New analytic model of coupling and substrate capacitance in nanometer technologies

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NEW ANALYTIC MODEL OF COUPLING AND SUBSTRATE
CAPACITANCE IN NANOMETER TECHNOLOGIES
ABSTRACT:
In this paper, we propose a new modeling method for computing coupling
capacitance between interconnects on the same or different layers and substrate capacitance in
the nanometer very large-scale integration circuits. The model has been developed based on a
template, which is obtained on the basis of electric field approximation and followed by a
curvefitting technique to reach promising accuracy. To verify our proposed model, we develop
scripts to generate thousands of layout samples which cover all possible geometric situations for
CMOS 180-, 90-, and 65-nm technologies. The proposed model is compared with previously
published works with reference to the extracted results from commercial tools. The experimental
results show that the estimation errors of our method are much lower than 10% (2%–4% or less
for most of the cases) but with significantly reduced computation effort. The proposed model is a
general methodology that can be used for any nanometer technologies with different geometric
parameters

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