This document discusses the development of a new technology for monitoring nanoparticles in semiconductor processing solutions down to sizes of 5nm. It notes that current inspection tools have limitations of 40nm for pure chemicals and 150nm for slurries. The new method uses aerosol particle measurement technology to overcome these limitations. Key features include automatic online monitoring of particle size and concentration from 5nm to 1000nm in slurries, chemicals and ultra pure water. The technology has been in development since 2012 and prototypes are being tested with semiconductor manufacturers. Future work includes analyzing particle compositions.

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半導體製程用溶液之奈米粒子監控方案
Hsin-Chia Ho
Center for Measurement Standards
Industrial Technology Research Institute

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Yield
良率
VLSI Research, 26 March 2013
Without measurement it is
impossible to adjust complex
processes

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• The design rules shrink and new processes are introduced.
Source: 2015 IC Insights, KLA-Tencor
Recent high profile process
changes required enormous
engineering focus and led to
the implementation of new
inspection and metrology
steps to characterize the
associated defect and drive yield
learning.
---Excerpted from 2015 Solid State technology/Process
Watch: Increasing process steps and the tyranny of
numbers.
---Recent examples are immersion lithography, high-k metal
gates, gate-last integration, and FinFET transistor structures.
More and more inspection demands as

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More particles in 3D gate structures
• Replacement gate structures require more CMP steps (4X)
→ more particles. Fins aspect ratio increase. Fins become
structurally weaker.
• Many new materials are introduced in the semiconductor
manufacturing which result in particles with many different
compositions.
• Particle interaction with surface depends on their compositions.
Crucial Issue for 10nm Semiconductor Yield

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Metrology challenge in liquid particle measurement
• Defects are in starting materials, which impact yield
Proc. SPIE 9048, 90480P (17 April 2014)
Process Chemical, UPW
Metrology, Inspection, and Process Control for
Microlithography XXV, Steve McGarvey, Proc. of SPIE Vol.
7971, 79712P ·© 2011 SPIE
Slurry
Sub 10 nm
Defects
Michael Lercel, Senior Director of Nanodefectivity and Metrology,
SEMATECH, November 2012
• “Processes add very small particles (10 nm to 17 nm) that
CANNOT be detected with existing defect inspection tools”
- Michael Lercel, Senior director SEMATECH
Point of Use
Inspection
Materials Inspection
• Needed “eyes” for 20 nm technology node and beyond

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10 nm?
300 mm wafer
→ 10 nm particle

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7
Abbas Rastegar, “Particle Control Challenges in Process Chemicals and
Ultra-pure Water for sub-10 nm Technology Nodes”,
5
Technical comparison

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Current technique - light scattering
• Optical scattering signal limitation
• Signal intensity proportional to d6
• Multiple scattering result in significant errors in both SLS and
DLS
• Nano- and micro-bubble
2015/6/12 8
100 nm SiO2 100 nm PSL 290 nm PSL
0
20
40
60
80
100
~3.5 %~5 %
Detectionefficiency(%)
~100 %
http://www.machinerylubrication.com/Read/351/particle-counters
Nanobubble
Metrology gaps in particle measurement

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Breakthrough
Breakthrough of the measurement bottleneck for 5 nm particles :
• Current inspection tools for particles in liquid, based on light
scattering, limitation ≥ 40 nm for UPW and chemical
• ≥ 150 nm for slurry
• Solution to be transferred into aerosol particles, which frees those
particles from the interference of bubbles in the solution.
Method Range Feature
SuperSizer II
(pure chemical)
5 nm to
1000 nm
• Size and concentration of ultra-fine particle
• Excellent accuracy and resolution in size distribution
• Chemicals all-in-one design, set up by tool
SuperSizer I
(slurry)
5 nm to
1000 nm
• Size and concentration of working particles
• Additive (chemical) information
• Multiple channels auto-sampling monitor
Liquid particle
counter
40 nm to
5 μm
• Chemical inspection - Low concentration particle counter
• Interference of bubbles
• Poor accuracy and resolution
Particle sizing
system
≧ 150 nm • Slurry inspection - high concentration particle counter
• Only large particle count
• Interference of bubbles
• Non-consistence intra-instruments comparison

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Technology
• A new generation monitoring system of nanoparticles in
solution, based on aerosol particles measurement
technology
• Core technologies – Auto-sampling, Atomizing, Differential
mobility analyzing, Condensation particle counting
• 24/7 automatic on-line monitor of the size and concentration
of particles in slurries, chemical solutions and ultra pure
water
• Ultra-fine monitoring range from 5 nm to 1000 nm
sampling, dilute, mixture atomizing, drying
Condensation particle
countercharging
Differential
mobility analysis

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• 2012 – started collaboration with
semiconductor company
• 2013 – Alpha site for slurry
• 2014 – Beta site for slurry
• 2014 – invited talk and exhibition by,
“Parts Technology & Outsourcing
Workshop”, UMC
• 2015 – finalist of R&D 100 Awards
• 2016 – ITRI “傑出研究獎”
• 2016 – invited talk, “Liquid Particle
Counter Technolog” seminar, tsmc
Developed history & honor

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Product - SuperSizer
ITRI – SuperSizer I
Product SuperSizer
Samples/
Applications
Particle in chemical, Slurry, pure water,
bionanoparticles
Monitor
Parameters
Size, distribution, additive, concentration
Range 5 nm to 1000 nm
Concentration 1014 / cm3 @ 100 nm
Variation < 5%
Sampling 24/7 Auto-sampling for multiple samples
Data Distribution (size spectrum)
Stirring Air dynamic

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13
Abbas Rastegar, “Particle Control Challenges in Process Chemicals and
Ultra-pure Water for sub-10 nm Technology Nodes”,
5
Technical comparison

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More than size distribution - composition
Courtesy of Adrian Hess, Empa Switzerland
DMAS + ICP-MS Particle’s size and component
• Metallic contamination on Wet process tool

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Conclusion
• These projects are co-work with lead users in Taiwan. The
developed products are conducted by the needs of user.
• We are working with foundries and several material
suppliers to develop BKM for UPW and chemical monitors.
• The prototype of the monitor for pure chemicals and UPW
will be finished at 2017 Q1.
• Compositions of nanoparticle is a important issue, which is
under development.
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