1. Nano-particle analysis using dark beam sensor
Meir Teichner
Alberta Nano-Monitoring Systems Ltd., 10504 Princess Elizabeth Ave., NovaNAIT Suite
W207-J, Edmonton, Alberta, Canada T5G 3K4
Abstract:
In the Semicon industry with patterns down to the 10 nm range, nano particles
contamination affects yield. The detection of these particles down to 20nm and below is
critical for the process.
Here a nano-particle analyzer extending into the deep nanometer region is presented.
Unlike conventional optical particle sizing instruments that are based on the analysis of
light scattered by a whole ensemble of particles, the present instrument is a single particle
analytical tool1
. It exploits the characteristics of a specially structured focused laser beam
as it interacts with single particles. On one hand, the method possesses high sensitivity and
was tested down to the detection of 20 nm particles while, on the other hand, the beam-
particle interaction generates specific particle-dependent signature. Thus, in a sample of
particles the system can perform a clustering process where particles are classified
according to their distinct optical fingerprints even if they are of the same size.
Data is presented showing the sensitivity of the instrument to measuring nano particles and
distinguishing between particles of similar size but different nature. The application of the
novel measurement to industrial processes such as the manufacture of integrated circuits is
discussed.
References:
1. J. Shamir and N. Karasikov, “A method for particle size and concentration measurement”
Australian patent 2004256318 (2010) Valid from July 2004 and US patent 7746469 June
2010.
Keywords:
Singular beam, Nano-scale, Nano-particle monitoring