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Nexray A. Dommann A , H. von Känel C , P. Gröning B , N. Blanc A , C. A. Bosshard A , A. D. Brenzikofer A , S. Giudice A , R. Jose James A , R. Kaufmann A ,  C. Kottler A , C. Lotto A , A. Neels A , P. Niedermann A , P. Seitz A , G. Spinola Durante A ,  C. Urban A , H.R. Elsener B , O. Gröning B , B. Batlogg C ,  C.V. Falub C , K. Mattenberger C , E. Müller C , P. Wägli C Bern, 13. 5. 2011 A: CSEM;  B: EMPA,  C: ETHZ Network of integrated miniaturized X-ray systems operating in complex environments
A system approach Source Sample Detector Contrast mechanism Resolution, Size, Efficiency Spectrum, power,  Coherence, Size Miniaturized, fast and programmable X-ray sources   Phase contrast X-ray imaging Direct X-ray detectors Breakthroughs in all key building blocks of X-ray systems: Sources, Contrast mechanism and Detectors
Network of integrated miniaturized X-ray systems operating in complex environments Single-photon solid-state X-ray detection Si-Ge layers for high-energy X-ray detection Phase contrast X-ray imaging Miniaturized, fast and programmable X-ray sources
Static Computed Tomography ,[object Object],[object Object]
Novel Concepts of Applications ,[object Object],[object Object],[object Object],[object Object],[object Object],High frequency source modulation  compatible with ToF-technology Allows for distance measurement  to object in reflexion geometry
Medicine and Nondestructive Testing ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
A system approach Source Sample Detector Contrast mechanism Resolution, Size, Efficiency Spectrum, power,  Coherence, Size Miniaturized, fast and programmable X-ray sources   Phase contrast X-ray imaging Direct X-ray detectors
X-ray source microfabrication Extraction   Anode Emission Cathode Diamond X-ray Window
Plasma Enhanced-CVD growth of CNTs Utilization of a Plasma during deposition  allows the growth  of vertically oriented CNTs Ni dot of Da =  70  nm -> catalyst for growth of straight CNTs TiN for homogenisation of CNTs electron emission
X-ray source packaging aspects ,[object Object],[object Object],[object Object],[object Object],[object Object],Pt UBM Au UBM showing good hermeticity ζ  phase Eutectic  gold tin Au UBM
High vacuum sealing of test vehicle ,[object Object],[object Object],[object Object],[object Object],CNT substrate Thin film getter µPirani AuSn solder ring
X-ray source experimental platform: The concept
Silicon chips for cathodes ,[object Object],[object Object],[object Object]
Microfabricated grids 2 x 2 mm grid 10 µm grid lines Diced wafer
Emission characteristics:  longtime-stability Applied elec. field 20, 100, 500 µA Longtime measurement: 13 h Distance: 20 µm Emission current:  50 µA (constant) I-V measurement after longtime test
A system approach Source Sample Detector Contrast mechanism Resolution, Size, Efficiency Spectrum, power,  Coherence, Size Miniaturized, fast and programmable X-ray sources   Phase contrast X-ray imaging Direct X-ray detectors
Low-Energy Plasma-Enhanced CVD (LEPECVD) •  Electrons emitted by a hot filament sustain a DC plasma •  Low (~10eV) ion energy – no ion damage •  Discharge confined by a magnetic field (~1 mT) •  Deposition rates 0.01-10nm/s depending on gas flow and plasma density •  Gas phase precursors: SiH 4 , GeH 4
CHALLENGES: Mismatched Epitaxy, e.g. Si-Ge Si Ge cracks Si Ge TD MD Ge Si •  Lattice mismatch  ( strain = 4.2 %). •  Mismatch of thermal expansion coefficients.  ,[object Object]
Problems related to Si:Ge Epitaxy LATTICE MISMATCH   (a Si  = 0.543095 nm, a Ge  = 5.564613 nm      a/a = 4.2 %  compressive )  Ge % Si Ge ,[object Object],[object Object],Threading dislocations Strained Ge on Si substrate strained  Ge bulk Si a ┴ > a Si a ║  = a Si relaxed  Ge bulk Si Misfit Relaxed SiGe on Si substrate a 0 a 0 Misfit Threading
Monolithic Integration on CMOS Wafers Demonstrated ,[object Object],[object Object],[object Object]
INNOVATION: Self-aligned epitaxial Ge crystals Micromachined Si pillars Epitaxial Ge pillars on Si Ge Si 5   m Ge ~30   m No limitation for layer thickness!
INNOVATION: Selective Epitaxy on pre-patterned Si  Ge fully relaxed Ge partially  strained (0.14%) Perfect crystal structure despite lattice strain! Perfect basic  understanding  of the growth morphology Simulations Experiment
Defect free Pillars
Nexray detector technology & chip schematic concept
SiGe Pillars RSMs on Ge/Si(004) and Ge/Si(115) – measured on patterned part of the wafer Relaxed Ge (115)   (004) Si-Substrate Patterned:  Very small mosaicity. No tilt compared to #56558.
Photon Counting Circuits  ,[object Object],[object Object],[object Object],[object Object],[object Object]
THANK YOU FOR YOUR ATTENTION

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Nexray

  • 1. Nexray A. Dommann A , H. von Känel C , P. Gröning B , N. Blanc A , C. A. Bosshard A , A. D. Brenzikofer A , S. Giudice A , R. Jose James A , R. Kaufmann A , C. Kottler A , C. Lotto A , A. Neels A , P. Niedermann A , P. Seitz A , G. Spinola Durante A , C. Urban A , H.R. Elsener B , O. Gröning B , B. Batlogg C , C.V. Falub C , K. Mattenberger C , E. Müller C , P. Wägli C Bern, 13. 5. 2011 A: CSEM; B: EMPA, C: ETHZ Network of integrated miniaturized X-ray systems operating in complex environments
  • 2. A system approach Source Sample Detector Contrast mechanism Resolution, Size, Efficiency Spectrum, power, Coherence, Size Miniaturized, fast and programmable X-ray sources Phase contrast X-ray imaging Direct X-ray detectors Breakthroughs in all key building blocks of X-ray systems: Sources, Contrast mechanism and Detectors
  • 3. Network of integrated miniaturized X-ray systems operating in complex environments Single-photon solid-state X-ray detection Si-Ge layers for high-energy X-ray detection Phase contrast X-ray imaging Miniaturized, fast and programmable X-ray sources
  • 4.
  • 5.
  • 6.
  • 7. A system approach Source Sample Detector Contrast mechanism Resolution, Size, Efficiency Spectrum, power, Coherence, Size Miniaturized, fast and programmable X-ray sources Phase contrast X-ray imaging Direct X-ray detectors
  • 8. X-ray source microfabrication Extraction Anode Emission Cathode Diamond X-ray Window
  • 9. Plasma Enhanced-CVD growth of CNTs Utilization of a Plasma during deposition allows the growth of vertically oriented CNTs Ni dot of Da = 70 nm -> catalyst for growth of straight CNTs TiN for homogenisation of CNTs electron emission
  • 10.
  • 11.
  • 12. X-ray source experimental platform: The concept
  • 13.
  • 14. Microfabricated grids 2 x 2 mm grid 10 µm grid lines Diced wafer
  • 15. Emission characteristics: longtime-stability Applied elec. field 20, 100, 500 µA Longtime measurement: 13 h Distance: 20 µm Emission current: 50 µA (constant) I-V measurement after longtime test
  • 16. A system approach Source Sample Detector Contrast mechanism Resolution, Size, Efficiency Spectrum, power, Coherence, Size Miniaturized, fast and programmable X-ray sources Phase contrast X-ray imaging Direct X-ray detectors
  • 17. Low-Energy Plasma-Enhanced CVD (LEPECVD) • Electrons emitted by a hot filament sustain a DC plasma • Low (~10eV) ion energy – no ion damage • Discharge confined by a magnetic field (~1 mT) • Deposition rates 0.01-10nm/s depending on gas flow and plasma density • Gas phase precursors: SiH 4 , GeH 4
  • 18.
  • 19.
  • 20.
  • 21. INNOVATION: Self-aligned epitaxial Ge crystals Micromachined Si pillars Epitaxial Ge pillars on Si Ge Si 5  m Ge ~30  m No limitation for layer thickness!
  • 22. INNOVATION: Selective Epitaxy on pre-patterned Si Ge fully relaxed Ge partially strained (0.14%) Perfect crystal structure despite lattice strain! Perfect basic understanding of the growth morphology Simulations Experiment
  • 24. Nexray detector technology & chip schematic concept
  • 25. SiGe Pillars RSMs on Ge/Si(004) and Ge/Si(115) – measured on patterned part of the wafer Relaxed Ge (115) (004) Si-Substrate Patterned: Very small mosaicity. No tilt compared to #56558.
  • 26.
  • 27. THANK YOU FOR YOUR ATTENTION