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Park Systems Pin point presentation
- 1. www.parkAFM.com Atomic Force MicroscopyPinPoint Nanomechanical Mode for Nanoscale Modulus Mapping – Cantilever Modulus and Applied Force Park Systems, Inc. July. 28, 2017
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- 5. Best Accuracy –Highest Resolution – Easiest to Use 5 Park AFM Scanner Decoupled XY and Z Scanners Park AFM Technology True Non-Contact™ Mode Park SmartScan™ Park AFM Operating Software
- 6. Learn more atwww.PARKafm.com 6
- 7. • How AFMworks • Why PinPoint Nanomechanical mode • PinPoint Nanomechanical mode technique • Influence of Probe Stiffness & Applied Force on Measured Modulus • CONTSCR • FMR • AC160TS Outline
- 8. AFM Basic Principle 8CopyrightPark Systems, Corp., All rights reserved. • Attractive force → Cantilever deflect towards the surface Repulsive Force Attractive Force Lenard Jones Plot AFM Schematic • AFM uses a cantilever with a sharp tip to scan the surface • Repulsive force → Cantilever deflect away from the surface • Cantilever deflection → Deflection of a reflected laser beam on PSPD • Feedback loop → Constant laser position → Constant probe-substrate distance → Record Z scanner position at every pixel • AFM image topography
- 9. • Slow Z-servoresponse → Difficulties in true Non-contact Imaging Conventional AFM – Major Problems • Piezo tube is not an orthogonal 3-D actuator → Image distortion Even after software flattening, flat surface does not “look” flat.
- 10. Park Systems –AFM Technology Innovation • Fast Z-servo → True Non- Contact AFM imaging • Flexure-based XY scanner → high-precision nanometroloy 90.0° 70.0 µm 70.0 µm Optical flat (80x80µm) 10 µm pitch calibration grating < 1 nm Single module parallel-kinematics x-y scanner
- 11. 15 μm < 5nm 0 Copyright Park Systems, Corp., All rights reserved. 11 Preload spring Kinematic pin Park Systems – AFM Technology Innovation • Z scanner straightness → Z scan out of motion < 0.015%
- 12. Park AFM –Capability beyond Topography 12Copyright Park Systems, Corp., All rights reserved. Nanomechanical Property Mapping Electrostatic Force Microscopy Magnetic Force Microscopy Scanning Ion Conductance Microscopy Nano-identation
- 13. 13Copyright Park Systems,Corp., All rights reserved. Conventional Mechanical Characterization Force Modulation Microscopy • Cantilever driven at a pre-set frequency → set amplitude and phase • Variation in sample mechanical properties → change in amplitude and phase • Height, FMM phase, FMM amplitude Topography FMM Phase Not Quantitative Force Distance (F-D) Spectroscopy Trace A B C E D • Indent a cantilever tip on sample surface → quantitative mechanical data • Trace → hardness/modulus • Retrace → stickiness/adhesion force • Height, modulus, adhesion force One Point at A Time = PinPointTM Mode
- 14. PinPointTM Mode Probe sample Electronics Controller Feedback control 14CopyrightPark Systems, Corp., All rights reserved. (A-B) d (Z displacement) F • The cantilever indents sample surface at each pixel → 256 × 256 pxl = 65536 FD curves • Cantilever deflection reaches threshold → Z scanner height recorded • Topography, stiffness and adhesion force maps are acquired simultaneously in real-time from high speed force-distance curves at each pixel. Force Threshold
- 15. PinPointTM Mode 15Copyright ParkSystems, Corp., All rights reserved. B. Stiffness & Modulus image: Calculated from selected range of FD curve A. Topography: Z-scanner movement captured as cantilever meets force threshold C. Adhesion Force image: Calculated from baseline of FD curve Force(nN) Z scanner travel distance (nm) approach retract Force threshold Stiffness calculating range Topography Δdistance (nm) Δforce(nN) Stiffness & Modulus Max. adhesion force Adhesion force
- 16. AFM Tip 16Copyright ParkSystems, Corp., All rights reserved. Modulus Calculation E*: Effective elastic modulus Indentation Displacement = d Surface AFM tip = Elastic sphere with radius R R F R d 𝐅 = 𝟒 𝟑 𝐄∗ 𝐑𝐝 𝟑 𝟏 𝐄∗ = 𝟏 − 𝐯𝐭𝐢𝐩 𝟐 𝐄𝐭𝐢𝐩 + 𝟏 − 𝐯𝐬𝐚𝐦𝐩𝐥𝐞 𝟐 𝐄 𝐬𝐚𝐦𝐩𝐥𝐞 E*: Effective elastic modulus v: Poisson’s ratio 𝑬 𝒔𝒂𝒎𝒑𝒍𝒆 = 𝑭 × 𝑬 𝒕𝒊𝒑 × (𝟏 − 𝒗 𝒔𝒂𝒎𝒑𝒍𝒆 𝟐 ) 𝟒 𝟑 𝑬 𝒕𝒊𝒑 𝑹𝒅 𝟑 − 𝑭 × (𝟏 − 𝒗 𝒕𝒊𝒑 𝟐 ) Applied force = F Dependence of Measured Modulus on: • Cantilever modulus • Applied force
- 17. The Instrument Park NX10AFM Park Systems (c) All rights reserved. The Experiment “The world’s most accurate AFM” “The easiest to use atomic force microscope”
- 18. 18Copyright Park Systems,Corp., All rights reserved. Sample & Probe Probe Calibrated Force Constant PPP-CONTSCR 0.236 N/m FMR 3.49 N/m AC160TS 25.5 N/m Polystyrene – low density polyolefin elastomer (PS- LDPE) sample 𝐸 𝑃𝑆 = ~2 𝐺𝑃𝑎 𝐸 𝑃𝐸 = ~0.1 𝐺𝑝𝑎 𝐸 𝑃𝑆 𝐸 𝑃𝐸 ≈ 20 Sample Probe
- 19. 19Copyright Park Systems,Corp., All rights reserved. PinPointTM Nanomechanical Mode in Action
- 20. 20Copyright Park Systems,Corp., All rights reserved. PinPointTM Nanomechanical Mode in Action
- 21. 21Copyright Park Systems,Corp., All rights reserved. PPP-CONTSCR (~0.2 N/m) : Topography 1 nN 2 nN 4 nN ↑Applied force/Set-point ↓Measured PE feature height • Higher applied force → higher loading on the sample → softer features more pushed down 0 -20 -40 -60 -80 nm 120 80 40 0 nm 50 nm 25 0 -25 -50 -75 0 1 2 3 4 5 µm
- 22. 30 20 10 0 MPa 0 1 23 4 5 µm 22Copyright Park Systems, Corp., All rights reserved. PPP-CONTSCR (~0.2 N/m) : Modulus 1 nN 2 nN 4 nN 10.8 MPa 0.5 MPa 1.2 MPa 26.2 MPa 35.2 MPa 1.8 MPa Setpoint (nN) Modulus – PE (MPa) Modulus – PS (MPa) Ratio 1 0.5 10.8 21.9 2 1.2 26.2 21.2 4 1.8 35.2 19.4 𝐄 𝐏𝐒 𝐄 𝐏𝐄 ≈ 𝟐𝟎 ↑Applied force/Set-point ↑Measured modulus
- 23. 0 1 23 4 5 µm 0 -20 -40 -60 nm 40 0 -40 -80 nm 80 120 80 40 0 nm 160 23Copyright Park Systems, Corp., All rights reserved. FMR (~3 N/m) : Topography 10 nN 20 nN 40 nN ↑Applied force/Set-point ↓Measured PE feature height • Higher applied force → higher loading on the sample → softer features more pushed down
- 24. 24Copyright Park Systems,Corp., All rights reserved. FMR (~3 N/m) : Modulus Setpoint (nN) Modulus – PE (MPa) Modulus – PS (MPa) Ratio 10 6.2 126 20.2 20 11.0 231 20.9 40 33.0 675 20.5 𝐄 𝐏𝐒 𝐄 𝐏𝐄 ≈ 𝟐𝟎 ↑Applied force/Set-point ↑Measured modulus 33 MPa 675 MPa231 MPa 11 MPa 126 MPa 6.2 MPa 10 nN 20 nN 40 nN 0 1 2 3 4 5 µm 800 600 400 0 200 MPa
- 25. 25Copyright Park Systems,Corp., All rights reserved. AC160TS (~26 N/m) : Topography 40 nN 80 nN 100 nN ↑Applied force/Set-point ↓Measured PE feature height • PE features more indented when compared to CONTSCR and FMR 0 -25 -50 -75 nm -100 40 0 -40 -80 nm 0 1 2 3 4 5 µm
- 26. 1264 MPa 64 MPa 1028MPa 54 MPa 380 MPa 19 MPa 26Copyright Park Systems, Corp., All rights reserved. AC160TS (~26 N/m) : Modulus Setpoint (nN) Modulus – PE (MPa) Modulus – PS (MPa) Ratio 40 19 380 20.0 80 54 1028 19.0 100 64 1264 19.8 𝐄 𝐏𝐒 𝐄 𝐏𝐄 ≈ 𝟐𝟎 ↑Applied force/Set-point ↑Measured modulus 40 nN 80 nN 100 nN 1.2 0.8 0.4 0 GPa 0 1 2 3 4 5 µm
- 27. 27Copyright Park Systems,Corp., All rights reserved. Discussion • ↑ Applied force, ↑ measured modulus • ↑ Spring constant, ↑ measured modulus • The calculated ratio remained ~20 for all three cantilevers PSModulusValue(Mpa)
- 28. Summary • Measured modulusvalues increase with applied force and cantilever force constant. • To obtain precise modulus values, a cantilever with proper force constant need to be selected. • Park PinPointTM mode can accurately measure relative sample modulus ratio/difference within a sample.
- 29. Thank you! 29Copyright ParkSystems, Corp., All rights reserved.