the gate-to-source capacitance Cgs as
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70. MOSFET Internal Capacitances
• For the gate-to-drain capacitance, we note that the channel pinch-off at
the drain end causes Cgd to consist entirely of the overlap component
Cov ,
The depletion-layer capacitances of the two reverse-biased pn junctions
formed between each of the source and the drain diffusions and the p-
type substrate.
Thus, for the source diffusion, we have the source-body capacitance,
Csb,
where Csb0 is the value of Csb at zero body-source bias, VSB is the
magnitude of the reverse-bias voltage, and V0 is the junction built-in
voltage (0.6 V to 0.8 V).
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71. MOSFET Internal Capacitances
• Similarly, for the drain diffusion, we have the drain-body capacitance
Cdb,
where Cdb0 is the capacitance value at zero reverse-bias voltage and
VDB is the magnitude of this reverse-bias voltage. Note that we have
assumed that for both junctions, the grading coefficient m = 1/2 .
Problem: For an n-channel MOSFET with tox = 10 nm, L = 1.0 μm, W =
10 μm, Lov = 0.05 μm, Csb0 = Cdb0 = 10 fF, V0 = 0.6 V, VSB = 1 V and
VDS = 2 V. Calculate the following capacitances when the transistor is
operating in saturation: Cox, Cov , Cgs, Cgd , Csb, and Cdb.
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Ans: Cox = 3.45 fF/μm2;
Cgd = 1.72 fF;
Cov = 1.72 fF;
Csb = 6.1 fF;
Cgs = 24.7 fF;
Cdb = 4.1 fF
73. MOSFET High Frequency Model
• Figure shows the small-signal model of the MOSFET, including the four
capacitances Cgs, Cgd , Csb, andCdb.
• This model is used to predict the high-frequency response of MOSFET
amplifiers.
High-frequency, equivalent-circuit model for the MOSFET
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74. MOSFET High Frequency Model
• When the source is connected to the body, the model simplifies
considerably, as shown in figure.
• In this model, Cgd, although small, plays a significant role in determining
the high-frequency response of amplifiers and thus must be kept in the
model.
The equivalent circuit for source is connected to the substrate
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75. MOSFET High Frequency Model
• Capacitance Cdb, can usually be neglected, resulting in significant
simplification of manual analysis.
• The resulting circuit is shown in figure.
The equivalent-circuit model with Cdb neglected
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76. MOSFET High Frequency Model
• Figure shows the high-frequency T model in its simplified form.
The simplified high-frequency T model
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77. MOSFET High Frequency Model
MOSFET High-Frequency Model: Summary
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78. MOSFET High Frequency Model
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• Problem: Calculate fT for the n-channel MOSFET whose capacitances
were found in Exercise 10.3. Assume operation at 100 μA and that kn =
160 μA/V2.
• Ans. 3.4 GHz
80. Frequency Response of CS Amplifier
Magnitude of the gain of a discrete-circuit MOS amplifier
versus frequency
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81. Frequency Response of CS Amplifier
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• Figure shows, at lower frequencies, the magnitude of the amplifier gain
falls off due to coupling and bypass capacitors. Here, it is assumed that
their impedances were small enough to act as short circuits.
• At midband frequencies, as the frequency of the input signal is lowered,
the reactance 1/jωC of each of these capacitors becomes significant,
this results in a decrease in the overall voltage gain of the amplifier.
• Lower and upper cut-off frequency fL & fH, are the frequencies at which
the gain drops by 3 dB below its value in midband.
• BW = fH −fL (discrete-circuit amplifiers)
• BW = fH (integrated-circuitamplifiers)
83. CMOS Inverter
The CMOS inverter is constructed by using
nMOS & pMOS transistors.
As the pMOS transistor passes strong 1 and
weak 0, it is connected to the supply voltage
VDD and
nMOS transistor passes strong 0 and weak
1, it is connected to the ground.
CMOS inverter
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84. CMOS Inverter
Circuit Operation:
• Consider the two extreme cases:
• When vi is at logic-0 level, which is 0 V, and
when vi is at logic-1 level, which is VDD volts.
• In both cases, for ease of exposition we
shall consider the n-channel device QN to be
the driving transistor and the p-channel
device QP to be the load.
• As circuit is symmetric, this assumption is
arbitrary, and the reverse would lead to
identical results.
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85. CMOS Inverter
Circuit Operation:
Circuit with vi =VDD
equivalent circuit
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86. CMOS Inverter
Circuit Operation:
Circuit with vi = 0V
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equivalent circuit