This document discusses processes for removing implanted photoresist and residual NiPt metal films. Ion implantation causes cross-linking and dehydration in photoresist, forming a high activation energy crust. Sulfuric acid and hydrogen peroxide solutions generate reactive radicals at high temperatures that can remove implanted photoresist and silicide metals. Optimizing the reaction chamber parameters allows these solutions to selectively remove implanted films.
APPLICATIONS OF PLA - POLY (LACTIC ACID) IN TISSUE ENGINEERING AND DELIVERY S...Ana Rita Ramos
Poly (lactic acid) is a thermoplastic derived from renewable resources and is at present, one of the most promising biodegradable and nontoxic biopolymers. In addition to its versatility and consequent large-scale production, PLA can be processed with a large number of techniques.
Due to its excellent mechanical properties and biocompatibility, this polymer is becoming largely applied in the biomedical field such as in tissue engineering for scaffolds and in delivery systems in the form of micro and nanoparticles. Furthermore, because it’s relatively cheap and an eco-friend, it has been considered as one of the solutions to lessen the dependence on petroleum-based plastics and solid waste problems.
In order to maximize the knowledge and development of this polymer, it is necessary to understand the material synthesis, proprieties, manufacturing processes, main applications, commercialization and its market state, which will be presented in this review.
1. Introduction
2. Poly (lactic acid)
2.1. Precursors
2.2. Synthesis
2.3. Proprieties
2.4. Processing
2.5. Biomedical Applications
2.6. Other Applications
3. Economic Potential of PLA
4. Conclusions
This document discusses selective epitaxial growth (SEG) of SiGe and Ge using chemical vapor deposition (CVD) for advanced MOS devices. It provides an introduction to epitaxy and selective epitaxial growth. Key points covered include pre-epitaxial cleaning to remove native oxide, properties of SiGe alloys, achieving selectivity against oxide and nitride, and examples of selective SiGe growth for quantum well field effect transistors (QWFETs) and raised source/drain applications to improve device performance.
APPLICATIONS OF PLA - POLY (LACTIC ACID) IN TISSUE ENGINEERING AND DELIVERY S...Ana Rita Ramos
Poly (lactic acid) is a thermoplastic derived from renewable resources and is at present, one of the most promising biodegradable and nontoxic biopolymers. In addition to its versatility and consequent large-scale production, PLA can be processed with a large number of techniques.
Due to its excellent mechanical properties and biocompatibility, this polymer is becoming largely applied in the biomedical field such as in tissue engineering for scaffolds and in delivery systems in the form of micro and nanoparticles. Furthermore, because it’s relatively cheap and an eco-friend, it has been considered as one of the solutions to lessen the dependence on petroleum-based plastics and solid waste problems.
In order to maximize the knowledge and development of this polymer, it is necessary to understand the material synthesis, proprieties, manufacturing processes, main applications, commercialization and its market state, which will be presented in this review.
1. Introduction
2. Poly (lactic acid)
2.1. Precursors
2.2. Synthesis
2.3. Proprieties
2.4. Processing
2.5. Biomedical Applications
2.6. Other Applications
3. Economic Potential of PLA
4. Conclusions
This document discusses selective epitaxial growth (SEG) of SiGe and Ge using chemical vapor deposition (CVD) for advanced MOS devices. It provides an introduction to epitaxy and selective epitaxial growth. Key points covered include pre-epitaxial cleaning to remove native oxide, properties of SiGe alloys, achieving selectivity against oxide and nitride, and examples of selective SiGe growth for quantum well field effect transistors (QWFETs) and raised source/drain applications to improve device performance.
A photoresist is a light-sensitive material used in several industrial processes, such as photolithography and photoengraving, to form a patterned coating on a surface.
PEEK is one of the material options that could replace titanium and zirconia in dental applications .It can be used as dental implants,abutments ,removable partial dentures .
The document provides information on the key steps of the photolithography process used in integrated circuit fabrication. These include applying a photoresist to the wafer via spin coating, soft baking to remove solvents, aligning a mask and exposing the photoresist to light, post exposure baking to refine the pattern, developing to remove exposed or unexposed areas of photoresist, and hard baking to harden the photoresist for subsequent etching or implantation steps. Proper execution of each step is important for high resolution patterning needed to manufacture advanced microchips.
Thermal oxidation of silicon produces silicon dioxide films of varying thickness and color. Capacitance-voltage measurements can be used to characterize semiconductor-insulator structures and extract properties like oxide thickness and charge densities. Advanced models have been developed to better understand oxidation kinetics and effects like oxidation-enhanced diffusion. Two-dimensional diffusion and stress effects due to volume expansion must be considered for non-planar silicon surfaces. Simulation tools can model oxidation processes and stress-dependent growth rates.
1) The document discusses pure polyurea coatings compared to hybrid polyurea/polyurethane and epoxy coatings.
2) Pure polyurea coatings have better properties like flexibility, chemical resistance, abrasion resistance, tensile strength and temperature resistance compared to hybrid and epoxy coatings.
3) Some key advantages of pure polyurea are that they are moisture insensitive, seamless, durable, and 100% solid which results in a coating with longer lifespan and better film quality than alternatives.
This document summarizes research on blending cyclic olefin copolymers (COC) with polyethylene to improve heat sealing characteristics. COC was found to improve seal strength, increase the sealing temperature window, and enhance hot tack strength when blended with LDPE, LLDPE, and plastomers. The highest improvements were seen with LLDPE and plastomers. COC is more compatible with LLDPE and plastomers than LDPE. Blending high Tg COC at levels above 20% provided seal-through capability to polyethylenes. In conclusion, COC/polyethylene blends can enhance modulus and heat sealing performance for packaging films.
Etching
In order to form a functional MEMS structure on a substrate, it is necessary to etch the thin films previously deposited and/or the substrate itself. In general, there are two classes of etching processes:
Wet etching where the material is dissolved when immersed in a chemical solution
Dry etching where the material is sputtered or dissolved using reactive ions or a vapour phase etchant
Indian Dental Academy: will be one of the most relevant and exciting training center with best faculty and flexible training programs for dental professionals who wish to advance in their dental practice,Offers certified courses in Dental implants,Orthodontics,Endodontics,Cosmetic Dentistry, Prosthetic Dentistry, Periodontics and General Dentistry.
Five keys to niche market in semi industry jchuSidewinder2011
The document discusses five keys to success in niche markets in the semiconductor manufacturing industry. 1) Niche markets exist just beyond current served markets. 2) Opportunities have limited windows and must be seized. 3) Profitability is the highest priority. 4) Strategy should focus on existing competencies. 5) Success comes from maximizing profit with minimum effort by leveraging competencies in niche markets.
A photoresist is a light-sensitive material used in several industrial processes, such as photolithography and photoengraving, to form a patterned coating on a surface.
PEEK is one of the material options that could replace titanium and zirconia in dental applications .It can be used as dental implants,abutments ,removable partial dentures .
The document provides information on the key steps of the photolithography process used in integrated circuit fabrication. These include applying a photoresist to the wafer via spin coating, soft baking to remove solvents, aligning a mask and exposing the photoresist to light, post exposure baking to refine the pattern, developing to remove exposed or unexposed areas of photoresist, and hard baking to harden the photoresist for subsequent etching or implantation steps. Proper execution of each step is important for high resolution patterning needed to manufacture advanced microchips.
Thermal oxidation of silicon produces silicon dioxide films of varying thickness and color. Capacitance-voltage measurements can be used to characterize semiconductor-insulator structures and extract properties like oxide thickness and charge densities. Advanced models have been developed to better understand oxidation kinetics and effects like oxidation-enhanced diffusion. Two-dimensional diffusion and stress effects due to volume expansion must be considered for non-planar silicon surfaces. Simulation tools can model oxidation processes and stress-dependent growth rates.
1) The document discusses pure polyurea coatings compared to hybrid polyurea/polyurethane and epoxy coatings.
2) Pure polyurea coatings have better properties like flexibility, chemical resistance, abrasion resistance, tensile strength and temperature resistance compared to hybrid and epoxy coatings.
3) Some key advantages of pure polyurea are that they are moisture insensitive, seamless, durable, and 100% solid which results in a coating with longer lifespan and better film quality than alternatives.
This document summarizes research on blending cyclic olefin copolymers (COC) with polyethylene to improve heat sealing characteristics. COC was found to improve seal strength, increase the sealing temperature window, and enhance hot tack strength when blended with LDPE, LLDPE, and plastomers. The highest improvements were seen with LLDPE and plastomers. COC is more compatible with LLDPE and plastomers than LDPE. Blending high Tg COC at levels above 20% provided seal-through capability to polyethylenes. In conclusion, COC/polyethylene blends can enhance modulus and heat sealing performance for packaging films.
Etching
In order to form a functional MEMS structure on a substrate, it is necessary to etch the thin films previously deposited and/or the substrate itself. In general, there are two classes of etching processes:
Wet etching where the material is dissolved when immersed in a chemical solution
Dry etching where the material is sputtered or dissolved using reactive ions or a vapour phase etchant
Indian Dental Academy: will be one of the most relevant and exciting training center with best faculty and flexible training programs for dental professionals who wish to advance in their dental practice,Offers certified courses in Dental implants,Orthodontics,Endodontics,Cosmetic Dentistry, Prosthetic Dentistry, Periodontics and General Dentistry.
Five keys to niche market in semi industry jchuSidewinder2011
The document discusses five keys to success in niche markets in the semiconductor manufacturing industry. 1) Niche markets exist just beyond current served markets. 2) Opportunities have limited windows and must be seized. 3) Profitability is the highest priority. 4) Strategy should focus on existing competencies. 5) Success comes from maximizing profit with minimum effort by leveraging competencies in niche markets.
This document discusses challenges with continuing to scale CMOS fabrication processes beyond 22nm. It presents information on:
1) Application requirements for high performance, low power, and low leakage in different device types like servers, phones, etc.
2) Trends in CMOS device resistance scaling and breakdown of external resistances like contact and silicide layers that contribute more at smaller nodes.
3) Projections that contact resistivity will exceed the ITRS roadmap target and require new materials to continue scaling beyond 22nm, along with thinner silicide layers required.
The document discusses project management for new product development. It outlines the key phases of product generating including market surveys, product definition, development, marketing, customer support and continuous improvement. It then provides details on project planning including defining work breakdown structures, milestones, activities, critical paths, buffers and allocating resources. An example case study of developing a new semiconductor metrology tool is also discussed.
The document discusses the key tasks of project management including planning, execution, and review. It outlines 6 tasks for project management: identifying projects and priorities, analyzing costs and benefits, identifying tasks and timelines, managing teams, engaging stakeholders, and setting up learning systems. It also provides 6 steps for laying out a project plan: defining a work breakdown structure, setting milestones, listing activities and relationships, determining the critical path, defining buffers, and allocating resources. The document emphasizes the importance of planning, tracking progress, and learning from projects.
Most Expected Presenter Final Report Of Wafer Cleaning Seminar 2007Sidewinder2011
The document summarizes a wafer cleaning seminar that took place in Shanghai, China in August 2007. 194 engineers from various semiconductor manufacturers attended the seminar. A survey of 139 attendees found a preference for presentations on wafer cleaning technologies. The document also promotes an automated batch spray cleaning system called the ZETA system from the company FSI International. It provides details on the system's capabilities and advantages over wet bench cleaning processes.
This document summarizes advances in developing a chlorine-free selective etching process for nickel platinum (NiPt) self-aligned silicide on 45nm logic devices with silicon-germanium (SiGe) stressors. A high-temperature, fresh sulfuric acid and hydrogen peroxide (SPM) solution is shown to effectively remove unreacted NiPt within shorter process times compared to traditional hydrochloric acid (HCl)-based etching. Specifically, an SPM-only process at 200°C reduces time by 66% to 10 minutes without platinum residue or silicide damage. This SPM-only process also demonstrates compatibility with SiGe structures and provides tighter sheet resistance distributions compared to HCl-based
Dr. Sean Tan, Head of Data Science, Changi Airport Group
Discover how Changi Airport Group (CAG) leverages graph technologies and generative AI to revolutionize their search capabilities. This session delves into the unique search needs of CAG’s diverse passengers and customers, showcasing how graph data structures enhance the accuracy and relevance of AI-generated search results, mitigating the risk of “hallucinations” and improving the overall customer journey.
For the full video of this presentation, please visit: https://www.edge-ai-vision.com/2024/06/building-and-scaling-ai-applications-with-the-nx-ai-manager-a-presentation-from-network-optix/
Robin van Emden, Senior Director of Data Science at Network Optix, presents the “Building and Scaling AI Applications with the Nx AI Manager,” tutorial at the May 2024 Embedded Vision Summit.
In this presentation, van Emden covers the basics of scaling edge AI solutions using the Nx tool kit. He emphasizes the process of developing AI models and deploying them globally. He also showcases the conversion of AI models and the creation of effective edge AI pipelines, with a focus on pre-processing, model conversion, selecting the appropriate inference engine for the target hardware and post-processing.
van Emden shows how Nx can simplify the developer’s life and facilitate a rapid transition from concept to production-ready applications.He provides valuable insights into developing scalable and efficient edge AI solutions, with a strong focus on practical implementation.
UiPath Test Automation using UiPath Test Suite series, part 6DianaGray10
Welcome to UiPath Test Automation using UiPath Test Suite series part 6. In this session, we will cover Test Automation with generative AI and Open AI.
UiPath Test Automation with generative AI and Open AI webinar offers an in-depth exploration of leveraging cutting-edge technologies for test automation within the UiPath platform. Attendees will delve into the integration of generative AI, a test automation solution, with Open AI advanced natural language processing capabilities.
Throughout the session, participants will discover how this synergy empowers testers to automate repetitive tasks, enhance testing accuracy, and expedite the software testing life cycle. Topics covered include the seamless integration process, practical use cases, and the benefits of harnessing AI-driven automation for UiPath testing initiatives. By attending this webinar, testers, and automation professionals can gain valuable insights into harnessing the power of AI to optimize their test automation workflows within the UiPath ecosystem, ultimately driving efficiency and quality in software development processes.
What will you get from this session?
1. Insights into integrating generative AI.
2. Understanding how this integration enhances test automation within the UiPath platform
3. Practical demonstrations
4. Exploration of real-world use cases illustrating the benefits of AI-driven test automation for UiPath
Topics covered:
What is generative AI
Test Automation with generative AI and Open AI.
UiPath integration with generative AI
Speaker:
Deepak Rai, Automation Practice Lead, Boundaryless Group and UiPath MVP
GraphSummit Singapore | The Future of Agility: Supercharging Digital Transfor...Neo4j
Leonard Jayamohan, Partner & Generative AI Lead, Deloitte
This keynote will reveal how Deloitte leverages Neo4j’s graph power for groundbreaking digital twin solutions, achieving a staggering 100x performance boost. Discover the essential role knowledge graphs play in successful generative AI implementations. Plus, get an exclusive look at an innovative Neo4j + Generative AI solution Deloitte is developing in-house.
Climate Impact of Software Testing at Nordic Testing DaysKari Kakkonen
My slides at Nordic Testing Days 6.6.2024
Climate impact / sustainability of software testing discussed on the talk. ICT and testing must carry their part of global responsibility to help with the climat warming. We can minimize the carbon footprint but we can also have a carbon handprint, a positive impact on the climate. Quality characteristics can be added with sustainability, and then measured continuously. Test environments can be used less, and in smaller scale and on demand. Test techniques can be used in optimizing or minimizing number of tests. Test automation can be used to speed up testing.
Unlock the Future of Search with MongoDB Atlas_ Vector Search Unleashed.pdfMalak Abu Hammad
Discover how MongoDB Atlas and vector search technology can revolutionize your application's search capabilities. This comprehensive presentation covers:
* What is Vector Search?
* Importance and benefits of vector search
* Practical use cases across various industries
* Step-by-step implementation guide
* Live demos with code snippets
* Enhancing LLM capabilities with vector search
* Best practices and optimization strategies
Perfect for developers, AI enthusiasts, and tech leaders. Learn how to leverage MongoDB Atlas to deliver highly relevant, context-aware search results, transforming your data retrieval process. Stay ahead in tech innovation and maximize the potential of your applications.
#MongoDB #VectorSearch #AI #SemanticSearch #TechInnovation #DataScience #LLM #MachineLearning #SearchTechnology
Communications Mining Series - Zero to Hero - Session 1DianaGray10
This session provides introduction to UiPath Communication Mining, importance and platform overview. You will acquire a good understand of the phases in Communication Mining as we go over the platform with you. Topics covered:
• Communication Mining Overview
• Why is it important?
• How can it help today’s business and the benefits
• Phases in Communication Mining
• Demo on Platform overview
• Q/A
Full-RAG: A modern architecture for hyper-personalizationZilliz
Mike Del Balso, CEO & Co-Founder at Tecton, presents "Full RAG," a novel approach to AI recommendation systems, aiming to push beyond the limitations of traditional models through a deep integration of contextual insights and real-time data, leveraging the Retrieval-Augmented Generation architecture. This talk will outline Full RAG's potential to significantly enhance personalization, address engineering challenges such as data management and model training, and introduce data enrichment with reranking as a key solution. Attendees will gain crucial insights into the importance of hyperpersonalization in AI, the capabilities of Full RAG for advanced personalization, and strategies for managing complex data integrations for deploying cutting-edge AI solutions.
Securing your Kubernetes cluster_ a step-by-step guide to success !KatiaHIMEUR1
Today, after several years of existence, an extremely active community and an ultra-dynamic ecosystem, Kubernetes has established itself as the de facto standard in container orchestration. Thanks to a wide range of managed services, it has never been so easy to set up a ready-to-use Kubernetes cluster.
However, this ease of use means that the subject of security in Kubernetes is often left for later, or even neglected. This exposes companies to significant risks.
In this talk, I'll show you step-by-step how to secure your Kubernetes cluster for greater peace of mind and reliability.
Alt. GDG Cloud Southlake #33: Boule & Rebala: Effective AppSec in SDLC using ...James Anderson
Effective Application Security in Software Delivery lifecycle using Deployment Firewall and DBOM
The modern software delivery process (or the CI/CD process) includes many tools, distributed teams, open-source code, and cloud platforms. Constant focus on speed to release software to market, along with the traditional slow and manual security checks has caused gaps in continuous security as an important piece in the software supply chain. Today organizations feel more susceptible to external and internal cyber threats due to the vast attack surface in their applications supply chain and the lack of end-to-end governance and risk management.
The software team must secure its software delivery process to avoid vulnerability and security breaches. This needs to be achieved with existing tool chains and without extensive rework of the delivery processes. This talk will present strategies and techniques for providing visibility into the true risk of the existing vulnerabilities, preventing the introduction of security issues in the software, resolving vulnerabilities in production environments quickly, and capturing the deployment bill of materials (DBOM).
Speakers:
Bob Boule
Robert Boule is a technology enthusiast with PASSION for technology and making things work along with a knack for helping others understand how things work. He comes with around 20 years of solution engineering experience in application security, software continuous delivery, and SaaS platforms. He is known for his dynamic presentations in CI/CD and application security integrated in software delivery lifecycle.
Gopinath Rebala
Gopinath Rebala is the CTO of OpsMx, where he has overall responsibility for the machine learning and data processing architectures for Secure Software Delivery. Gopi also has a strong connection with our customers, leading design and architecture for strategic implementations. Gopi is a frequent speaker and well-known leader in continuous delivery and integrating security into software delivery.
GraphSummit Singapore | The Art of the Possible with Graph - Q2 2024Neo4j
Neha Bajwa, Vice President of Product Marketing, Neo4j
Join us as we explore breakthrough innovations enabled by interconnected data and AI. Discover firsthand how organizations use relationships in data to uncover contextual insights and solve our most pressing challenges – from optimizing supply chains, detecting fraud, and improving customer experiences to accelerating drug discoveries.
Goodbye Windows 11: Make Way for Nitrux Linux 3.5.0!SOFTTECHHUB
As the digital landscape continually evolves, operating systems play a critical role in shaping user experiences and productivity. The launch of Nitrux Linux 3.5.0 marks a significant milestone, offering a robust alternative to traditional systems such as Windows 11. This article delves into the essence of Nitrux Linux 3.5.0, exploring its unique features, advantages, and how it stands as a compelling choice for both casual users and tech enthusiasts.
TrustArc Webinar - 2024 Global Privacy SurveyTrustArc
How does your privacy program stack up against your peers? What challenges are privacy teams tackling and prioritizing in 2024?
In the fifth annual Global Privacy Benchmarks Survey, we asked over 1,800 global privacy professionals and business executives to share their perspectives on the current state of privacy inside and outside of their organizations. This year’s report focused on emerging areas of importance for privacy and compliance professionals, including considerations and implications of Artificial Intelligence (AI) technologies, building brand trust, and different approaches for achieving higher privacy competence scores.
See how organizational priorities and strategic approaches to data security and privacy are evolving around the globe.
This webinar will review:
- The top 10 privacy insights from the fifth annual Global Privacy Benchmarks Survey
- The top challenges for privacy leaders, practitioners, and organizations in 2024
- Key themes to consider in developing and maintaining your privacy program
Enchancing adoption of Open Source Libraries. A case study on Albumentations.AIVladimir Iglovikov, Ph.D.
Presented by Vladimir Iglovikov:
- https://www.linkedin.com/in/iglovikov/
- https://x.com/viglovikov
- https://www.instagram.com/ternaus/
This presentation delves into the journey of Albumentations.ai, a highly successful open-source library for data augmentation.
Created out of a necessity for superior performance in Kaggle competitions, Albumentations has grown to become a widely used tool among data scientists and machine learning practitioners.
This case study covers various aspects, including:
People: The contributors and community that have supported Albumentations.
Metrics: The success indicators such as downloads, daily active users, GitHub stars, and financial contributions.
Challenges: The hurdles in monetizing open-source projects and measuring user engagement.
Development Practices: Best practices for creating, maintaining, and scaling open-source libraries, including code hygiene, CI/CD, and fast iteration.
Community Building: Strategies for making adoption easy, iterating quickly, and fostering a vibrant, engaged community.
Marketing: Both online and offline marketing tactics, focusing on real, impactful interactions and collaborations.
Mental Health: Maintaining balance and not feeling pressured by user demands.
Key insights include the importance of automation, making the adoption process seamless, and leveraging offline interactions for marketing. The presentation also emphasizes the need for continuous small improvements and building a friendly, inclusive community that contributes to the project's growth.
Vladimir Iglovikov brings his extensive experience as a Kaggle Grandmaster, ex-Staff ML Engineer at Lyft, sharing valuable lessons and practical advice for anyone looking to enhance the adoption of their open-source projects.
Explore more about Albumentations and join the community at:
GitHub: https://github.com/albumentations-team/albumentations
Website: https://albumentations.ai/
LinkedIn: https://www.linkedin.com/company/100504475
Twitter: https://x.com/albumentations
As most of us are already aware, photoresist exposed to ion implantation will form a dehydrogenated amorphous carbon layer. The difficulty of removing this carbonized layer is determined by the implant conditions which can have a wide variation in species, energy, dosage, and other parameters. The challenge for both ashing and all-wet PR stripping is to have the process aggressive enough to remove the carbonized surface layer on the photoresist, but still maintain low material loss. We have found that the most challenging residue is formed where the photoresist pattern meets the wafer surface and especially at the edge of the wafer near the edge-bead removal region. Any photoresist stripping process must be closely examined for its ability to remove this edge removal as it is usually the last contamination to be removed from the wafer.
This work from many years ago, recently published in a new handbook by Doering and Nishi exemplifies the difficulty in removing the carbonized crust layer. The activation energy for crust removal by ashing was found to be much higher than that for un-implanted resist