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IC Mask Design Nmi Presentation 2009

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AdrianOShaughnessy

Yield and DFM in Layout at Nanometer Technologies

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“ Yield and DFM in Layout at Nanometer Technologies” NMI Conference, April 2 nd 2009
Yield: Introduction ,[object Object],[object Object],[object Object],[object Object],[object Object]
Yield: Introduction ,[object Object],Designs requiring full mask spins Designs operating as expected
[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],Design For Manufacture: Recommended Design Rules
[object Object],[object Object],Design For Manufacture: Recommended Design Rules Aggressive layout rules Relaxed layout rules Source/Drain short Source/Channel short Sticky Contact
[object Object],[object Object],[object Object],Design For Manufacture: Recommended Design Rules Increase poly endcap dimension Rounding error
[object Object],[object Object],[object Object],[object Object],[object Object],Design For Manufacture: Recommended Design Rules Increased metal/poly overlap of contact
[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],Design For Manufacture: Recommended Design Rules
[object Object],[object Object],[object Object],[object Object],[object Object],Design For Manufacture: Layout For High Yield
Design For Manufacture: Layout For High Yield ,[object Object],[object Object],[object Object],[object Object],[object Object]
Design For Manufacture: Layout For High Yield ,[object Object],[object Object],[object Object],[object Object],[object Object],Matched Devices Dummy Structures
[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],Design For Manufacture: Layout For High Yield Non-uniform polysilicon direction Uniform polysilicon direction
[object Object],[object Object],[object Object],[object Object],[object Object],Design For Manufacture: Lithography Aware/Friendly Layout
[object Object],Design For Manufacture: Lithography Aware/Friendly Layout
[object Object],Design For Manufacture: Lithography Aware/Friendly Layout Original Layout Data DFM Analysis Result Short Short Open
Design For Manufacture: VDSM Design Flow
Yield and DFM at Nanometer Technologies: Summary ,[object Object],[object Object],[object Object],[object Object],[object Object]

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IC Mask Design Nmi Presentation 2009