An Advanced Rapid Thermal Processing System with Multi-Gas Capabilities The RTP-3000 is a fully automated production system. The system with a 200mm chamber is capable of up to 6″ Compound Semiconductor, or with a 300mm chamber up to 12″ Silicon wafer processing.

1. 1SemiStar Corp. www.semistarcorp.com
SemiStar Corp.
380 Tennant Ave., Suite 5.
Morgan Hill, CA95037
Tel (408)612-1209
Email: sales@semistarcorp.com
Product Description
An Advanced Rapid Thermal Processing System with Multi-Gas Capabilities
The RTP-3000 is a fully automated production system. The system with a 200mm
chamber is capable of up to 6″ Compound Semiconductor, or with a 300mm chamber up
to 12″ Silicon wafer processing.
PROCESSES
• Contact alloying
• Implant activation
• Silicide formation
• Nitridation of metals
• Oxidation
• Glass reflow

2. 2SemiStar Corp. www.semistarcorp.com
SemiStar Corp.
380 Tennant Ave., Suite 5.
Morgan Hill, CA95037
Tel (408)612-1209
Email: sales@semistarcorp.com
FEATURES
• Dual-Arm Robot Transport
• Dual Cassette Platform
• Quartz Processing Chamber
• Quartz Wafer Processing Tray
• Four-layer Tungsten Halogen Lamp Array Heating
• Zone Control with unique lamp arrangement ensures highly uniform heating of up
to 12″ Silicon Wafers (300mm chamber) or 8″ Silicon Wafers / 6” GaAs Wafers with 8″
O.D. Susceptor (200mm chamber)
• Extended Range Pyrometer Plus (ERP+) internally cooled pyrometer for extended
temperature range from 350 – 1250 Degrees C
• Electro polished stainless steel (316L) gas plumbing with VCR Connectors
• MFC controlled gas lines, up to ten (10) gas lines available.
TEMPERATURE CONTROL
The RTP-3000 System features a loop temperature control algorithim with a temperature
control stability of +/- 2 deg. C from set point. This feature greatly simplifies
programming complex multi-step cycles, since no “tweaking” of system variables is
required. The Lamp Calibration feature allows user-optimization of heating uniformity.
Software diagnostics are provided to monitor each lamp and compensate for lamp aging
effects.
TEMPERATURE MEASUREMENT

3. 3SemiStar Corp. www.semistarcorp.com
SemiStar Corp.
380 Tennant Ave., Suite 5.
Morgan Hill, CA95037
Tel (408)612-1209
Email: sales@semistarcorp.com
The temperature measurement techniques available for the RTP-3000 system are
thermocouple, pyrometer. The type-K thermocouple is useful for low-temperature
processing and calibrating the pyrometer. The Extended Range Pyrometer Plus (ERP+)
internally cooled pyrometer can be used to measure wafer temperatures in the range of
350-1250 deg. C. (Actual range depends upon process, wafer type and system
configuration.)
SOFTWARE
An integrated software package has been developed to control the RTP-3000 System. The
software modules interactively serve to integrate the various functions and operations of
this system. Software features allow convenient recipe creation and editing. Process data
may be collected during a run cycle and stored in a data file for later display and analysis.
The process and recipe data files can be internally stored as DIF (Data Interchange
Format) which can be imported into popular software packages such as Lotus 1-2-3, as a
worksheet for display, plotting and further analysis.
RTP-3000 Software Features
• Real-Time Process Control
• Real-Time Graphics Display
• Real-Time Process Data Collection
• Recipe Editor
• Recipe Validation
• Process Data File Management

4. 4SemiStar Corp. www.semistarcorp.com
SemiStar Corp.
380 Tennant Ave., Suite 5.
Morgan Hill, CA95037
Tel (408)612-1209
Email: sales@semistarcorp.com
• Process Data File Display and Analysis
• System Diagnostics
• System Configuration Utilities
The valid time is subject to prior sale without notice.
Plasma Etcher, Pl ease Etchi ng, Dr y Etching, Dr yClean, Semiconductor Equi pment, Used Semiconductor Equi pment, Semiconductor Pr ocess Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rai nbow 4400, Lam R ainbow 4420, Lam R ainbow 4428, Lam R ainbow 4500, Lam Rai nbow 4520, Lam R ainbow 4528, Lam Rai nbow 4600, Lam R ainbow 4620, Lam R ai nbow 4628, Lam Rai nbow 4700, Lam R ainbow 4720, Lam Rai nbow 4728,
Plasma Asher, Pl asma Descum, Dr yCl ean, Semiconductor Equi pment, Used Semiconductor Equi pment, Semiconductor Pr ocess Equi pment, Matrix 105, M atri x 205, Matrix 303, M atri x 403,M atri x 106,Matrix 104, M atri x 102,M atri x 101, Matri x 10, System One Stripper, Model 105, System One Etcher , model 303, model 403
Plasma Asher, Pl asma Descum, Dr yCl ean, Semiconductor Equi pment, Used Semiconductor Equi pment, Semiconductor Pr ocess Equi pment, Br anson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher
Plasma Asher, Pl asma Descum, Dr yCl ean, D ownstr eam Asher,Semiconductor Equi pment, Used Semiconductor Equi pment, Semiconductor Pr ocess Equi pment, Gasonics Aura 1000, Gasonics Aur a 2000, Gasonics Aur a 3000, Gasonics L3510, Gasonics Aur a 3010
Plasma Etcher, Pl ease Etchi ng, Dr y Etching, Dr yClean, Semiconductor Equi pment, Used Semiconductor Equi pment, Semiconductor Pr ocess Equipment, Teg al 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Teg al 703,Tegal 801,Tegal 803,Teg al 981e,Teg al 903e
Plasma Etcher, Pl asma Etching, Dr y Etchi ng, Dr yCl ean, Semiconductor Equi pment, Used Semiconductor Eq uipment, Semiconductor Process Equi pment, Gasonics AE 2001, Microwave Etcher, Micr owave Pl asma Etcher, Micr owave Etch, Downstream Pl asma Etch
Rapi d Ther mal Process, Rapid Ther mal Pr ocessing, R apid Ther mal Anneal, R api d Ther mal Annealing, Rapid Ther mal Oxi dation, R apid Ther mal Ni tride, RTA, RTP, RTO, RTN,, Semiconductor Eq uipment, Used Semiconductor Eq uipment, Semiconductor Process Eq uipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associ ates, Heatpulse 210, H eatpulse 410, Mi nipulse 310, H eatpulse 610, Heatpul se 610I, AG Heatpulse 410, AG H eatpulse 610, AG H eatpulse 210, AG Mini pulse 310, Atmospheric R apid Ther mal Process, Vacuum R api d Ther mal Process, Furnace, Oven, Ther mal Fur nace, Ther mal Pr ocess, Ther mal Processi ng,JIPELEC, ag2146,JetClip,JetStar, AST SH S2000, AST STEAG 2800, ssintegration, R apid Ther mal Oxi de,JetFirst ,M attson, annealsys, heatpulse ,ag 2146,Koyo Thermo Systems,AST STEAG- MATTSON 2800, heat pulse, Sol aris, Eclipse ,modular pro, RLA-1000, AG H eatpulse, rapid ther mal pr ocessor, Steag AST SHS2000, Solaris 75,
Sol aris75,STEAG El ectr onic Systems ,eng-sol, Annealsys, R LA- 3000, Engi neering Sol uti ons ，Sol aris 150, R apid Thermal Anneal er , AS-Master ,modul arpr o,RTO ,M odular Pr ocess Technol ogy, Sol aris150,AS-One,AS-Micro,
Mgage 200, Mg age 300, M-gage 200, M-gage 300,Sheet Resistant measurement, M etrol og y, Tencor M-Gag e 300,Tencor M-Gag e 200, sheet r esistance, sheet r esistance Measurement, Semiconductor Equipment, Semiconductor metr olog y Equi pment, KLA-Tencor, Tencor
Per ki n-El mer 4400, Per kin- Elmer 4410, Per ki n-El mer 4450,Per kin-El mer 4480, Per ki n-El mer 2400, Per kin El mer 4400, Per ki n El mer 4410, Per ki n Elmer 4450,Per ki n El mer 4480, Per ki n Elmer 2400, Sputter, Mag netron Sputter, Di ode Sputter, DC Sputter , RF Sputter, DC M agnetron Sputter , RF M agnetron Sputter, C o-sputter, R eacti ve Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dr y Clean, Bias Functi on, C athode, Load l ock, Degas, Semiconductor Equipment, Used Semiconductor Equi pment, Semiconductor Process Equi pment,, Thi n Fil m, M etal Thin Film, Thin Fil m D eposi tion, PVD, Physical Vapor D epositi on